• Kyungpook Mathematical Journal
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• v.55 no.2
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• pp.373-382
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• 2015

In this paper, we introduce and study a new multivalued mapping in $\mathbb{R}$-trees, called k-strictly pseudononspreading. We also introduce a new two-step iterative process for two k-strictly pseudononspreading multivalued mappings in $\mathbb{R}$-trees. Strong convergence theorems of the proposed iteration to a common fixed point of two k-strictly pseudononspreading multivalued mappings in $\mathbb{R}$-trees are established. Our results improve and extend the corresponding results existing in the literature.

• Bulletin of the Korean Chemical Society
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• v.32 no.2
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• pp.407-410
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• 2011

An isolable activated ester, diethyl thiophosphoryl [(Z)-(2-aminothiazol-4-yl)-2-(methoxyimino)acetate (9a, DAMA) was prepared in high purity, which was at least stable for 7 d at $25^{\circ}C$ and 6 months at $5^{\circ}C$. Its reaction with 7-ACA (4) in the presence of tributylamine in i-PrOH provided cefotaxime (1) of high purity in good yield. Preparation of DAMA and its reaction with 7-ACA (4) to 1 was performed in one-pot manner, respectively with minimal unit operations of stirring and filtration.

• The Korean Journal of Applied Statistics
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• v.29 no.2
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• pp.369-379
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• 2016

The Sigma Level, proposed by Motorola Inc., is one of the many Process Capability Index (PCI)'s that have been presented since the 1970's. It is used to evaluate process capability and unlike other PCI's, it has an advantage in that it uses population probability distribution. However, it is originally designed for mass production and is inadequate to evaluate prototypes or early products in the R&D stages. For use in such cases, we propose an R&D target Sigma Level, derived by considering 1.5 sigma shifts in traditional sigma level from a statistical point of view. We also explain the way to find robust limits for design tolerance because the sigma level or defect probability is useful to establish economical tolerance limits at the R&D stage and mass production.

• Membrane Journal
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• v.12 no.2
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• pp.67-74
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• 2002

Submerged membrane bioreactor(SMBR) and reverse osmosis(R/O) systems treated dye wastewater for reusing of industrial water. The permeate fluxes of SMBR at 20-25 cmHg of lab. test and field test were 10 LMH($1/m^2$.hr) all test. Removal efficiencies of CODcr, $COD_{Mn}$ and T-N were 93%, 90% and 60% in the SMBR, respectively The advanced treatment of combined process(SMBR+R/0) was accomplished for increasing the removal efficiency of non-biodegradable materials and T-N. Therefore, the removal efficiency of T-N obtained in 80% above, then nitrogen concentration was under 15 mg/L. The combined process(SMBR+R/0) was suitable to reuse of the dye wastewater.

• Journal of Korean Society of Environmental Engineers
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• v.22 no.6
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• pp.1093-1101
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• 2000

The object of this study was to develop new BNR process using fixed-biofilm which could be applied to retrofit the existing wastewater treatment plant or to introduce as tertiary treatment plant. To achieve complete denitrification from typical raw sewage in Korea, external carbon source must be supplied because $SCOD_{cr}/T-N(NH_4{^+}-N+NOx-N)$of raw sewage was lower than other countries. In this study, the ratio of $SCOD_{cr}/NH_4{^+}-N$ was 2.49 and the influent $NH_4{^+}$-N concentration during the experimental period was varied from 25 to 37 mg/L. To enhance nitrogen removal from the sewage, the two processes using fixed biofilm were adopted as R-Hanoxic/mid.settler/aerobic/anoxic/ aerobic) and R-2(aerobic/mid.settlerlanoxic/anoxic/aerobic), respectively. In the comparison of $NH_4{^+}$-N, T-N effluent quality and T-N removal efficiency in both processes without external carbon source, R-1 process was better than R-2 process for nitrogen removal from raw sewage. With respect to $SCOD_{cr}$/NOx-N ratio and total nitrogen removal in each anoxic reactor of two processes, R-1's was more effective than R-2's for distributing organic matters of raw sewage. In the both processes using fixed biofilm, the amount of required alkalinity to remove unit $NH_4{^+}$-N were 5.18 and 5.76($g{\cdot}CaCO_3/g{\cdot}NH_4{^+}-N_{removed}$), respectively and were lower than activated sludge BNR process(7.14).

• Journal of the Korean Society of Systems Engineering
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• v.13 no.2
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• pp.34-41
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• 2017

The Pyro project, one of the large national R&D project to construct Korea Advanced Pyroprocessing Facility (KAPF), which has many goals such as development of pyro technology and process equipment, design of equipment and facility, construction, and test operation, is now under research and development. To reduce uncertainty and risk of such complex project, the technical management processes in systems engineering standards and NASA handbook were reviewed, and then the ten common technical management processes were selected for the large national R&D project to meet its goal successfully. And the essential technical management processes were finally suggested for Pyro project in consideration of current situation of the project.

• Journal of Internet Computing and Services
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• v.19 no.2
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• pp.43-48
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• 2018

Various artifacts that are produced as software R&D project progresses contain research plan, research report, software requirements and design descriptions, etc. When conducting a software R&D project, it is necessary to confirm that the developed system has implemented its research requirements well. However, various research results make it difficult to design appropriate tests. So, there is a practical need for us to comprehensively handle the planning, execution, and reporting of software test for finding and verifying information related to the research. In this paper, we propose a useful method for software test process in R&D project which supports model based software testing. The proposed method supports automation of test design and generation of test data by explicitly separating each step of System Under Test (SUT). The method utilizes the various models representing the control flow of the function to extract the information necessary for testing the system. And it supports a systematic testing process based on TMMi and ISO 29119. Finally, we show the validity of the method by implementing a prototype with basic functionality to generate test data from software behavioral models.

• Journal of the Microelectronics and Packaging Society
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• v.22 no.4
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• pp.25-29
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• 2015

Demand for a low-cost, high-throughput, and high-resolution patterning method for fabricating devices continues to increase. The roll-to-roll (R2R) imprint lithography technique has received a great deal of attention as a means of fabricating next-generation devices. In this paper, we propose a fabrication method for polymeric planar lightwave circuit (PLC) devices that uses R2R imprint lithography. The proposed technique uses an elastomeric polydimethylsiloxane (PDMS) mold. A Si wafer with micro patterns is used as the Si master. The PDMS mold is then replicated from the Si master. By applying a precise web tension and at a given web speed, we fabricated a micro-patterned PLC device. The insertion losses were 4.0 dB for a $1{\times}2$ optical splitter. As such, the proposed method of fabricating a PLC device by the R2R process was shown to be an effective solution.

• Communications of the Korean Mathematical Society
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• v.11 no.2
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• pp.471-480
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• 1996

Consider a strong Markov process $X^0$ that has continuous sample paths in the closed cone $\bar{G}$ in $R^d(d \geq 3)$ such that the process behaves like a ordinary Brownian motion in the interior of the cone, reflects instantaneously from the boundary of the cone and is absorbed at the vertex of the cone. It is shown that $X^0(t)$ has a representation $R(t) \ominus (t)$ where $R(t) \in [0, \infty)$ and $\ominus(t) \in S^{d-1}$, the surface of the unit ball.

• 한국정보디스플레이학회:학술대회논문집
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• 2004.08a
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• pp.1244-1247
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• 2004

For obtaining the best panel quality of color filter on array(COA) architecture in TFF LCD, we investigated the influence of deposition temperature, $O_2$ flow, thickness on the optical transmittance, wet etching and adhesion properties of IZO deposited onto each color photo resist(red, green, blue). Average transmittance of the pixel single layer in the visible range(between 380 and 780nm) was mainly affected by thickness and showed maximum at 1250 ${\AA}$ while the thickness showing peak transparency in each R, G, B wavelength was different. The relation was calculated by using bi-layer transmission and reflectance model, which corresponded to experimental data very well. The adhesion of IZO deposited on each color PR was found to have enhanced value except red PR case, compared to that of IZO which was deposited on $SiN_x$. Wet etching pattern linearity was decreased as the thickness increased. The thickness of IZO was one of vital factors in order to optimize overall pixel process for fabricating COA structure.