• 제목/요약/키워드: RF Heating

검색결과 142건 처리시간 0.024초

평면형 마이크로 가스센서 (Planar-Type Micro Gas Sensor)

  • 이상윤;정완영;이덕동
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1998년도 추계학술대회 논문집
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    • pp.101-104
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    • 1998
  • A new planar-type micro gas sensor was designed and fabricated on silicon substrate and the operating characteristics of the sensor were investigated. The thin sensitive film of the sensor was fabricated by spin-coating of the SnO$_2$ sol solution which was synthesized by hydrothermal method. The spin-coating method for preparation of sensing layer was adopted to improve the long-term stability of the fabricated sensing film instead of physical methods such as rf sputtering and thermal evaporation. The fabricated microsensor showed a fairly good sensing performance for CO gas in air at 250$^{\circ}C$ The sensitivity(S=Ra/Rg) was shown to be about 5 to 2000ppm CO with heating power of 50mW.

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Thermite Reaction Between CuO Nanowires and Al for the Crystallization of a-Si

  • Kim, Do-Kyung;Bae, Jung-Hyeon;Kim, Hyun-Jae;Kang, Myung-Koo
    • Transactions on Electrical and Electronic Materials
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    • 제11권5호
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    • pp.234-237
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    • 2010
  • Nanoenergetic materials were synthesized and the thermite reaction between the CuO nanowires and the deposited nano-Al by Joule heating was studied. CuO nanowires were grown by thermal annealing on a glass substrate. To produce nanoenergetic materials, nano-Al was deposited on the top surface of CuO nanowires. The temperature of the first exothermic reaction peak occurred at approximately $600^{\circ}C$. The released heat energy calculated from the first exothermic reaction peak in differential scanning calorimetry, was approximately 1,178 J/g. The combustion of the nanoenergetic materials resulted in a bright flash of light with an adiabatic frame temperature potentially greater than $2,000^{\circ}C$. This thermite reaction might be utilized to achieve a highly reliable selective area crystallization of amorphous silicon films.

스퍼터 증착된 CdS 박막의 $CdCl_2$를 이용한 열처리 효과 (Effects of $CdCl_2$ Heat Treatment on the Properties of Sputter Deposited CdS Films)

  • 이재형;최성헌;이동진;정학기;임동건;양계준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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    • pp.63-64
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    • 2005
  • CdS thin films were fabricated by rf magnetron sputter technique, and annealed in tube furnace using vacuum evaporated $CdCl_2$ layer, In addition, effects of the thickness of $CdCl_2$ layer and the annealing temperature on structural and optical properties of CdS films were investigated. The heat treatment process was carried out by heating the sample in air at $350-500^{\circ}C$ for 20 minute.

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Modeling and Experimental Study of Radio-frequency Glow Discharges and Applications for Plasma Processing

  • Kang, Nam-Jun
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.179-179
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    • 2012
  • Low pressure radio-frequency glow discharges are investigated using theoretical modeling and various experimental diagnostic methods. In the calculations, global models and transformer models are developed to understand the chemical kinetics as well as the electrical properties such as the effective collision frequency, the heating mechanism and the power transferred to the plasma electrons. In addition, Boltzmann equation solver is used to compensate the effect of the electron energy distribution function (EEDF) shape in the global model, and the general expression of energy balance for non-Maxwellian electrons is developed. In the experiments, a number of traditional plasma diagnostic methods are used to compare with calculated results such as Langmuir probe, optical emission spectroscopy (OES), optical absorption spectroscopy (OAS) and two-photon absorption laser-induced fluorescence (TALIF). These theoretical and experimental methods are applied to understand several interesting phenomena in low pressure ICP discharges. The chemical and physical properties of low pressure ICP discharges are described and the applications of these methods are discussed.

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열처리에 따른 AlN 단결정의 결정성에 관한 연구 (A study on the crystallinity of AlN single crystals by heat treatment)

  • 강승민
    • 한국결정성장학회지
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    • 제27권3호
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    • pp.105-109
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    • 2017
  • 고주파 유도 가열 장치를 이용하여 승화법으로 성장된 AlN 단결정을 질소 분위기 하에서 $1200^{\circ}C$$1500^{\circ}C$에서 열처리하였다. 열처리 후 단결정 시편들의 표면을 광학현미경으로 관찰하였으며, DCXRD(Double crystal X-ray Diffractometry)를 이용하여 FWHM(Full width of half maximum) 값을 측정하여 결정성의 변화를 평가하였다.

Effect of a ZnO Buffer Layer on the Structural, Optical and Electrical Properties of TIO/ZnO Bi-layered Films

  • Choe, Su-Hyeon;Park, Yun-Je;Choi, Jin-Young;Kim, Daeil
    • 한국표면공학회지
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    • 제52권6호
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    • pp.289-292
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    • 2019
  • Transparent and conducting titanium doped indium oxide (TIO) thin films were deposited by RF magnetron sputtering on zinc oxide (ZnO)-coated glass substrates to investigate the effect of the ZnO buffer layer on optical and electrical properties of TIO/ZnO bi-layered films. TIO 90 nm / ZnO 10 nm films having a lower resistivity (3.09×10-3 Ωcm) and a higher visible transmittance (80.3%) than other TIO/ZnO films were prepared in this study. Figure of merit results indicate that a 10 nm thick ZnO thin film is an effective buffer layer that enhances optical transmittance and electrical conductivity of TIO films without intentional substrate heating or post-deposition annealing.

한빛 자기거울 장치의 고주파 가열 시스템에 대한 등가회로 모델 정립 및 정합 특성 분석 (Establishment of an Equivalent Circuit Model and Analysis of Impedance Matching Characteristics of RF-Heating System in Hanbit Magnetic Minor Device)

  • 이종규;윤남식;박병호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.568-569
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    • 2005
  • 한빛 자기거울 장치는 고온 플리즈마 물성을 연구하기 위한 장치로서 플러즈마 밀도 형성을 위한 slot 형 안테나 고주파 가열 시스템이 중앙 진공용기에 설치되어 있다. 본 연구에서는 이러한 고주파 전송선로, 임피던스 정합 network. 장치 임피던스를 포함하는 한빛 장치의 고주파 가열 시스템에 대하여 기존에 정립된 고주파 가열 이론[1]을 기반으로 하여 이론적인 해석만으로 구성된 회로모델을 완성하였다. 임피던스 정합 소자 값들은 임피던스 정합 조건으로 결정함으로써 다양한 장치 및 플라즈마 변수들의 함수로 표현하여 그 의존성을 조사하였다.

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2차원 동역학 시뮬레이션을 활용한 부분적으로 자화된 용량성 결합 플라즈마 전산 모사 (2D Kinetic Simulation of Partially Magnetized Capacitively Coupled Plasma Sources)

  • 손성현;박준범;정경재
    • 반도체디스플레이기술학회지
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    • 제22권1호
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    • pp.118-123
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    • 2023
  • Partially magnetized capacitively coupled plasma (CCP) sources are investigated using a two-dimensional kinetic simulation code named EDIPIC-2D. A converging numerical solution was obtained for CCP with a 60 MHz power source, while properly capturing the dynamics of electrons and power absorption over a single RF period. The effects of magnetic fields with different orientations were evaluated. Axial magnetic fields caused changes in the spatial distribution of plasma density, affecting the loss channel. Transverse magnetic fields enhanced stochastic heating near the powered electrode, leading to an increase in plasma density while the significant E×B drift loss compensated for this rise.

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주파수 도메인 반사파 측정법을 이용한 플라즈마 공정장비 상태변화 연구 (Status Change Monitoring of Semiconductor Plasma Process Equipment)

  • 이윤상;홍상진
    • 반도체디스플레이기술학회지
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    • 제23권1호
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    • pp.52-55
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    • 2024
  • In this paper, a state change study was conducted through Frequency Domain Reflectometry (FDR) technology for the process chamber of plasma equipment for semiconductor manufacturing. In the experiment, by direct connecting the network analyzer to the RF matcher input of the 300 mm plasma enhanced chemical vapor deposition (PECVD) chamber, S11 was measured in a situation where plasma was not applied, and the frequency domain reacting to the chamber state change was searched. Response factors to changes in the status, such as temperature, spacing of the heating chuck, internal pressure difference, and process gas supply state were confirmed. Through this, the frequency domain in which a change in the reflection value was detected through repeated experiments. The reliability of the measured micro-displacement was verified through reproducibility experiments.

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싸이리스터와 다이오드 소자를 이용하는 입력 ESD 보호방식의 비교 연구 (A Comparison Study of Input ESD Protection schemes Utilizing Thyristor and Diode Devices)

  • 최진영
    • 대한전자공학회논문지SD
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    • 제47권4호
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    • pp.75-87
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    • 2010
  • 표준 CMOS 공정에서 제작 가능한 보호용 싸이리스터 소자와 다이오드 소자를 사용하는 RF IC용 두 가지 입력 ESD 보호회로 방식을 대상으로, 2차원 소자 시뮬레이터를 이용하는 DC 해석, 혼합모드 과도해석 및 AC 해석을 통해 보호용 소자내 격자온도 상승 및 입력버퍼단의 게이트 산화막 인가전압 측면에서의 HBM ESD 보호강도에 대한 심도있는 비교 분석을 시도한다. 이를 위해, 입력 ESD 보호회로가 장착된 CMOS 칩의 입력 HBM 테스트 상황에 대한 등가회로를 구성하고, 5가지 HBM 테스트 모드에 대해 최대 6개의 보호용 소자를 포함하는 혼합모드 과도 시뮬레이션을 시행하고 그 결과를 분석함으로써 실제 테스트에서 발생할 수 있는 문제점들에 대한 상세한 분석을 시도한다. 이 과정에서 보호용 소자 내 바이폴라 트랜지스터의 트리거를 수월케 하는 방안을 제안하며, 두 가지 보호회로 방식에서 내부회로의 게이트 산화막 파괴는 보호용 소자 내에 존재하는 NMOS 구조의 접합 항복전압에 의해 결정됨을 규명한다. RF IC용 입력 보호회로로서의 두 가지 보호방식의 특성 차이에 대해 설명하는 한편, 각 보호용 소자와 회로의 설계와 관련되는 유용한 기준을 제시한다.