• 제목/요약/키워드: Potential barrier height

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Impact of Energy Relaxation of Channel Electrons on Drain-Induced Barrier Lowering in Nano-Scale Si-Based MOSFETs

  • Mao, Ling-Feng
    • ETRI Journal
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    • 제39권2호
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    • pp.284-291
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    • 2017
  • Drain-induced barrier lowering (DIBL) is one of the main parameters employed to indicate the short-channel effect for nano metal-oxide semiconductor field-effect transistors (MOSFETs). We propose a new physical model of the DIBL effect under two-dimensional approximations based on the energy-conservation equation for channel electrons in FETs, which is different from the former field-penetration model. The DIBL is caused by lowering of the effective potential barrier height seen by the channel electrons because a lateral channel electric field results in an increase in the average kinetic energy of the channel electrons. The channel length, temperature, and doping concentration-dependent DIBL effects predicted by the proposed physical model agree well with the experimental data and simulation results reported in Nature and other journals.

유연성 방호책을 이용한 철도변 낙석방호사례 (Flexible Barrier System for Rockfall Protection)

  • 최승일;유병옥;김경석
    • 한국지반공학회:학술대회논문집
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    • 한국지반공학회 2003년도 사면안정학술발표회
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    • pp.103-116
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    • 2003
  • Rockfall Protection fence is one of the most common rockfall Protection methods in Korea. If rockfall protection fences are required along the road or railway, their location, height and capacity, in terms of the maximum kinetic energy that they can absorb, should be specified. Within this paper, the best practice of rockfall barrier is introduced. Modern rockfall simulations as a means to define risks, protection requirements, dynamic loading and height of potential structures and selection of appropriate placement is presented. Technical possibilities of rockfall barriers and their actual limits are presented. Safety concepts based on probabilistic approaches are proposed. Recent studies peformed in other countries show that Flexible Barriers are also a feasible system to stop and retain debris flows. Finally an outlook onto further development is given.

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유연성 원리를 이용한 낙석방호시스템 (Flexible Barrier System for Rockfall Protection)

  • 최숭일;이창호;김덕봉
    • 한국철도학회:학술대회논문집
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    • 한국철도학회 2003년도 춘계학술대회 논문집
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    • pp.68-81
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    • 2003
  • Rockfall protection fence is one of the most common rockfall protection methods in Korea. If rockfall protection fences are required along the road or railway, their location, height and capacity, in terms of the maximum kinetic energy that they can absorb, should be specified. Within this paper, the best practice of rockfall barrier is introduced. Modern rockfall simulations as a means to define risks, protection requirements, dynamic loading and height of potential structures and selection of appropriate placement is presented. Technical possibilities of rockfall barriers and their actual limits are presented. Safety concepts based on probabilities approaches are proposed. Recent studies performed in other countries show that Flexible Barriers are also a feasible system to stop and retain debris flows. Finally an outlook onto further development is given.

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PTC 세라믹 입계의 전위장벽 측정 (Determination of Potential Barrier Heights at the Grain Boundaries of PTC Ceramics)

  • 조성걸;이영근
    • 한국세라믹학회지
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    • 제38권7호
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    • pp.639-642
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    • 2001
  • 전형적인 비저항-온도 특성을 갖는 BaTiO$_3$계 PTC 세라믹을 일반적인 세라믹 공정을 이용하여 제조하였고, 결정립계면에 형성된 전위장벽의 높이를 구하였다. ZnO 바리스터의 전위장벽을 구하기 위해 이용되었던 커패시턴스-전압 관계식과는 다른 새로운 관계식을 제안하였고, 기존의 비저항-온도 관계식을 다소 변경한 관계식을 이용하여 전위장벽을 구하였다. 두 관계식으로부터 구한 전위장벽의 높이는 매우 유사한 값을 보이고 있으며 타 연구자들에 의해 보고된 값과도 잘 일치하고 있다. 비저항-온도 관계식과 커패시턴스-전압 관계식을 이용하여 130-18$0^{\circ}C$ 구간에서 구한 전위장벽의 크기는 각각 0.41-0.76V와 0.36-0.80V이었다.

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수소충전소 폭발위험장소 완화를 위한 확산차단벽 최적화 설계 (Optimization of Designing Barrier to Mitigate Hazardous Area in Hydrogen Refueling Stations)

  • 안승효;오세현;김은희;이준서;마병철
    • 한국수소및신에너지학회논문집
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    • 제34권6호
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    • pp.734-740
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    • 2023
  • Hydrogen emphasis on safety management due to its high potential for accidents from wide explosive limits and low ignition energy. To prevent accidents, appropriate explosion-proof electrical equipment with installed to safe management of ignition sources. However, designing all facilities with explosion-proof structures can significantly increase costs and impose limitations. In this study, we optimize the barrier to effectively control the initial momentum in case of hydrogen release and form the control room as a non-hazardous area. We employed response surface method (RSM), the barrier distance, width and height of the barrier were set as variables. The Box-Behnken design method the selection of 15 cases, and FLACS assessed the presence of hazardous area. Analysis of variance (ANOVA) analysis resulting in an optimized barrier area. Through this methodology, the workplace can optimize the barrier according to the actual workplace conditions and classify reasonable hazardous area, which is believed to secure safety in hydrogen facilities and minimize economic burden.

Si 기판에서의 광소자 응용을 위한 Ge 박막의 Transfer 기술개발 (Ge thin layer transfer on Si substrate for the photovoltaic applications)

  • 안창근;조원주;임기주;오지훈;양종헌;백인복;이성재
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2003년도 하계종합학술대회 논문집 II
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    • pp.743-746
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    • 2003
  • We have successfully used hydrophobic direct-wafer bonding, along with H-induced layer splitting of Ge, to transfer 700nm think, single-crystal Ge films to Si substrates. Optical and electrical properties have been also observed on these samples. Triple-junction solar cell structures gown on these Ge/Si heterostructure templates show comparable photoluminescence intensity and minority carrier lifetime to a control structure grown on bulk Ge. When heavily doped p$^{+}$Ge/p$^{+}$Si wafer bonded heterostructures were bonded, ohmic interfacial properties with less than 0.3Ω$\textrm{cm}^2$ specific resistance were observed indicating low loss thermal emission and tunneling processes over and through the potential barrier. Current-voltage (I-V) characteristics in p$^{+}$Ge/pSi structures show rectifying properties for room temperature bonded structures. After annealing at 40$0^{\circ}C$, the potential barrier was reduced and the barrier height no longer blocks current flow under bias. From these observations, interfacial atomic bonding structures of hydrophobically wafer bonded Ge/Si heterostructures are suggested.ested.

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비대칭 DGMOSFET의 도핑분포함수에 따른 DIBL (Drain Induced Barrier Lowering of Asymmetric Double Gate MOSFET for Channel Doping Profile)

  • 정학기
    • 한국정보통신학회논문지
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    • 제19권11호
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    • pp.2643-2648
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    • 2015
  • 본 연구에서는 비대칭 이중게이트 MOSFET의 채널 내 도핑농도분포에 대한 드레인유도장벽감소(Drain Induced Barrier Lowering; DIBL)에 대하여 분석하고자한다. DIBL은 드레인 전압에 의하여 소스 측 전위장벽이 낮아지는 효과로서 중요한 단채널 효과이다. 이를 분석하기 위하여 포아송방정식을 이용하여 해석학적 전위분포를 구하였으며 전위분포에 영향을 미치는 채널도핑농도의 분포함수변화에 대하여 DIBL을 관찰하였다. 채널길이, 채널두께, 상하단 게이트 산화막 두께, 하단 게이트 전압 등을 파라미터로 하여 DIBL을 관찰하였다. 결과적으로 DIBL은 채널도핑 농도분포함수의 변수인 이온주입범위 및 분포편차에 변화를 나타냈다. 특히 두 변수에 대한 DIBL의 변화는 최대채널도핑농도가 $10^{18}/cm^3$ 정도로 고도핑 되었을 경우 더욱 현저히 나타나고 있었다. 채널길이가 감소할수록 그리고 채널두께가 증가할수록 DIBL은 증가하였으며 하단 게이트 전압과 상하단게이트 산화막 두께가 증가할수록 DIBL은 증가하였다.

An Analytical Model of the First Eigen Energy Level for MOSFETs Having Ultrathin Gate Oxides

  • Yadav, B. Pavan Kumar;Dutta, Aloke K.
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제10권3호
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    • pp.203-212
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    • 2010
  • In this paper, we present an analytical model for the first eigen energy level ($E_0$) of the carriers in the inversion layer in present generation MOSFETs, having ultrathin gate oxides and high substrate doping concentrations. Commonly used approaches to evaluate $E_0$ make either or both of the following two assumptions: one is that the barrier height at the oxide-semiconductor interface is infinite (with the consequence that the wave function at this interface is forced to zero), while the other is the triangular potential well approximation within the semiconductor (resulting in a constant electric field throughout the semiconductor, equal to the surface electric field). Obviously, both these assumptions are wrong, however, in order to correctly account for these two effects, one needs to solve Schrodinger and Poisson equations simultaneously, with the approach turning numerical and computationally intensive. In this work, we have derived a closed-form analytical expression for $E_0$, with due considerations for both the assumptions mentioned above. In order to account for the finite barrier height at the oxide-semiconductor interface, we have used the asymptotic approximations of the Airy function integrals to find the wave functions at the oxide and the semiconductor. Then, by applying the boundary condition at the oxide-semiconductor interface, we developed the model for $E_0$. With regard to the second assumption, we proposed the inclusion of a fitting parameter in the wellknown effective electric field model. The results matched very well with those obtained from Li's model. Another unique contribution of this work is to explicitly account for the finite oxide-semiconductor barrier height, which none of the reported works considered.

공기산화법으로 제조한 Magnetite의 물분산매 자성 유체의 특성 (The Characteristics of Water Based Ferrofluid of Magnetite Prepared by Air Oxidation)

  • 신학기;장현명;한창덕;김태옥
    • 한국세라믹학회지
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    • 제27권1호
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    • pp.109-117
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    • 1990
  • Magnetite for Water-based ferrofluid was synthesized by air oxidation of aqueous suspension in the pH range 7-12 at $65^{\circ}C$. The optimum condition of magneite formation was delineated by examining various physicochemcial properties such as Fe2+ content, phase characteristics, MHC and $\sigma$max. The point of zero charge of iron oxide powders obtained at various pH conditions were correlated with the oxidation state of Fe in the iron oxide. The magnetite powder prepared at pH 9 ws dispersed using sodium oleate and sodium dodecylbenzenesulfonate (SDBS) as dispersants, and the dispersion characteristics of the magnetite ferrofluid were examined by means of the fraction of solid dispersed, zeta potential data and FT-IR spectrum. A simple calculation on the potential energy of two interacting magnetite particles showed that the dispersion stability was directly correlated with height of the potential energy barrier or the shape of zeta potential.

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Metal/SiC(4H) 쇼트키 다이오드의 포텐셜 장벽 높이 (Potential barrier height of Metal/SiC(4H) Schottky diode)

  • 박국상;김정윤;이기암;남기석
    • 한국결정성장학회지
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    • 제8권4호
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    • pp.640-644
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    • 1998
  • Sb/SiC(4H) 및 Ti/SiC(4H) 쇼트키 다이오드(SBD)를 제작하여 그 특성을 조사하였다. 용량-전압(C-V) 측정으로부터 얻은 n-형 SiC(4H)의 주개(donor) 농도는 약 $2.5{\times}10 ^{17}{\textrm}cm^{-3}$이었다. 순방향 전류-전압(I-V) 특성의 기울기로부터 얻은 Sb/SiC(4H) 쇼트키 다이오드의 이상계수는 1.31이었고, 역방향 항복전장(breakdown field)은 약 4.4$\times$102V/cm 이었다. 용량-전압(C-V) 측정으로부터 얻은 Sb/SiC(4H) SBD의 내부전위(built-in potential) 및 쇼트키 장벽 높이는 각각 1.70V 및 1.82V이었다. Sb/SiC(4H)의 장벽높이 1.82V는 Ti/SiC(4H)의 0.91V보다 높았다. 그러나 Sb/SiC(4H)의 전류밀도와 역방향 항복전장은 Ti/SiC(4H)의 것보다 낮았다. Ti/SiC(4H)는 물론 Sb/SiC(4H) 쇼트키 다이오드는 고전력 전자소자로서 유용하다.

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