Abstract
This paper presents a design of the reticle stage for lithography using VCM(Voice Coil Motor) and kinematic analysis. The stage has three axes for X,Y,${\theta}_z$, those actuated by three VCM's individually. The reticle stage has cross coupled relations between X,Y,${\theta}_z$ axes, and the closed solution of the forward/inverse kinematics were solved to get an accurate reference position. The reticle stage for lithography was designed for reaching both high accuracy and long stroke, which was $0.1{\mu}m$ (X,Y)/ $1{\mu}rad({\theta}_z)$ accuracies and relatively long strokes about 2mm (X,Y) and 2 degrees(${\theta}_z$). Also this research presents a rotational compensation algorithm for the precision gap sensor for the stage. Simulation results show the overall performance of the whole algorithm and the improvement quantity of the rotational compensation algorithm.