• 한국표면공학회지
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• 제48권4호
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• pp.179-184
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• 2015

Quadrupole Mass Spectrometers (QMS) is a very useful tool in vacuum process diagnosis. Tungsten filament based ion sources are vulnerable to contamination from process gas monitoring. Common symptoms of quadrupole mass spectrometer malfunction is appearance of unwanted contaminant mass peaks or no detection of any ion peaks. We disassembled used quadrupole mass spectrometer and found out black insulating deposits on inside of ion source parts. Five steps of cleaning procedure were applied and almost full restoration of functions were confirmed in two types of closed ion source quadrupole mass spectrometer. By using a numerical modeling (CFD-ACE+) technique, the electric potential profile of ion source with/without insulating deposit was calculated and showed the possibility of quadrupole mass spectrometer malfunction by the deterioration of designed potential profile inside the ion source.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2014년도 추계학술대회 논문집
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• pp.169-170
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• 2014

반도체, 디스플레이 산업 등의 진공공정이 사용되면서 공정 중에 내부기체 종류와 양을 정확한 측정하기 위해서 QMS (Quadrupole Mass Spectrometer)가 사용되고 있다. 이온전류 변화로 공정분석을 진행하므로 필라멘트로 인한 오염과 이온소스의 오염은 치명적으로 작용한다.

• 한국진공학회지
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• 제16권2호
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• pp.91-98
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• 2007

한국표준과학연구원 진공기술센터에서 잔류기체분석기 교정장치를 개발하였으며, 이 장치를 이용하여 서로 다른 구조를 가진 두개의 사중극 질량분석기 (quadrupole mass spectrometer)의 질소, 아르곤, 헬륨에 대한 기체감도를 측정하였다. 그 결과 기체감도는 QMS 구조와 상관없이 기체의 질량이 클수록 높게 나타났고 압력에 따라서도 다른 특성을 보였으므로 정확한 사용을 위해서는 기체감도를 꼭 보정해야 함을 알 수 있었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2008년도 제34회 동계학술대회 초록집
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• pp.374-374
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• 2008

• Applied Science and Convergence Technology
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• 제24권5호
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• pp.142-150
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• 2015

A failure analysis of tungsten filaments used in quadrupole mass spectrometer for plasma process monitoring was carried by using SEM and EDS. Failed at high temperature, filaments showed two kinds of failure modes. The one is that diameter of filament became thinner gradually and finally snapped. The other is that filament abruptly snapped almost at a right angle. The EDS analysis showed Fe and C, including W and Fe, on the surface of failed filament. when failed filaments were treated with plasma in mixture of Ar and $CF_4$, the amount of Fe and C decreased. The failure analysis of filament showed that the cause of filament failure is thermal evaporation and grain growth of tungsten at high temperature.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권4호
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• pp.204-208
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• 2006

In this study, we investigated the ion energy distributions in a chlorine based inductively coupled plasma by quadrupole mass spectrometer with an electrostatic ion energy analyzer. Ion energy distributions are presented for various plasma parameters such as $BCl_3/Ar$ gas mixing ratio, RF power, and process pressure. As the $BCl_3/Ar$ gas mixing ratio and process pressure decreases, and RF power increases, the saddle-shaped structures is enhanced. The reason is that there are ionized energy difference between $BCl_3$ and Ar, change of plasma potential, alteration of mean free path. and variety of ion collision in the sheath.

• 한국전기전자재료학회논문지
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• 제13권7호
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• pp.563-567
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• 2000

We presented the etch results of indium-tin oxide thin films by using SF$_{6}$/O$_2$gas electron cyclotron resonance plasma and conducted X-ray phtoelectron spectroscopy and quadrupole mass spectrometer analyses for the etch characteristics. The etch rate of the films was greatly dependent on that of oxygen which was the major constituent element of the films. The oxygen was removed by the forms like $O_2$or SOF$_2$. We examined the ratio of atomic content of O and In and the change of this ratio was related to the removal rate of InF$_{x}$ and the S-metal bonding.ing.

• Bulletin of the Korean Chemical Society
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• 제22권8호
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• pp.883-888
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• 2001

We describe an ion-surface scattering apparatus newly developed to investigate the reactive scattering process of low-energy alkali-metal ions at surfaces. The apparatus consists of an alkali-metal ion gun that is rotatable by 360°, a quadrupole mass spectrometer (QMS) with an ion energy analyzer, a sample manipulator with a heating-and-cooling stage, and an ultrahigh vacuum (UHV) chamber that houses these components. Preliminary experimental results obtained from the apparatus are presented on angular and energy distributions of the ions scattered from clean Pt(111) and water-adsorbed Pt surfaces.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.104-104
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• 2011

사중극 질량분석기(Quadrupole Mass Spectrometer, QMS)의 신뢰성을 향상시키기 위해 이온소스를 개선하고 평가하였다. 공정가스에 의한 오염 및 charging 효과로 인해 이온전류가 감소하는 현상을 발견하였고 이를 개선하기 위해 이온소스의 표면 거칠기를 줄여서 신뢰성을 향상시켰다. 또한 이온소스를 평가하는 방법으로 희석된 혼합가스를 이용하여 MDPP (Minimum Detectable Partial Pressure)를 측정하였고 이를 위해 희석된 가스의 이온 전류와 배경 노이즈의 비율(Signal/Noise)을 극대화시키면서 QMS를 튜닝하였다. 이 평가방법을 이용하여 상용 이온소스와 한국표준과학연구원에서 제작한 두 종류의 이온소스를 평가 비교하였다. QMS에 대한 국제표준안(ISO/TC 112 CD14291) 제정을 위한 진행상황도 소개하려고 한다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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• pp.187-190
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• 2004

In this study, PST thin films were etched with inductively coupled $Cl_2/(Cl_2+Ar)$ plasmas. The etch characteristics of PST thin films as a function of $Cl_2/(Cl_2+Ar)$ gasmixtures were analyzed by using quadrupole mass spectrometer (QMS). Systematic studies were carried out as a function of the etching parameters, including the RF power and the working pressure. The maximum PST film etch rate is 56.2 nm/min, because a small addition of $Cl_2$ to the $Cl_2/Ar$ mixture increased the chemical effect. It was proposed that sputter etching is the dominant etching mechanism while the contribution of chemical reaction is relatively low due to low volatility of etching products.