• Title/Summary/Keyword: Plasma modeling

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A NUMERICAL STUDY ON JET IMPINGEMENT OF PULSED PLASMA DISCHARGE ON A FLAT PLATE (벽면에 충돌하는 펄스 플라즈마 제트 유동특성에 대한 수치적 연구)

  • Kim, K.;Kwak, H.S.;Park, J.Y.
    • Journal of computational fluids engineering
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    • v.14 no.1
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    • pp.70-77
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    • 2009
  • In this study, time-dependent numerical analysis was carried out to investigate the plasma jet impingement on a flat plate, and a compressible form of two-dimensional inviscid gas dynamics equations were solved using the flux corrected transport algorithm. The mathematical modeling of Joule heating in the polycarbonate capillary bore and the mass ablation from the bore wall was incorporated in the numerical analysis and the series of computation was performed for three cases depending on the distance of the opposing plate from the capillary exit. The computational results reveal that the presence of the opposing plate does not affect the flow conditions inside the capillary when compared to the case of open-air plasma discharge. In the exterior region, the flow structure shows the typical supersonic underexpanded jet which consists of the strong Mach disk in front of the opposing plate and the barrel shock at the side of the jet. It is found that the shock evolution becomes more quasi-steady when the plate distance decreases. Also, the effects of the distance between the capillary bore exit and the opposing plate on the flow conditions along the opposing plate are investigated and the pressure variation on the plate shows more complicated interaction between the plasma discharge and the opposing plate when the location of plate becomes closer to the capillary exit.

The Transient Response of CF$_4$ RF Plasmas Using One-dimensional Fluid Model (1차원 유체모델을 이용한 CF$_4$ RF 플라즈마의 과도응답 특성)

  • 소순열;임장섭
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.53 no.1
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    • pp.24-29
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    • 2004
  • $CF_4$ gas is one of the most useful gases in modern technologies for semiconductor fabrication. However, there are many problems which should be solved in order to fabricate semiconductor device, for example, etching speed drop due to ion charge-up and etching selectivity drop due to the high electron energy. One of useful method in order to suppress their damages above is pulsed-time modulated plasma (PM). However, transient responses of charged particles occur when the source power is turned-on and -off in PM method. To control plasma properties in detail, such a transient phenomenon must be investigated. In this paper, we investigate $CF_4$ RF plasma properties under a one-dimensional fluid model. And also for dynamic and stable control of $CF_4$ plasmas, we investigated the transient behavior of the plasmas after step up or down of the amplitude of the power source voltage $V_s$(t). Fundamental properties of transient $CF_4$ plasmas was discussed. Furthermore, we intend to discuss new method for pulsed-time plasma modulation.

Theoretical Modeling of Pulsed Plasma Thruster Performance with Teflon Ablation

  • Cho, Mingyoung;Sung, Hong-Gye
    • International Journal of Aeronautical and Space Sciences
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    • v.18 no.1
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    • pp.138-143
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    • 2017
  • A performance analysis for a pulsed plasma thruster(PPT) has been conducted to predict the thrust and current change. Two models were implemented - a one-dimensional lumped circuit analysis model and the Teflon ablation model provided by Michael Keidar. The circuit model incorporating resistance and inductance models was adapted to predict the magnitude of the discharge current. Numerical simulations like current discharge rates with different voltages were reasonably well compared with experimental data. The effects of Teflon ablation on thruster characteristics were investigated.

Comparision Study Between Modeling and Experiment of the Breakdown Voltage for AC Plasma Display Panel (AC 플라즈마 디스플레이패널의 방전개시전압에 모델과 실험의 비교에 관한 연구)

  • 박장식
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.12
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    • pp.1039-1044
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    • 2000
  • Breakdown voltage model and expertiments are compared for discharge cells of AC plasma display panel. In the model, discharge paths are assumed to be initial electric field lines and the one-dimensional continuity equation is applied to the charged particle transport at each field line. The comparisons are performed in the wide range of gas pressure (50-600torr), Xe partial pressure over total pressure (1-6%), sustain electrode gap(100-1000$\mu\textrm{m}$), wall height(130, 300$\mu\textrm{m}$), and voltage pulse width(2-6${\mu}$s). The presented breakdown voltage model well agree with experiments in the above wide range. The increase of breakdown voltage with the decrease of the width(L) of protruding electrode is also described by the model.

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Numerical Modeling of Nano-powder Synthesis in a Radio-Frequency Inductively Coupled Plasma Torch

  • Hur, Min Young;Lee, Donggeun;Yang, Sangsun;Lee, Hae June
    • Applied Science and Convergence Technology
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    • v.27 no.1
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    • pp.14-18
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    • 2018
  • In order to understand the mechanism of the synthesis of particles using a plasma torch, it is necessary to understand the reaction mechanisms using a computer simulation. In this study, we have developed a simulation method to combine the Lagrangian scheme to follow microparticles and a nodal method to treat nanoparticles categorized with different particle sizes. The Lagrangian scheme includes the Coulomb force which affects the dynamics of larger particles. In contrast, the nodal method is adequate for the nanoparticles because the charge effect is negligible for nanoparticles but the number of nanoparticles is much larger than that of microparticles. This method is helpful to understand the dynamics and growth mechanism of micro- and nano-powder mixture observed in the experiment.

The Study of NOx Removal Experiment and Numerical Analysis Modeling using Chemical Addition with Non-thermal Plasma (저온 플라즈마와 첨가제를 이용한 NOx 제거실험 및 수치해석)

  • Chae, J.O.;Moon, S.I.;Kim, K.Y.;Kim, S.W.;Park, Y.K.;Lee, C.M.
    • Proceedings of the KSME Conference
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    • 2000.11b
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    • pp.720-725
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    • 2000
  • To remove harmful gases from combustion exhaust gases. fundamental study on NOx removal using pulse corona discharge has been performed through experiments and simulations. The energy consumption should be decreased in order to apply non-thermal plasma technology to industry process. This work summarized the effects of $H_2O$ and Hydrocarbon additive in NOx removal efficiency. The Radical program is used to simulate high voltage discharge and the process of NOx removal. At last, experimental results were compared with simulation results to verify the reliability of this program.

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Modeling of Dielectric Barrier Discharge Plasma Process for the Removal of Nitric Oxide (유전체 방전 플라즈마 공정에 의한 일산화질소 제거 공정 모델링)

  • Mok, Young-Sun
    • Journal of the Korean Society of Industry Convergence
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    • v.6 no.4
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    • pp.277-289
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    • 2003
  • This study proposes a mathematical model to characterize the removal of nitrogen oxides in a dielectric barrier discharge plasma process. As well as the reactions between nitrogen oxides, water vapor, oxygen and nitrogen, the model takes into account the effect of ethylene often used as a chemical additive to reduce the power consumption of the process on the removal of nitrogen oxides. Since the concentrations of the radicals concerned in the main reactions including O, OH, H and N should be calculated to predict the removal efficiency of nitrogen oxides, they were theoretically derived. The parameters affecting the removal of nitrogen oxides, such as initial concentration, discharge power, humidity, and ethylene concentration were experimentally evaluated, which were compared with the calculated results to verify the validity of the model proposed. The predicted concentrations of several byproducts formed in this process were also presented and discussed. The effects of several parameters mentioned above on the removal of nitrogen oxides were reasonable described by the proposed model.

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Auto/Cross-Correlated Time Series Modeling of Plasma Equipment Sensor Information (플라즈마 장비 센서정보의 Auto/Cross-Correlated 시계열 모델링)

  • Kim, Ki-Tae;Kim, Byung-Whan
    • Proceedings of the KIEE Conference
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    • 2006.04a
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    • pp.99-101
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    • 2006
  • Auto-Cross Correlated time series (ACTS) model was constructed by using the backpropagation neural network. The performance of ACTS model was evaluated with sensor information collected from a large volume, industrial plasma-enhanced chemical vapor deposition system. A total of 18 sensor information were collected. The effect of inclusion of past and future information were examined. For all but three sensor information with a large data variance demonstrated a prediction error less than 3%. By integrating ACTS model into equipment software, process quality can be more stringently monitored while improving device throughput.

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A Study on the Arc Characteristics and Weld Pool Analysis of GHTAW under the Space Environment (우주 환경에서 GHTAW 아크 특성과 용융지 해석에 관한 연구)

  • Lee, Sang-Hoon;Na, Suck-Joo
    • Journal of Welding and Joining
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    • v.28 no.4
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    • pp.67-72
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    • 2010
  • The purpose of this paper is to understand the behavior of GHTAW process under the space environment with the experimental and numerical analysis. Gas Hollow Tungsten Arc Welding (GHTAW) using a hollow tungsten electrode was adopted, since the ignition and discharge of a conventional GTAW process is not appropriate to the space environment due to low pressure in space. In order to clarify the phenomena of GHTAW under space environment, an investigation of thermal and physical properties of the GHTAW arc plasma was experimentally performed under low pressure conditions. Furthermore, the molten pool behavior and weldment of GHTAW were understood by CFD-based numerical analysis, based on the models of GHTA heat source, arc pressure and electromagnetic force induced by arc plasma, the characteristics of which were obtained by the captured images of a CCD camera.

Modeling and Analysis of Fine Particle Behavior in Ar Plasma (모델링을 통한 Ar 플라즈마 중의 미립자 운동에 관한 연구)

  • 임장섭;소순열
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.18 no.1
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    • pp.52-59
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    • 2004
  • Recently, many researches for fine particles plasma have been focused on the fabrication of the new devices and materials in micro-electronic industry, although reduction or elimination of fine particles was interested in plasma processing until now on. In order to enhance their utilization, it is necessary to control and analyze fine particle behavior. Therefore, we developed simulation model of fine particles in RF Ar plasmas. This model consists of the calculation parts of plasma structure using a two-dimensional fluid model and of fine particle behavior. The motion of fine particles was derived from the charge amount on the fine particles and forces applied to them. In this paper, Ar plasma properties using two-dimensional fluid model without fine particles were calculated at power source voltage 15[V] and pressure 0.5[Torr]. Time-averaged spatial distributions of Ar plasma were shown. The process on the formation of Coulomb crystal of fine particles was investigated and it was explained by combination of ion drag and electrostatic forces. And also analysis on the forces of fine particles was presented.