• Title/Summary/Keyword: Pt thin-film

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An Analysis of Structural Characteristics in Amorphous Vanadium Oxide ($V_2$$O_5$) Cathode Film for Thin Film Batteries after Cycling by High-resolution Electron Microscopy (HREM) (고분해능 투과전자 현미경을 이용한 박막 전지용 비정질 산화 바나듐 양극 박막의 충-방전에 따른 구조변화 분석)

  • 김한기;성태연;전은정;옥영우;조원일;윤영수
    • Journal of the Korean Ceramic Society
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    • v.38 no.3
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    • pp.274-279
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    • 2001
  • Pt/Ti/Si 기판 위에 성장시킨 박막 전지용 비정질 산화 바나듐 박막에 고상 전해질 박막 LiPON을 이용하여 전고상형 박막전지를 제작하여 충-방전 시험을 시행하였다. 이렇게 제작된 전고상형 박막전지는 500 사이클 이상까지 평균 15$\mu$Ah의 방전용량을 나타내었으나 초기 사이클 영역부터 방전 용량의 감소가 일어나기 시작했다. 박막 전지의 방전 용량 감소에 따른 비정질 산화 바나듐 박막의 구조적 특성 변화를 관찰하기 위하여 고분해능 현미경 분석을 시행하였다. 충-방전을 하지 않은 초기의 산화 바나듐 박막은 입계를 갖지 않고 다결정 특성을 보이지 않는 완전한 비정질 특성을 보였고 이는 TED 결과와 일치하였다. 그러나 450번의 반복적인 충-방전을 시행한 후의 비정질 산화 바나듐 박막 내에는 microcrystalline 형태의 산화 바나듐의 형성됨을 고분해능 전자 현미경 분석을 통해 발견할 수 있었다. 비정질 산화바나듐 박막의 방전 용량 감소의 원인인 Li의 비가역적 탈-삽입은 비정질 내에 형성된 microcrystalline에 의해 유발된다고 사료된다. 또한 LiPON 전해질 박막과 산화 바나듐 박막사이의 계면에 Li 이온과 산화바나듐과의 반응에 의해 형성된 계면 층에 발견할 수 있었는데 이러한 계면 층 역시 Li 확산과 계면 저항에 영향을 주어 방전 용량 감소에 원인으로 작용한다.

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A study on the crystalline orientation and electric properties of sol-gel PZT thin film for piezoelectric sensors (졸겔 법으로 제조한 압전 센서용 PZT 박막의 결정 배향 및 전기적 특성 연구)

  • Byun, Jin-Moo;Lee, Ho-Nyun;Lee, Hong-Kee;Lee, Seong-Eui;Lee, Hee-Chul
    • Journal of Sensor Science and Technology
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    • v.19 no.3
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    • pp.202-208
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    • 2010
  • This study examined the dependency of crystalline orientation and electric properties of sol-gel PZT film on hydrolysis, a $PbTiO_3$ seed layer and a concentration of sol-gel solution. The PZT thin films were prepared by using 2-Methoxyethanol-based sol-gel method and spin-coating on Pt/Ti/$SiO_2$/Si substrates. The 1-${\mu}m$-thick PZT films were coated and then fired in a furnace by direct insert method. The highly (111) oriented PZT film of pure perovskite structure could be obtained. We could control the degree of orientation by various parameters such as hydrolysis, a $PbTiO_3$ seed layer and a concentration of sol-gel solution. The highest measured remanent polarization, dielectric constant and piezoelectric coefficient are $24.16\;{\mu}C/cm^2$, 2808, and 159 pC/N, respectively.

Fabrication of LiMn2O4 Thin-Film Rechargeable Batteries by Sol-Gel Method and Their Electrochemical Properties (졸-겔 방법을 이용한 LiMn2O4 박막 이차 전지 제작 및 전기화학적 특성 조사)

  • Lee, J.H.;Kim, K.J.
    • Journal of the Korean Vacuum Society
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    • v.20 no.3
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    • pp.205-210
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    • 2011
  • Structural and electrochemical properties of spinel oxide $LiMn_2O_4$ thin films prepared by using a sol-gel method on Pt/Ti/$SiO_2$/Si substrates were investigated. When Li/Mn molar ratio of the film was smaller than 0.5, $Mn_2O_3$hase was found to coexist with $LiMn_2O_4$. Half-cell batteries fabricated using the $LiMn_2O_4$ films as the cathode were put into chargedischarge (C-D) cycles and the change in structural properties of the cathode after the cycles was examined by X-ray diffraction and Raman spectroscopy. As the C-D cycle number increases, the discharge capacity of pure $LiMn_2O_4$ battery gradually decreases, being reduced to 72% of the initial capacity at 300 cycles. Such capacity fading is attributable to the decrease in the number of $Li^+$ ions that return to the tetrahedral sites of the spinel structure during the discharge step and the resultant increase in $Mn^{4+}$ density in the film. Also, $Mn_2O_3$ phase gradually appeared in the film as the cycle number increases.

The Preparation and Characterization of Bismuth Layered Ferroelectric Thin Films by Sol-Gel Process (II. Dielectric Properties of Ferroelectric $Sr_{0.7}/B_{2.3}(Ta_{1-x}Nb_x)_2O_9$ Thin Films Prepared by MOD Process) (솔 - 젤법을 이용한 Bismuth Layered Structure를 가진 강유진성 박막의 제조 및 특성평가에 관한 연구 (II. MOD법으로 제조한 강유전성 $Sr_{0.7}/B_{2.3}(Ta_{1-x}Nb_x)_2O_9$ 박막의 유전특성))

  • 최무용;송석표;정병직;김병호
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.12 no.1
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    • pp.62-68
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    • 1999
  • Ferroelectric $Sr_{0.7}/B_{2.3}(Ta_{1-x}Nb_x)_2O_9$(x=0, 0.1, 0.2, 0.3) thin films were deposited on $Pt/SiO_2/Si$ substrate by MOD(Metalorganic Decomposition) process. Metal carboxylate and metal alkoxide were used as precursors, and 2-methoxyethanol, xylene as solvents. After spin coating, thin films were pre-annealed at $400^{\circ}C$, followed by RTA(Rapid Thermal Annealing) and final annealing at $800^{\circ}C$ in oxygen atmosphere. These procedures were repeated three times to obtain thin films with the thickness of $2000{\AA}$. To enhance the nucleation and growth of layered-perovskite phase, thin films were rapid-thermally annealed above $720^{\circ}C$ in oxygen atmosphere. As RTA temperature increased, fluorite phase was transformed to layered-perovskite phase. And the change of Nb contents affected dielectric / electrical properties and microstructure. The ferroelectric characteristics of $Sr_{0.7}/B_{2.3}(Ta_{1-x}Nb_x)_2O_9$ thin film were Pr=8.67 $\mu{C}/cm^2$, Ec=62.4kV/cm and $I_{L}=1.4\times10^{-7}A/cm^2$ at the applied voltage of 5V, respectively.

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Orientation Control and Dielectric Properties of Sol-gel Deposited (Ba,Sr)TiO3 Thin Films for Room-temperature Tunable Element Applications

  • Zhai, Jiwei;Chen, Haydn
    • Journal of the Korean Ceramic Society
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    • v.40 no.4
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    • pp.380-384
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    • 2003
  • The effects of the mole concentrations of precursor solution on the microstructure and dielectric properties of sol-gel deposited $Ba_{0.85}$S $r_{0.15}$Ti $O_3$(BST) thin films have been investigated. The films were of single perovskite phase with strong (100) preferred orientation when grown on LaNi0$_3$ buffered Pt/Ti/ $SiO_2$Si substrates using a diluted precursor solution. Variation of the precursor solution concentration resulted in a different microstructure and, in turn, affected the tunability of the sol-gel deposited films. It was observed that leakage currents increased asymmetrically for the negative and positive bias voltage with decreasing thickness. Overall results suggest that those BST films have acceptable properties f3r applications as room-temperature tunable elements.

Correction between Dielectric and Strain in PST Thin Films prepared by Sol-gel method for Tunable application (Tunable 소자 응용을 위한 Sol-gel 법으로 제작된 $(Pb_{0.5},Sr_{0.5})TiO_3$ 박막의 stain 과 유전 관계)

  • Kim, Kyoung-Tae;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.582-585
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    • 2004
  • Pb0.5Sr0.5TiO3 (PST) thin films were fabricated by the alkoxide-based sol-gel process using spin-coating method on Pt/Ti/SiO2/Si substrate. The PST films annealed from 500C to 650C for 1h show a perovskite phase and dense microstructure with a smooth surface. The grain size and dielectric constant of PST films increases with the increase in annealing temperature, which reduces the SiO2 equivalent thickness of the PST film. The crystallinity or internal strain in the PST thin films analyzed from the diffraction-peak widths correlate well with the decrease in the dielectric losses. The dielectric constants and dielectric loss (%) of the PST films annealed at 650c (teq : 0.89 nm) were 549 and 0.21%, respectively.

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Structural and Dielectric Properties of Sol-gel Derived BiFeO3/Pb(Zr,T)O3 Heterolayered Thin Films

  • Nam, Sung-Pill;Lee, Sung-Gap;Lee, Young-Hie
    • Transactions on Electrical and Electronic Materials
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    • v.11 no.5
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    • pp.212-215
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    • 2010
  • $BiFeO_3/Pb(Zr_{0.95}Ti_{0.05})O_3$ (BFO/PZT) heterolayered thin films were fabricated by the spin coating method on a Pt/Ti/$SiO_2$/Si substrate using metal alkoxide solutions. The coating and heating procedure was repeated 6 times to form the heterolayered films. The thickness of the BFO/PZT films after one cycle of drying/sintering is about 30-40 nm. All BFO/PZT films show a void free uniform grain structure without the presence of rosette structures. It can be assumed that the crystal growth of the upper BFO layers can be influenced by the lower PZT layers. As the number of coatings increased, the dielectric constant increased, so that the value for the 6-layer film was 1360 at 1 KHz.

Electrical Characteristics of PZT Ferroelectric Thin Films (PZT 강유전 박막의 전기적 특성)

  • Kim, Hyun-Gwon;Paik, Dong-Soo;Choi, Hyung-Wook;Kim, Jun-Han;Park, Chang-Yup
    • Proceedings of the KIEE Conference
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    • 1993.11a
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    • pp.225-227
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    • 1993
  • Pb(Zr, Ti)$O_3$ ferroelectric thin layers were deposited onto Pt/$SiO_2$/Si substrates by Sol-Gel processing and annealed by RTA at $600^{\circ}C$ for $20{\sim}30\;sec$. microstructure of the films was examined by XRD and SEM analysis. Electrical properties of PZT thin films with different Zr/Ti ratio yield $P_r$ ranging $10{\sim}21{\mu}C/cm^2$, $E_c$, ranging $37.5{\sim}137.5\;kV/cm$, switching times faster than 180nsec, and leakage current about $20{\mu}A/cm^2$. The film was endured about $10^{10}$ fatigue cycles.

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Fabrication and Properties of ZnSnO3 Piezoelectric Films Deposited by a Pulsed Laser Deposition (Pulsed Laser Deposition 방법으로 증착된 ZnSnO3 압전 박막의 성장과 특성 평가)

  • Park, Byeong-Ju;Yoon, Soon-Gil
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.1
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    • pp.18-21
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    • 2014
  • Because the Pb-based piezoelectric materials showed problems such as an environmental pollution. lead-free $O_3$ materials were studied in the present study. The $O_3$ thin films were deposited at $640^{\circ}C$ on $Pt/Ti/SiO_2$ substrate by pulsed laser deposition (PLD) and were annealed for 5 min at $750^{\circ}C$ using rapid thermal annealing (RTA) in nitrogen atmosphere. Samples annealed at $750^{\circ}C$ showed a smooth morphology and an improvement of the dielectric and leakage properties, as compared with as-grown samples. However, electrical properties of the $O_3$ thin films obtained in the present study should be improved for piezoelectric applications.

A Fabrication and ferroelectric properties of BLT Thin Films for FRAM (FRAM 응용을 위한 BLT 박막의 제작 및 특성)

  • Kim, Kyoung-Tae;Kwon, Ji-Woon;Shim, Il-Wun;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.565-568
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    • 2001
  • We have fabricated $Bi_{3.25}La_{0.75}Ti_{3}O_{12}(BLT)$ thin(200nm) films on the $Pt/Ti/SiO_{2}/Si$ substrates using a MOD(Metalorganic decomposition) method with annealing temperature from $550^{\circ}C$ to $750^{\circ}C$. The structural properties of the films examined by x-ray diffraction. The layered-perovskite phase obtained above $600^{\circ}C$. Scanning electron micrographs showed uniform surface composed of rodlike grains. The grain size increased with increasing annealing temperature. The BLT thin films showed little polarization fatigue test up to $3.5{\times}10^{9}$ bipolar cycling at a 5V and 100kHz.

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