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http://dx.doi.org/10.5762/KAIS.2015.16.6.4121

Study on characteristics of thin films for reflection of near infrared light  

Chung, Youn-Gil (Dept. of Electrical, Electronic and Control Engineering, Graduate School of Future Convergence Technology, Institute for information technology convergence, Hankyong National University)
Park, Hyun-Sik (Dept. of Electrical, Electronic and Control Engineering, Graduate School of Future Convergence Technology, Institute for information technology convergence, Hankyong National University)
Publication Information
Journal of the Korea Academia-Industrial cooperation Society / v.16, no.6, 2015 , pp. 4121-4124 More about this Journal
Abstract
Near infrared blocking function in energy saving window glass is required. The design, deposition and characteristics of optical thin films for reflection of near-infrared light were studied. The optical thin film is designed as laminated film structure with low refractive index film and high index film. Deposition experiments of $SiO_2$ and $TiO_2$ thin films with designed structure using the RF sputtering method were carried out. The characteristics of the thin film with deposition conditions were analyzed. High-refractive-index thin film of $TiO_2$/low refractive-index thin film of $SiO_2$ and high-refractive-index thin film of $TiO_2$ structure for reflection of near-infrared light was designed to be simulated. Results of simulation showed reflectance of 30% or more in the range from 930nm to 1682nm. Triple layer thin films fabricated with simulated results showed wavelength bands from 930nm to 1525nm for the reflectance of 33% or more.
Keywords
Near infrared; Reflection; Thin film;
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