• 한국응용과학기술학회지
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• 제21권2호
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• pp.148-155
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• 2004

Response surface analysis was used to study dietary ratios of n-3/n-6 fatty acid and P/S to minimize plasma triglycerides, total cholesterol and LDL ${\cdot}$ VLDL-C levels and maximize plasma HDL ${\cdot}$ C levels of rats. Because the dietary components were not statistically independent, they were studied in combinations of two variables. The two-variable combinations were the most useful in locating the desired maximum or minimum plasma triglycerides, total cholesterol and LDL ${\cdot}$ VLDL-C response in terms of the proportions of the dietary components. Response surface contours and three dimensional plots were developed for each plasma lipid response. The contours and three dimensional plots were used to help determine those combinations of the dietary fatty acid ratios that would produce the desired minimum or maximum lpid responses. The statistical analyses indicated that the minimized plasma cholesterol response levels could be attained with a diet consisting of 2.26 n-3/n-6 fatty acid and 2.15 P/S ratios.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.306-306
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• 2010

A high density (> $10^{11}\;cm^{-3}$) and low electron temperature (< 2 eV) plasma is produced by using a conventional HF (13.56 MHz) plasma enhanced chemical vapor deposition (PECVD) with an additional ultra high frequency (UHF, 314 MHz) plasma source utilizing two parallel antenna assembly. It is applied for the high rate synthesis of high quality nanocrystalline silicon (nc-Si) films. A high deposition rate of 1.8 nm/s is achieved with a high crystallinity (< 70%), a low spin density (< $3{\times}10^{16}\;cm^{-3}$) and a high light soaking stability (< 1.5). Optical emission spectroscopy measurements reveal emission intensity of $Si^*$ and $SiH^*$, intensity ratio of $H{\alpha}/Si^*$ and $H{\alpha}/SiH^*$ which are closely related to film deposition rate and film crystallinity, respectively. A high flux of precursor and atomic hydrogen which are produced by an additional high excitation frequency is effective for the fast deposition of highly crystallized nc-Si films without additional defects.

• 한국자동차공학회논문집
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• 제10권2호
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• pp.48-54
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• 2002

Since photocatalysts are activated by lights of UV wavelengths, plasma is alternatively used as a light source for a photocatalytic reactor. Light intensity generated by plasma is proportional to the surface area of catalytic material, and this, in many practical applications, is prescribed by the geometry of a plasma generator. Thus, it is crucial to increase the surface area far sufficient light intensity for photocatalytic reaction. For example, in a pack-bed type reactor, multitudes of beads are used as a substrate in order to increase the surface area. Honeycomb monolith type substrate, which has very good surface area to volume ratio, has been difficult to apply plasma as a light source due to the fact that light penetration depth through the honeycomb monolith was too short to cover sufficient area, thus resulting in poor intensity for photocatalytic reaction. In this study, nonthermal plasma generation through a photocatalytic reactor of honeycomb monolith substrate is investigated to lengthen this short penetration depth. The ceramic honeycomb monolith substrate used in this study has the same length as a three way catalyst used fur automotive applications, and it is shown that sufficient light intensity for photocatalytic reaction can also be obtained with honeycomb monolith type reactor.

• Macromolecular Research
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• 제15권3호
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• pp.238-243
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• 2007

Nanofibers were prepared by electrospinning a solution of poly(lactic-co-glycolic acid) (PLGA) and their mean diameter was 340 nm. The PLGA nanofibers were treated with a plasma in the presence of either oxygen or ammonia gas to change their surface characteristics. The hydrophilicity of the electrospun PLGA nanofibers was significantly increased by the gas plasma treatment, as confirmed by contact angle measurements. XPS analysis demonstrated that the chemical composition of the PLGA nanofiber surface was influenced by the plasma treatment, resulting in an increase in the number of polar groups, which contributed to the enhanced surface hydrophilicity. The degradation behavior of the PLGA nanofibers was accelerated by the plasma treatment, and the adhesion and proliferation of mouse fibroblasts on the plasma-treated nanofibers were significantly enhanced. This approach to controlling the surface characteristics of nanofibers prepared from biocompatible polymers could be useful in the development of novel polymeric scaffolds for tissue engineering.

• 접착 및 계면
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• 제6권2호
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• pp.6-12
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• 2005

플라즈마는 고체, 액체, 기체와 더불어 제 4의 물질상태로 불리어지고 있는데, 기체의 일부가 전리된 가스상태이며 외부기장에 영향을 받고 전기를 통과시키면 발광하는 에너지가 높은 기체의 영역으로 정의된다. 인위적으로 에너지를 가하여 플라즈마를 발생시켜 많은 부분에서 새로운 첨단 연구가 활발하게 이루어지고 있으며, 많은 부분들이 우리의 생활에 들어와 있다. 플라즈마를 이용하여 고분자물의 표면을 처리하게 되면 몇 가지 장점이 있다. 먼저 플라즈마는 표면의 물성만을 변화시켜 고분자 본 물성을 유지시켜주고, 유기용제를 사용하지 않으며, 공정 운행 중 발생하는 폐기물이 없어 환경친화적이며, 상압 플라즈마의 경우 자동화 연속공정이 가능하다. 본 실험에서는 신발소재 고분자 재료의 상호 접착능력을 향상시키기 위하여 플라즈마를 사용하여 표면 개질을 시도하였고, 처리 시간과 사용한 가스의 유량에 따른 박리강도 시험을 통하여 접착력 향상을 확인하였고, 접촉각 측정과 SEM 측정을 통하여 고분자 표면 변화를 확인하였다.

• 접착 및 계면
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• 제9권1호
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• pp.9-15
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• 2008

산소 플라즈마를 이용하여 처리시간을 다르게 하면서 EVA foam 표면의 개질을 시도하였다. EVA foam 표면 특성에 대한 플라즈마 처리 효과는 FT-IR ATR, XPS, 접촉각 측정기, SEM을 통해 연구하였으며 EVA foam의 접착특성은 박리접착강도를 측정하여 확인하였다. 플라즈마를 이용한 표면처리 결과, 유기화합물의 제거, 산소함유량의 증가, 표면의 물리적 변화 효과를 얻을 수 있었으며 EVA foam의 접착특성이 향상되었다. 플라즈마 처리 시간이 길어질수록 친수성과 EVA foam 표면의 물리적 변화가 증가하였고 각각 180초와 420초 처리에서 최대치를 나타내었다. 접착력은 420초 처리에서 최고를 나타내었으며 결과적으로 EVA foam표면의 물리적 변화가 접착력에 가장 큰 영향을 미치는 것으로 나타났다.

• 반도체디스플레이기술학회지
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• 제18권4호
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• pp.1-5
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• 2019

This study has been focused on properties of surface technology for large diameter upper electrode using in high density plasma process as like semi-conductor manufacturing process. The experimental studies have been carried out to get mirror surface for upper electrode. For a formation of high surface quality upper electrode, single crystal silicon upper electrode has been mechanical and chemical machining worked. Mechanical machining work of the upper electrode is carried out with varying mesh type using diamond wheel. In case of chemical machining work, upper electrode surface roughness was observed to be strongly dependent upon the etchant. The different surface roughness characteristics were observed according to etchant. The machining result of the surface roughness and surface morphology have been analyzed by use of surface roughness tester, laser microscope and ICP-MS.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.74-74
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• 2010

The aqua-plasma is the non-thermal plasma in electrical conductive electrolyte by generates the vapor film layer on the immersed metal electrode surface. This plasma can generate the hydroxyl radical by dissociate the water molecule with the plasma electron. To develop the plasma discharge device for high efficiency in the hydroxyl radical generation, proper model for estimation of plasma power is necessary. In this work, the 1-D spherical model was developed, considering temperature dependence material constants. The relation between the plasma power and hydroxyl generation was also studied by the comparison between the optical emission intensity from the hydroxyl radical using monochromator and estimated plasma power. First, the thickness of vapor layer thickness was estimated using the Navier-Stokes fluid equation in order to calculate the discharge E-field inside vapor layer. Using the E-field magnitude and power balance on the plasma generation, it was possible to estimate the plasma power. The plasma power was assumed to uniformly fill the vapor layer and the temperature of vapor layer was fixed in the boiling temperature of electrolyte, 375K. In the experiment, the aqua-plasma was discharged in the saline by applied the voltage on the bipolar electrode. The range of applied voltage was 234 to 280V-rms in the frequency of 380 kHz. Two type electrodes were produced with two ${\Phi}0.2$ tungsten. The plasma power was estimated from the V-I signal from the two high voltage probes and current probe. The estimated plasma power agreed with the profile of emission intensity when the plasma discharged between the metal electrode and vapor layer surface. However, when the plasma discharged between the metal electrodes, the increasing rate of emission intensity was lower than the increase of plasma power. It implies that the surface reaction is more sufficient rather than the volume reaction in the radical generation, due to the high density of water molecule in the liquid.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.231.1-231.1
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• 2015

Surface energy, being an important material parameter to control its interactions with the other surfaces plays a key role in bio-related application. Carbon films are found very promising due to their characteristics such as wear and corrosion resistant, high hardness, inert, low resistivity and biocompatibility. The present work deals with the deposition of carbon films using unbalanced facing target magnetron sputtering technique. The discharge characteristics were studied using optical emission spectroscopy and correlated with the film properties. Surface energy was investigated through contact angle measurement. The ID/IG ratio as calculated from Raman spectroscopy data increases with the increase in power density due to the higher number of sp2 clusters embedded in the amorphous matrix. The deposited films were smooth and homogeneous as observed by Atomic force microscopy having RMS roughness in the range of 1.74 to 2.25 nm. It is observed that electrical resistivity and surface energy varies in direct proportionality with operating pressure and has inverse relation with power density. The surface energy results clearly exhibited that these films can have promising applications in cell cultivation.

• 한국방사성폐기물학회:학술대회논문집
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• 한국방사성폐기물학회 2004년도 학술논문집
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• pp.32-42
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• 2004

Recently, plasma surface-cleaning or surface-etching techniques have been focused in respect of the decontamination of spent or used nuclear parts and equipment. In this study the removal rate of metallic cobalt surface is experimentally investigated via its surface etching rate with a $CF_4-o_2$mixed gas plasma. Experimental results reveal that a mixed etchant gas with about 80% $CF_4$-20% $O_2$ (molar) gives the highest reaction rate and the rate reaches 0.06 ${\mu}m$/min at $380^{\circ}C$ and ion-assisted etching dramatically enhances the surface reaction rate. With a negative 300 V DC bias voltage applied to the substrate, the surface reaction initiation temperature lowers and the rate increases about 20 times at $350^{\circ}C$ and up to 0.43 ${\mu}m$/min at $380^{\circ}C$, respectively. Surface morphology analysis confirms the etching rate measurements. Auger spectrum analysis clearly shows the adsorption of fluorine atoms on the reacted surface. From the current experimental findings and the results discussed in previous studies, mechanistic understanding of the surface reaction, fluorination and/or fluoro-carbonylation reaction, is provided.