• 제목/요약/키워드: Pre-film

검색결과 388건 처리시간 0.024초

Adsorption behaviour of film-forming amine on pre-oxidized carbon steel surface

  • Genxian, Lin;Yun, Sun;Canshuai, Liu;Jun, Fang;Lijun, Song;Bin, Liu
    • Nuclear Engineering and Technology
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    • 제54권4호
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    • pp.1185-1194
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    • 2022
  • The maintenance of condenser main pipe is the key to achieve film-forming amine maintenance effectiveness. In this work, oxygen content, pH and temperature of the solution were controlled to simulate the condition of condenser main pipe, and magnetite coated carbon steel sample was prepared by pre-oxidization. CAM was used to characterize the hydrophobicity of film formed samples. Hydrophobic film was formed on pre-oxidized carbon steel samples when octadecylamine concentration reaches 20 mg/kg. SEM, EDS, EIS, and PD were used to characterize the influence of octadecylamine concentration on maintenance effectiveness. It was found that the maintenance effectiveness was enhanced and the corrosion rate was suppressed with the increase of octadecylamine concentration. FIB and TEM were used to detect the adsorbed octadecylamine film thickness founding that octadecylamine adsorbed onto the surface of pre-oxidized carbon steel by multi-layer adsorption mechanism.

Effect of Pre-annealing on the Formation of Cu2ZnSn(S,Se)4 Thin Films from a Se-containing Cu/SnSe2/ZnSe2 Precursor

  • Ko, Young Min;Kim, Sung Tae;Ko, Jae Hyuck;Ahn, Byung Tae;Chalapathy, R.B.V.
    • Current Photovoltaic Research
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    • 제10권2호
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    • pp.39-48
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    • 2022
  • A Se-containing Cu/SnSe2/ZnSe precursor was employed to introduce S to the precursor to form Cu2ZnSn(S,Se)4 (CZTSSe) film. The morphology of CZTSSe films strongly varied with two different pre-annealing environments: S and N2. The CZTSSe film with S pre-annealing showed a dense morphology with a smooth surface, while that with N2 pre-annealing showed a porous film with a plate-shaped grains on the surface. CuS and Cu2Sn(S,Se)3 phases formed during the S pre-annealing stage, while SnSe and Cu2SnSe3 phases formed during the N2 pre-annealing stage. The SnSe phase formed during N2 pre-annealing generated SnS2 phase that had plate shape and severely aggravated the morphology of CZTSSe film. The power conversion efficiency of the CZTSSe solar cell with S pre-annealing was low (1.9%) due to existence of Zn(S.Se) layer between CZTSSe and Mo substrate. The results indicated that S pre-annealing of the precursor was a promising method to achieve a good morphology for large area application.

초기 스퍼터링조건이 스테인리스강의 이온질화시 지로하층 형성거동에 미치는 영향 (The Effects of Sputtering conditions in Pre Sputtering on the Formation Behavior of Nitride Layer in the Ion Nitriding of Stainless Steel)

  • 최상진
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 1999년도 추계학술대회 논문집 - 한국공작기계학회
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    • pp.197-203
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    • 1999
  • Stainless steels in general has passive film having strong corrosion resistance on surface. Therefore it must be necessarily removed by etching in mixing solution of sulfuric and chloric acid before Nitriding treatment. But in the ion nitriding, nitride layer was easily formed because passive film was removed without difficult by sputtering effect. The removal extent of these passive films was greatly effected by gas mixing ratios and pressure and holding times of pre sputtering factors in pre sputtering stage. As a results of experiment it has been known that pre sputtering pressure and holding time was not nearly effective on the formation behavior of nitride layer. But when A/H2 gas mixing ratios was 1/2 (vol%) was the most effective of the all pre sputtering conditions. It was resulted from the combination of mechanical reaction byArgon bombardment and chemical reaction by reduction of hydrogen on the passive film.

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Structure of Oxide Film Prepared by Two-step Anodization of Aluminum

  • Ko, Eunseong;Ryu, Jaemin;Kang, Jinwook;Tak, Yongsug
    • Corrosion Science and Technology
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    • 제5권4호
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    • pp.137-140
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    • 2006
  • The effect of pre-existing barrier-type film on porous aluminum oxide film formation during anodization was investigated to control the uniform film growth rate. Initial potential fluctuations during anodization indicated that the breakdown of barrier-film is preceded before the porous formation and the induction time for the porous film growth increases with the increases of pre-existing film thickness. The porous film growth mechanism is lot affected by the presence of barrier film on aluminum surface. In parallel, uniform growth of barrier film underneath the porous structure was attained by two-step anodization processes.

O2 플라즈마로 처리한 폴리머 기판 위에 성장된 GZOB 박막의 특성 (The Characteristics of GZOB Thin Film on O2 Plasma Treated Polymer Substrate)

  • 유현규;이종환;이태용;허원영;이경천;신현창;송준태
    • 한국전기전자재료학회논문지
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    • 제22권8호
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    • pp.645-649
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    • 2009
  • We investigated the effects of a high density $O_2$ plasma treatment on the structural and electrical properties of Ga-, B- codoped ZnO (GZOB) films. The GZOB films were deposited on polymer substrate without substrate heating by DC magnetron sputtering. Prior to the GZOB film growth, we treated a polymer substrate with highly dense inductively coupled oxygen plasma. The optical transmittance of the GZOB film, about 80 %, was maintained regardless of the plasma pre-treatment. The resistivity of the GZOB film on PC substrate decreased from 9.08 ${\times}$ $10^{-3}$ ${\Omega}-cm$ without an $O_2$ plasma pre-treatment to 2.12 ${\times}$ $10^{-3}$ ${\Omega}-cm$ with an $O_2$ plasma pre-treatment. And PES substrate decreased from 1.14 ${\times}$ $10^{-2}$ ${\Omega}-cm$ without an $O_2$ plasma pre-treatment to 6.13 ${\times}$ $10^{-3}$ ${\Omega}-cm$ with an $O_2$ plasma pre-treatment.

Dynamic Response Behavior of Femtosecond Laser-Annealed Indium Zinc Oxide Thin-Film Transistors

  • Shan, Fei;Kim, Sung-Jin
    • Journal of Electrical Engineering and Technology
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    • 제12권6호
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    • pp.2353-2358
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    • 2017
  • A femtosecond laser pre-annealing process based on indium zinc oxide (IZO) thin-film transistors (TFTs) is fabricated. We demonstrate a stable pre-annealing process to analyze surface structure change of thin films, and we maintain electrical stability and improve electrical performance. Furthermore, dynamic electrical characteristics of the IZO TFTs were investigated. Femtosecond laser pre-annealing process-based IZO TFTs exhibit a field-effect mobility of $3.75cm^2/Vs$, an $I_{on}/I_{off}$ ratio of $1.77{\times}10^5$, a threshold voltage of 1.13 V, and a subthreshold swing of 1.21 V/dec. And the IZO-based inverter shows a fast switching behavior response. From this study, IZO TFTs from using the femtosecond laser annealing technique were found to strongly affect the electrical performance and charge transport dynamics in electronic devices.

AZ91 마그네슘 합금의 PEO 피막 형성거동에 미치는 HF전처리의 영향 (Effect of pre-treatment of AZ91 Mg alloy in HF solution on PEO film formation behavior)

  • 권두영;송풍근;문성모
    • 한국표면공학회지
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    • 제54권4호
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    • pp.184-193
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    • 2021
  • This study demonstrates formation behavior and morphological changes of PEO (Plasma Electrolytic Oxidation) films on AZ91 Mg alloy as a function of pre-treatment time in 1 M HF solution at 25 ± 1 ℃. The electrochemical behavior and morphological changes of AZ91 Mg alloy in the pre-treatment solution were also investigated with pre-treatment time. The PEO films were formed on the pre-treated AZ91 Mg alloy specimen by the application of anodic current 100 mA/cm2 of 300 Hz AC in 0.1 M NaOH + 0.4 M Na2SiO3 solution. Vigorous generation of hydrogen bubbles were observed upon immersion in the pre-treatment solution and its generation rate decreased with immersion time. It was also found that 𝛽-Mg17Al12 in AZ91 Mg alloy was dissolved and a protective thin film of MgF2 was formed on the AZ91 Mg alloy surface during the pre-treatment process in the 1 M HF solution. PEO film did not grow on the AZ91 Mg alloy specimen when the surface was not pre-treated and irregular PEO films with nodular defects were formed for the specimens pre-treated up to 1 min. Uniform PEO films were formed when the AZ91 Mg alloy specimen was pre-treated more than 3 min. The growth rate of PEO films on AZ91 Mg alloy increased significantly with increasing pre-treatment time.

마이크로웨이브 플라즈마 화학증착법에 의해 메탄, 수소, 산소의 혼합가스로부터 다이아몬드 박막의 합성 (Diamond Film Deposition by Microwave Plasma CVD Using a Mixture of $CH_4$, $H_2$, $O_2$,)

  • 이길용;제정호
    • 한국세라믹학회지
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    • 제27권4호
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    • pp.513-520
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    • 1990
  • Diamond film was deposited on Si wafer substrate from a gas mixture of methane, hydrogen and oxygen by microwave plasma-assisted chemical vapor deposition. The effects of the pre-treatments of the substrate and of the oxygen addition on the diamond film synthesis are described. In order to obtain diamond film, the substrate was pre-treated with 3 kinds of methods. When the substrate was ultrasonically vibrated within the ethyl alcohol dispersed with 25${\mu}{\textrm}{m}$ diamond powder, the denset diamond film was deposited. Addition of oxygen in the gas mixture of methane and hydrogen improved the crystallinity of the deposited diamond film and also increased the deposition rate of the diamond film more than two times.

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원자층 증착 기술을 이용한 TiOx 기반 TFT의 어닐링 효과 (Annealing Effect on TiOx Based Thin-Film Transistors with Atomic Layer Deposition)

  • 김한상;김성진
    • 한국전기전자재료학회논문지
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    • 제30권8호
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    • pp.474-478
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    • 2017
  • We report on thin-film transistors based on $TiO_x$ pre-annealed by femtosecond laser pulses. A 30-nm thick $TiO_x$ active channel layer was initially deposited by an ALD system. The $TiO_x$ semiconducting films were annealed by irradiation with a femtosecond laser (power: $3W/cm^2$) for 5, 25, and 50s. Atomic force microscopy images revealed that the surface of a $TiO_x$ film without femtosecond laser pre-annealing was relatively rough, while after annealing with femtosecond laser pulses, the surface of the $TiO_x$ films became smooth. With increasing radiation time, the surrounding gas atmosphere could have a larger impact on the $TiO_x$ surface; meanwhile, the thin-film roughness decreased. Thin-film transistors with $TiO_x$ active channels pre-annealed at 50s exhibited good transfer characteristics and an on-to-off current ratio of ${\sim}10^3$.

Effect of Pre-Cycling Rate on the Passivating Ability of Surface Films on Li4Ti5O12 Electrodes

  • Jung, Jiwon;Hah, Hoe Jin;Lee, Tae jin;Lee, Jae Gil;Lee, Jeong Beom;Kim, Jongjung;Soon, Jiyong;Ryu, Ji Heon;Kim, Jae Jeong;Oh, Seung M.
    • Journal of Electrochemical Science and Technology
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    • 제8권1호
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    • pp.15-24
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    • 2017
  • A comparative study was performed on the passivating abilities of surface films generated on lithium titanate (LTO; $Li_4Ti_5O_{12}$) electrodes during pre-cycling at two different rates. The surface film deposited at a faster pre-cycling rate (i.e., 0.5 C) is irregularly shaped and unevenly covers the LTO electrode. Owing to the incomplete coverage of the protective film, this LTO electrode exhibits poor passivating ability. Additional electrolyte decomposition and concomitant film deposition occur during subsequent charge/discharge cycles. As a result of the thick surface film, severe cell polarization occurs and eventually causes cell failure. However, pre-cycling the Li/LTO cell at a slower rate (0.1 C) improves cell polarization and capacity retention; this occurs because the surface film uniformly covers the LTO electrode and provides strong passivation. Accordingly, there is no significant film deposition during subsequent charge/discharge cycling. Additionally, self-discharge is reduced during high-temperature storage.