• Title/Summary/Keyword: Reflection Film

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Study on characteristics of thin films for reflection of near infrared light (근적외선 반사 박막 특성 연구)

  • Chung, Youn-Gil;Park, Hyun-Sik
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.16 no.6
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    • pp.4121-4124
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    • 2015
  • Near infrared blocking function in energy saving window glass is required. The design, deposition and characteristics of optical thin films for reflection of near-infrared light were studied. The optical thin film is designed as laminated film structure with low refractive index film and high index film. Deposition experiments of $SiO_2$ and $TiO_2$ thin films with designed structure using the RF sputtering method were carried out. The characteristics of the thin film with deposition conditions were analyzed. High-refractive-index thin film of $TiO_2$/low refractive-index thin film of $SiO_2$ and high-refractive-index thin film of $TiO_2$ structure for reflection of near-infrared light was designed to be simulated. Results of simulation showed reflectance of 30% or more in the range from 930nm to 1682nm. Triple layer thin films fabricated with simulated results showed wavelength bands from 930nm to 1525nm for the reflectance of 33% or more.

Fabrication of Anti-Reflection Thin Film by Using Screen Printing Method (Screen Printing법을 이용한 반사방지막 제조)

  • Choi, Chang-Sik;Nam, Jeong-Sic;Lee, Ji-Sun;Jeon, Dae-Woo;Lee, Young-jin;Bae, Hyun;Kim, Jin-Ho
    • Korean Journal of Materials Research
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    • v.28 no.12
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    • pp.714-718
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    • 2018
  • Anti-reflection thin films are fabricated on glass substrates using the screen printing method. Tetra ethyl silicate(TEOS) and methyl tri methoxy silane(MTMS) are used as starting materials and buthyl carbitol acetate(BCA) and buthyl cellusolve(BC) are mixed to improve the viscosity of the solution. Anti-reflection thin films are fabricated according to the number of the screen mesh and the characteristics improve as the mesh size increases. The transmittance and reflectance of the coated thin film using 325 mesh are about 94 % and 0.43 % in the visible wavelength. The thickness and refractive index of the AR thin film are 107 nm and n = 1.26, respectively.

Analysis of the Spectro-ellipsometric Data with Backside Reflection from Semi-transparent Substrate by Using a Rotating Polarizer Ellipsometer (반투명 기층에 의한 후면반사를 고려한 회전검광자 방식의 타원측정 및 분석)

  • Seo, Yeong-Jin;Park, Sang-Uk;Yang, Seong-Mo;Kim, Sang-Youl
    • Korean Journal of Optics and Photonics
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    • v.22 no.4
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    • pp.170-178
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    • 2011
  • The spectroscopic ellipsometric constants are analyzed to determine the thickness and the complex refractive index of a film coated on a semi-transparent substrate, with the reflection from the backside of the substrate properly considered. Expressions representing the effect of the backside reflection on ellipsometric constants are derived using the thickness and the complex refractive index of the substrate. The thickness and the complex refractive of an ITO thin film coated on a glass substrate are obtained by using this method. The results agree quite well with the ones obtained by following the conventional modeling procedure where the backside reflection is neglected during ellipsometric measurement and analysis.

The study of Design Surface Treatment Obtained Metal Color in Magnesium Alloy

  • Lee, Jung Soon;Lee, Hee Myoung
    • Applied Science and Convergence Technology
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    • v.26 no.2
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    • pp.21-25
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    • 2017
  • The shape of the reflection spectrum is complex and appears to overlap with several signals, because the surface state is uneven due to the natural oxide film, so that the spectrum becomes a complicated signal shape divided into regions 1 and 2 due to diffuse reflection. On the other hand, it is seen that the reflection spectrum after PEO surface treatment is overlapped with several signals. In addition, the reflectance of the energy band varies from 1.32 to 1.46 eV. Usually, the MgO-type oxide film was observed at an energy band of ~4.2 eV. The thickness of the oxide film was increased as the DC voltage was increased by the thin film thickness meter (QuaNix; 7500M) after Plasma Electrolytic Oxidation (; PEO) surface treatment. This is because the higher the DC voltage, the easier the binding of the $OH^-$ ions in the solution solution and the $Mg^+$ ions of the magnesium alloy. An important part of the bonding of ordinary ions is the energy source (plasma) which can promote bonding. However, when a certain threshold voltage or more is applied, the material is adversely affected. The oxide film of the surface may be destroyed without increasing the thickness of the oxide film, that is, whitening of the material may occur.

Effects of electron reflection for the tungsten oxide film coated on shadow mask in CRT (CRT Shadow mask 위에 도포된 산화텅스텐 피막의 전자반사 효과)

  • 김상문;배준호
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.11a
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    • pp.129-132
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    • 1998
  • In this paper, we have studied the effect of electron reflection on shadow mask on which tungsten oxide film is coated and have studied the variation of beam mislanding with coating thickness in CRT. We found the method to be able to control coating thicknessed and optimum coating thickness of tungsten oxide film was 1∼2$\mu\textrm{m}$. Mislanding of electron beam was reduced about 20∼48% with increasing coating thickness in CRT

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The Study on the Reflection Coating Design Scheme in the Thin-Film Silicon Solar Cell (박막 실리콘 태양전지의 반사코팅 설계기술 연구)

  • Kim, Chang-Bong
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.12 no.11
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    • pp.5172-5177
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    • 2011
  • This paper presents a reflection coating design scheme in the thin-film silicon solar cell. The antireflection(high reflection) coating skill is needed in the front(back) panel of the thin-film solar cell to improve an efficiency of light absorbing. In the single structure a reflectivity is changed according to the thickness of coating for antireflection scheme and its minimum value can be obtained by controlling thickness of coating. In the symmetric multi layer structure low reflectivity can be obtained in the wide wavelength range. And we also find that high reflectivity can be obtained through multi layer structure, which has alternate layers of high and low material, for high reflection scheme in the back panel.

Preparation of UV curable coating solution from multi functional acrylates and characterization of optical properties of coated layer on PET film (다관능 아크릴레이트계 자외선 경화형 코팅액의 제조 및 이를 이용한 PET 필름 도막의 광학 특성 연구)

  • Lee, Soo;Jin, Seok-Hwan
    • Journal of the Korean Applied Science and Technology
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    • v.26 no.4
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    • pp.467-472
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    • 2009
  • Ultraviolet curable coating solution was prepared with poly(ethylene glycol) acrylate oligomer and various mono and multi-functional acrylate monomers. The optical properties of UV cured coating layer on PET film with acrylate coating solution containing metal oxides, such as fumed silica and alumina, were also investigated to reduce light reflection on films. Poly(ethylene glycol) diacrylate which has 575 of average molecular weight was used as oligomer acrylate, and pentaerythritol triacrylate and dipentaerythritolpenta-/hexa acrylate were used as multi-functional acrylate monomers. Also, butyl acrylate was used to improve the adhesion as well as to reduce glass transition temperature to give a better flexability. 1-hydroxy cyclohexyl phenyl ketone was used as photoinitiator. We found out the metal oxides in acrylate coating solution showed a homogeneous dispersion from energy dispersive spectroscopy data. Transmittance and light reflection of coated PET film was measured with UV/vis spectrometer and gloss meter, respectively. When 1.00 g of both metal oxides was added into coating solution, the transmittance and the glossiness were reduced from 90% to 30% and from 190 GU to 35 GU, respectively. However, adding up to 1.00 g of the metal oxide into coating solution did not affect on the hardness of coating layer and adhesion between coated layer and PET film. Conclusively, we can control transmittance and light reflection of coated film by adjusting the amounts of metal oxide in coating solution.

Optical Simulation Study on the Effect of Reflecting Properties of Reflection Films on the Performances of Collimating Films for the LCD Backlight Applications

  • Lee, Jeong-Ho;Ju, Young-Hyun;Park, Ji-Hee;Lee, Ji-Young;Nahm, Kie-Bong;Ko, Jae-Hyeon;Kim, Joong-Hyun
    • Journal of Information Display
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    • v.9 no.1
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    • pp.26-32
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    • 2008
  • The dependence of optical performances of collimating films such as prism films and pyramid films on the reflecting properties of reflection films were investigated by using a ray tracing technique. The angular distribution of the luminance and the on-axis luminance gain were obtained by using a simple backlight model composed of a reflection film, a virtual flat light source, and a collimating film. Three kinds of reflecting properties were used, which were a perfect Lambertian reflector, a perfect mirror reflector, and a reflector having both diffuse and specular properties. It was found that the on-axis luminance gain was the highest in the simulation where a mirror reflector was used, while the viewing angle was the widest where the Lambertian reflector was used. This result indicates that it is necessary to optimize the simulation condition such as the reflecting properties in order to predict the optical performances of collimating films accurately. Quantitative correlation between the optical characteristics of collimating films and the reflecting properties of reflection films can be used to improve simulation technique for the development and the optimization of collimating films for LCD backlight applications.

Anti-Reflection Coating Application of SixOy-SixNy Stacked-Layer Fabricated by Reactive Sputtering (반응성 스퍼터링으로 제작된 SixOy-SixNy 적층구조의 반사방지 코팅 응용)

  • Gim, Tzang-Jo;Lee, Boong-Joo;Shina, Paik-Kyun
    • Journal of the Korean Vacuum Society
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    • v.19 no.5
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    • pp.341-346
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    • 2010
  • In this paper, anti-reflection coating was investigated for decreasing the reflection in visible range of 400~650 [nm] through four staked layers of $Si_xO_y$ and $Si_xN_y$ thin films prepared by reactive sputtering method. Si single crystal of 6 [inch] diameter was used as a sputtering target. Ar and $O_2$ gases were used as sputtering gases for reactive sputtering for the $Si_xO_y$ thin film, and Ar and $N_2$ gases were used for reactive sputtering for the $Si_xN_y$ thin film. DC pulse power of 1900 [W] was used for the reactive sputtering. Refractive index and deposition rate were 1.50 and 2.3 [nm/sec] for the $Si_xO_y$, and 1.94 and 1.8 [nm/sec] for the $Si_xN_y$ thin film, respectively. Considering the simulation of the four layer anti-reflection coating structure with the above mentioned films, the $Si_xO_y-Si_xN_y$ stacked four-layer structure was prepared. The reflection measurement result for that structure showed that a "W" shaped anti-reflection was obtained successfully with a reflection of 1.7 [%] at 550 [nm] region and a reflection of 1 [%] at 400~650 [nm] range.

Convective Deposition of Silica Nano-Colloidal Particles and Preparation of Anti-Reflective Film by Controlling Refractive Index (콜로이드 실리카 나노입자의 부착에 의한 반사방지막 제조 및 굴절율 조절)

  • Hwang Yeon;Prevo Brian;Velev Orlin
    • Korean Journal of Materials Research
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    • v.15 no.5
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    • pp.285-292
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    • 2005
  • Anti-reflection film was coated by using spherical silica nano colloids. Silica colloid sol was reserved between two inclined slide glasses by capillary force, and particles were convectively stacked to form a film onto the substrate as the water evaporates. As the sliding speed increased, the thickness of the film decreased and the wavelength at the maximum transmittance decreased. The microstructure observed by SEM showed that silica particles were nearly close packed, which enabled the calculation of the effective refractive index of the film. The film thickness was measured by proffer and calculated from the wavelength of maximum transmittance and the effective refractive index. The effective refractive index of the film could be controlled by a subtle controlling of the coating speed and by mixing two different sized silica particles. When the 100 nm and 50 m particles were mixed at 4:1-5:1 volume ratio, the maximum transmittance of $95.2\%$ for one-sided coating was obtained. This is the one that has increased by $3.8\%$ compared to bare glass substrate, and shows that $99.0\%$ of transmittance or $1.0\%$ of reflectance can be achieved by the simple process if both sides of the substrate are coated.