• Title/Summary/Keyword: Random-Access-Memory(RAM)

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Design and Implementation of Automatic Installation System for Application Synchronization in PDA (개인 휴대단말에서 응용 프로그램 동기화를 위한 자동설치 시스템의 설계 및 구현)

  • Na, Seung-Won;Oh, Se-man
    • The KIPS Transactions:PartA
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    • v.10A no.6
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    • pp.685-690
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    • 2003
  • The application for PDA as a new wireless Internet device is variously developed to improve the function of PDA, and the application software must be installed to PDAs. In addition. when the power supply of PDA becomes fully discharged, all data stored in the RAM (Random Access Memory) could be vanished, and then the application programs should be reinstalled. This paper presents an automatic installation system of application program, PAIS (PDA Automatic Installation System). It is designed to solve the problem of PDA that PDA's users have to install the application programs on their PDA themselves. When this engine is applied, PDA users can save the time and effort for installation. It's convenient for the PDA users. The PDA and application software company can save the cost to create materials to explain the installation process.

Field-induced Resistive Switching in Ge-Se Based ReRAM

  • Lee, Gyu-Jin;Eom, Jun-Gyeong;Jeong, Ji-Su;Jang, Hye-Jeong;Kim, Jang-Han;Jeong, Hong-Bae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.342-342
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    • 2012
  • Resistance-change Random Access Memory (ReRAM), which utilizes electrochemical control of nanoscale quantities of metal in thin films of solid electrolyte, shows great promise as a future solid state memory. The technology utilizes the electrochemical formation and removal of metallic pathways in thin films of solid electrolyte. Key attributes are low voltage and current operation, excellent scalability, and a simple fabrication sequence. In this study, we investigated the nature of thin films formed by photo doping of Ag+ ions into chalcogenide materials for use in solid electrolyte of programmable metallization cell devices. We measured the I-V characteristics by field-effect of the device. The results imply that a Ag-rich phase separates owing to the reaction of Ag with free atoms from chalcogenide materials.

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Dicon Report

  • Im, Yeong-Mo
    • Digital Contents
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    • no.8 s.159
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    • pp.66-71
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    • 2006
  • 예전에 모뎀을 통한 PC통신이 한창 유행할 때, ROM족이라는 유행어가 있었다. RAM(Random Access Memory)과 함께 컴퓨터의 기억장치로 활용되는, 읽기만 가능한 저장매체(Read Only Memory)를 뜻하는 용어였다. 그런데 이 용어는 이 속성을 빗대어 게시판을 읽기만 하는 회원(Read Only Member)을 가리키는 말로도 쓰였다. 정보화시대에 있어서 정보라는 것, 비록 형태가 없는 것들이 대부분이지만 이 역시 누군가가 사용하기 위해서는 누군가가 만들어내야 한다. 수요와 공급이 일어나는 정보 유통 구조다. 혹자는 ROM족으로 소비생활에만 치중하지만, 또 다른 혹자들은 소비와 생산을 동시에 하는 프로슈머(ProSumer) 역할을 한다. 이번호에서는 이러한 생산성을 띤 소비자들에 대한 이야기를 하고자 한다.

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Nonvolatile Memory and Photovoltaic Devices Using Nanoparticles

  • Kim, Eun Kyu;Lee, Dong Uk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.79-79
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    • 2013
  • Quantum-structures with nanoparticles have been attractive for various electronic and photonic devices [1,2]. In recent, nonvolatile memories such as nano-floating gate memory (NFGM) and resistance random access memory (ReRAM) have been studied using silicides, metals, and metal oxides nanoparticles [3,4]. In this study, we fabricated nonvolatile memories with silicides (WSi2, Ti2Si, V2Si) and metal-oxide (Cu2O, Fe2O3, ZnO, SnO2, In2O3 and etc.) nanoparticles embedded in polyimide matrix, and photovoltaic device also with SiC nanoparticles. The capacitance-voltageand current-voltage data showed a threshold voltage shift as a function of write/erase voltage, which implies the carrier charging and discharging into the metal-oxide nanoparticles. We have investigated also the electrical properties of ReRAM consisted with the nanoparticles embedded in ZnO, SiO2, polyimide layer on the monolayered graphene. We will discuss what the current bistability of the nanoparticle ReRAM with monolayered graphene, which occurred as a result of fully functional operation of the nonvolatile memory device. A photovoltaic device structure with nanoparticles was fabricated and its optical properties were also studied by photoluminescence and UV-Vis absorption measurements. We will discuss a feasibility of nanoparticles to application of nonvolatile memories and photovoltaic devices.

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A Comparative Study of PRAM-based Join Algorithms (PRAM 기반의 조인 알고리즘 성능 비교 연구)

  • Choi, Yongsung;On, Byung-Won;Choi, Gyu Sang;Lee, Ingyu
    • Journal of KIISE
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    • v.42 no.3
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    • pp.379-389
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    • 2015
  • With the advent of non-volatile memories such as Phase Change Memory (PCM or PRAM) and Magneto Resistive RAM (MRAM), active studies have been carried out on how to replace Dynamic Random-Access Memory (DRAM) with PRAM. In this paper, we study both endurance and performance issues of existing join algorithms that are based on PRAM-based computer systems and have been widely used until now: Block Nested Loop Join, Sort-Merge Join, Grace Hash Join, and Hybrid Hash Join. Our experimental results show that the existing join algorithms need to be redesigned to improve both the endurance and performance of PRAMs. To the best of our knowledge, this is the first research to scientifically study the results of the four join algorithms running on PRAM-based systems. In this work, our main contribution is the modeling and implementation of a PRAM-based simulator for a comparative study of the existing join algorithms.

A High Performance Flash Memory Solid State Disk (고성능 플래시 메모리 솔리드 스테이트 디스크)

  • Yoon, Jin-Hyuk;Nam, Eyee-Hyun;Seong, Yoon-Jae;Kim, Hong-Seok;Min, Sang-Lyul;Cho, Yoo-Kun
    • Journal of KIISE:Computing Practices and Letters
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    • v.14 no.4
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    • pp.378-388
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    • 2008
  • Flash memory has been attracting attention as the next mass storage media for mobile computing systems such as notebook computers and UMPC(Ultra Mobile PC)s due to its low power consumption, high shock and vibration resistance, and small size. A storage system with flash memory excels in random read, sequential read, and sequential write. However, it comes short in random write because of flash memory's physical inability to overwrite data, unless first erased. To overcome this shortcoming, we propose an SSD(Solid State Disk) architecture with two novel features. First, we utilize non-volatile FRAM(Ferroelectric RAM) in conjunction with NAND flash memory, and produce a synergy of FRAM's fast access speed and ability to overwrite, and NAND flash memory's low and affordable price. Second, the architecture categorizes host write requests into small random writes and large sequential writes, and processes them with two different buffer management, optimized for each type of write request. This scheme has been implemented into an SSD prototype and evaluated with a standard PC environment benchmark. The result reveals that our architecture outperforms conventional HDD and other commercial SSDs by more than three times in the throughput for random access workloads.

High Security FeRAM-Based EPC C1G2 UHF (860 MHz-960 MHz) Passive RFID Tag Chip

  • Kang, Hee-Bok;Hong, Suk-Kyoung;Song, Yong-Wook;Sung, Man-Young;Choi, Bok-Gil;Chung, Jin-Yong;Lee, Jong-Wook
    • ETRI Journal
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    • v.30 no.6
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    • pp.826-832
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    • 2008
  • The metal-ferroelectric-metal (MFM) capacitor in the ferroelectric random access memory (FeRAM) embedded RFID chip is used in both the memory cell region and the peripheral analog and digital circuit area for capacitance parameter control. The capacitance value of the MFM capacitor is about 30 times larger than that of conventional capacitors, such as the poly-insulator-poly (PIP) capacitor and the metal-insulator-metal (MIM) capacitor. An MFM capacitor directly stacked over the analog and memory circuit region can share the layout area with the circuit region; thus, the chip size can be reduced by about 60%. The energy transformation efficiency using the MFM scheme is higher than that of the PIP scheme in RFID chips. The radio frequency operational signal properties using circuits with MFM capacitors are almost the same as or better than with PIP, MIM, and MOS capacitors. For the default value specification requirement, the default set cell is designed with an additional dummy cell.

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Convergence Study on Fabrication and Plasma Module Process Technology of ReRAM Device for Neuromorphic Based (뉴로모픽 기반의 저항 변화 메모리 소자 제작 및 플라즈마 모듈 적용 공정기술에 관한 융합 연구)

  • Kim, Geunho;Shin, Dongkyun;Lee, Dong-Ju;Kim, Eundo
    • Journal of the Korea Convergence Society
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    • v.11 no.10
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    • pp.1-7
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    • 2020
  • The manufacturing process of the resistive variable memory device, which is the based of neuromorphic device, maintained the continuity of vacuum process and applied plasma module suitable for the production of the ReRAM(resistive random access memory) and process technology for the neuromorphic computing, which ensures high integrated and high reliability. The ReRAM device of the oxide thin-film applied to the plasma module was fabricated, and research to improve the properties of the device was conducted through various experiments through changes in materials and process methods. ReRAM device based on TiO2/TiOx of oxide thin-film using plasma module was completed. Crystallinity measured by XRD rutile, HRS:LRS current value is 2.99 × 103 ratio or higher, driving voltage was measured using a semiconductor parameter, and it was confirmed that it can be driven at low voltage of 0.3 V or less. It was possible to fabricate a neuromorphic ReRAM device using oxygen gas in a previously developed plasma module, and TiOx thin-films were deposited to confirm performance.

Resistive Switching Characteristics of Hafnium Oxide Thin Films Sputtered at Room Temperature (상온에서 RF 스퍼터링 방법으로 증착한 Hafnium Oxide 박막의 저항 변화 특성)

  • Han, Yong;Cho, Kyoung-Ah;Yun, Jung-Gwon;Kim, Sang-Sig
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.9
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    • pp.710-712
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    • 2011
  • In this study, we fabricate resistive switching random access memory (ReRAM) devices constructed with a Al/$HfO_2$/ITO structure on glass substrates and investigate their memory characteristics. The hafnium oxide thin film used as a resistive switching layer is sputtered at room temperature in a sputtering system with a cooling unit. The Al/$HfO_2$/ITO device exhibits bipolar resistive switching characteristics, and the ratio of the high resistance (HRS) to low resistance states (LRS) is more than 60. In addition, the resistance ratio maintains even after $10^4$ seconds.

A study on VLSI circuit design using PLA (PLA를 이용한 VLSI의 회로설계에 관한 연구)

  • Song Hong-Bok
    • Journal of the Korea Computer Industry Society
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    • v.7 no.3
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    • pp.205-215
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    • 2006
  • In this paper, a method how to make Programmable Logic Array (PLA) design and inspection of circuit relative to recent 64bit microprocessor simple and easy was discussed. A design method using Random Access Memory (RAM), Read Only Memory (ROM) and PLA has been settled down in Very Large Scale Integrated Circuit (VLSI) and logical design, modifying circuit and inspection are easy in PLA so it holds fairly good advantages in the aspect of performance and cost. It is expected PLA will also occupy an important position as a basic factor in designing VLSI in the future.

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