• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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• pp.58-62
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• 2003

Silicon carbide (SiC) was etched in a $NF_3/CH_4$ inductively coupled plasma. The etch process was modeled by using a neural network called generalized regression neural network (GRNN). For modeling, the process was characterized by a $2^4$ full factorial experiment with one center point. To test model appropriateness, additional test data of 16 experiments were conducted. Particularly, the GRNN predictive capability was drastically improved by a genetic algorithm (GA). This was demonstrated by an improvement of more than 80% compared to a conventionally obtained model. Predicted model behaviors were highly consistent with actual measurements. From the optimized model, several plots were generated to examine etch rate variation under various plasma conditions. Unlike the typical behavior, the etch rate variation was quite different depending on the bias power Under lower bias powers, the source power effect was strongly dependent on induced dc bias. The etch rate was strongly correated to the do bias induced by the gas ratio. Particularly, the etch rate variation with the bias power at different gas ratio seemed to be limited by the etchant supply.

• 한국재료학회지
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• 제17권4호
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• pp.215-221
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• 2007

The effect of $CF_4$ plasma treatment condition on the interfacial adhesion energy of inkjet printed Ag/polyimide system is evaluated from $180^{\circ}$ peel test by calculating the plastic deformation energy of peeled metal films. Interfacial fracture energy between Ag and as-received polyimide was 5.5 g/mm. $CF_4$ plasma treatment on the polyimide surface enhanced the interfacial fracture energy up to 17.6 g/mm. This is caused by the increase in the surface roughness as well as the change in functional group of the polyimide film due to $CF_4$ plasma treatment on the polyimide surface. Therefore, both the mechanical interlocking effect and the chemical bonding effect are responsible for interfacial adhesion improvement in ink jet printed Ag/polyimide systems.

• 전기학회논문지
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• 제63권10호
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• pp.1412-1416
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• 2014

We report thin-film organic moisture barriers based on polystyrene(PS) laminates deposition by PECVD for an encapsulation of OLEDs. The organic polystyrene thin-film has the benzene ring structure and high hydrophobic characteristics and it was polymerized by PECVD in dry process. Life time properties of Ca test were obtained 32 minutes at the RF 100W process conditions. From the AFM test, the roughness of multi-layer thin-film was more excellent rather than that of a single-layer thin-film. In addition, 5 layers of the multi-layer film properties were obtained 45 minutes. So that the optical and electrical properties were not affected with these plasma polymerized organic thin-film encapsulation. For life time improvement, the inorganic $Al_2O_3$ thin-film were deposited 5nm using ALD atomic layer deposition. The WVTR(Water Vaper Transmission Rate) value of hybrid thin-film encapsulation in the optimum process conditions was resulted by less than $10-3g/m^2/day$. From the results of experiment, plasma polymerized hybrid encapsulation was suggested as the flexible display applications.

• 한국산학기술학회논문지
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• 제5권5호
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• pp.458-461
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• 2004

본 논문에서는 Si wafer와 Cu사이의 밀착력을 증가시키기 위해 Si wafer전처리 후 plasma와 SAMs처리 방법에 의한 Cu도금의 형성에 관한 방법을 설명하였다. Si wafer를 Piranha solution과 $0.5{\%}$ HF처리 후 유기박막인 SAMs과 plasma를 이용하는 방법으로 wafer와 Cu층 사이의 밀착력을 증가시켰다. 도금층의 밀착력은 scratch test 로 측정하였으며 , AFM을 이용해 시편에 형성된 패턴의 형태를 관찰하고 SEM과 EDS를 이용해 시편의 조직을 관찰하였다. 그 결과 Si wafer를 $O_{2}, He, SAMs$를 혼합처리 했을 때 밀착성이 가장 우수하였다.

• 한국재료학회지
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• 제29권11호
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• pp.657-663
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• 2019

In this work, we study physical and mechanical properties of oxide films formed on AZ91D magnesium alloy by plasma anodization at different temperatures. It is found that the higher the electrolyte temperature, the lower is the breakdown voltage of oxide layer. This is probably because films formed at higher temperatures are thinner and denser. Moreover, electrolyte temperature plays an important role in the physical properties of the films. As the electrolyte temperature increases from 20 to $50^{\circ}C$, the hardness of the oxide layer increases. Friction test against steel balls indicates that wear scars become narrower for films formed at higher temperatures because the films are harder, as indicated by the Vickers hardness. The thinner and denser nature of the oxide film formed at $50^{\circ}C$ is also advantageous for heat transfer when film is used as a heat sink. Laser flash test results show very fast heat transfer for AZ91D with plasma anodized oxide layer formed at higher temperatures.

• 폴리머
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• 제31권1호
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• pp.31-36
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• 2007

플라스마 표면처리는 전체적인 물성은 유지하고 표면의 특성만을 변화시킨다고 전해지고 있다. 이번 연구에서는 플라스마 처리에 의해 높은 발수성을 나타내는 나일론 6 섬유로의 개질을 시도하였다. 발수성을 나타내는 나일론 섬유는 가스 종류, 처리시간, 인가 파워를 변수로 하여 RF 진공 플라스마 시스템에서 처리되었다. 플라스마 처리된 섬유의 표면을 scanning electron microscopy(SEM)과 atomic force microscopy(AFM)으로 모폴로지 변화를 살펴보았으며, 기계적 특성과 고분자 고유의 특성을 인장강도와 Differential scanning calorimetry(DSC), thermo-gravimetric analysis (TGA)로 각각 분석하였다. 또한 나일론 섬유의 발수성 평가는 물방울 흡수시간으로 테스트를 실시하였다. 이러한 결과들은 플라스마 표면처리로 인해서 나일론 섬유의 발수성이 향상됨을 나타내었다.

• Journal of Welding and Joining
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• 제33권1호
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• pp.61-71
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• 2015

The effect of welding condition on microstructure and mechanical property of Plasma-MIG Hybrid Weld between Al 5083 plates(thickness : 10mm) was investigated. 1 pass weld without any defects such as puckering, undercut, and lack of fusion was obtained by 150~200A of plasma current and 5~7mm of welding speed. Gas porosities and shrinkage porosities were existed in the weld near fusion line. As welding speed and plasma current were decreasing, the area fraction of porosity was increasing. The hardness of the weld is increasing as welding speed. On the basis of microstructural analysis, Mg segregated region near dendrite boundaries tends to increase with the welding speed. In the result of hardness test, Distribution of hardness in fusion zone showed little change with the plasma current. However, when the welding speed increased, hardness in weld metal markdly increased. It could be considered that effect of heat input to growth of the dendritic solidification structures. Based on tensile test, tensile properties of weld metal was predominated by area fraction of porosities. Consequently, tensile properties can be controlled by formation site and area fraction of porosity.

• 한국재료학회지
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• 제2권2호
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• pp.85-94
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• 1992

Plasma 용사된 단열피복에 내재하는 기공의 크기, 형상 및 분포는 피복층 자체의 물성에 지대한 영향을 미치므로 이를 용사변수에 따라 조사하였다. MgO 안정화 지르코니아 피복시 도입되는 기공은 미세기공 외에 각각 생성기구가 다른 조대한 기공 즉 구형과 불규칙한 기공, 그리고 crack으로 구성되었다. 용사거리에 따라 기공의 생성과정과 특성이 변하였으며 Plasma 전류 및 가스 유량의 증가에 의해서 기공도는 감소하는 경향을 보였다. Plasma 가스가 $N_2$인 경우가 Ar보다 더 높은기공도를 보였고 전체적으로 단열피복의 기공도는 10~18%였다. Scratch test로 측정된 단열피복층의 상대적인 경도는 기공도와 높은 상관관계를 보였다.

• Composites Research
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• 제25권3호
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• pp.76-81
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• 2012

대기압 플라즈마 처리를 통해 탄소나노튜브(CNT) 표면은 개질 되며 개질된 입자의 표면과 탄소섬유 강화 CNT 페놀 복합재료간에 계면접착력에 변화를 확인하였다. CNT 표면에 플라즈마 처리에 따라 표면 변화가 발생되고 표면 개질의 결과를 확인하기 위해 FT-IR을 사용하였다. 또한, 정적 접촉각 실험법을 통해 플라즈마 처리에 따른 CNT의 젖음성을 비교 평가하였다. 순수 CNT 입자의 접촉각은 $118^{\circ}$ 였으나, 플라즈마 처리를 할 경우 $60^{\circ}$도로 표면 개질을 통해 젖음성이 향상됨을 확인하였다. 탄소섬유와 CNT-페놀복합재료 간 계면접착력은 플라즈마 처리에 따라 겉보기 강성도가 증가되는 결과를 확인하였으며, 음향방출 실험법과 전기저항 측정법을 병행한 이중기지평가법을 통해 계면전단강도 (IFSS)를 계산하여 계면접착력 향상을 확인하였다.

• Journal of Microbiology
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• 제44권1호
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• pp.72-76
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• 2006

Plasma-derived products are produced from plasma via fractionation and chromatography techniques, but can also be produced by other methods. In the performance of nucleic acid amplification tests (NAT) with plasma-derived products, it is necessary to include an internal control for the monitoring of all procedures. In order to avoid false negative results, we confirmed the usefulness of the bovine viral diarrhoea virus (BVDV) for use as an internal control in the detection of hepatitis C virus (HCV) RNA in plasma-derived products. These products, which were spiked with BVDV, were extracted and then NAT was performed. Specificity and sensitivity were determined via the adjustment of primer concentrations and annealing temperatures. BVDV detection allows for validation in the extraction, reverse transcription, and amplification techniques used for HCV detection in plasma-derived products.