• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.05c
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• pp.157-160
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• 2001

We have investigated the Dielectric and Piezoelectric properties of $xPb(R_{1/2}Ta_{1/2})O_3-(1-x)Pb(Zr_{0.52}Ti_{0.48})O_3$ (R=Al,Y) solid solutions in which R ions are substituted for Al and Y ions. The maximum value of electromechanical coupling factor kp of 55% and 51% were obtained at the composition of 5mol% PAT and 5mol% PYT. However mechanical quality factor$(Q_m)$ had a minimum value of 44 and 69 at the composition of 5mol% PAT and 5mol% PYT. Also, the maximum value of piezoelectctric constant of $d_{33}(329[pC/N])$ and $d_{33}(310[pC/N])$ were obtained at the composition of 5mol% PAT and 5mol% PYT.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.11a
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• pp.140-143
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• 2002

In this study, we prepared ZnO/glass and $ZnO/SiO_{2}/Si$ thin film by Facing Targets Sputtering (FTS) system for Film Bulk Acoustic Resonator (FBAR). When the ZnO thin film applied to piezoelectric thin film, it requires good c-axis preferred orientation. And c-axis orientation has a remarkable difference with preparation conditions. Therefore, c-axis orientation must be significantly evaluated according to changing deposition conditions. Moreover, in order to prepare ZnO thin film with good crystallographic properties and progressive of efficiency of product process, the ZnO thin film should have to prepared as low temperature as possible. In this work, we prepared ZnO thin films on slide glass and $SiO_{2}/Si$ substrate. And the crystallographic characteristics of ZnO thin films on sputtering conditions were investigated by alpha-step and X-ray diffraction.

• Journal of the Korean Ceramic Society
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• v.17 no.2
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• pp.80-88
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• 1980

The sintering phenomena and piezoelectric properties of PZT ceramics of composition $Pb(Zr_{0.54} Ti_{0.46})O_3$ were investigated when a small quantity of $La_2O_3$ , $LaMnO_3$, $LaCrO_3$ were added. The unwanted chemical composition change in PZT during sinterin porces du to PbO evaporation poses a severe problem in PZt manufacturinig. It is observed tat an addition of small amount of $LaMnO_3$ to PZT markedly decreases the evaporation of PbO during sintering . The green compact of (1-x) PZT.xLaMnO3(x=0.02~0.10) could be sintered of under O2 atmosphere alone with no significant loss of PbO. The planar coupling factor kp of the sintered $0.98Pb(Zr_{0.54} Ti_{0.46})O_{3.0.02}LaMnO}3$ is similar to that of commercial PZT 6A. Microstructure investigation shows that part of sintering process of $Pb(Zr, Ti)O_3$.$LaMnO_3$ system progresses via liquid phase sintering. It is believed that the evaporation of PbO in PZT sintering is restricted by the addition of $LaMnO_3$ due to the above phenomena. Furthermore the solid solution of $LaMnO_3$ in PZT causes diffuses phase transition.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.8
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• pp.711-715
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• 2003

In this study, we prepared ZnO/glass and ZnO/SiO$_2$/Si thin film by Facing Targets Sputtering (FTS) system for Film Bulk Acoustic Resonator (FBAR). When the ZnO thin film applied to piezoelectric thin film, it requires good c-axis preferred orientation. And c-axis orientation has a remarkable difference with preparation conditions. Therefore, c-axis orientation must be significantly evaluated as a function of deposition conditions. Moreover, in order to prepare ZnO thin film with good crystallographic properties and progressive of efficiency of product process, the ZnO thin film should be prepared as low temperature as possible. In this work, we prepared ZnO thin films on slide glass and SiO$_2$/Si substrate. And the crystallographic characteristics of ZnO thin films on sputtering conditions were investigated by alpha-step and X-ray diffraction.

• Journal of Magnetics
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• v.15 no.4
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• pp.165-168
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• 2010

$Li_{0.1}Zn_{0.9}O$ and $MgFe_2O_4$ powders were synthesized using chemical methods and mixed in different proportions to prepare a mixture of $Li_{0.1}Zn_{0.9}O$ and $MgFe_2O_4$ that was thermally treated between 900 to $1100^{\circ}C$ for 1 hour. Structural characterization was done using X-ray powder diffraction measurements. Grain sizes and morphologies of $Li_{0.1}Zn_{0.9}O$, $MgFe_2O_4$, and $Li_{0.1}Zn_{0.9}O+MgFe_2O_4$ samples were observed using a scanning electron microscope. Variation of magnetic properties of the $Li_{0.1}Zn_{0.9}O+MgFe_2O_4$ samples due to the addition of $Li_{0.1}Zn_{0.9}O$ was studied in relation to the structural changes occurring due to the thermal treatment. In particular, changes in the cationic distribution between the tetrahedral and octahedral positions were studied with respect to the increase of the annealing temperature. Magnetization was found to be dependent on the cations distributed in the tetrahedral and octahedral sites of the $MgFe_2O_4$.

• Korean Journal of Materials Research
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• v.31 no.12
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• pp.697-703
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• 2021

Aluminum nitride having a dense hexagonal structure is used as a high-temperature material because of its excellent heat resistance and high mechanical strength; its excellent piezoelectric properties are also attracting attention. The structure and residual stress of AlN thin films formed on glass substrate using TFT sputtering system are examined by XRD. The deposition conditions are nitrogen gas pressures of 1 × 10^-2, 6 × 10^-3, and 3 × 10^-3, substrate temperature of 523 K, and sputtering time of 120 min. The structure of the AlN thin film is columnar, having a c-axis, i.e., a <00·1> orientation, which is the normal direction of the glass substrate. An X-ray stress measurement method for crystalline thin films with orientation properties such as columnar structure is proposed and applied to the residual stress measurement of AlN thin films with orientation <00·1>. Strength of diffraction lines other than 00·2 diffraction is very weak. As a result of stress measurement using AlN powder sample as a comparative standard sample, tensile residual stress is obtained when the nitrogen gas pressure is low, but the gas pressure increases as the residual stress is shifts toward compression. At low gas pressure, the unit cell expands due to the incorporation of excess nitrogen atoms.

• Proceedings of the KIEE Conference
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• 1999.07d
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• pp.1523-1525
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• 1999

ZnO is a wide-bandgap II-VI semiconductor and has a variety of potential application. ZnO exhibits good piezoelectric, photoelectric and optic properties, and is good for a electroluminescence device. ZnO films have been deposited at (0001) shappire by PLD technique. Chamber was evacuated by turbomolecular pump to a base pressure of $1{\times}10^{-6}$ Torr Nd:YAG pulsed laser was operated at ${\lambda}=355nm$. The ZnO films were deposited at oxygen pressures from base to 500 mTorr. The substrate temperatures was increased from $200^{\circ}C$ to $700^{\circ}C$. At aleady works, UV emission and green-yellow PL was observed. In this work, ZnO films showed UV, violet, green and yellow emissions. UV emission was enhanced by increasing partial oxygen pressure. We investigated relationship between partial oxygen pressure and UV emission.

• Proceedings of the KIEE Conference
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• 1999.07d
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• pp.1846-1848
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• 1999

A technique is investigated for achieving broadband properties by controlling the operation frequency of microstrip antennas. The control is achieved by applying DC and AC bias to the microstrip antenna. Air gap antenna with pzt post and microstrip antenna with simple rectangular patch on the $LiNbO_3$ substrate were fabricated. In the case of Air gap antenna, the variation of operating frequency was 11Mhz and $LiNbO_3$ antennas was 11Mhz. Also, frequency scanning was achieved by appling AC bias.

• Journal of Integrative Natural Science
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• v.7 no.3
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• pp.183-187
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• 2014

Lead zirconate titanate (PZT) is significant material in electrical and optical devices for their ferroelectric, piezoelectric and dielectric properties. In this research, PZT films were fabricated by reactive RF co-sputtering method using Pb, Zr, and Ti targets. From XPS study, lead, zirconium, and titanium are successfully deposited on Si(100) substrate. Thickness of PZT films was measured with a surface profiler and the thickness was decreased as the oxygen gas ratio increased in the sputter gas.

• 제어로봇시스템학회:학술대회논문집
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• 1997.10a
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• pp.276-279
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• 1997

When a magnetostrictive material is exposed to a magnetic field, its geometry changes due to a magnetostrictive effect. The magnetostriction is analogous to the piezoeletricity. The displacement of the magnetostrictive material is proportional to the applied current while that of the piezoelectric material is proportional to the voltage. A magnetostrictive material generates large displacement and higher compressive force compared with a piezoeletric material. These advantages provide a good performance of a vibration isolation of a platform. In this work, it is applied to a driving actuator for vibration isolation of a platform. The properties of a magnetostrictive material are investigated in terms of hysteresis and displacement vs. applied current for a various preload. Modeling of the displacement of the vibration isolating actuator is performed as it behaves as a flow source. A sliding mode controller is designed to demonstrate the ability of the magnetostrictive actuator to reduce the vibration at the platform. The effectiveness of the proposed scheme is demonstrated through experimental works. The experimental results of the vibration of the platform axe presented in terms of time response and frequency response.