Selective etching characteristics of ITO/semiconductor and ITO/BaTiO3 structures by reactive ion ethcing (Reactive Ion Etching에 의한 ITO/반도체 및 ITO/BaTiO3 구조의 선택적 에칭 특성)
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- Journal of the Korean Institute of Telematics and Electronics A
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- v.32A no.1
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- pp.152-158
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- 1995