• Title/Summary/Keyword: Pure Nickel

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Corrosion Behavior of a High-Manganese Austenitic Alloy in Pure Zinc Bath

  • Yi, Zhang;Liu, Junyou;Wu, Chunjing
    • Corrosion Science and Technology
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    • v.9 no.2
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    • pp.98-103
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    • 2010
  • In order to further reduce the cost without reducing the corrosion resistance, a high-manganese austenitic alloy for sink roll or stabilizer roll in continuous hot-dip coating lines was developed. A systematic study of corrosion behavior of the high-manganese austenitic alloy in pure zinc bath at $490^{\circ}C$ was carried out. The results shows that, the high-manganese austenitic alloy shows better corrosion resistance than 316L steel. The corrosion rate of the high-manganese austenitic alloy in pure zinc bath is calculated to be approximately $6.42{\times}10^{-4}g{\cdot}cm^{-2}{\cdot}h^{-1}$, while the 316L is $1.54{\times}10^{-3}g{\cdot}cm^{-2}{\cdot}h^{-1}$. The high-manganese austenitic alloy forms a three-phase intermetallic compound layer morphology containing ${\Gamma$}, ${\delta}$ and ${\zeta}$ phases, while the 316L is almost ${\zeta}$ phase. The ${\Gamma}$ and ${\delta}$ phases of the high-manganese austenitic alloy contain about 8.5 wt% Cr, the existence of Cr improve the stabilization of phases, which slow down the reaction of Fe and Zn, improve the corrosion resistance of the high-manganese austenitic alloy. So substitute the nickel with the manganese to manufacture the high-manganese austenitic alloy of low cost is feasible.

Characterization of Nanostructure and Electronic Properties of Catalytically Grown Carbon Nanofiber (촉매법으로 제조한 나노탄소섬유의 미세구조 및 전기적 특성 제어 연구)

  • 김명수;우원준;송희석;임연수;이재춘
    • Journal of the Korean Ceramic Society
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    • v.37 no.4
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    • pp.345-353
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    • 2000
  • Carbon nanofibers were prepared from the decomposition of various carbon-containing gases over pure Ni, pure Fe and their alloys with Cu. They yields, properties, and structure of carbon nanofibers obtained from the various reaction conditions were analyzed. Type of reacting gas, reaction temperature and catalyst composition were changed as the reaction variable. With Ni-Cu catalysts, the maximum yields of carbon nanofibers were obtained at temperatures between 550 and 650$^{\circ}C$ according to the reacting gas mixtures of C2H2-H2, C2H4-H2 and C3H8-H2, and the surface areas of the carbon nanofibers produced were 20∼350㎡/g. In the case of CO-H2 mixture, the rapid deposition of carbon nanofibers occurred with Fe-Cu catalyst and the maximum yield were obtained around 550$^{\circ}C$ with the range of surface areas of 140∼170㎡/g. The electrical resistivity of carbon nanofiber regarded as the key property of filler for the application of electromagnetic interference shielding was very sensitive to the type of reactant gas and the catalyst composition ranging 0.07∼1.5Ωcm at a pressure of 10000 psi, and the resistivity of carbon nanofibers produced over pure nickel catalyst were lower than those over alloy catalysts. SEM observation showed that the carbon nanofibers produced had the diameters ranging 20∼300 nm and the straight structure of carbon nanofibers changed into the twisted or helical conformation by the variation of reacting gas and catalyst composition.

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Formation Temperature Dependence of Thermal Stability of Nickel Silicide with Ni-V Alloy for Nano-scale MOSFETs

  • Tuya, A.;Oh, S.Y.;Yun, J.G.;Kim, Y.J.;Lee, W.J.;Ji, H.H.;Zhang, Y.Y.;Zhong, Z.;Lee, H.D.
    • Proceedings of the IEEK Conference
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    • 2005.11a
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    • pp.611-614
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    • 2005
  • In this paper, investigated is the relationship between the formation temperature and the thermal stability of Ni silicide formed with Ni-V (Nickel Vanadium) alloy target. The sheet resistance after the formation of Ni silicide with the Ni-V showed stable characteristic up to RTP temperature of $700\;^{\circ}C$ while degradation of sheet resistance started at that temperature in case of pure-Ni. Moreover, the Ni silicide with Ni-V indicated more thermally stable characteristic after the post-silicidation annealing. It is further found that the thermal robustness of Ni silicide with Ni-V was highly dependent on the formation temperature. With the increased silicidation temperature (around $700\;^{\circ}C$), the more thermally stable Ni silicide was formed than that of low temperature case using the Ni-V.

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Thermal Stability Improvement of Ni-Germanide Using Ni-N(1%) for Nano Scale Ge-MOSFET Technology (나노급 Ge-MOSFET를 위한 Ni-N(1%)을 이용한 Ni-germanide의 열 안정성 개선)

  • Yim, Kyeong-Yeon;Park, Kee-Young;Zhang, Ying-Ying;Li, Shi-Guang;Zhong, Zhun;Jung, Soon-Yen;Lee, Ga-Won;Wang, Jin-Suk;Lee, Hi-Deok
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.17-18
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    • 2008
  • In this paper, 1%-nitrogen doped Nickel was used for improvement of thermal stability of Ni-Germanide. Proposed Ni-N(1%)/TiN structure has shown better thermal stability, sheet resistance and less agglomeration characteristic than pure Ni/TiN structure. During the germanidation process, it is believed that the nitrogen atoms in the deposited nickel layer can suppress the agglomeration of Ni germanide by retarding the diffusion of Ni atoms toward silicon layer, hence improve the thermal stability of Ni-germanide.

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Study of Thermal Stability of Ni Silicide using Ni-V Alloy

  • Zhong, Zhun;Oh, Soon-Young;Lee, Won-Jae;Zhang, Ying-Ying;Jung, Soon-Yen;Li, Shi-Guang;Lee, Ga-Won;Wang, Jin-Suk;Lee, Hi-Deok;Kim, Yeong-Cheol
    • Transactions on Electrical and Electronic Materials
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    • v.9 no.2
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    • pp.47-51
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    • 2008
  • In this paper, thermal stability of Nickel silicide formed on p-type silicon wafer using Ni-V alloy film was studied. As compared with pure Ni, Ni-V shows better thermal stability. The addition of Vanadium suppresses the phase transition of NiSi to $NiSi_2$ effectively. Ni-V single structure shows the best thermal stability compared with the other Ni-silicide using TiN and Co/TiN capping layers. To enhance the thermal stability up to $650^{\circ}C$ and find out the optimal thickness of Ni silicide, different thickness of Ni-V was also investigated in this work.

Pulse electrodeposition and characterization of Ni-$TiO_2$ nano composite coatings

  • Cho, Sung-Hun;Gyawali, Gobinda;Woo, Dong-Jin;Lee, Soo-Wohn
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2011.05a
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    • pp.153-153
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    • 2011
  • Ni $TiO_2$ nano composite coatings were fabricated by using pulse current electrodeposition technique at 100 Hz pulse frequency with a constant 50% pulse duty cycles and reference was taken with respect to the direct current electrodeposition. The properties of the composite coatings were investigated by using SEM, XRD, Wear test and Vicker's microhardness test. XRD patterns of pulse deposited composite coatings were found to be changed from preferred (100) orientation to the random mixed orientations. The results demonstrated that the Vickers microhardness of composite coatings under pulse condition was significantly improved than that of pure nickel coating as well as direct current electrodeposited Ni-$TiO_2$ composite coatings. Wear tracks have shown the less plastic deformation at pulse condition with reduced coefficient of friction. Nickel matrix grain size was also found to be lower in pulse plated composite coatings as compared to direct current electrodeposited composite coatings.

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Synthesis and Magnetic Properties of Nanocrystalline Fe-Ni Alloys During Hydrogen Reduction of NiFe2O4 (NiFe2O4의 수소환원에 의한 나노구조 Fe-Ni 합금의 제조 및 자성특성)

  • Paek, Min Kyu;Do, Kyung Hyo;Bahgat, Mohamed;Pak, Jong Jin
    • Korean Journal of Metals and Materials
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    • v.49 no.1
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    • pp.52-57
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    • 2011
  • Nickel ferrite ($NiFe_2O_4$) powder was prepared through the ceramic route by calcination of a stoichiometric mixture of nickel oxide (NiO) and iron oxide ($Fe_2O_3$). The pressed pellets of $NiFe_2O_4$ were isothermally reduced in pure hydrogen at 800, 900, 1000 and $1100^{\circ}C$. Based on thermogravimetric analysis, the reduction behavior and the kinetic reaction mechanisms of the synthesized ferrite were studied. The initial ferrite powder and various reduction products were characterized by XRD, SEM, reflected light microscope and VSM to reveal the effect of hydrogen reduction on the composition, microstructure, magnetic properties and reaction kinetics of the produced Fe-Ni alloy. Complete reduction of the $NiFe_2O_4$ was achieved with synthesis of homogeneous nanocrystalline Fe-Ni alloys. Arrhenius equation with the approved mathematical formulations for a gas-solid reaction was applied for calculating the activation energy ($E_a$) values and detecting the controlling reaction mechanism.

A Study on the Tool Wear and Prediction of CBN, Poly Crystal and Single Crystal Diamond Tools in Cutting of Nickel (니켈절삭시 CBN, 소결 및 단결정 다이아몬드 공구의 마멸과 예측에 관한 연구)

  • 성기석;김정두
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.17 no.1
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    • pp.120-130
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    • 1993
  • Generally, the machinability of materials that have a good mechanical properties is poor. For materials having a high strength, high toughness, high strength in high temperature and wear resistance, it is difficult to remove a chip from work materials. These properties are well shown in a Nickel, so this metal is used in machine materials, semi-conductor industry, metal mold and optical fields etc. But it is limitted in use because of high cost and poor machinability. In this study, the cutting of pure Nickel was conducted to examine wear of CBN, poly crystal diamond (PCD) and single crystal diamond (SCD) tools. From the result, the CBN tool is superior to poly crystal diamond tools or single crystal diamond tools in terms of tool wear and tool wear is predictable from experimental data base.

High Quality Nickel Atomic Layer Deposition for Nanoscale Contact Applications

  • Kim, Woo-Hee;Lee, Han-Bo-Ram;Heo, Kwang;Hong, Seung-Hun;Kim, Hyung-Jun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.05a
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    • pp.22.2-22.2
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    • 2009
  • Currently, metal silicides become increasingly more essential part as a contact material in complimentary metal-oxide-semiconductor (CMOS). Among various silicides, NiSi has several advantages such as low resistivity against narrow line width and low Si consumption. Generally, metal silicides are formed through physical vapor deposition (PVD) of metal film, followed by annealing. Nanoscale devices require formation of contact in the inside of deep contact holes, especially for memory device. However, PVD may suffer from poor conformality in deep contact holes. Therefore, Atomic layer deposition (ALD) can be a promising method since it can produce thin films with excellent conformality and atomic scale thickness controllability through the self-saturated surface reaction. In this study, Ni thin films were deposited by thermal ALD using bis(dimethylamino-2-methyl-2-butoxo)nickel [Ni(dmamb)2] as a precursor and NH3 gas as a reactant. The Ni ALD produced pure metallic Ni films with low resistivity of 25 $\mu{\Omega}cm$. In addition, it showed the excellent conformality in nanoscale contact holes as well as on Si nanowires. Meanwhile, the Ni ALD was applied to area-selective ALD using octadecyltrichlorosilane (OTS) self-assembled monolayer as a blocking layer. Due to the differences of the nucleation on OTS modified surfaces toward ALD reaction, ALD Ni films were selectively deposited on un-coated OTS region, producing 3 ${\mu}m$-width Ni line patterns without expensive patterning process.

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Effects of Oxygen Flow Ratio on the Crystallographic Orientation of NiO Thin Films Deposited by RE Magnetron Sputtering (RF 마그네트론 스퍼터링에 의한 NiO 박막 증착시 산소 유량비가 박막의 결정 배향성에 미치는 영향)

  • 류현욱;최광표;노효섭;박용주;박진성
    • Journal of the Korean Ceramic Society
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    • v.41 no.2
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    • pp.106-110
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    • 2004
  • Nickel oxide (NiO) thin films were prepared on Si(100) substrates at room temperature by RF magnetron sputtering using a NiO target. The effects of oxygen flow ratio for the plasma gas on the preferred orientation and surface morphology of the NiO films were investigated. Highly crystalline NiO film with (100) orientation was obtained when it was deposited in pure Ar gas. For NiO film deposited in pure O$_2$ gas, on the other hand, the orientation of the film changed from (100) to (111) and its deposition rate decreased. The origin of the preferred orientation of the films was discussed. NiO films also showed different surface morphologies and roughnesses with the oxygen flow ratio.