• Title/Summary/Keyword: Pulse reaction

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Nanomachining on Single Crystal Silicon Wafer by Ultra Short Pulse Electrochemical Oxidation based on Non-contact Scanning Probe Lithography (비접촉 SPL기법을 이용한 단결정 실리콘 웨이퍼 표면의 극초단파 펄스 전기화학 초정밀 나노가공)

  • Lee, Jeong-Min;Kim, Sun-Ho;Kim, Tack-Hyun;Park, Jeong-Woo
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.20 no.4
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    • pp.395-400
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    • 2011
  • Scanning Probe Lithography is a method to localized oxidation on single crystal silicon wafer surface. This study demonstrates nanometer scale non contact lithography process on (100) silicon (p-type) wafer surface using AFM(Atomic force microscope) apparatuses and pulse controlling methods. AFM-based experimental apparatuses are connected the DC pulse generator that supplies ultra short pulses between conductive tip and single crystal silicon wafer surface maintaining constant humidity during processes. Then ultra short pulse durations are controlled according to various experimental conditions. Non contact lithography of using ultra short pulse induces electrochemical reaction between micro-scale tip and silicon wafer surface. Various growths of oxides can be created by ultra short pulse non contact lithography modification according to various pulse durations and applied constant humidity environment.

Infrared Multiphoton Dissociation of $CHCl_2F$: Reaction Mechanisms and Product Ratio Dependence on Pressure and Laser Pulse Energy

  • Song, Nam-Woong;Lee, Won-Chul;Kim, Hyong-Ha
    • Journal of Photoscience
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    • v.12 no.2
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    • pp.101-107
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    • 2005
  • Infrared multiphoton dissociation of $CHCl_2F$ was studied using $CO_2$ laser excitation. Three products, $C_2Cl_2F_2$, $C_2ClF_3$, and $C_2HClF_2$, were identified by the analysis of the gas mixture from the photoreaction of $CHCl_2F$. The dependence of the reaction probability on added Ar gas pressure and excitation laser pulse energy was investigated. At low pressure (< 10 torr), the reaction probability increased as Ar pressure increased due to the rotational hole-filling effect, while it diminished with the increase of Ar pressure at high pressure (> > 20 torr) due to the collisional deactivation. The ratio of two products $(C_2ClF_3/C_2Cl_2F_2)$ decreased at low pressure (< 10 torr) and increased at high pressure (> 20 torr) with the increase of Ar pressure. The log-log plot of the reaction probability vs. laser pulse energy (${\\phi}$) was found to have a linear relationship, and its slope decreased as the added Ar pressure was increased. The reaction mechanisms for product formation have been suggested and validated by experimental evidences and considering the energetics. Fluorine-chlorine exchange reaction in the intermediate complex has been suggested to explain the formation of $C_2ClF_3$.

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Effect of Electrochemical Redox Reaction on Growth and Metabolism of Saccharomyces cerevisiae as an Environmental Factor

  • Na, Byung-Kwan;Hwang, Tae-Sik;Lee, Sung-Hun;Ahn, Dae-Hee;Park, Doo-Hyun
    • Journal of Microbiology and Biotechnology
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    • v.17 no.3
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    • pp.445-453
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    • 2007
  • The effect of an electrochemically generated oxidation-reduction potential and electric pulse on ethanol production and growth of Saccharomyces cerevisiae ATCC 26603 was experimented and compared with effects of electron mediators (neutral red, benzyl viologen, and thionine), chemical oxidants (hydrogen peroxide and hypochlorite), chemical reductants (sulfite and nitrite), oxygen, and hydrogen. The oxidation (anodic) and reduction (cathodic) potential and electric pulse activated ethanol production and growth, and changed the total soluble protein pattern of the test strain. Neutral red electrochemically reduced activated ethanol production and growth of the test strain, but benzyl viologen and thionine did not. Nitrite inhibited ethanol production but did not influence growth of the test strain. Hydrogen peroxide, hypochlorite, and sulfite did not influence ethanol production and growth of the test strain. Hydrogen and oxygen also did not influence the growth and ethanol production. It shows that the test strain may perceive electrochemically generated oxidation-reduction potential and electric pulse as an environmental factor.

A Study on Analysis of the Hydrogen-Oxygen Gas Generator Using Pulse Power Supply (펄스전원에 의한 수산화가스 발생기에 관한 연구)

  • 이정민;강병희;목형수;최규하
    • The Transactions of the Korean Institute of Power Electronics
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    • v.6 no.5
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    • pp.377-385
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    • 2001
  • The mixed gas of Hydrogen and Oxygen is gained from water electrolysis reaction. It has constant volume ratio 2 : 1 Hydrogen and Oxygen, and it is used as a source of thermal energy by combustion reaction. This gas has better characteristics in the field of economy, efficiency of energy, and environmental intimacy than acetylene gas and LPG used for gas welding machine. So several studies of this gas are actively in progress nowadays. The object of this study is the optimization of power condition in the side of electricity for the Hydrogen-Oxygen gas generator, Firstly chemical analysis of electrolysis is conducted, and the relation of electrical energy and chemical energy is quantitatively investigated through Faraday's laws of electrolysis. After that, pulse power supply is designed for basic experiment which could be applied to the analysis of Hydrogen-Oxygen gas generator. In the basis of above steps, comparison and analysis of Hydrogen-Oxygen gas generator was conducted as variable frequency using pulse Power supply.

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Numerical Investigation on detonation combustion waves of hydrogen-air mixture in pulse detonation combustor with blockage

  • Pinku Debnath;K.M. Pandey
    • Advances in aircraft and spacecraft science
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    • v.10 no.3
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    • pp.203-222
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    • 2023
  • The detonation combustion is a supersonic combustion process follows on shock wave oscillations in detonation tube. In this paper numerical studies are carried out combined effect of blockage ratio and spacing of obstacle on detonation wave propagation of hydrogen-air mixture in pulse detonation combustor. The deflagration to detonation transition of stoichiometric (ϕ=1)fuel-air mixture in channel has been analyzed for effect of blockage ratio (BR)=0.39, 0.51, 0.59, 0.71 with spacing of 2D and 3D. The reactive Navier-Stokes equation is used to solve the detonation wave propagation mechanism in Ansys Fluent platform. The result shows that fully developed detonation wave initiation regime is observed near smaller vortex generator ratio of BR=0.39 inside the combustor. The turbulent rate of reaction has also a great significance role for shock wave structure. However, vortices of rapid detonation wave are appears near thin boundary layer of each obstacle. Finally, detonation combustor demonstrates the superiority of pressure gain combustor with turbulent rate of reaction of 0.6 kg mol/m3 -s inside the detonation tube with obstacle spacing of 12 cm, this blockage enhanced the turbulence intensity and propulsive thrust. The successful detonation wave propagation speed is achieved in shortest possible time of 0.031s with a significance magnitude of 2349 m/s, which is higher than Chapman-Jouguet (C-J) velocity of 1848 m/s. Furthermore, stronger propulsive thrust force of 36.82 N is generated in pulse time of 0.031s.

Support Effects of Containing Catalysts on Methanol Dehydrogenation

  • Jung, Kwang-Deog;Joo, Oh-Shim
    • Bulletin of the Korean Chemical Society
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    • v.23 no.8
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    • pp.1135-1138
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    • 2002
  • CuO/ZnO, CuO/SiO,sub>2, and CuO/ZrO2 catalysts were prepared for investigating the support effects on methanol dehydrogenation. It was found that the conversion of methanol was proportional to the copper surface area on Cu/ZnO cat alysts and was independent on that on Cu/ZrO2 and Cu/SiO2. The highest copper surface area was obtained with the Cu/ZrO2 (9/1). The unusual deactivation of the Cu/ZnO, which showed the highest selectivity among the catalysts tested, was observed. Pulse reaction with methanol indicated that the lattice oxygen in ZnO could be removed by forming CO2 in the catalytic reaction, supporting that the ZnO reduction was responsible for the severe deactivation of the Cu/ZnO.

The Effect of Galvanic Vestibular Stimulation on Autonomic Nervous System Response (평류안뜰자극이 자율신경성 반응에 미치는 영향)

  • Moon, Hwa-Young;Kang, Sol;Kim, Hwa-Sung;Soon, Yu-Ri;Huh, So-Young;Lee, Jeong-Woo
    • Journal of the Korean Academy of Clinical Electrophysiology
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    • v.8 no.2
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    • pp.19-24
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    • 2010
  • Purpose : This study aims to examine the influences of galvanic vestibular stimulation on autonomic reaction of normal adults. Methods : Participants in this research totaled 28 (14 men and 14 women). Galvanic vestibular stimulation was conducted with a binaural electrode configuration for 60 sec. Galvanic vestibular stimulation measurements were conducted with the subjects in a prone position. Measured items included skin conductance, blood flow, pulse rate, and respiratory rate. Measurements were repeated for a total of five times, before application, during application, after application, 5 minutes after application and 10 minutes after application. Results : Skin conductance reaction showed statistically significant differences in changes depending on time after galvanic vestibular stimulation and there were statistically differences in changes of blood flow, pulse rate and respiratory rate after galvanic vestibular stimulation. Conclusion : Blood flow, pulse rate and respiratory rate of autonomic reactions were not influenced by galvanic vestibular stimulation, but skin conductance reaction was influenced by it and it was found that it was reduced during and after stimulation rather than before stimulation. Consequently, it was considered that galvanic vestibular stimulation affected the autonomic reaction.

Etch Characteristics of CO/NH3 Plasma Gas for Magnetic Random Access Memory in Pulsed-biased Inductively Coupled Plasmas

  • Yang, Gyeong-Chae;Jeon, Min-Hwan;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.200-200
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    • 2013
  • 기존 메모리 반도체에 비교해 빠른 재생속도와 높은 집적도, 비휘발성 등의 특성을 가지는 MRAM (Magnetic Random Access Memory)은 DRAM, flash memory 등을 대체할 수 있는 차세대 기억 소자로서 CoFeB/MgO/CoFeB로 구성된 한 개의 MTJ (Magnetic Tunnel Junction)를 단위 메모리로 사용한다. 이 MTJ 물질들은 고밀도 플라즈마를 이용한 건식 식각공정시 Cl2, BCl3 등과 같은 chlorine 을 포함한 가스를 이용하여 왔으나 식각 후 sidewall에서 발생하는 부식과 식각 선택비 확보의 어려움 등으로 마스크 물질에 제약을 받고 소자 특성이 감소하게 되는 등의 문제가 있다. 따라서 이러한 식각 문제점을 해결하기 위한 대안으로 noncorrosive 가스인 CO/NH3, CH3OH, CH4 등을 이용한 MTJ 식각 연구가 진행되어 오고 있으며 이중 CO/NH3 혼합가스는 부식성이 없고 hard mask와의 높은 선택비를 가지는 기체로 CO gas에 NH3 gas를 첨가하게 되면 etch rate이 증가하는 특성을 보인다. 또한 rf pulse-biased power를 이용하여 이온의 입사를 시간에 따라 제어함으로써 pulse off time 때 etch gas와 MTJ 물질간의 chemical reaction을 향상시킬 수 있다. 따라서 본 연구에서는 CO/NH3 혼합가스를 이용하여 다양한 rf pulse-biased power 조건에서 MTJ 물질인 CoFeB, MgO와 hard mask 물질인 W을 식각 한 뒤 식각특성을 분석하였으며 MTJ surface의 chemical binding state, surface roughness 측정을 진행하였다. 식각 샘플의 측정은 Alpha step profiler, XPS (X-ray Photoelectron Spectroscopy), AFM (Atomic Force Microscopy)를 통해 진행되었다. Time-averaged pulse bias에서는 duty ratio가 감소할수록 etch rate의 큰 감소 없이 CoFeB/W, MgO/W 물질의 etch selectivity가 향상됨을 확인할 수 있었으며 pulse off time 구간에서의 chemical reaction 향상으로 인해 식각부산물의 재증착이 감소하고 CoFeB의 surface roughness가 감소하는 것을 확인하였다.

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A Study of Electrode Reaction of Concentrated $NaClO_3$ Solution (진한 염소나트륨의 전극반응에 관한 연구)

  • Hwang, Geum So
    • Journal of the Korean Chemical Society
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    • v.18 no.4
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    • pp.244-250
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    • 1974
  • The mechanisms of the electrode reaction of chlorate ion were investigated, using Pt-electrode, by means of the technique of galvanostatic double pulses. For double current pulses (a cathodic pulse followed by an anodic pulse), the mechanism of the electrode reaction of chlorate ion over a current density range from 20 ma/cm2 to 25 ma/cm2 was suggested as the following: $CIO_3^-\;{\longrightarrow^{I}_{n_{1c}}\;CIO_2^-\;{\longrightarrow^{II}_{n_{2a}}\;CIO^-\;{\longrightarrow^{I'}_{n_{1a}}\;CIO_2^-\;{\longrightarrow^{II'}_{n_{2a}}\;CIO_4^-$ For a higher current density from 40 ma/cm2, it was suggested as the following: $CIO_3^-\;{\longrightarrow^{III}_{n_c}}\;CIO^-\;{\longrightarrow^{I'}_{n_{1a}}\;CIO_2^-\;{\longrightarrow^{II'}_{n_{2a}}\;CIO_4^-$ or $CIO_3^-\;{\longrightarrow_{n_c}}\;CIO^-\;{\longrightarrow_{n_a}}\;CIO_4^-$

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Chemical Properties of Cu( II ) Compound Containing Endocrine Disrupter, Bis-Phenol A

  • Park, Chil-Nam
    • Environmental Sciences Bulletin of The Korean Environmental Sciences Society
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    • v.10 no.S_3
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    • pp.121-126
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    • 2001
  • The techniques of pulse and cyclic voltammetry were applied to the determination of (E$_{1}$2)$_2$-(E$_{1}$2)$_1$ for two-step electrochemical charge transfers. In addition, a simple amplitude was derived far the dependence of the differential pulse response on (E$_{l}$ 2/)$_1$ and (E$_{1}$2/)$_2$. and the use of peak to peak separation in cyclic voltammetry and differential pulse methods was evaluated. A comparison of the comproportionation constants(Ke) from differential pulse and cyclic voltammetry methods exhibited a good agreement within 5%.

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