• 제목/요약/키워드: Pulsed Power

검색결과 588건 처리시간 0.025초

이온교환막의 막오염 및 오염저감 (Fouling of Ion Exchange Membranes and Their Fouling Mitigation)

  • 문승현;이홍주
    • 멤브레인
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    • 제12권2호
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    • pp.55-66
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    • 2002
  • 본 총설에서는 전기투석 공정의 운전과 설계 능력 향상을 위해 이온교환막의 막오염현상에 관한 연구를 조사하였다. 이온교환막의 막오염현상을 정량적으로 평가하기 위해 압력차를 구동력으로 하는 막공정의 막오염지수와 유사한 전기투석 막오염지수(EDMFI)를 정의하였다. 막오염현상은 무기오염원인 실리카졸과 유기 오염원인 휴믹산과 BSA를 함유한 전기 투석 실험 결과를 비교하여 연구되었다. 이 비교에서 EDMFI는 전기투석 공정의 막오염경향을 정량적인 척도로 유용하게 이용될 수 있음을 보여주었다. 새로운 오염저감 기술로 사각파 전원이 유효함이 유기 오염물을 포함한 전기투석 실험결과에서 보고되었다. 이펄스 형태의 사각파 전원은 최적주파수에서 막오염현상을 현저하게 감소시킬 수 있었다.

레이저/아크 하이브리드용접기술의 최신 동향 (Recent Technological Tendency of Laser/Arc Hybrid Welding)

  • 김영식;길상철
    • Journal of Welding and Joining
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    • 제31권2호
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    • pp.4-15
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    • 2013
  • The laser/arc hybrid welding process is a new process combining the laser beam and the arc as welding heat source. The laser beam and arc influence and assist one another. By application of hybrid welding, synergistic effects are achievable, and disadvantage of the respective processes can be compensated. The laser-arc hybrid welding process has good potential to extend the field of applications of laser technology, and provide significant improvements in weld quality and process efficiency in manufacturing applications. This review analyses the recent advances in the fundamental understanding of hybrid welding processes using the works of the data base of Web of Science (SCI-Expanded) since the 2000 year. The research activity on the hybrid welding has been become more actively since 2006, especially in China, presenting the most research papers in the world. Since the hybrid welding process was adopted in manufacturing of the automobile in Europe in the early of 2000's, its adopting is widely expanded in the field of manufacturing of automobile, ship building, steel construction and the other various industry. The hybrid welding process is expected to advance toward higher productivity, higher precision, higher reliability through the mixing of high power and flexible fiber laser or disk laser and digitalized pulsed arc source.

Cu seed layer 표면의 플라즈마 전처리가 Cu 전기도금 공정에 미치는 효과에 관한 연구 (Effects of Plasma Pretreatment of the Cu Seed Layer on Cu Electroplating)

  • 오준환;이성욱;이종무
    • 한국재료학회지
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    • 제11권9호
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    • pp.802-809
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    • 2001
  • Electroplating is an attractive alternative deposition method for copper with the need for a conformal and conductive seed layer In addition, the Cu seed layer should be highly pure so as not to compromise the effective resistivity of the filled copper interconnect structure. This seed layer requires low electrical resistivity, low levels of impurities, smooth interface, good adhesion to the barrier metal and low thickness concurrent with coherence for ensuring void-free fill. The electrical conductivity of the surface plays an important role in formation of initial Cu nuclei, Cu nucleation is much easier on the substrate with higher electrical conductivities. It is also known that the nucleation processes of Cu are very sensitive to surface condition. In this study, copper seed layers deposited by magnetron sputtering onto a tantalum nitride barrier layer were used for electroplating copper in the forward pulsed mode. Prior to electroplating a copper film, the Cu seed layer was cleaned by plasma H$_2$ and $N_2$. In the plasma treatment exposure tome was varied from 1 to 20 min and plasma power from 20 to 140W. Effects of plasma pretreatment to Cu seed/Tantalum nitride (TaN)/borophosphosilicate glass (BPSG) samples on electroplating of copper (Cu) films were investigated.

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Low Temperature Synthesis of Transparent, Vertically Aligned Anatase TiO2 Nanowire Arrays: Application to Dye Sensitized Solar Cells

  • In, Su-Il;Almtoft, Klaus P.;Lee, Hyeon-Seok;Andersen, Inge H.;Qin, Dongdong;Bao, Ningzhong;Grimes, C.A.
    • Bulletin of the Korean Chemical Society
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    • 제33권6호
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    • pp.1989-1992
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    • 2012
  • We present a low temperature (${\approx}70^{\circ}C$) method to prepare anatase, vertically aligned feather-like $TiO_2$ (VAFT) nanowire arrays $via$ reactive pulsed DC magnetron sputtering. The synthesis method is general, offering a promising strategy for preparing crystalline nanowire metal oxide films for applications including gas sensing, photocatalysis, and 3rd generation photovoltaics. As an example application, anatase nanowire films are grown on fluorine doped tin oxide coated glass substrates and used as the photoanode in dye sensitized solar cells (DSSCs). AM1.5G power conversion efficiencies for the solar cells made of 1 ${\mu}m$ thick VAFT have reached 0.42%, which compares favorably to solar cells made of the same thickness P25 $TiO_2$ (0.35%).

A possibility of enhancing Jc in MgB2 film grown on metallic hastelloy tape with the use of SiC buffer layer

  • Putri, W.B.K.;Kang, B.;Ranot, M.;Lee, J.H.;Kang, W.N.
    • 한국초전도ㆍ저온공학회논문지
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    • 제16권2호
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    • pp.20-23
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    • 2014
  • We have grown $MgB_2$ on SiC buffer layer by using metallic Hastelloy tape as the substrate. Hastelloy tape was chosen for its potential practical applications, mainly in the power cable industry. SiC buffer layers were deposited on Hastelloy tapes at 400, 500, and $600^{\circ}C$ by using a pulsed laser deposition method, and then by using a hybrid physical-chemical vapor deposition technique, $MgB_2$ films were grown on the three different SiC buffer layers. An enhancement of critical current density values were noticed in the $MgB_2$ films on SiC/Hastelloy deposited at 500 and $600^{\circ}C$. From the surface analysis, smaller and denser grains of $MgB_2$ tapes are likely to cause this enhancement. This result infers that the addition of SiC buffer layers may contribute to the improvement of superconducting properties of $MgB_2$ tapes.

대출력 펄스 클라이스트론 부하의 성능시험 (Performance Test of High-Power Pulsed Klystron-Load)

  • 장성덕;손윤규;오종석
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2003년도 하계학술대회 논문집 C
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    • pp.1756-1758
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    • 2003
  • 포항 방사광 가속기의 선형가속기는 2.5GeV 전자빔 용 마이크로웨이브의 발생을 위하여 80MW 급 클라이스트론(klystron) 11대와 입사부 용 65MW 급 클라이스트론 1대를 사용한다. 80-MW 급 클라이스트론 부하를 구동하기 위하여 최대 펄스 정격출력 200 MW(400kv, 500A, 평탄도 4.4 ${\mu}s$)인 대출력 펄스 전원공급 장치(modulator)가 요구된다. 모듈레이터 시스템 용 PFN(pulse forming network) 커패시터의 충전용 입력전원으로써 최대 출력전압 50 kV, ${\pm}$ 0.5% 이내의 전압제어가 가능한 고전압 인버터 전원장치를 적용하여 클라이스트론 부하의 성능시험을 수행하였다. 클라이스트론의 RF 전력과 입력 빔의 특성을 정확히 측정하기 위하여 응답특성이 양호한 측정 장치와 정밀한 측정이 요구된다. 인버터 시스템의 적용에 따른 모듈레이터의 충전 특성을 파악하였으며, 방향성 결합기와 검파기를 설치하여 클라이스트론의 RF 출력을 측정하였다. 본 논문에서는 포항 방사광 가속기의 대출력 펄스 고주파원으로 사용되는 클라이스트론 부하의 성능시험 과정에서 수행하였던 시험장치 개선 및 특성 분석, 고전압(빔전압 320 kV) 및 RF 길들이기의 시험 결과에 관하여 고찰하고자 한다.

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신경망을 이용한 SiN 박막 표면거칠기에의 이온에너지 영향 모델링 (Neural Network Modeling of Ion Energy Impact on Surface Roughness of SiN Thin Films)

  • 김병환;이주공
    • 한국표면공학회지
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    • 제43권3호
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    • pp.159-164
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    • 2010
  • Surface roughness of deposited or etched film strongly depends on ion bombardment. Relationships between ion bombardment variables and surface roughness are too complicated to model analytically. To overcome this, an empirical neural network model was constructed and applied to a deposition process of silicon nitride (SiN) films. The films were deposited by using a pulsed plasma enhanced chemical vapor deposition system in $SiH_4$-$NH_4$ plasma. Radio frequency source power and duty ratio were varied in the range of 200-800 W and 40-100%. A total of 20 experiments were conducted. A non-invasive ion energy analyzer was used to collect ion energy distribution. The diagnostic variables examined include high (or) low ion energy and high (or low) ion energy flux. Mean surface roughness was measured by using atomic force microscopy. A neural network model relating the diagnostic variables to the surface roughness was constructed and its prediction performance was optimized by using a genetic algorithm. The optimized model yielded an improved performance of about 58% over statistical regression model. The model revealed very interesting features useful for optimization of surface roughness. This includes a reduction in surface roughness either by an increase in ion energy flux at lower ion energy or by an increase in higher ion energy at lower ion energy flux.

The Summary of Researches on ADS in China

  • Haihong Xia;Zhixiang Zhao;Jigen Li;Yongqian Shi;Yinlu Han;Shengyun Zhu;Yongli Xu;Xialing Guan;Shinian Fu;Baoqun Cui
    • 한국방사성폐기물학회:학술대회논문집
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    • 한국방사성폐기물학회 2005년도 Proceedings of The 6th korea-china joint workshop on nuclear waste management
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    • pp.76-85
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    • 2005
  • The conceptual study of Accelerator Driven System (ADS) had lasted for about five years and ended in 1999 in China. As one project of 'the major state basic research program (973)' in energy domain, which is sponsored by the China Ministry of Science and Technology (MOST), a five years program of basic research for ADS physics and related technology has been launched since 2000 and passed national review last month. CIAE (China Institute of Atomic Energy), IHEP (Institute of High Energy Physics), PKU-IHIP (Institute of Heavy Ion Physics in Peking University) and other institutions are jointly carrying on the research. The research activities are focused on HPPA physics and technology, reactor physics of external source driven sub-critical assembly, nuclear data base and material study. For HPPA, a high current injector consisting of an ECR ion source, LEBT and a RFQ accelerating structure of 3.5MeV has been built. In reactor physics study, a series of neutron multiplication experimental study has been carried out and is being carrying on. The VENUS facility has been constructed as the basic experimental platform for the neutronics study in ADS blanket. It's a zero power sub-critical neutron multiplying assembly driven by external neutron produced by a pulsed neutron generator. The theoretical, experimental and simulation study on nuclear data, material properties and nuclear fuel circulation related to ADS is carrying on to provide the database for ADS system analysis. The main results on ADS related researches will be reported.

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평면형 대기압 유전장벽방전장치의 제작 및 동작특성분석 (Fabrication of Atmospheric Coplanar Dielectric Barrier Discharge and Analysis of its Driving Characteristics)

  • 이기융;김동현;이호준
    • 전기학회논문지
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    • 제63권1호
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    • pp.80-84
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    • 2014
  • The discharge characteristics of Surface Dielectric Barrier Discharge (SDBD) reactor are investigated to find optimal driving condition with adjusting various parameter. When the high voltage with sine wave form is applied to SDBD source, successive pulsed current waveforms are observed owing to multiple ignitions through the long discharge channel and wall charge accumulation on the dielectric surface. The discharge voltage, total charge between dielectrics, mean energy and power are calculated from measured current and voltage according to electrode gap and dielectric thickness. Discharge mode transition from filamentary to diffusive glow is observed for narrow gap and high applied voltage case. However, when the diffusive discharge is occurred with high applied voltage, the actual firing voltage is always lower than that with low driving voltage. The $Si_3N_4$, $MgF_2$, $Al_2O_3$ and $TiO_2$ are considered for dielectric protection and high secondary electron emission coefficient. SDBD with $MgF_2$ shows the lowest breakdown voltage. $MgF_2$ thin film is proposed as a protection layer for low voltage atmospheric dielectric barrier discharge devices.

레이저를 이용한 폴리머 탄화현상 해석 및 LCD 제조공정에서의 응용 (Analysis of Polymer Carbonization using Lasers and its Applications for LCD Manufacturing Process)

  • 안대환;박병구;김동언;김동식
    • 한국정밀공학회지
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    • 제27권6호
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    • pp.24-31
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    • 2010
  • Laser carbonization of a polymer layer can be employed in various applications in the microelectronics industry, e.g repairing brightness pixels of an LCD panel. In this work, the process of thermal degradation of LCD color filter polymer by various laser sources with pulsewidths from CW to fs is studied. LCD pixels are irradiated by the lasers and the threshold irradiance of LCD color filter polymer carbonization is experimentally measured. In the numerical analysis, the transient temperature distribution is calculated and the number density of carbonization in the polymer layer is also estimated. It is shown that all the lasers can carbonize the polymer layers if the output power is adjusted to meet the thermal conditions for polymerization and that pulsed lasers can result in more uniform distribution of temperature and carbonization than the CW laser.