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S. S. Kim, D. K. Choi, "The development of RF generator for remote plasma cleaning source," The 30th International Conference on Plasma Science, 2003. ICOPS 2003.
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J. H. Lee, D. K. Choi, S. S. Kim, B. K. Lee, C. Y. Won "RF Power Conversional System for Environmentfriendly Ferrite Core Inductively Coupled Plasma Generator," Journal of the Korean Institute of Illuminating and Electrical Installation Engineers, vol. 20, no. 8, pp. 6-14, Sep. 2006.
DOI
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Ken Tran, Alan Millner, "A new power supply to ignite and sustain plasma in a reactive gas generator," 2008 Twenty-Third Annual IEEE Applied Power Electronics Conference and Exposition, pp. 1885-1892, 2008.
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S. Raoux, J. G. Langan, "Remote NF3 Chamber Clean Virtually Eliminates PFC Emission from CVD Chamber and Improves System Productivity," semiconductor fabtech-9th edition, pp. 107-113.
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Y. K. Lee, D. S. Lee, K. H. Bai, C. W. Chung, H.Y. Chang, "On inductively coupled plasma for nextgeneration processing," Surface and Coatings Technology, pp. 167-170, 2003.
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D. K. Choi, applied for a U.S. patent (Appl. No.10- 2002-63298).
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G. S. N. Raju, S. Doradla, "An LCL resonant converter with PWM control-analysis, simulation, and implementation," IEEE Transactions on Power Electronics, vol. 10, no. 2, pp. 164-174, 1995.
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M. Borage, S. Tiwari, S. Kotaiah, "Analysis and design of an LCL-T resonant converter as a constantcurrent power supply," IEEE Transactions on Industrial Electronics, vol. 52, no. 6, pp 1547-1554, 2005.
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