• Title/Summary/Keyword: Plasma test

Search Result 1,363, Processing Time 0.032 seconds

The Status of the High Enthalpy Plasma Test Facility in Chonbuk National University (전북대 고온플라즈마 설비 구축현황)

  • Choi, Seong-Man;Shin, Eui-Sup;Suh, Young-Sug;Seo, Jun-Ho;Hong, Bong-Geun
    • Proceedings of the Korean Society of Propulsion Engineers Conference
    • /
    • 2010.05a
    • /
    • pp.417-420
    • /
    • 2010
  • The high enthalpy plasma research center in Chonbuk national university is under construction with the support of the ministry of the education, science and technology as a fundamental research project The project periods are five year and started at July, 1, 2009. The total project budget is about 39,300 million Won. Four types of plasma equipment will be installed in this research center during the project periods. The equipments are 1 set of 0.4 MW class enhanced Huels type plasma equipment, 1 set of 2.4MW class enhanced Huels type plasma equipment, 1 set of 60Kw RF plasma equipment and 1s set of 200 kW RF plasma equipment.

  • PDF

Growth and characterization of BON thin films prepared by low frequency RF plasma enhanced MOCVD method

  • Chen, G.C.;Lim, D.-C.;Lee, S.-B.;Hong, B.Y.;Kim, Y.J.;Boo, J.-H.
    • Journal of the Korean institute of surface engineering
    • /
    • v.34 no.5
    • /
    • pp.510-515
    • /
    • 2001
  • It was first time that low frequency R.F. derived plasma enhanced MOCVD with frimethylborate precursor was used to fabricate a new ternary compound $BO_{x}$ $N_{y}$ . The formation of BON molecule was resulted from nitrogen nitrifying B-O, and forming the angular molecule structure proved by XPS and FT-IR results. The relationship between hardness and film thickness was studied. An thickness-independent hardness was fond about 10 GPa. The empirical calculation of band-gap and UV test result showed that our deposited $BO_{x}$ $N_{y}$ thin film was semiconductor material with 3.4eV of wide band gap. The electrical conductivity, $4.8$\times$10^{-2}$ /($\Omega$.cm)$^{-1}$ also confirmed that $BO_{x}$ $N_{y}$ has a semiconductor property. The roughness detected from the as-grown films showed that there was no serious bombarding effect due to anion in the plasma occurring in the RF frequency derived plasma.

  • PDF

Wear Behavior of Plasma Transferred Arc Deposited Layers for Ni - and Co - base Alloy (Ni계 및 Co계 합금 PTA 오버레이용접층의 마모거동에 관한 연구)

  • 윤병현;이창희;김형준
    • Journal of Welding and Joining
    • /
    • v.19 no.5
    • /
    • pp.540-547
    • /
    • 2001
  • This study has evaluated the wear behavior of PTA (Plasma Transferred Arc) Inconel 625 and Stellite 6 overlays on Nimonic 80A substrate. Nimonic 80A alloy was also included for comparison. In order to evaluate the wear performance, three-body abrasive wear test and pin-on-disk dry sliding wear test were performed. Microstructural development during the solidification of deposits is also discussed. Wear test results show that the wear rate of Stellite 6 deposit is lower than that of Inconel 625 deposit and Nimonic 80A. The sliding wear resistance of overlay deposits follows a similar trend to the abrasive wear resistance, but for Nimonic 80A. The main wear mechanisms were abrasive wear for Inconel 625 deposit, adhesive wear and delamination for Stellite 6 deposit in pin-on-disk dry sliding wear test and ploughing in three-body abrasive wear test. Cross sectional examinations of the worn surface of pin specimens after pin-on-disk dry sliding wear test implies that the plastic deformation near worn surface has occurred during the wear testing.

  • PDF

Plasma etching behavior of RE-Si-Al-O glass (RE: Y, La, Gd)

  • Lee, Jeong-Gi;Hwang, Seong-Jin;Lee, Seong-Min;Kim, Hyeong-Sun
    • Proceedings of the Materials Research Society of Korea Conference
    • /
    • 2010.05a
    • /
    • pp.49.1-49.1
    • /
    • 2010
  • The particle generation during the plasma enhanced process is highly considered as serious problem in the semiconductor manufacturing industry. The material for the plasma processing chamber requires the plasma etching characteristics which are homogeneously etched surface and low plasma etching depth for preventing particulate contamination and high durability. We found that the materials without grain boundaries can prevent the particle generation. Therefore, the amorphous material with the low plasma etching rate may be the best candidate for the plasma processing chamber instead of the polycrystalline materials such as yttria and alumina. Three glasses based on $SiO_2$ and $Al_2O_3$ were prepared with various rare-earth elements (Gd, Y and La) which are same content in the glass. The glasses were plasma etched in the same condition and their plasma etching rate was compared including reference materials such as Si-wafer, quartz, yttria and alumina. The mechanical and thermal properties of the glasses were highly related with cationic field strength (CFS) of the rare-earth elements. We assumed that the plasma etching resistance may highly contributed by the thermal properties of the fluorine byproducts generated during the plasma exposure and it is expected that the Gd containing glass may have the highest plasma etching resistance due to the highest sublimation temperature of $GdF_3$ among three rare-earth elements (Gd, Y and La). However, it is found that the plasma etching results is highly related with the mechanical property of the glasses which indicates the cationic field strength. From the result, we conclude that the glass structure should be analyzed and the plasma etching test should be conducted with different condition in the future to understand the plasma etching behavior of the glasses perfectly.

  • PDF

ARC availability experiment by comparing plasma renin activity (PRA) and active renin concentration (ARC) (Plasma renin activity(PRA) and Active renin concentration(ARC)비교를 통한 ARC 유용성 실험)

  • Park, Jun Mo;Kim, Han Chul;Choi, Seung Won
    • The Korean Journal of Nuclear Medicine Technology
    • /
    • v.22 no.1
    • /
    • pp.84-89
    • /
    • 2018
  • Purpose Renin is a proteolytic enzyme synthesized and secreted from epidermal(juxtaglomerular) cells in kidney. Renin acts on the renin substrate angiotensinogen to produce angiotensin I, and then angiotensin II is produced by the action of angiotensin converting enzyme. This causes the adrenal glands to boost blood pressure (vasoconstriction) and promote aldosterone secretion. While Plasma renin activity (PRA) is to test angiotensin I, the active renin concentration (ARC) is a renin test directly. They have different test methods and their own substrates. However, these two methods are sometimes interpreted as the same as a result. The purpose of this study was to evaluate the usefulness of the ARC test by comparing the results between PRA and ARC. Materials and Methods For the diversity of the experiment, 26 samples were requested to test with PRA(TFB company) and ARC(Cisbio company) to other institution. We compared and analyzed PRA(Immunotech company) and ARC(Cisbio company) tests using 28 samples from September $15^{th}$ to October $13^{th}$ in 2017. The statistical analysis method for PRA/ARC evaluated the usefulness using Microsoft Excel program by verifying a correlation analysis of Aldosterone/PRA ratio and a correlation analysis of Aldosterone/ARC ratio and conducting T-test. Results The regression equation of the PRA(Immunotech company)/ARC(Cisbio company), which was tested in the department, was y = 0.0619x + 0.4615 and the correlation coefficient was 0.73. The regression equation of the PRA(TFB company)/ARC(Cisbio company), which was tested in the other institution, was y = 0.0888x + 0.3316 and the correlation coefficient was 0.91. In addition, The regression equation of Aldosterone / PRA ratio and Aldosterone / ARC ratio was y = 0.875x - 11.688 and the correlation coefficient was 0.87. Plus T - test showed no significant difference (P>0.05). Conclusion Both tests showed a strong positive correlation, but this only represents the strength and direction of the relationship between the two tests. Furthermore, the actual results showed somewhat differences. It is presumed that the measured value was influenced by the endogenous renin group mass in the plasma, the condition of the enzyme reaction and the kind of the inhibitor. When the active renin concentration (ARC) test is performed, it is useful to distinguish between the two tests as they are complementary.

Launch Environment Test for Scale magNetospheric and Ionospheric Plasma Experiment (SNIPE) Engineering Qualification Model (초소형위성 SNIPE(Scale Magnetospheric and Ionospheric Plasma Experiment) 시제인증모델의 발사환경시험 및 분석)

  • Kim, Min-Ki;Kim, Hae-Dong;Choi, Won-Sub;Kim, Jin-Hyung;Kim, KiDuck;Kim, Ji-Seok;Cho, Dong-Hyun
    • Journal of Space Technology and Applications
    • /
    • v.1 no.3
    • /
    • pp.319-336
    • /
    • 2021
  • This paper discusses the results of launch environment tests for the engineering qualification model (EQM) of nanosatellite Scale magNetospheric and Ionospheric Plasma Experiment (SNIPE) for scientific missions and lessons learned for the design of nanosatellites. SNIPE is a group of four formation-flying 6U nanosatellites with a range of payloads for missions including space weather measurement. We developed the EQM to verify the preliminary design prior to fabricating the flight model. Launch environment test of EQM was conducted for the first time in 2019, and all failures were corrected and verified at the second test conducted in 2021. A notable point of the two tests is that the nanosatellite deployer used in the first test is different from that of the second test. The second deployer has the capability to fix the internal satellite whereas the first deployer just contains and deploys the satellite. Thus actual mechanical loads the satellite receives is reduced for the second test compared to the first test. This work compares the mechanical responses of two tests and proposes general guidelines for structural design of nanosatellites.

Development and characteristic study of high brightness ion source using inductively coupled plasma for focused ion beam (유도결합 플라즈마를 이용한 집속이온빔용 고휘도 이온원의 개발 및 특성연구)

  • Kim, Yoon-Jae;Park, Dong-Hee;Hwang, Yong-Seok
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
    • /
    • 2004.04a
    • /
    • pp.494-499
    • /
    • 2004
  • A ion source using inductively coupled plasma has been tested in order to test its feasibility as a high brightness ion source for focused ion beam. When operating the ion source with filter magentas in front of plasma electrode for a negative ion source, lower remittances are expected. Extracted beam remittances are measured with an Allison-type scanning device for various plasma parameters and extraction conditions. The normalized omittance has been measured to be around 0.2$\pi$mmmrad with beam currents of up to 0.55 ㎃. In particular, noting that multicusp magnets have a role in decreasing the remittance as well as increasing plasma discharge efficiency, transverse magnetic field has been confirmed to be a useful tool fur decreasing remittance via electron energy control.

  • PDF

An experimental study on the resistivity of injector plasma (인젝터 플라즈마 저항의 실험적 연구)

  • 한충규
    • Journal of the Korea Institute of Military Science and Technology
    • /
    • v.5 no.4
    • /
    • pp.19-26
    • /
    • 2002
  • A chamber enduring 3,000 bars and an electrical high voltage power system have been designed and installed for studying the characteristics of the plasma produced in electro-thermal chemical propulsion system. In order to test the structural characteristics, polyethylene injectors were used which have 4 or 6 mm inner diameter and several lengths from 15 to 70 mm. The capacitors were charged at the voltages of 5.2, 7.3 and 10.4 kV which correspond to 5.58, 11 and 22.3 kJ in charging energy. The observed resistivities of the plasma injector are close to those predicted by a theoretical model that describes the plasma resistivity according to high current density.

Microplasma-Jet Device for Bio-medical Application (바이오-메디컬 응용을 위한 마이크로 플라즈마 분사 소자)

  • Kim, Kang-Il;Hong, Yong-Cheol;Kim, Guen-Young;Yang, Sang-Sik
    • The Transactions of The Korean Institute of Electrical Engineers
    • /
    • v.58 no.12
    • /
    • pp.2474-2479
    • /
    • 2009
  • This paper presents an atmospheric microplasma-jet device for bio~medical application. The microplasma-jet device consists of four components; a thin Ni anode, porous alumina insulator, a stainless steel cathode and an aluminum case. The anode has 8 holes, and hole diameter and depth are $200 {\mu}m$ and $60 {\mu}m$, respectively. The discharge test was performed in atmospheric pressure using nitrogen gas and AC voltage at the optimum gas flow rate of 4 Vmin. The plasma-jet is ejected stably for the input voltage ranging from 5.5 to $9.5 kV_{p-p}$. The plasma becomes dense as the input voltage increases, which was verified by the hydrophilicity change of PMMA surface treated by the plasma. The temperature increasement of the aluminum film exposed to plasma-jet illustrates that the micro plasma-jet device is feasible for bio-medical application.

Analysis of the Effects of SD Plasma on Aerodynamic Drag Reduction of a High-speed Train

  • Lee, Hyung-Woo;Kwon, Hyeok-Bin
    • Journal of Electrical Engineering and Technology
    • /
    • v.9 no.5
    • /
    • pp.1712-1718
    • /
    • 2014
  • Experimental analysis according to the plasma actuator design variables was performed in order to verify the effects of sliding discharge plasma on aerodynamic drag reduction of a high-speed train. For the study, sliding discharge plasma actuator and high-frequency, high-voltage power supply were developed and experimented to figure out the best design variables for highest ionic wind velocity which could reduce the drag force. And then, 5% reduced-scale model of a high-speed train was built for wind tunnel test to verify it. From the results, it was confirmed that sliding discharge plasma had contribution to reduce the drag force and it had the potential to be applied to real-scale trains.