• Title/Summary/Keyword: Reaction bonding

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Synthesis and Characterization of New Organotin (IV)-phenylenebisdithiocarbamate Complexes

  • Lee, Won-Ho;Jung, Ok-Sang;Sohn, Youn-Soo;Kim, Poong-Zag
    • Bulletin of the Korean Chemical Society
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    • v.7 no.6
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    • pp.421-425
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    • 1986
  • New di- and triorganotin(IV) complexes of meta- and para-phenylenebisdithiocarbamate(m- and p-pbdtc) have been synthesized and characterized by means of chemical analysis, mass spectrometry, and IR spectroscopy. The reaction of the m-pbdtc ligand with diorganotin(IV) halides resulted in 1:1 products, $R_2Sn{\cdot}m$-pbdtc (R = Me, Cy, n-Bu) of dimeric nature whereas the p-pbdtc ligand led to an oligomeric or polymeric structure. The pbdtc ligands were also reacted with triorganotin(IV) halides to form monomeric complexes, $(R_3Sn)_2{\cdot}pbdtc.$ The tin coordination chemistry of these complexes were also discussed in terms of Sn-C and Sn-S bonding modes.

Chemically Bonded Thermally Expandable Microsphere-silica Composite Aerogel with Thermal Insulation Property for Industrial Use

  • Lee, Kyu-Yeon;Phadtare, Varsha D.;Choi, Haryeong;Moon, Seung Hwan;Kim, Jong Il;Bae, Young Kwang;Park, Hyung-Ho
    • Journal of the Microelectronics and Packaging Society
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    • v.26 no.2
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    • pp.23-29
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    • 2019
  • Thermally expandable microsphere and aerogel composite was prepared by chemical compositization. Microsphere can produce synergies with aerogel, especially an enhancement of mechanical property. Through condensation between sulfonated microsphere and hydrolyzed silica sol, chemically-connected composite aerogel could be prepared. The presence of hydroxyl group on the sulfonated microsphere was observed, which was the prime functional group of reaction with hydrolyzed silica sol. Silica aerogel-coated microsphere was confirmed through microstructure analysis. The presence of silicon-carbon absorption band and peaks from composite aerogel was observed, which proved the chemical bonding between them. A relatively low thermal conductivity value of $0.063W/m{\cdot}K$ was obtained.

Structural behavior of steel beams strengthened with CFRP strips and cables

  • Lim, Donghwan
    • Steel and Composite Structures
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    • v.42 no.3
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    • pp.289-298
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    • 2022
  • In the present study, structural behavior of steel beams strengthened with CFRP strips and cables was investigated by a series of experiments. For this purpose, two groups of experimental studies were carried out: one for the beam series strengthened only with CFRP strips and the other for the steel beam series strengthened with CFRP strips and prestressed wires. From this test, it is found that the flexural stiffness and strength of the steel beams strengthened with CFRP strips and cables were significantly improved comparing to the un-strengthened one. Three failure modes such as sudden de-bonding, splitting and rupturing of CFRP strips were observed. The ultimate tensile strains of attached CFRP strips on the steel beams were noticed in the range between 8,000με and 11,000με, and this result disclose the perfect composite reaction CFRP strips and steel beams.

Evaluation of Shrinkage Properties of Tiles Reinforced with Epoxy Resin Adhesive (에폭시 수지 접착제를 보강한 타일의 수축특성 평가)

  • Lee, Sang-Kyu;Kim, Gyu-Yong;Hwang, Eui-Chul;Son, Min-Jae;Lee, Sang-yun;Nam, Jeong-Soo
    • Proceedings of the Korean Institute of Building Construction Conference
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    • 2020.11a
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    • pp.163-164
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    • 2020
  • The purpose of this study was to evaluate the shrinkage properties of a tile reinforced with epoxy resin, which has the advantages of high adhesion and low shrinkage, and causes a hardening reaction by chemical bonding with cement mortar. As a result, since the epoxy resin adhesive suppresses the moisture evaporation of the mortar, the drying shrinkage of the mortar itself is reduced, accordingly, the shrinkage of the tile itself is greatly reduced, and it is thought that it is possible to prevent a decrease in adhesion due to shear stress.

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Annealing Effect on Adhesion Between Oxide Film and Metal Film (산화막위에 증착된 금속박막과 산화막과의 계면결합에 영향 미치는 열처리 효과)

  • Kim Eung Soo
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.41 no.1
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    • pp.15-20
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    • 2004
  • The interfacial layer between the oxide film and the metal film according to RTP annealing temperature of metal film has been studied. Two types of oxides, BPSG and PETEOS, were used as a bottom layer under multi-layered metal films. We observed the interface between oxide and metal films using SEM (scanning electron microscopy), TEM (transmission electron microscopy), AES (auger electron spectroscopy). Bonding failure was occurred by interfacial reaction between the BPSG oxide and the multi-layered metal films above $650^{\circ}C$ RTP anneal. The phosphorus accumulation layer was observed at interface between BPSG oxide and metal films by AES and TEM measurements. On the other hand, bonding was always good in the sample using PETEOS oxide as a bottom layer. We have known that adhesion between BPSG and multi-layered metal films was improved when the sample was annealed below $650^{\circ}C$.

Effects of the Brazing Bonding between Al2O3 and STS304 with an Ion Beams (이온빔을 이용한 STS304와 알루미나 브레이징 접합효과)

  • Park, Il-Soo
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.16 no.12
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    • pp.8679-8683
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    • 2015
  • Using a surface modification technique, ion beam assisted deposition (IBAD) of Ti thin film it becomes possible to prepare an active ceramic surface to braze $Al_2O_3$-STS304 with conventional Ag-Cu eutectic composition filler metal. Researches on bonding formations at interfaces of ceramic joints were mainly related on the development of filler metals to ceramic, the process parameters, and clarifications of reaction products. From the results, the reactive brazing is a very convenient technique compared to the conventional Mn-Mo method. However melting point of reactive filler is still higher than that of Ag-Cu eutectic and it forms the brittle inter metallic compound. Recently several new approaches are introduced to overcome the main shortcomings of the reactive metal brazing in ceramic-metal, metal vapor vacuum arc ion source was introduced to implant the reactive element directly into the ceramics surface, and sputter deposition with sputter etching for the deposition of active material.

A Study on the Brazed Joint of Duplex Stainless Steel with Ni Base Insert Metal (Ni기 인서트금속을 이용한 2상 스테인리스강의 브레이징 접합부에 관한 연구)

  • Rhee, Byong-Ho;Ma, Chang-Ik;Kim, Dae-Up
    • Journal of the Korean Society for Aeronautical & Space Sciences
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    • v.30 no.8
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    • pp.65-70
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    • 2002
  • The brazing of duplex stainless steels which is an essential process for rocket engine manufacturing has been investigated on bonding phenomena and shear strength. The UNS32550 was used for base metal, and the MBF-50 was used for insert metal. Brazing was carried out under the various conditions (brazing temperature : 1473K, 1498K, holding time : 0, 0.3, 0.9, 1.8 ks). There were various phases in the joint because of reaction between liquid insert metal and base metal, In the early stage, BN is formed in the bonded interlayer and base metal near the bonded layer. Cr nitride is formed in the bonded interlayer. The amount of BN and Cr nitride decrease with the increase of holding time. Superior shear strength of 550MPa is obtained by restraining the formation of nitride.

Kinetic Study on Nucleophilic Displacement Reactions of 2-Chloro-4-Nitrophenyl X-Substituted-Benzoates with Primary Amines: Reaction Mechanism and Origin of the α-Effect

  • Um, Tae-Il;Kim, Min-Young;Kim, Tae-Eun;Um, Ik-Hwan
    • Bulletin of the Korean Chemical Society
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    • v.35 no.2
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    • pp.436-440
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    • 2014
  • The ${\alpha}$-Effect; Ground state; Transition state; Intramolecular H-bonding; Yukawa-Tsuno plot; Second-order rate constants for aminolysis of 2-chloro-4-nitrophenyl X-substituted-benzoates (1a-h) have been measured spectrophotometrically in 80 mol % $H_2O/20$ mol % DMSO at $25.0^{\circ}C$. The Br${\emptyset}$nsted-type plot for the reactions of 2-chloro-4-nitrophenyl benzoate (1d) with a series of primary amines curves downward, which has been taken as evidence for a stepwise mechanism with a change in rate-determining step (RDS). The Hammett plots for the reactions of 1a-h with hydrazine and glycylglycine are nonlinear while the Yukawa-Tsuno plots exhibit excellent linearity with ${\rho}_X=1.22-1.35$ and ${\gamma}= 0.57-0.59$, indicating that the nonlinear Hammett plots are not due to a change in RDS but are caused by stabilization of substrates possessing an electron-donating group (EDG) through resonance interactions between the EDG and C=O bond of the substrates. The ${\alpha}$-effect exhibited by hydrazine increases as the substituent X changes from a strong EDG to a strong electron-withdrawing group (EWG). It has been concluded that destabilization of hydrazine through the electronic repulsion between the adjacent nonbonding electrons is not solely responsible for the substituent dependent ${\alpha}$-effect but stabilization of the transition state is also a plausible origin of the ${\alpha}$-effect.

The Effect of Nb-doped TiO2 Coating for Improving Stability of NiCrAl Alloy Foam (NiCrAl 합금 폼의 안정성 향상을 위해 코팅된 Nb-doped TiO2의 효과)

  • Jo, Hyun-Gi;Shin, Dong-Yo;Ahn, Hyo-Jin
    • Korean Journal of Materials Research
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    • v.29 no.5
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    • pp.328-335
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    • 2019
  • Nb-doped $TiO_2$(NTO) coated NiCrAl alloy foam for hydrogen production is prepared using ultrasonic spray pyrolysis deposition(USPD) method. To optimize the size and distribution of NTO particles based on good physical and chemical stability, we synthesize particles by adjusting the weight ratio of the Nb precursor solution(5 wt%, 10 wt% and 15 wt%). The morphological, chemical bonding, and structural properties of the NTO coated NiCrAl alloy foam are investigated by X-ray diffraction(XRD), X-ray photo-electron spectroscopy(XPS), and Field-Emission Scanning Electron Microscopy(FESEM). As a result, the samples of controlled Nb weight ratio exhibit a common diffraction pattern at ${\sim}25.3^{\circ}$, corresponding to the(101) plane, and have chemical bonding(O-Nb=O) at 534 eV. The NTO particles with the optimum weight ratio of N (10 wt%) show a uniform distribution with a size of ~18.2-21.0 nm. In addition, they exhibit the highest corrosion resistance even in the electrochemical stability estimation. As a result, the introduction of NTO coated NiCrAl alloy foam by USPD improves the chemical stability of the NiCrAl alloy foam by protecting the direct electrochemical reaction between the foam and the electrolyte. Thus, the optimized NTO coating can be proposed for excellent protection of NiCrAl alloy foam for hydrocarbon-based steam methane reforming(SMR).

A Study on the etching mechanism of $CeO_2$ thin film by high density plasma (고밀도 플라즈마에 의한 $CeO_2$ 박막의 식각 메커니즘 연구)

  • Oh, Chang-Seok;Kim, Chang-Il
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.38 no.12
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    • pp.8-13
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    • 2001
  • Cerium oxide ($CeO_2$) thin film has been proposed as a buffer layer between the ferroelectric thin film and the Si substrate in Metal-Ferroelectric-Insulator-Silicon (MFIS) structures for ferroelectric random access memory (FRAM) applications. In this study, $CeO_2$ thin films were etched with $Cl_2$/Ar gas mixture in an inductively coupled plasma (ICP). Etch properties were measured for different gas mixing ratio of $Cl_2$($Cl_2$+Ar) while the other process conditions were fixed at RF power (600 W), dc bias voltage (-200 V), and chamber pressure (15 mTorr). The highest etch rate of $CeO_2$ thin film was 230 ${\AA}$/min and the selectivity of $CeO_2$ to $YMnO_3$ was 1.83 at $Cl_2$($Cl_2$+Ar gas mixing ratio of 0.2. The surface reaction of the etched $CeO_2$ thin films was investigated using x-ray photoelectron spectroscopy (XPS) analysis. There is a Ce-Cl bonding by chemical reaction between Ce and Cl. The results of secondary ion mass spectrometer (SIMS) analysis were compared with the results of XPS analysis and the Ce-Cl bonding was monitored at 176.15 (a.m.u). These results confirm that Ce atoms of $CeO_2$ thin films react with chlorine and a compound such as CeCl remains on the surface of etched $CeO_2$ thin films. These products can be removed by Ar ion bombardment.

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