• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.492-492
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• 2012

RF biased inductively coupled plasma (ICP) has been widely used in various semiconductor etching processes and laboratory plasma researches. However, almost researches for the RF bias have been focused on the controls of dc self-bias voltages, even though the RF bias can change plasma parameters, such as electron temperature, plasma density, electron energy distribution (EED), and their spatial distributions. In this study, we report on the effect of the RF bias on the plasma parameters and the EEDs with various external parameters, such the RF bias power, the ICP power, the gas pressure, the gas mixture, and the frequency of RF bias. Our study shows the correlation between the RF bias and the plasma parameters and gives a crucial key for the understanding of collisionless electron heating mechanism in the RF biased ICP.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.132-132
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• 2015

Virtual metrology (VM) model based on plasma information (PI) parameter for C4F8 plasma-assisted oxide etching processes is developed to predict and monitor the process results such as an etching rate with improved performance. To apply fault detection and classification (FDC) or advanced process control (APC) models on to the real mass production lines efficiently, high performance VM model is certainly required and principal component regression (PCR) is preferred technique for VM modeling despite this method requires many number of data set to obtain statistically guaranteed accuracy. In this study, as an effective method to include the 'good information' representing parameter into the VM model, PI parameters are introduced and applied for the etch rate prediction. By the adoption of PI parameters of b-, q-factors and surface passivation parameters as PCs into the PCR based VM model, information about the reactions in the plasma volume, surface, and sheath regions can be efficiently included into the VM model; thus, the performance of VM is secured even for insufficient data set provided cases. For mass production data of 350 wafers, developed PI based VM (PI-VM) model was satisfied required prediction accuracy of industry in C4F8 plasma-assisted oxide etching process.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.147-147
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• 2012

Cutoff probe has been used for measuring a plasma density using the cutoff peak which is located at the plasma frequency in the low pressure plasma. However, research on analysis of low frequency region of transmission microwave frequency (TMF) spectrum does not performed even though important plasma parameters are located in the low frequency region, i.e., ion plasma frequency and collision frequency. In this research, we analyzed the low frequency region of the TMF spectrum. Experimental results reveal the effect of plasma parameters on the low frequency region on the TMF spectrum. Based on the response of TMF spectrum from changing of plasma parameters, deduction of the plasma parameters was tried. This comprehensive analysis of TMF spectrum expands applicable area of cutoff probe.

• 대한가정학회지
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• 제33권6호
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• pp.89-97
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• 1995

This study was undertaken to examine the correlations between dietary intakes or anthropometric parameters and the plasma lipid level. measurements of dali nutrients intake, body weight, height, body bass index, skinfold thickness, blood pressure, plasma total lipid, triglyceride and cholesterol were made to each of 124 healthy adult(25-59yrs) : 56 males and 65 females. The mean energy and nutrients intake, anthropometric parameters and plasma lipid levels were all in normal range. In females, the fat and protein intake, the amount and percents to total energy intake, had positive association with the plasma total lipid, but the energy percent from carbohydrate intake was correlated negatively. And body mass index positively correlated with plasma total lipid level, in male and female, Therefore we could postulated the dietary fat intake and body mass index affected to plasma lipid levels in normal conditions of healthy adult.

• 한국진공학회지
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• 제21권3호
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• pp.121-129
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• 2012

진공을 기초로 한 극판 전력이 인가된 유도 결합 플라즈마 소스에 관한 대부분의 연구는 자기 바이어스 효과에만 한정되어 있으며, 다양한 반도체 및 디스플레이 식각 공정에서 공정 결과와 소자 품질에 결정적인 역할을 하는 플라즈마 변수들(전자 온도, 플라즈마 밀도)과 극판 전력의 상관관계에 대한 연구는 거의 없는 실정이다. 본 연구에서는 극판 전력이 플라즈마 변수에 미치는 영향에 관한 내용을 다루고 있으며, 최근의 연구 결과에 대한 리뷰를 포함하고 있다. 플라즈마 밀도는 극판 전력 인가에 의하여 감소 또는 증가하였으며, Fluid global model에 의한 결과와 잘 일치하는 경향을 보였다. 전자 온도는 RF 바이어스에 의하여 증가하였으며, 전자 에너지 분포 측정을 통하여 전자 가열 메커니즘을 관찰하였다. 또한, 플라즈마 밀도의 공간 분포는 극판 전력에 의하여 더욱 균일해짐을 알 수 있었다. 이러한 극판 전력과 플라즈마 변수들의 상관관계와 전자 가열 메커니즘에 대한 연구는 방전 특성의 물리적 이해뿐만 아니라, 반도체 식각 공정에서 소자 품질 및 공정 개선을 위한 최적의 방전조건 도출과 외부 변수 제어에 큰 도움을 주리라 예상된다.

• 한국항공우주학회지
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• 제40권6호
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• pp.492-498
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• 2012

DBD(Dielectric Barrier Discharge) 플라즈마 액츄에이터의 설계 파라미터에 따른 특성을 연구하였다. 방전전압, 주파수, 전극의 간격, 폭, 길이, 유전체 두께에 따른 DBD 플라즈마 액츄에이터의 유속 및 소모전력을 측정하였다. 방전전압과 주파수가 클수록 유속과 소모전력은 증가하였다. 전극간격은 클수록 소모전력은 감소하면서 유속은 증가하였으나, 플라즈마 방전을 위해 높은 전압이 요구되었다. 상부전극폭은 좁을수록, 하부전극폭은 넓을수록 일정한 소모전력으로 유속을 증가시킬 수 있었다. 주어진 방전조건과 전극형상에서 DBD 플라즈마 액츄에이터의 성능을 예측할 수 있을 것으로 기대된다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.145-145
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• 2011

Recently, multi-hole electrode RF capacitively coupled plasma discharge is being used in the deposition of microcrystalline silicon for thin film solar cell to increase the speed of deposition. To make efficient multi-hole electrode RF capacitively coupled plasma discharge, the hole diameter is to be designed concerning the plasma parameters. In past studies, the relationship between plasma parameters such as pressures and gas species, and hole diameter for efficient plasma density enhancement is experimentally shown. In the presentation, the relationship between plasma deriving frequency and hole diameter for efficient multi-hole electrode RF capacitively coupled plasma discharge is shown. In usual capacitively coupled plasma discharge, plasma parameter, such as plasma density, plasma impedence and plasma temperature, change as frequency increases. Because of the change, the optimum hole diameter of the multi-hole electrode RF capacitively coupled plasma for high density plasma is thought to be modified when the plasma deriving frequency changes. To see the frequency effect on the multi-hole RF capacitively coupled plasma is discharged and one of its electrode is changed from a plane electrode to a variety of multi-hole electrodes with different hole diameters. The discharge is derived by RF power source with various frequency and the plasma parameter is measured with RF compensated single Langmuir probe. The shrinkage of the hole diameter for efficient discharge is observed as the plasma deriving frequency increases.

• Fisheries and Aquatic Sciences
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• 제22권5호
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• pp.9.1-9.7
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• 2019

The study investigated the changes in growth performance, hematological parameters, plasma components, and stress indicators of juvenile starry flounder, Platichthys stellatus, depending on varying exposure to hexavalent chromium. P. stellatus was exposed to waterborne chromium at 0, 50, 100, 200, and 400 ppb for 4 weeks. The result showed that Cr exposure resulted in decreased daily length gain (DLG), daily weight gain (DWG), condition factor (CF), and hepatosomatic index (HIS) in P. stellatus. In terms of hematological parameters, red blood cell (RBC) count, hematocrit (Ht), and hemoglobin (Hb) significantly decreased at 400 ppb after 2 weeks. In terms of plasma components, inorganic analysis was unchanged and cholesterol, an organic component, considerably increased at 400 ppb after 4 weeks. Plasma enzyme components including glutamic oxalate transaminase (GOT) and glutamic pyruvate transaminase (GPT) were significantly increased. Stress indicators such as cortisol and glucose were notably increased over 100 ppb after 4 weeks with increasing chromium concentration. The results indicate that exposure to waterborne Cr induced toxic effects on growth, hematological parameters, plasma components, and stress indicators.

• 한국어병학회지
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• 제28권2호
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• pp.87-92
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• 2015

Juvenile Paralichthys olivaceus (mean length $17.3{\pm}2.2cm$, mean weight $46.5{\pm}6.3g$) were exposed for 10 days to tributyltin (TBT) at various concentrations (0, 1, 2, 4 and $8{\mu}g/L$). Hematological parameters, such as red blood cell (RBC) count, hematocrit (Ht), and hemoglobin (Hb) concentration, were considerably decreased by high TBT concentrations. In plasma constituents, inorganic components such calcium and magnesium were also significantly altered. Plasma calcium was notably decreased, whereas plasma magnesium was increased. The enzyme components, glutamic oxalate transaminase (GOT) and glutamic pyruvate transaminase (GPT), were significantly decreased by TBT exposure. The present findings suggest that TBT exposure can cause significant alterations in hematological parameters and plasma constituents of flatfish Paralichthys olivaceus.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.242.1-242.1
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• 2014

The electron cyclotron resonance plasma source with a belt-type magnet assembly (BMA) is designed for effective plasma confinements. For characterizing the plasma source, the plasma parameters are measured by Langmuir probe. However, the plasma parameters and the motion of charged particles near the ECR zone are not easy to diagnostics, because of the high plasma density and temperature. Thus, as an alternative method, the electromagnetic simulation of the plasma source has been performed by using three-dimensional particle-in-cell and Monte Carlo collisional (PIC-MCC) simulation codes. For considering the limitation of simulation resources and time, the periodic boundary condition is applied and the coulomb collision is neglected. In this paper, we present the results of 3D PIC simulations of ECR plasmas with BMA and we compare them with the experimental results.