Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2012.08a
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- Pages.78-78
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- 2012
Expanding Thermal Plasma CVD of Silicon Thin Films and Nano-Crystals: Fundamental Studies and Applications
- Sanden, Richard Van De (Dutch Institute for Fundamental Energy Research, Nieuwegein, The Netherlands & Department of Applied Physics, Eindhoven University of Technology)
- Published : 2012.08.20
Abstract
In this presentation I will review the expanding thermal plasma chemical vapour deposition (ETP-CVD) technology, a deposition technology capable of reaching ultrahigh deposition rates. High rate deposition of a-Si:H,
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