• 정보저장시스템학회논문집
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• 제1권2호
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• pp.192-196
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• 2005

In this paper, we investigated the possibility of replicating patterned media by nano-injection molding process with a metallic nano-stamper. The original nano-master was fabricated by E-beam lithography and ICP etching process. The metallic nano-stamper was fabricated using a nanoimprint lithography and nano-electroforming process. The nano-patterned substrate was replicated using a nano-injection molding process without additional etching process. In nano-injection molding process, since the solidified layer, generated during the polymer filling, deteriorates transcribability of nano patterns by preventing the polymer melt from filling the nano cavities, an injection-mold system was constructed to actively control the stamper surface temperature using MEMS heater and sensors. The replicated polymeric patterns using nano-injection molding process were as small as 50 nm in diameter, 150 nm in pitch, and 50 nm in depth. The replicated polymeric patterns can be applied to high density patterned media.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2006년도 춘계학술대회 논문집
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• pp.105-108
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• 2006

It has been issued to fabricate nano-scale patterns with large-scale in the field of digital display. Also, large-scale fabrication technology of nano pattern is very important not only for the field of digital display but also for the most of applications of the nano-scale patterns in the view of the productivity. Among the fabrication technologies, UV nano imprinting process is suitable for replicating polymeric nano-scale patterns. However, in case of conventional UV nano imprinting process using flat mold, it is not easy to replicate large areal nano patterns. Because there are several problems such as releasing, uniformity of the replica, mold fabrication and so on. In this study, to overcome the limitation of the conventional UV nano imprinting process, we proposed a continuous UV nano imprinting process using a pattern roll stamper. A pattern roll stamper that has nano-scale patterns was fabricated by attaching thin metal stamper to a roll base. A continuous UV nano imprinting system was designed and constructed. As practical examples of the process, various nano patterns with pattern size of 500, 150 and 50nm were fabricated. Finally, geometrical properties of imprinted nano patterns were measured and analyzed.

• 한국고분자학회:학술대회논문집
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• 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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• pp.368-368
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• 2006

Micro-molded parts can be defined as parts with microgram weight, parts with micro-structured surface, and parts with micro-precision. In this study, various micro-scale molded parts for various polymers were produced by using a precision micro-molding machine. Molded parts with nano-structure surface were also produced to analyze the effect of molding conditions on replication of surface pattern and higher-order structure development of molded parts. Replication of molded parts was influenced by material properties, molding conditions and size of surface pattern. Higher-order structure of molded parts was investigated by using polarized microscope. Skin-shear-core regions inside the molded parts were observed and shear region affected to surface replication.

• 소성∙가공
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• 제14권7호
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• pp.624-627
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• 2005

In this paper, we investigated the possibility of replicating patterned media by nano-injection molding process with a metallic nano-stamper. The original nano-master was fabricated by I-beam lithography and ICP etching process. The metallic nano-stamper was fabricated using a nanoimprint lithography and nano-electroforming process. Finally, the nano-patterned substrate was replicated using a nano-injection molding process without additional etching process. The replicated patterns using nano-injection molding process were as small as 50nm in diameter, 150nm in pitch, and 50nm in depth.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2005년도 춘계학술대회 논문집
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• pp.60-63
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• 2005

In this paper, we investigated the possibility of replicating patterned media by nano-injection molding process with a metallic nano-stamper. The original nano-master was fabricated by E-beam lithography and ICP etching process. The metallic nano-stamper was fabricated using a nanoimprint lithography and nano-electroforming process. Finally, the nano-patterned substrate was replicated using a nano-injection molding process without additional etching process. The replicated patterns using nano-injection molding process were as small as 50 nm in diameter, 150 nm in pitch, and 50 nm in depth.

• 비파괴검사학회지
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• 제32권2호
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• pp.142-148
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• 2012

본 연구에서는 초음파원자현미경 캔틸레버의 접촉 공진주파수를 이용하여 실리콘 웨이퍼와 나노 스케일의 폴리머 박막 패턴의 접합면 사이에서 나타나는 접합 특성을 UAFM 이미지를 통해 평가하였다. 이를 위해 실리콘 웨이퍼의 표면 처리 공정을 다르게 하였고 리소그래피 공정을 통해 300 nm의 폴리머 박막 패턴을 제작하였다. 제작된 시험편의 접합 상태를 광학현미경 이미지를 통해 서로 비교하였고 나노 스크래치 시험의 임계하중 값을 통하여 나노 패턴의 접합 상태를 검증하였다. 각각의 시험편에 대해 UAFM을 이용하여 $1{\mu}m{\times}1{\mu}m$ 크기의 표면 이미지와 표층부의 접합 상태이미지를 각각 얻었고 접촉 공진주파수의 진폭과 위상의 변화로 인한 접합부의 이미지 콘트라스트 차이로 접합 상태를 평가하였다.

• Macromolecular Research
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• 제13권5호
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• pp.435-440
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• 2005

This study describes a method where the match of two different length scales, i.e., the patterns from self-assembled block copolymer (<50 nm) and electron beam writing (>50 nm), allow the nanometer scale pattern mask. The method is based on using block copolymers containing a poly(methyl methacrylate) (PMMA) block, which is subject to be decomposed under an electron beam, as a pattern resist for electron beam lithography. Electron beam on self assembled block copolymer thin film selectively etches PMMA microdomains, giving rise to a polymeric nano-pattern mask on which subsequent evaporation of chromium produces the arrays of Cr nanoparticles followed by lifting off the mask. Furthermore, electron beam lithography was performed on the micropatterned block copolymer film fabricated by micro-imprinting, leading to a hierarchical self assembled pattern where a broad range of length scales was effectively assembled, ranging from several tens of nanometers, through submicrons, to a few microns.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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• pp.71-71
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• 2003

Hot embossing has been widely accepted as an alternative to photolithography in generating patterns on polymeric substrates. The optimization of embossing process should be accomplished based on polymer substrate materials. In this paper, the effect of polymer substrates on nano scale hot embossing process was studied. Silicon molds with nano size patterns were fabricated by e-beam direct writing. Molds were coated with self-assembled monolayer (SAM) of (1, 1, 2.2H -perfluorooctyl)-trichlorosilane to reduce the stiction between mold and substrates. For an embossing, pressure of 55, 75 bur, embossing time of 5 min and temperature of above transition temperature were peformed. Polymethylmethacrylates (PMMA) with different molecular weights of 450,000 and 950,000, MR-I 8010 polymer (Micro Resist Technology) and polyaliphatic imide copolymer were applied for hot embossing process development in nano size. These polymers were spun coated on the Si wafer with the thickness between 150 and 200 nm. The nano size patterns obtained after hot embossing were observed and compared based on the polymer properties by scanning electron microscopy (SEM). The imprinting uniformity dependent on the Pattern density and size was investigated. Four polymers have been evaluated for the nanoimprint By optimizing the process parameters, the four polymers lead to uniform imprint and good pattern profiles. A reduction in the friction for smooth surfaces during demoulding is possible by polymer selection.

• 한국광학회지
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• 제17권1호
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• pp.54-59
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• 2006

본 논문에서는 집적 광학 광도파로 소자 기술을 적용하여 생화학 물질의 성분을 정밀하게 측정 가능한 광소자로서 폴리머 광도파로와 브래그 격자를 이용하는 구조를 최초로 제안하였다. 유효굴절률법과 전송행렬법을 이용하여 최적의 감도를 가지는 브래그 격자 광도파로를 설계하였으며 코아와 하부 클래딩의 굴절률이 각각 1.540, 1.430인 폴리머를 이용하여 코아 두께가 $3{\mu}m$ 인 구조의 반전립 광도파로를 제작하였다. 코아 층까지 완성된 도파로 위에 레이저 빔 간섭계와 플라즈마 에칭을 이용하여 격자를 형성한 뒤 격자표면에 20 nm 두께의 Au층을 증착하고 칼릭사린(calixarene) 단분자층을 만들어 바이오센서를 제작하였다. 제작된 광센서를 이용하여 PBS(phosphate bufferedsaline) 용액에 함유된 $K^+$의 농도에 따라 브래그 반사픽이 단파장으로 이동하는 것을 관찰할 수 있었다.

• 한국광학회지
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• 제18권2호
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• pp.149-154
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• 2007

저가의 소자 개발이 가능한 나노임프린팅 공정을 도입하여 510 nm 주기의 브래그 격자 구조를 가지는 폴리머 광도파로 소자를 제작하였다. 폴리머 격자 광소자의 온도 의존성을 감소시키기 위한 방법으로 플라스틱 박막으로 이루어진 유연성 기판상에 브래그 격자를 제작하는 것이 필요하다. 임프린팅 공정을 손쉽게 수행하기 위한 광도파로 구조를 채택하였으며, 코아와 클래딩의 굴절률이 각각 1.540, 1.430인 폴리머를 이용하여 코아 두께가 $3{\mu}m$인 단일모드 광도파로 구조를 얻을 수 있었다. 유연성 기판 브래그 격자 광도파로 소자의 특성을 Si기판 브래그 격자 광도파로 소자와 비교하여 관측한 결과, 유연성 기판 도입에 따른 브래그 반사 소자의 성능 저하는 나타나지 않았다.