• Title/Summary/Keyword: Pulsed Laser deposition

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Hall effect of K-doped $BaFe_2As_2$ superconducting thin films

  • Son, Eunseon;Lee, Nam Hoon;Hwang, Tae-Jong;Kim, Dong Ho;Kang, Won Nam
    • Progress in Superconductivity and Cryogenics
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    • v.15 no.3
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    • pp.5-8
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    • 2013
  • We have studied Hall effect for potassium (K)-doped $BaFe_2As_2$ superconducting thin films by analyzing the relation between the longitudinal resistivity (${\rho}_{xx}$) and the Hall resistivity (${\rho}_{xy}$). The thin films used in this study were fabricated on $Al_2O_3$ (000l) substrates by using an ex-situ pulsed laser deposition (PLD) technique under a high-vacuum condition of ~$10^{-6}$ Torr. The samples showed the high superconducting transition temperatures ($T_c$) of ~ 40 K. The ${\rho}_{xx}$ and the ${\rho}_{xy}$ for K-doped $BaFe_2As_2$ thin films were measured by using a physical property measurement system (PPMS) with a temperature sweep (T-sweep) mode at an applied current density of $100A/cm^2$ and at magnetic fields from 0 up to 9 T. We report the T-sweep results of the ${\rho}_{xx}$and the ${\rho}_{xy}$ to investigate Hall scaling behavior on the basis of the relation of ${\rho}_{xy}={A{\rho}_{xx}}^{\beta}$. The ${\beta}$ values are $3.0{\pm}0.2$ in the c-axis-oriented K-doped $BaFe_2As_2$ thin films, whereas the thin films with various oriented-directions like a polycrystal showed slightly lower ${\beta}$ than that of c-axis-oriented thin films. Interestingly, the ${\beta}$ value is decreased with increasing magnetic fields.

Effect of BSO addition on Cu-O bond of GdBa2Cu3O7-x films with varying thickness probed by extended x-ray absorption fine structure

  • Jeon, H.K.;Lee, J.K.;Yang, D.S.;Kang, W.N.;Kang, B.
    • Progress in Superconductivity and Cryogenics
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    • v.18 no.4
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    • pp.1-4
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    • 2016
  • We investigated the relation between the Cu-O bond length and the superconducting properties of $BaSnO_3$ (BSO)-added $GdBa_2Cu_3O_{7-x}$ (GdBCO) thin films by using extended x-ray absorption fine structure (EXAFS) spectroscopy. 4 wt.% $BaSnO_3$ (BSO) added $GdBa_2Cu_3O_{7-x}$ (GdBCO) thin films with varying thickness from $0.2{\mu}m$ to $1.0{\mu}m$ were fabricated by using pulsed laser deposition (PLD) method. The transition temperature ($T_c$) and the residual resistance ratio (RRR) of the GdBCO films increased with increasing thickness up to $0.8{\mu}m$, where the crystalline BSO has the highest peak intensity, and then decreased. This uncommon behaviors of $T_c$ and RRR are likely to be created by the addition of BSO, which may change the ordering of GdBCO atomic bonds. Analysis from the Cu K-edge EXAFS spectroscopy showed an interesting thickness dependence of ordering behavior of BSO-added GdBCO films. It is noticeable that the ordering of Cu-O bond and the transition temperature are found to show opposite behaviors in the thickness dependence. Based on these results, the growth of BSO seemingly have evident effect on the alteration of the local structure of GdBCO film.

Surface morphology of YBa$_{2}$Cu$_{3}$O$_{7}$ thin films prepared by the PLD method (PLD법으로 제작한 YBa$_{2}$Cu$_{3}$O$_{7}$ 반막의 표면상태 변화)

  • Han, Gi-Youl;Hwang, Tae-Jong;Yu, Seong-Cho;Lee, Kyu-Won;Ha, Dong-Han
    • 한국초전도학회:학술대회논문집
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    • v.10
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    • pp.66-69
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    • 2000
  • We have observed the morphology of YBCO thin films grown on the SrTiO$_3$(100) substrates by the Pulsed Laser Deposition method. AFM and SEM images show that the YBCO grains grow spirally from their own seeds whereas outgrowths are considered to remain unchained as the film thickness increases. The images of various stages of film growth suggest that the outgrowths of 1000${\sim}$2000 ${AA}$ size are mainly formed at the very early stage of film growth. The results of XRD measurement clearly show that even a film of about 10 ${AA}$ thickness already forms orthorhombic YBCO structure although common superconducting resistivity behavior is known to be observed for the films with thickness above 100 ${AA}$.

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레이져 증착법으로 제조된 (Ba,Sr)$TiO_3-MFSFET $구조의 성장 및 응력에 의한 강유전성

  • 전성진;한근조;강신충;이재찬
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.87-87
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    • 1999
  • 본 연구에서는 Pulsed Laser Deposition(이하 PDL)방법을 이용하여 Si기판에 (Ba,Sr)TiO3(이하 BST)박막을 MFS-FET(Metal-Ferroelectric-Semiconductor Field-effect Transistor)구조로 제조하였으며 BST박막의 강유전성이 BST 박막에 유도되는 응력에 어떤 영향을 받는지 살펴보았다. 본 연구에서는 완충막을 사용함으로써 BST박막과 완충막간의 격자부정합을 이용하여 BST박막에 강유전성을 유도하려고 하였다. 또한 MFS-FET구조의 BST박막에 유도되는 응력조절을 위하여 BST박막과 완충막의 두께를 변화하였으며 XRD를 통한 구조 분석 및 C-V test를 통한 전기적 특성을 관찰을 하였다. PLD법을 통해서 epitaxial 성장된 BST 박막에서는 Si에 epitaxial 성장된 완충막과의 격자부정합에 의한 BST박막내의 자발분극의 발생이 예상된다. 따라서, 본 연구는 강유전체의 자발분극에 의하여 발생되는 C-V 이력현상이 BST박막과 완충막과의 격자부정합에 의한 응력에 의해 발생될 것으로 예상하여, BST 박막에 유도되는 응력과 C-V 이력현상의 관계를 통하여 상온에서 상유전성을 갖는 BST가 응력에 의하여 어느 정도의 강유전성을 나타내는지를 밝히기 위해 진행되었다. 본 연구에서 사용된 완충막은 YSZ(Yttria Stabilized Zirconia)박막으로 0.4mTorrO2 분위기 하에서 600~80$0^{\circ}C$의 온도에서 증착하여 상형성을 살펴보았고 $700^{\circ}C$에서 epitaxial 성장을 확인하였으며 두께는 30~$\AA$으로 변화하였다. 또한 BST박막은 완충막과의 전압분배를 고려해 300~2000$\AA$으로 두께를 변화를 시키며 증착하였다. MFS 구조에서 Al 전극을 사용하여 완충막과 BST박막간의 두께 변화에 따른 Capacitance - Voltage(C-V) 측정을 하였으며 이를 통하여 강유전상의 특성인 C-V 이력현상을 관찰하였다. 그 결과 YSZ 박막에서는 C-V 이력현상이 나타나지 않았으며 BST 박막에서는 약 1.2V의 C-V이력현상이 보였다.

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Effect of the thickness of CeO$_2$ buffer layer on the YBCO coated conductor

  • Dongqi Shi;Ping Ma;Ko, Rock-Kil;Kim, Ho-Sup;Ha, Hong-Soo;Chung, Jun-Ki;Kyu-Jeong, Song;Park, Chan;Moon, Seung-Hyun
    • Progress in Superconductivity and Cryogenics
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    • v.6 no.4
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    • pp.1-4
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    • 2004
  • Three group samples with difference thickness of $CeO_2$ capping layer deposited by PLD were studied. Among them, one group $CeO_2$ films were deposited on stainless steel tape coated with IBAD- YSZ and $CeO_2$ buffer layer ($CeO_2$/IBAD-YSZ/SS); other two groups of $CeO_2 YSZ Y_2O_3$multi-layer were deposited on NiW substrates for fabrication of YBCO coated conductor through RABiTS approach. The pulsed laser deposition (PLD) and DC magnetron sputtering were employed to deposit these buffer layers. On the top of buffer layer, YBCO film was deposited by PLD. The effect of thickness of $CeO_2$ film on the texture of $CeO_2$ film and critical current density ($J_c$) of YBCO film were analyzed. For the case $CeO_2$ on $CeO_2$/IBAD-YSZ/SS, there was a self-epitaxy effect with the increase of $CeO_2$ film. For $YSZ/Y_2O_3$ NiW which was deposited by PLD or DC magnetron sputtering, there is not self-epitaxy effect. However, the capping layer of $CeO_2$ film deposited by PLD improved the quality of buffer layer for $YSZ/Y_2O_3$ which was deposited by DC magnetron sputtering, therefore increased the $J_c$ of YBCO film.

PLD 법으로 증착된 IZO 박막의 Indium 양에 따른 배향성 변화 연구

  • Jang, Bo-Ra;Lee, Ju-Yeong;Lee, Jong-Hun;Lee, Da-Jeong;Kim, Hong-Seung;Gong, Bo-Hyeon;Jo, Hyeong-Gyun;Bae, Gi-Yeol;Lee, Won-Jae
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2010.05a
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    • pp.59-59
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    • 2010
  • ZnO는 II-VI 족 화합물 반도체로써 상온에서 큰 엑시톤 결합에너지 (~60 meV) 를 가지며 밴드갭이 3.37 eV인 직접 천이형 반도체로 잘 알려진 물질이다. 이러한 ZnO의 물리적 특성은 광학소자로 상용화된 GaN와 유사하기 때문에 LED나 LD등의 광 소자 재료로 주목 받고 있다. 또한 ZnO는 3족 원소 (In, Ga, Al)를 도핑 함으로써 전기적 특성 제어가 가능한 장점을 가지고 있다. 본 연구는 펄스레이저 증착법 (Pulsed Laser Deposition)을 이용하여 Si (111) 기판 위에 ZnO:In 박막을 성장 시켰으며, 도핑된 indium 양에 따른 ZnO 박막의 배향성 변화를 관찰 하였다. X-선 회절 분석법 (X-ray diffraction), 탐침형 원자현미경 (Atomic Force Microscope) 그리고 투과전자 현미경 (Transmission Electron Microscope)을 측정하였다. XRD 측정 결과 un-doped ZnO 박막은 (002) 방향으로 c-축 우선성장 하였다. 그러나 ZnO 박막내의 Indium 양이 증가 할수록 (002) 방향에서 (101), (102), (103) 등의 (101) 방향으로 성장이 변화 하였으며 5 at.% 이상에서는 (100) 방향의 성장이 관찰 되었다. TEM 측정 결과 un-doped ZnO 박막은 columnar 구조로 성장 되었으나, Indium 양이 증가할수록 column의 size가 감소하며, 5 at.% 이상에서 columnar 구조 성장이 거의 관찰되지 않는다. AFM 결과에서는 Indium 양이 증가 할수록 박막의 표면거칠기와 결정립 크기가 감소하였다.

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Resistive Switching Properties of Cr-Doped SrZrO3 Thin Film on Si Substrate (실리콘 기판위에서의 Cr-Doped SrZrO3 박막의 저항변화 특성)

  • Yang, Min-Kyu;Ko, Tae-Kuk;Park, Jae-Wan;Lee, Jeon-Kook
    • Korean Journal of Materials Research
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    • v.20 no.5
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    • pp.241-245
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    • 2010
  • One of the weak points of the Cr-doped SZO is that until now, it has only been fabricated on perovskite substrates, whereas NiO-ReRAM devices have already been deposited on Si substrates. The fabrication of RAM devices on Si substrates is important for commercialization because conventional electronics are based mainly on silicon materials. Cr-doped ReRAM will find a wide range of applications in embedded systems or conventional memory device manufacturing processes if it can be fabricated on Si substrates. For application of the commercial memory device, Cr-doped $SrZrO_3$ perovskite thin films were deposited on a $SrRuO_3$ bottom electrode/Si(100)substrate using pulsed laser deposition. XRD peaks corresponding to the (112), (004) and (132) planes of both the SZO and SRO were observed with the highest intensity along the (112) direction. The positions of the SZO grains matched those of the SRO grains. A well-controlled interface between the $SrZrO_3$:Cr perovskite and the $SrRuO_3$ bottom electrode were fabricated, so that good resistive switching behavior was observed with an on/off ratio higher than $10^2$. A pulse test showed the switching behavior of the Pt/$SrZrO_3:Cr/SrRuO^3$ device under a pulse of 10 kHz for $10^4$ cycles. The resistive switching memory devices made of the Cr-doped $SrZrO_3$ thin films deposited on Si substrates are expected to be more compatible with conventional Si-based electronics.

Thickness dependence of ZnO thin films grown on sapphire by PLD (PLD법에 의해 제조된 ZnO박막의 두께 변화에 따른 특성 연구)

  • Yun, Uk-Hui;Myeong, Jae-Min;Lee, Dong-Hui;Bae, Sang-Hyeok;Yun, Il-Gu;Lee, Sang-Ryeol
    • Korean Journal of Materials Research
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    • v.11 no.4
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    • pp.319-323
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    • 2001
  • In order to investigate the effect of thickness on the properties of ZnO thin films, a series of films having different thickness were deposited on (0001) sapphire by using pulsed laser deposition(PLD). SEM and XRD analyses showed that, as the film thickness increases, the grain size increased and the crystallinity improved. Room-temperature PL spectra also exhibited that the intensities of both ultraviolet and deep level emission Peaks increased as the film thickness increased. Hall measurements at room- temperature revealed that, as the film thickness changes from 400 to 4000 , the carrier concentration of the film showed sharp decrease, which that of thicker film gradually saturated. Therefore, it is concluded that the strain due to the lattice mismatch between substrate and film is fully relaxed around the thickness of 4000 .

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Fabrication and Characterization of High Temperature in-situ Ramp-edge Type Josephson Junction (고온초전도체 in-situ ramp-edge 형태의 조셉슨 접합 제작 및 특성)

  • Hur, Yun-Sung;Kim, Jin-Tae;Hwang, Yun-Seok;Lee, Sun-Gul;Park, Gwang-Seo;Kim, In-Seon;Park, Yong-Ki;Park, Jong-Chul
    • Korean Journal of Materials Research
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    • v.8 no.3
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    • pp.263-267
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    • 1998
  • In this study, we have fabricated in-situ multilayer $YBa_2Cu_3O_{7-\delta}$/$SrTiO_{3}$/$YBa_2Cu_3O_{7-\delta}$ ramp edge type junctions by using a metal mask and pulsed laser deposition method and studied the junction properties. The junctions showed RSJ-like I-V characteristics. The normal state junction resistance R, of $18 \omega$ was nearly constant with temperature. The dc-SQUID sensors fabricated with the junctions show a sensitivity that transfer function dV/$d\Phi$)~$22\mu$V/$\Phi_{0}$, indicating that the in-situ ramp edge type junction is potentially useful for sensor application.

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Origin of High Critical Current density in $MgB_2$ thin films

  • Kang, W.N.;Kim, Hyeong-Jin;Park, Eun-Mi;Kim, Mun-Seong;Kim, Kijoon H. P.
    • Progress in Superconductivity
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    • v.3 no.2
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    • pp.135-139
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    • 2002
  • We have fabricated high-quality c-axis-oriented $MgB_2$ thin films by using a pulsed laser deposition technique. The thin films grown on (1 1 0 2) $Al_2$$O_3$ substrates show an onset transition temperature of 39.2 K with a sharp transition width of ~0.15 K. X-ray diffraction patterns indicate a c-axis-oriented crystal structure perpendicular to the substrate surface. We observed high critical current densities ($J_{c}$) of ~ 16 $MA/\textrm{cm}^2$ at 15 K and under self-field, which is comparable to or exceeds those of cuprate high-temperature superconductors. The extrapolation $J_{c}$ at 5 K was estimated to be ~ 40 MA/$\textrm{cm}^2$, which is the highest record for $MgB_2$ compounds. At a magnetic field of 5 T, the $J_{c}$ of~ 0.1 $MA/\textrm{cm}^2$ was detected at 15 K, suggesting that this compound is very promising candidate for the practical applications at high temperature with lower power consumption. As a possible explanation for the high current-carving capability, the vortex-glass phase will be discussed.d.d.d.

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