• 제목/요약/키워드: RF oscillation

검색결과 102건 처리시간 0.037초

960 MHz 다층구조 VCO 발진특성 (Oscillation Characteristics of the Multi-Layered VCO for using 960 MHz Band)

  • 이동희;박귀남;이헌용
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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    • pp.653-656
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    • 2002
  • In this paper, we present the simulation results of multi-layer VCO(voltage controlled oscillator), which is composed of resonator, oscillator, and buffer circuit, using EM simulator and nonlinear RF circuit simulator. EM simulator is used for obtaining the EM(Electromagnetic) characteristics of conductor pattern as well as designing the multi-layer VCO. Obtained EM characteristics were used as real components in nonlinear RF circuit simulation. Finally the overall VCO was simulated by the nonlinear RF circuit simulator. The material for the circuit pattern was Ag and the dielectric was DuPont 951AT, which will be applied for LTCC process. The structure of multi-layer VCO is constructed with 4 conducting layer. Simulated results showed that the output level was about 4.5 [dBm], the phase noise was -104 [dBc/Hz] at 30 [kHz] offset frequency, the harmonics -8 dBc, and the control voltage sensitivity of 30 [MHz/V] with a DC current consumption of 9.5 [mA]. The size of VCO is $6{\times}9{\times}2$ mm(0.11[cc]).

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Decrease of Parasitic Capacitance for Improvement of RF Performance of Multi-finger MOSFETs in 90-nm CMOS Technology

  • Jang, Seong-Yong;Kwon, Sung-Kyu;Shin, Jong-Kwan;Yu, Jae-Nam;Oh, Sun-Ho;Jeong, Jin-Woong;Song, Hyeong-Sub;Kim, Choul-Young;Lee, Ga-Won;Lee, Hi-Deok
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제15권2호
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    • pp.312-317
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    • 2015
  • In this paper, the RF characteristics of multi-finger MOSFETs were improved by decreasing the parasitic capacitance in spite of increased gate resistance in a 90-nm CMOS technology. Two types of device structures were designed to compare the parasitic capacitance in the gate-to-source ($C_{gs}$) and gate-to-drain ($C_{gd}$) configurations. The radio frequency (RF) performance of multi-finger MOSFETs, such as cut-off frequency ($f_T$) and maximum-oscillation frequency ($f_{max}$) improved by approximately 10% by reducing the parasitic capacitance about 8.2% while maintaining the DC performance.

TDD-OFDMA 방식의 귀환 신호 제거 디지털 RF 중계기 설계 및 구현 (The Design and Implementation of TDD-OFDMA Feedback Signal Cancellation(FSC) Digital RF Repeater)

  • 류규태;김대연;박세준
    • 한국정보통신설비학회:학술대회논문집
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    • 한국정보통신설비학회 2006년도 하계학술대회
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    • pp.57-61
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    • 2006
  • As high speed internet users are tremendously increasing, three are keenly in need of development of high speed portable internet technology which can provide high quality wireless internet service cheaply even in the mobile. Unlike the FDD-CDMA, TDD-OFDMA has relatively poor wave environment with inducing interference, fading and delay because it agrees to multi-carrier modulation method and time-division radio telecommunication system. To solve this problem, it is necessary to develop repeater operating by digital signal processing method which have more strict wireless channel control and wave signal processing technology over TDD telecommunication equipments. This thesis is dealing with design and implementation of Digital RF Repeater which implemented 'Synchronization Acquisition Unit', 'TDD signal switching Unit', 'Feedback Signal Cancellation Unit'. Over this argument, we will develop digital RF repeater with more cheap, more adaptive in wave environment like oscillation control, adaptive wave monitoring and output increasing and having control function as a result it will be helpful for success in high speed portable internet service business.

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게이트 리세스 식각 방법에 따른 PHEMT 특성 변화 (Analysis of characteristics of PHEMT's with gate recess etching method)

  • 이한신;임병옥;김성찬;신동훈;전영훈;이진구
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2002년도 하계종합학술대회 논문집(2)
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    • pp.249-252
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    • 2002
  • we have studied the characteristics of PHEMT's with gate recess etching method. The DC characterization of PHTMT fabricated with the wide single recess methods is a maximum drain current density of 319.4 ㎃/mm and a peak transconductance of 336.7 ㎳/mm. The RF measurements were obtained in the frequency range of 1~50GHz. At 50GHz, 3.69dB of 521 gain were obtained and a current gain cut-off frequency(f$_{T}$) of 113 CH and a maximum frequency of oscillation(f$_{max}$) of 172 Ghz were achieved from this device. On the other hand, a maximum drain current of 367 mA/mm, a peak transconduclancc of 504.6 mS/mm, S$_{21}$ gain of 2.94 dB, a current gain cut-off frequency(f$_{T}$) of 101 CH and a maximum frequency of oscillation(f$_{max}$) of 113 fa were achieved from the PHEMT's fabricated by the .narrow single recess methods.methods.

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$0.13{\mu}m$ CMOSFET의 차단주파수 및 최대진동주파수 특성 분석 (Analysis of Cuoff Frequency and Maximum Oscillation Frequency Characteristics for $0.13{\mu}m$ CMOSFET)

  • 김종혁;이성현;김영욱
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2006년도 하계종합학술대회
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    • pp.539-540
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    • 2006
  • The dependence of cutoff frequency and maximum oscillation frequency of $0.13{\mu}m$ CMOS transistors on layout parameters such as the unit gate width and gate finger number is measured and analyzed in this paper. This information will be very useful for high performance RF IC design.

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AlGaN/GaN HEMT 전력소자 시뮬레이션에 관한 연구 (A Study on the Simulation of AlGaN/GaN HEMT Power Devices)

  • 손명식
    • 반도체디스플레이기술학회지
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    • 제13권4호
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    • pp.55-58
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    • 2014
  • The next-generation AlGaN/GaN HEMT power devices need higher power at higher frequencies. To know the device characteristics, the simulation of those devices are made. This paper presents a simulation study on the DC and RF characteristics of AlGaN/GaN HEMT power devices. According to the reduction of gate length from $2.0{\mu}m$ to $0.1{\mu}m$, the simulation results show that the drain current at zero gate voltage increases, the gate capacitance decreases, and the maximum transconductance increases, and thus the cutoff frequency and the maximum oscillation frequency increase. The maximum oscillation frequency maintains higher than the cutoff frequency, which means that the devices are useful for power devices at very high frequencies.

2단계 게이트 리세스 방법으로 제작한 100 nm mHEMT 소자의 DC 및 RF 특성 (DC and RF Characteristics of 100-nm mHEMT Devices Fabricated with a Two-Step Gate Recess)

  • 윤형섭;민병규;장성재;정현욱;이종민;김성일;장우진;강동민;임종원;김완식;정주용;김종필;서미희;김소수
    • 한국전자파학회논문지
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    • 제30권4호
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    • pp.282-285
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    • 2019
  • 본 연구에서는 2단계 게이트 리세스 방법을 사용하여 T-형 게이트 길이가 100 nm인 mHEMT 소자를 제작하였다. 제작한 소자는 65 mA의 드레인전류($I_{dss}$), 1090 mS/mm의 트랜스콘덕턴스($g_m$), -0.65 V의 문턱전압 ($V_{th}$) 등의 DC 특성을 보였다. 또한 차단주파수($f_T$) 190 GHz와 최대 공진주파수($f_{MAX}$) 260 GHz인 우수한 고주파 특성을 나타내었다. 제작한 mHEMT 소자는 향후에 W-대역의 MMIC 개발에 활용될 수 있을 것으로 기대된다.

InAlAs/InGaAs/GaAs 100 nm-게이트 MHEMT 소자의 에피 구조 최적화 설계에 관한 연구 (Optimization Study on the Epitaxial Structure for 100nm-Gate MHEMTs with InAlAs/InGaAs/GaAs Heterostructure)

  • 손명식
    • 반도체디스플레이기술학회지
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    • 제10권4호
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    • pp.107-112
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    • 2011
  • This paper is for improving the RF frequency performance of a fabricated 100nm ${\Gamma}$-gate MHEMT, scaling down vertically for the epitaxy-structure layers of the device. Hydrodynamic simulation parameters are calibrated for the fabricated MHEMT with the modulation-doped $In_{0.52}Al_{0.48}As/In_{0.53}Ga_{0.47}$As heterostructure grown on the GaAs substrate. With these calibrated parameters, simulations for the vertically-scaled epitaxial layers of the device are performed and analyzed for DC/RF characteristics, including the quantization effect due to the thickness reduction of InGaAs channel layer. A newly designed epitaxy-structure device shows higher extrinsic transconductance, $g_m$ of 1.556 S/mm, and higher frequency performance, $f_T$ of 222.5 GHz and $f_{max}$ of 849.6 GHz.

mm파 AlGaAs/InGaAs/GaAs Power PM-HEMT 제작 연구 (Fabrication of AlGaAs/InGaAs/GaAs Pseudomorphic HEMT's for mm waves.)

  • 이성대;허종곤이일형이진구
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 1998년도 추계종합학술대회 논문집
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    • pp.633-636
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    • 1998
  • In this study, power AlGaAs/InGaAs/GaAs PM-HEMT's for mm wave's were fabricated using Electron beam lithography and air-bridge techniques, and so on. DC and AC characteristics of the fabricated power PM-HEMTs were measured under the various bias conditions. For example, DC and RF characteristics such as S21 gain of 3.6 dB at 35 ㎓, current gain cut-off frequencies of 45 ㎓ and maximum oscillation frequencies of 100 ㎓ were carefully analyzed for design methodology of sub-mm wave power devices.

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내화금속 다이오드에서 전자기에너지 발전에 관한 연구 (Generation of Electromagnetic Energy in a Refractory Metal Thermionic Diode)

  • Lee, Deuk-Yong
    • 대한전기학회논문지
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    • 제41권7호
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    • pp.823-828
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    • 1992
  • A thermionic energy converter test station is constructed for the study of electromagnetic energy generation. Of particular interest is the frequency variations due to changes in the interelectrode gap, the electrode temperature, and the cesium vapor pressure. It is found experimentally that the most intense ratio-frequency(rf) oscillations occur at two non-overlapping regions.

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