• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.26 no.11
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• pp.836-840
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• 2013

In this study, the surface modification of copper foil using an inductively coupled $O_2$ / Ar plasma as $O_2$ gas fraction (0~100%) was investigated in order to improve the surface characteristics. After plasma treatment, the measurement of the surface roughness, surface contact angle and surface energy were performed for the surface analysis of copper foil. As a result, the surface roughness and the surface energy were increased. And plasma diagnostics was performed by a double Langmuir probe (DLP) and optical emission spectroscopy (OES). Using these results, the plasma surface modification mechanism was investigated.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.218.1-218.1
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• 2014

In order to measure the absolute plasma density, various probes are proposed and investigated and microwave probes are widely used for its advantages (Insensitivity to thin non-conducting material deposited by processing plasmas, High reliability, Simple process for determination of plasma density, no complicate assumptions and so forth). There are representative microwave probes such as the cutoff probe, the hairpin probe, the impedance probe, the absorption probe and the plasma transmission probe. These probes utilize the microwave interactions with the plasma-sheath and inserted structure (probe), but frequency range used by each probe and specific mechanisms for determining the plasma density for each probe are different. In the recent studies, behaviors of each microwave probe with respect to the plasma parameters of the plasma density, the pressure (the collision frequency), and the sheath width is abundant and reasonably investigated, whereas relative diagnostic characteristics of the probes by a comparative study is insufficient in spite of importance for comprehensive applications of the probes. However, experimental comparative study suffers from spatially different plasma characteristics in the same discharge chamber, a low-reproducibility of ignited plasma for an uncertainty in external discharge parameters (the power, the pressure, the flow rate and so forth), impossibility of independently control of the density, the pressure, and the sheath width as well as expensive and complicate experimental setup. In this paper, various microwave probes are simulated by finite-different time-domain simulation and the error between the input plasma density in FDTD simulations and the measured that by the unique microwave spectrums of each probe is obtained under possible conditions of plasma density, pressure, and sheath width for general low-temperature plasmas. This result shows that the each probe has an optimum applicable plasma condition and reliability of plasma density measurement using the microwave probes can be improved by the complementary use of each probe.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.78-78
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• 2012

In this presentation I will review the expanding thermal plasma chemical vapour deposition (ETP-CVD) technology, a deposition technology capable of reaching ultrahigh deposition rates. High rate deposition of a-Si:H, ${\mu}c$-Si:H, a-SiNx:H and silicon nanocrystals will be discussed and their various applications, mainly for photovoltaic applications demonstrated. An important aspect over the years has been the fundamental investigation of the growth mechanism of these films. The various in situ (plasma) and thin film diagnostics, such as Langmuir probes, retarding field analyzer, (appearance potential) mass spectrometry and cavity ring absorption spectroscopy, spectroscopic ellipsometry to name a few, which were successfully applied to measure radical and ion density, their temperature and kinetic energy and their reactivity with the growth surface. The insights gained in the growth mechanism provided routes to novel applications of the ETP-CVD technology, such as the ultrahigh high growth rate of silicon nanorystals and surface passivation of c-Si surfaces.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.178-178
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• 2012

Neutral atom temperature was measured by Laser Rayleigh scattering method using neutral depletion by neutral heating with ideal gas law in Inductively coupled plasma. We observed sudden pressure change when plasma is turned on and off. We analyzed mechanism of neutral heating by employing zero-dimensional neutral and ion energy balance model simultaneously. The results showed that neutral atom temperature increase with ion density. The mechanism of neutral atom heating and cooling is mainly dominated by ion-neutral collision including elastic and charge-exchange collision and by wall cooling respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.245-246
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• 2011

Emission lines ratios were used for diagnostics of and excited level densities in low-temperature plasmas. In this work, an optical emission spectroscopy (OES) was used to determine the electron temperature and metastable level densities in low-pressure inductively coupled plasma. The emission spectroscopy method was based on a simple collisional-radiative model. The selected lines of the Ar(4p to 4s) were influenced by the radiation trapping at relatively high pressures where the plasma become optically thick. To quantify this effect, a pressure dependence factor ${\alpha}$(P) was derived by using corrections for the measured intensities. It was found that the lower metastable level densities were obtained when ${\alpha}$(P) increased with the increasing discharge pressure. The effect of non-Maxwellian electron energy distribution functions (EEDFs) on the metastables was also presented and discussed.

• Journal of electromagnetic engineering and science
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• v.1 no.1
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• pp.18-23
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• 2001

A fast-sweep broadband FM reflectometer system has been successfully developed and operacted at the DIII-D tokamak, producing reliable density Profiles with excellent spatial (1 $\leq$ cm) and temporal resolution (~100 $\mu$ s). The system uses a solid-state microwave oscillator and an active quadrupler, covering full Q-band frequencies (33~50 GHz) and providing relatively high output power (20~60 mW). The system hardware allows fu11band frequency sweep in 10 $\mu$ s, but due to digitization rate limit on DIII-D, sweep time was limited to 75~100 $\mu$ s. Fast frequency sweep has helped to reduce density fluctuation effects on the reflectometer phase measurements, thus improving reliability for individual sweeps. The fast-sweep system with high spatial and temporal resolution has allowed to measure fast-changing edge density profiles during plasma ELMS and L-H transitions, thus enabling fast-time sca1e physics studies.

• Journal of the Korean Vacuum Society
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• v.17 no.3
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• pp.189-194
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• 2008

Measurements with a Langmuir probe, which are the most often used procedures of plasma diagnostics, can disturb plasma flows and change its characteristics quite a little because the probe should be inserted into thermal flowing plasmas. In this study, we calculated the characteristics of thermal plasmas with and without the probe into an atmospheric argon free-burning arc numerically, and investigated aerodynamic and thermal disturbances with temperature and axial velocity distributions. For the modelling of thermal plasmas, we have made two governing equations, which are on the thermal-flow and electromagnetic fields, coupled together with a commercial CFD package and user-coded subroutines. It was found that thermal disturbances happened to both sides of the probe, before and behind, seriously. Due to the aerodynamic disturbance, we could find that there were the stagnation point in front of the probe and the wake behind it. Therefore, aerodynamic and thermal disturbances caused by the probe insertion should be considered to increase the reliability of the probe diagnostics.

• Journal of the Korean Vacuum Society
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• v.16 no.3
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• pp.172-180
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• 2007

A new diagnostics of plasma electron temperature and plasma density is introduced with the observation of the light emission along the tube of external electrode fluorescent lamps. With two different methods operating an external electrode fluorescent lamp of outer diameter 4.0 mm and length 860 mm for the back-light source of 37-inch LCD-TVs, the lighting modes and the plasma properties are investigated. In the center balance operation, the light-emission propagates simultaneously from both sides of the high voltage electrodes to the center of the lamp, while in conventional operation the light-emission propagates from the one end of a high voltage to the other ground electrode. In the operation value of luminance $10,000{\sim}15,000cd/m^2$, the electron plasma thermal energy $(kT_e)$ is about $1.3{\sim}2.7eV$ with the electron density $(n_e)$ is about $(1.6{\sim}3.6){\times}10^{16}m^{-3}$.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.332-332
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• 2011

The extreme ultraviolet (EUV) radiation, whose wavelength is from 120 nm down to 10 nm, and the energy from 10 eV up to 124 eV, is widely utilized such as in photoelectron spectroscopy, solar imaging, especially in lithography and soft x-ray microscopy. In this study, we have investigated the plasma diagnostics as well as the debris characteristics between the two types of dense plasma focusing devices with coaxial electrodes of Mather and hypocycloidal pinch (HCP), respectively. The EUV emission intensity, electron temperature and plasma density have been investigated in these cylindrical focused plasma along with the debris characteristics. An input voltage of 5 kV has been applied to the capacitor bank of 1.53 uF and the diode chamber has been filled with Ar gas at pressure ranged from 1 mTorr and 180 mTorr. The inner surface of the cathode was covered by polyacetal insulator. The central anode electrode has been made of tin. The wavelength of the EUV emission has been measured to be in the range of 6~16 nm by a photo-detector (AXUV-100 Zr/C, IRD). The visible emission has also been measured by the spectrometer with the wavelength range of 200~1,100 nm. The electron temperature and plasma density have been measured by the Boltzmann plot and Stark broadening methods, respectively, under the assumption of local thermodynamic equilibrium (LTE).

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.240.2-240.2
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• 2014

Characteristics of pulse-discharged plasma in liquid and its biological applications to proteins are investigated by making use of high voltage Marx generator. The Marx generator has been consisted of 5 stages, where each charging capacitor is $0.5{\mu}F$ to generate a high voltage pulse with rising time of $1{\mu}s$. We have applied an input voltage of 6 kV to the each capacitor of $0.5{\mu}F$. The high voltage pulsed plasma has been generated inside a polycarbonate tube by a single-shot operation, where the breakdown voltage is measured to be 7 kV, current of 1.2 kA, and pulse width of ${\sim}1{\mu}s$ between the two electrodes of anode-cathode made of stainless steel, which are immersed into the liquids. For the investigation of the influence of pulsed plasma on biomolcules, we have focused on the amino acids, DNA, proteins, cell and cholesterol.