• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.93-93
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• 2016

Large scale integrated circuits (LSIs) has been improved by the shrinkage of the circuit dimensions. The smaller chip sizes and increase in circuit density require the miniaturization of the line-width and space between metal interconnections. Therefore, an extreme precise control of the critical dimension and pattern profile is necessary to fabricate next generation nano-electronics devices. The pattern profile control of plasma etching with an accuracy of sub-nanometer must be achieved. To realize the etching process which achieves the problem, understanding of the etching mechanism and precise control of the process based on the real-time monitoring of internal plasma parameters such as etching species density, surface temperature of substrate, etc. are very important. For instance, it is known that the etched profiles of organic low dielectric (low-k) films are sensitive to the substrate temperature and density ratio of H and N atoms in the H2/N2 plasma [1]. In this study, we introduced a feedback control of actual substrate temperature and radical density ratio monitored in real time. And then the dependence of etch rates and profiles of organic films have been evaluated based on the substrate temperatures. In this study, organic low-k films were etched by a dual frequency capacitively coupled plasma employing the mixture of H2/N2 gases. A 100-MHz power was supplied to an upper electrode for plasma generation. The Si substrate was electrostatically chucked to a lower electrode biased by supplying a 2-MHz power. To investigate the effects of H and N radical on the etching profile of organic low-k films, absolute H and N atom densities were measured by vacuum ultraviolet absorption spectroscopy [2]. Moreover, using the optical fiber-type low-coherence interferometer [3], substrate temperature has been measured in real time during etching process. From the measurement results, the temperature raised rapidly just after plasma ignition and was gradually saturated. The temporal change of substrate temperature is a crucial issue to control of surface reactions of reactive species. Therefore, by the intervals of on-off of the plasma discharge, the substrate temperature was maintained within ${\pm}1.5^{\circ}C$ from the set value. As a result, the temperatures were kept within $3^{\circ}C$ during the etching process. Then, we etched organic films with line-and-space pattern using this system. The cross-sections of the organic films etched for 50 s with the substrate temperatures at $20^{\circ}C$ and $100^{\circ}C$ were observed by SEM. From the results, they were different in the sidewall profile. It suggests that the reactions on the sidewalls changed according to the substrate temperature. The precise substrate temperature control method with real-time temperature monitoring and intermittent plasma generation was suggested to contribute on realization of fine pattern etching.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.25 no.4
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• pp.65-70
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• 2011

Perfluorocompounds (PFCs) gases were decomposed by gliding arc plasma generated by AC pulse power. $N_2$ gas of 10 LPM flow rate and $H_2$ gas of 0.5 LPM were introduced into the gliding arc plasma generated between a pair of electrodes with SUS 303 material, and the PFCs gases were injected in the plasma and thereby were decomposed. The PFCs gas-decomposition-characteristics through the gliding arc plasma were analyzed by FT-IR, where pure $N_2$ and $H_2$-added $N_2$ environment were used to generate the gliding arc plasma. The PFCs gas-decomposition-properties were changed by electric power for gliding arc plasma generation and the H2 gas addition was effective to enhance the PFCs decomposition rate.

• Transactions of the Korean hydrogen and new energy society
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• v.22 no.6
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• pp.934-941
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• 2011

Characteristics of low NOx burner is investigated. Low NOx burner introduced in this paper adopts two staged combustion with plasma burner for the 1st stage combustion. Extensive parametric tests were done to figure out the effect of burner stoichiometry, staged thermal load, electric power for plasma generation. Overall NOx production by burner shows effective reduction by adopting plasma staged burner. and the aspects depends on the fuel stoichiometry of 1st stage burner or operating condition of plasma burner. It is promising to use plasma burner as an alternative tools of low NOx burner technology.

• Journal of Electrical Engineering and Technology
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• v.13 no.1
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• pp.345-351
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• 2018

This paper analyzes a resonant inverter to generate plasma. The resonant inverter consists of a full bridge converter, resonant network and reactor to generate a magnetic field for plasma generation. A plasma load has very distinct characteristics compared to conventional loads. The characteristics of plasma load are analyzed through experimental results. This paper presents the study on the resonant network, which was performed in order to determine how to achieve a constant current gain. Another important contribution of this study is the analysis of drop-out phenomenon observed in plasma loads which is responsible for unpredictable shutdown of the plasma generator that requires stable operation. In addition, the design process for the resonant network of a plasma generator is proposed. The validity of this study is verified through simulations and experimental results.

• Journal of the Korean Society of Safety
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• v.14 no.3
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• pp.63-68
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• 1999

In this paper, characteristics of ozone generation by using coil and SPCP + DC corona reactor was studied. The ceramic-based surface discharge electrode, which was first invented as a high-efficiency ozonizer, has been used as an experimental plasma chemical reactor.(Surface Induced Plasma Chemical Processing, SPCP.) The electrode, however, has a structural disadvantage that a highly energetic plasma region is localized near the electrode surface, which may make it impossible for higher efficiency to realize. In an attempt to overcome this advantage, we have developed a hybrid reactor which employs a corona discharge unit together with the surface discharge unit. Experimental results suggest that the efficiency of the ozone production rate is improved when positive corona discharge is added.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.56 no.5
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• pp.921-925
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• 2007

Gas removal characteristics of an air clean system, consisted of a filter and a nonthermal discharge plasma reactor with a magnetic field, have been investigated with emphasis on the enhancing gas removal efficiency of the applied magnetic field. It is found that the magnetic field influenced significantly to the corona discharge characteristics, decreasing the corona onset voltage and increasing the corona current. As a result, the proposed air clean system with the magnetic field showed the higher removal efficiency of the gas (e.g., trimethlyamine) than that of without the magnetic field. This would be because the magnetic field applied to the discharge plasma reactor of the air clean system can elevate the corona characteristics, and activate the generation of ozone, thus the removal efficiency of the gas was concurrently enhanced. This reveals that the proposed air clean system with the magnetic field could be used as an effective means of removal an indoor pollutant gas.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.67 no.1
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• pp.82-86
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• 2018

Low voltage atmospheric plasma generation using DBD Initiation carrier injection is reported. DBD afterglow was used as initiation carriers prior to a primary discharge and a significant reduction in the breakdown voltage of atmospheric discharge was observed when sufficient initiation carriers were provided. Quantative correlation study between the breakdown voltage and the initiation carriers suggests that the atmospheric breakdown voltage reduces to only half of the breakdown voltage for Townsend regime. Also, use of DBD initiation carrier injection likely offers better device reliability by protecting electrodes with a dielectric layer and thus suppressing electrode wear.

• Proceedings of the KIEE Conference
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• 2004.07e
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• pp.88-91
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• 2004

In order to improve ozone generation, we experimentally investigated the silent discharge plasma and ozone generation characteristics of a multi-discharge type ozonizer. Ozone in a multi-discharge type ozonizer is generated by superposition of a silent discharge plasma, which is simultaneously generated in separated discharge spaces. A multi-discharge type ozonizer is composed of three different kinds of superposed silent discharge type ozonizers, depending on the method of applying power to each electrode. We observed that the discharge period of the current pulse for a multi-discharge type ozonizer can be longer than that of silent discharge type ozonizer with two electrodes and one gap.Hence, ozone generation is improved up to 17185 ppm and 783 g/kwh for the superposed silent discharge type ozonizer for which an AC high voltages with a 180 phase difference were applied to the internal electrode and the external electrode, respectively, with the central electrode being ground

• The Transactions of the Korean Institute of Electrical Engineers
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• v.45 no.1
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• pp.113-122
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• 1996

As integrity of semiconductor device is increased, accurate and efficient modeling and recipe generation of semiconductor fabrication procsses are necessary. Among the major semiconductor manufacturing processes, dry etc- hing process using gas plasma and accelerated ion is widely used. The process involves a variety of the chemical and physical effects of gas and accelerated ions. Despite the increased popularity, the complex internal characteristics made efficient modeling difficult. Because of difficulty to determine the control input for the desired output, the recipe generation depends largely on experiences of the experts with several trial and error presently. In this paper, the optimal control of the etching is carried out in the following two phases. First, the optimal neural network models for etching process are developed with genetic algorithm utilizing the input and output data obtained by experiments. In the second phase, search for optimal control inputs in performed by means of using the optimal neural network developed together with genetic algorithm. The results of study indicate that the predictive capabilities of the neural network models are superior to that of the statistical models which have been widely utilized in the semiconductor factory lines. Search for optimal control inputs using genetic algorithm is proved to be efficient by experiments. (author). refs., figs., tabs.

• Proceedings of the KIEE Conference
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• 2005.07c
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• pp.2109-2111
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• 2005

The effect of arc like streamer discharge is investigated on the hydrogen generation in the plasma reactor with multineedle - plate electrode geometry and SDR (Plasma reactor using the surface discharge). An additive of the two type (the saw type and the pellet type) was placed under the water surface to investigate the effect of the water surface conditions. The experimental results are compared in case of the reactor with and without an additive on the water surface. The generation of arc streamer discharge is more powerful with increasing applied voltage in the saw type. The maximum hydrogen Production concentration is about 4300 ppm at 74W in the SDR with additive of the saw type. Also, the Energy yield of the SDR (28990 g/kWh, 4300ppm, 74W) is higher than of the multineedle - plate electrode geometry (20892g/kWh, 3300ppm, 77W).