• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.94-97
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• 2003

A precise fabrication technology of glass is increasingly demanded fer the latest Industrial applications of spherical lenses. micro-optical components, laser applications and so on. Most of cases, the surface roughness of glass is required to be minute for improving the optical characteristics. Then. the machining characteristics of SF-5 glass and quarts glass were studied by using the ELID grinding process to get mirror surface and productivity compared with a general lapping process. A rotary type grinder with ELID generator was used to make the mirror surface of glass and a Mitutoyo surface tester and a nano-hardness tester were also used to measure the grinded surface or glass. As the results of experiments. they showed that the surface roughness(Ra) of SF-5 glass was under 7.8 nm and that of quartz glass was under 3.0 nm using the # 8000 grinder. So, the possibility of highly efficient and accurate surface for optical components can be achieved by the ELID grinding process.

• 한국정밀공학회지
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• 제20권7호
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• pp.56-62
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• 2003

The precision fabrication of glass is increasingly demanded for the latest industrial applications of spherical lenses, micro-optical components, and so on. In many cases, the surface roughness of glass is required to be minute for improving the optical characteristics. In this paper, machining characteristics of SF-5 glass and quarts glass are studied by using the ELID grinding process to get mirror surface and productivity compared with a general lapping process. A rotary type grinder with air spindle was used for the experiments. Mitutoyo surface tester and AFM were also used to measure the grinded surface of glass. As the results of experiments, they showed that the surface roughness (Ra) of SF-5 glass was under 7.8 nm and that of quartz glass was under 3.0 m using the # 8000 grinder. So, the possibility of highly efficient and accurate surface for optical components can be achieved by the ELID grinding process.

• Nuclear Engineering and Technology
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• 제53권6호
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• pp.2025-2037
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• 2021

The influence of lead cations on natural quartz (QZ) from Egypt as a glass shielding material for the composition with nominal formula (10Na₂O - (90 - x) QZ - xPbO (where x = 30, 35, 40, 45 and 50 mol %)) was examined. The studied samples are synthesized via the melt quenching method at 1050 ℃. The X-ray diffraction XRD patterns were confirmed the glass nature for studied samples. Moreover, the optical properties, and the transparency for all compositions were examined by UV-Vis spectroscopy. Also, the major elemental composition of the natural quartz were estimated via the X-ray fluorescence (XRF) technique. Further, the density and molar volume were determined. Furthermore, the nuclear shielding parameters such as, mass attenuation coefficient, effective atomic number, electronic density, the total atomic, and electronic cross sections as well as the mean free path, and the half value layer with different gamma ray energies (81 keV-1407 keV) were calculated. Besides, the results showed that the shielding behavior towards the gamma ray radiation for all glass samples was increased as the increment in PbO concentration in the glass system.

• 한국분말재료학회지
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• 제20권2호
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• pp.134-137
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• 2013

The quartz glasses were prepared by fumed silica powders sintering method at $1210^{\circ}C$, $1230^{\circ}C$, $1250^{\circ}C$ in air and the effect of sintering temperature on their properties were investigated. The X-ray diffraction pattern, the OH concentration, the light transmittance, the apparent porosity and the density were analyzed. The transparent quartz glass were obtained above $1230^{\circ}C$. The OH-group and macroscopic pores were removed above $1230^{\circ}C$ and highest density and light transmittance were obtained at $1250^{\circ}C$.

• 한국세라믹학회지
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• 제21권3호
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• pp.209-216
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• 1984

The influence of the particle size of quartz and the change of cooling rate to the strength of conventional triaxial porcelain was studied, . The results indicate that 1. The residual quartz content was increased by particle size increasing. And the strength was increased by increas-ing residual quartz content which increased the total stress in the specimen. But the influence of residual quartz was lessened by the extent of crack between quartz particle and glass matrix 2. In order to increase the strength of the body fast cooling is suitable to small quartz particle and slow cooling is suitable to large quartz particle.

• Current Optics and Photonics
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• 제7권4호
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• pp.337-344
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• 2023

Three-point bending is the main method for measuring the elastic modulus of a thin plate. Although various displacement transducers may be used to measure the bending, these are single-point measurements, and it is difficult to eliminate the error caused by eccentric load and shear force. Error-correction models for the elastic modulus of quartz glass using digital speckle interferometry are proposed for eccentric load and shear force. First, the positional misalignment between maximum deflection and load is analyzed, and the error caused by eccentric load is corrected. Then, the additional displacement caused by shear force at different positions of the quartz glass plate is explored. The effect of shear deformation is also corrected, by measuring two points. Since digital speckle interferometry has the advantage of full-field measurement, it can simultaneously obtain deflection data for multiple points to realize error correction. Experimental results are presented to demonstrate that the proposed model can effectively correct the measurement error of the elastic modulus.

• 한국결정성장학회지
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• 제32권3호
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• pp.115-120
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• 2022

반도체 웨이퍼용 실리콘 잉곳 제조과정에서 사용되는 석영유리 도가니 내측표면의brownish ring (BR)에 대해 연구하였다. BR의 크기는 20~30 ㎛이고 비대칭 갈색 고리형태이다. 도가니 위치에 따라 BR의 크기와 분포가 상이하며, Si 잉곳 성장시 도가니 온도가 가장 높은 round 부가 가장 크고 많았다. BR은 석영유리보다 열팽창계수가 큰 cristobalite를 함유하고 있어 표면 crack이 나타나는 것으로 판단된다. BR의 발색 현상과 p in hole은 산소 결손에 의한 것으로 생각된다.

• 한국분말재료학회지
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• 제19권6호
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• pp.412-415
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• 2012

The quartz glasses were prepared by sintering of fumed silica powders and the effect of OH concentration on their surface on sintering was studied. Through the firing process, the fumed silica was crystallized from 1180 to $1260^{\circ}C$ region. The amount of hydroxyl group decreased with increase in calcination temperature and consequently the crystallization was prevented. A transparent quartz glass was obtained from fumed silica, previously calcined at $1000^{\circ}C$, by the sintering at $1250^{\circ}C$ for 1 h.

• 한국결정성장학회지
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• 제4권3호
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• pp.238-244
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• 1994

보로실리케이트 유리기판과 석영기판을 사용하여 $800^{\circ}C~520^{\circ}C$의 온도 범위에서 용액 성장법에 의한 다결정 실리콘 박막의 성장에 관해 조사 하였다. 기판상에는 용애과의 젖음성을 좋게 해주기 위해 박막의 알루미늄츠오가 실리콘층이 증착되었으며, 용매로는 알루미늄과 실리콘옥사이드와의 반응에 의해서 일어난다. 결정립 크기가 수백 마이크론까지 이르는 실리콘을 얻을 수 있었으며, 석영기 판의 경우에는 보르실리 케이트 유리기판보다 강한 (111) 우선 성장 방향을 보여주고 있다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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• pp.1103-1107
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• 2005

Single-crystal silicon thin films on glass (SOG) and on fused-quartz (SOQ) were prepared using wafer bonding and hydrogen-induced layer transfer. Thinfilm transistors (TFTs) were subsequently fabricated. The high-temperature processed SOQ TFTs show better device performance than the low-temperature processed SOG TFTs. Tensile and compressive strain was measured respectively on SOQ and SOG. Consistent with the tensile strain, enhanced electron effective mobility was measured on the SOQ TFTs.