• Title/Summary/Keyword: Plasma flow control

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Optical In-Situ Plasma Process Monitoring Technique for Detection of Abnormal Plasma Discharge

  • Hong, Sang Jeen;Ahn, Jong Hwan;Park, Won Taek;May, Gary S.
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.2
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    • pp.71-77
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    • 2013
  • Advanced semiconductor manufacturing technology requires methods to maximize tool efficiency and improve product quality by reducing process variability. Real-time plasma process monitoring and diagnosis have become crucial for fault detection and classification (FDC) and advanced process control (APC). Additional sensors may increase the accuracy of detection of process anomalies, and optical monitoring methods are non-invasive. In this paper, we propose the use of a chromatic data acquisition system for real-time in-situ plasma process monitoring called the Plasma Eyes Chromatic System (PECS). The proposed system was initially tested in a six-inch research tool, and it was then further evaluated for its potential to detect process anomalies in an eight-inch production tool for etching blanket oxide films. Chromatic representation of the PECS output shows a clear correlation with small changes in process parameters, such as RF power, pressure, and gas flow. We also present how the PECS may be adapted as an in-situ plasma arc detector. The proposed system can provide useful indications of a faulty process in a timely and non-invasive manner for successful run-to-run (R2R) control and FDC.

Monitoring and Controlling Uniformity of Plasma Emission Intensity for IGZO Sputtering Process (IGZO박막 증착 공정에서 플라즈마 방출광 모니터링 및 플라즈마 균일도 제어)

  • Choi, Jinwoo;Hwang, Sang Hyuk;Kim, Woo Jae;Shin, Gi Won;Kwon, Heui Tae;Jo, Tae Hoon;Woo, Won Gyun;Cha, Sung Duk;An, Byung Chul;Park, Wan Woo;Do, Jae Chul;Kwon, Gi-Chung
    • Journal of the Semiconductor & Display Technology
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    • v.15 no.4
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    • pp.27-32
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    • 2016
  • In recent years, various researches have been conducted to improve process yields in accordance with miniaturization of semiconductor. APC(Advanced Process Control) is considered one of the methods to increase in process yields. APC is a process control technology that maintains optimal process conditions and improves the reliability of results by controlling and formulating the relationship among the various process parameters and results. We built up an optical diagnostic system with a three-channel spectrometer. The system detects signals those represent the changes of specific emission peaks intensity versus each reference and converts it into MFC control signals to get back the changes to the reference state. Controlling the MFC continues until the specific peak intensity changes into the normal state. Through this device, we tested a APC automatically responding to process changes during the plasma process. We could control gas flow while sputtering process on going and improve uniformity of plasma intensity with this system. Finally, we have got results those enhance the plasma intensity non-uniformity to 7.7% from 15.5%. Also, found unexpected oxygen flow what is estimated to be come out from IGZO target.

A Study of Atmospheric-pressure Dielectric Barrier Discharge (DBD) Volume Plasma Jet Generation According to the Flow Rate (유량에 따른 대기압 유전체 전위장벽방전(DBD) 플라즈마 젯 발생에 관한 연구)

  • Byeong-Ho Jeong
    • Journal of Industrial Convergence
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    • v.21 no.7
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    • pp.83-92
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    • 2023
  • The bullet shape of the plasma jet using the atmospheric-pressure dielectric barrier discharge method changes depending on the applied fluid rate and the intensity of the electric field. This changes appear as a difference in spectral distribution due to a difference in density of the DBD plasma jet. It is an important factor in utilizing the plasma device that difference between the occurrence of active species and the intensity through the analysis of the spectrum of the generated plasma jet. In this paper, a plasma jet generator of the atmospheric pressure volume DBD method using Ar gas was make a prototype in accordance with the proposed design method. The characteristics jet fluid rate analysis of Ar gas was accomplished through simulation to determine the dependence of flow rate for the generation of plasma jets, and the characteristics of plasma jets using spectrometers were analyzed in the prototype system to generate optimal plasma jet bullet shapes through MFC flow control. Through the design method of the proposed system, the method of establishing the optimal plasma jet characteristics in the device and the results of active species on the EOS were verified.

Diagnosis of Processing Equipment Using Neural Network Recognition of Radio Frequency Impedance Matching

  • Kim, Byungwhan
    • 제어로봇시스템학회:학술대회논문집
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    • 2001.10a
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    • pp.157.1-157
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    • 2001
  • A new methodology is presented to diagnose faults in equipment plasma. This is accomplished by using neural networks as a pattern recognizer of radio frequency(rf) impedance match data. Using a realtime match monitor system, the match data were collected. The monitor system consisted mainly of a multifunction board and a signal flow diagram coded by Visual Designer. Plasma anomaly was effectively represented by electrical match positions. Twenty sets of fault-symptom patterns were experimentally simulated with experimental variations in process factors, which include rf source power, pressure, Ar and O$_2$ flow rates. As the inputs to neural networks, two means and standard deviations of positions were used ...

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Heat and mass flow in plasma arc keyhole-welding of thin plate (플라즈마 키홀 박판 용접에서의 열 및 물질 유동)

  • 김원훈;나석주
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.12 no.4
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    • pp.813-824
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    • 1988
  • Use of a plasma arc as the source of energy for penetration welding of thin plates gives rise to a cylindrical hole surrounded by the molten metal. Material moves from the front to the rear of the hole by flowing around the hole as the workpiece is translated relatively to the arc. Based on the finite difference method, three different computer models have been proposed for the steady state, two dimensional heat and mass flow during the plasma arc welding. In the formulation energy equation was derived by the energy blance method through the cell control volume, and all the governing equations derived for the fixed coordinates was translated for the moving coordinate system. The driving force for fluid flow being considered was only electromagnetic force. The calculated and measured molten poon and HAZ width were compared and better agreement was obtained for the models considering the keyhole effect.

Influence of Electrode Position on Performance of Sparkjet Actuator Using Numerical Analysis (수치해석을 이용한 전극 위치에 따른 스파크제트 액츄에이터의 성능 연구)

  • Shin, Jin Young;Kim, Hyung-Jin;Kim, Kyu Hong
    • Journal of the Korean Society for Aeronautical & Space Sciences
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    • v.47 no.11
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    • pp.753-760
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    • 2019
  • Sparkjet actuator, also known as plasma synthetic jet actuator, which is a kind of active flow control actuator is considered as being high possibility for the supersonic flow control due to ejecting stronger jet compared to the other active flow control actuators. Sparkjet actuator generates high temperature and high pressure flow inside the cavity by using arc plasma and leads momentum by ejecting such flow through orifice or nozzle. In this research, numerical calculation of sparkjet actuator with respect to the location of electrodes which exists inside the cavity is conducted and the change of the performance of sparkjet actuator is suggested. As the location of electrodes goes closer to the bottom of the cavity, impulse is increased and the average pressure inside the cavity maintains higher. When the location of electrode is 25% and 75% of the entire cavity height, impulse is 2.515 μN·s and 2.057 μN·s, respectively. Each impulse is changed by about 9.92% and -10.09% compared to when the location of electrodes is 50% of the entire cavity height.

Optical Properties for Plasma Polymerization Thin Films Using Envelope Method By Spectrophotometry (ENVELOPE METHOD를 이용한 플라즈마 중합 유기박막의 광학특성)

  • Yoo, D.C.;Park, G.B.;Lee, D.C.;HwqangBo, C.K.;Jin, K.H.
    • Proceedings of the KIEE Conference
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    • 1991.07a
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    • pp.183-186
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    • 1991
  • In order to prepare the functional organic optic meterials, the capacitive coupled gas flow type plasma polymerization apparatus was designed and manufactured. Styrene and para-Xylene monomer were adopt as organic materisl. Optical constant, refrative index, extinction coefficient of organic thin films by the gas flow type plasma polymerization appratus were determined by envelope method using spectrophotometry. The refractive index of plasma polymerized thin films was decreased in accordance to increase of wave length and discharge time. The extinction coefficient was very small compared with refractive index. From the experimental result of optical constant and film thickness, it was considered that the films which had required optical properties and thickness can be prepared by control of polymerization condition.

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Diagnosis of Plasma Equipment using Neural Network and Impedance Match Monitoring

  • Byungwhan Kim
    • KIEE International Transaction on Systems and Control
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    • v.2D no.2
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    • pp.120-124
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    • 2002
  • A new methodology is presented to diagnose faults in equipment plasma. This is accomplished by using neural networks as a pattern recognizer of radio frequency (rf) impedance match data. Using a match monitor system, the match data were collected. The monitor system consisted mainly of a multifunction board and a signal flow diagram coded by Visual Designer. Plasma anomaly was effectively represented by electrical match positions. Twenty sets of fault-symptom patterns were experimentally simulated with variations in process factors, which include rf source power, pressure, Ar, and $O_$2 flow rates. As an input to neural networks, two means and standard deviations of positions were used as well as a reflected power. Diagnostic accuracy was measured as a function of training factors, which include the number of hidden neurons, the magnitude of initial weights, and two gradients of neuron activation functions. The accuracy was the most sensitive to the number of hidden neurons. Interaction effects on the accuracy were also examined by performing a 2$^$4 full factorial experiment. The experiments were performed on multipole inductively coupled plasma equipment.

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A Study on Off-Gas Treatment of an Air Stripping Tower Using a Plasma Reactor

  • Lim, Gye-Gyu;Yoo, Ho-Sik
    • Journal of Korean Society for Atmospheric Environment
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    • v.9 no.E
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    • pp.382-389
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    • 1993
  • An evaluation of a plasma reactor was conducted to investigate its potential as a feasible and economical off-gas control technology for an air stripping tower (AST). The plasma reactor was powered by an alternating current with frequencies up to 1000Hz. The study showed that over 90% conversion of gas-phase trichloroethylene (TCE) can be achieved. An optimum frequency for the laternating current existed for maximum power input. The optimum frequency was dependent on the reactor geometry and the primary voltage applied. for a fixed geometry, a plasma reactor has a limited capacity for flow rate. Even though it is a feasible process to control off-gases, further investigations should be conducted to develop a more economic process.

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Modeling of Process Plasma Using a Radial Basis Function Network: A Cases Study

  • Kim, Byungwhan;Sungjin Rark
    • Transactions on Control, Automation and Systems Engineering
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    • v.2 no.4
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    • pp.268-273
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    • 2000
  • Plasma models are crucial to equipment design and process optimization. A radial basis function network(RBFN) in con-junction with statistical experimental design has been used to model a process plasma. A 2$^4$ full factorial experiment was employed to characterized a hemispherical inductively coupled plasma(HICP) in characterizing HICP, the factors that were varied in the design include source power, pressure, position of shuck holder, and Cl$_2$ flow rate. Using a Langmuir probe, plasma attributes were collected, which include typical electron density, electron temperature. and plasma potential as well as their spatial uniformity. Root mean-squared prediction errors of RBEN are 0.409(10(sup)12/㎤), 0.277(eV), and 0.699(V), for electron density, electron temperature, and Plasma potential, respectively. For spatial uniformity data, they are 2.623(10(sup)12/㎤), 5.704(eV) and 3.481(V), for electron density, electron temperature, and plasma potential, respectively. Comparisons with generalized regression neural network(GRNN) revealed an improved prediction accuracy of RBFN as well as a comparable performance between GRNN and statistical response surface model. Both RBEN and GRNN, however, experienced difficulties in generalizing training data with smaller standard deviation.

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