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Diagnostics of Inductively Coupled $BCl_3/Ar$ Plasma Characteristics Using Quadrupole Mass Spectrometer  

Kim, Gwan-Ha (중앙대학 전자전기공학부)
Kim, Chang-Il (중앙대학 전자전기공학부)
Publication Information
The Transactions of the Korean Institute of Electrical Engineers C / v.55, no.4, 2006 , pp. 204-208 More about this Journal
Abstract
In this study, we investigated the ion energy distributions in a chlorine based inductively coupled plasma by quadrupole mass spectrometer with an electrostatic ion energy analyzer. Ion energy distributions are presented for various plasma parameters such as $BCl_3/Ar$ gas mixing ratio, RF power, and process pressure. As the $BCl_3/Ar$ gas mixing ratio and process pressure decreases, and RF power increases, the saddle-shaped structures is enhanced. The reason is that there are ionized energy difference between $BCl_3$ and Ar, change of plasma potential, alteration of mean free path. and variety of ion collision in the sheath.
Keywords
Plasma Diagnostics; QMS; EEDF; ICP; $Ar/BCl_3$;
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