• 제목/요약/키워드: Photoresist

검색결과 432건 처리시간 0.03초

구리기둥주석범프의 전해도금 형성과 특성 (Formation and Properties of Electroplating Copper Pillar Tin Bump)

  • 소대화
    • 한국정보통신학회논문지
    • /
    • 제16권4호
    • /
    • pp.759-764
    • /
    • 2012
  • 고밀도집적을 위하여 전기도금과 무전해도금법을 적용하여 구리기둥주석범프(CPTB)를 제작하고, 그 특성을 분석하였다. CPTB는 ${\sim}100{\mu}m$의 피치를 갖도록 KM-1250 건식감광필름(DFR)을 사용하여 먼저 구리기둥범프(CPB)를 도금 전착시킨 다음, 구리의 산화억제를 위하여 그 위에 주석을 무전해 도금하였다. 열-압력에 따른 산화효과와 접합특성을 위하여 전기저항계수와 기계적 층밀림 전단강도를 측정하였다. 전기저항계수는 산화두께의 증가에 따라서 증가하였고, 전단강도는 $330^{\circ}C$에서 500 N의 열-압력일 때 최고치를 나타냈다. 시뮬레이션 결과에 따르면, CPTB는 시간이 경과됨에 따라 통전면적의 크기 감소의 결과를 나타냈으며, 그것은 구리의 산화에 의해 크게 영향을 받는 것으로 확인되었다.

마이크로 렌즈 어레이를 이용한 유기 발광 소자의 광추출 효율 향상에 관한 연구 (Improvement of Outcoupled Light Efficiency of Organic Light-emitting Diodes with a Use of Microlens Array)

  • 김혜숙;황덕현;홍진웅;송민종;한원근;김태완
    • 한국전기전자재료학회논문지
    • /
    • 제27권5호
    • /
    • pp.307-311
    • /
    • 2014
  • Because of a waveguiding effect and total internal reflection caused by a difference in refractive indices, only 20% of generated light is emitted to the air and the rest is trapped or absorbed in the device. An improvement of outcoupled efficiency of organic light-emitting diodes was studied using a microlens array. Mold of microlens array was fabricated by using photo-lithography with the AZ9260 photoresist, and the microlens array was formed onto the glass substrate using the UV curing agent named ZPU13-440. Device structure consists of microlens/glass/ITO/TPD/$Alq_3$/LiF/Al. It was found that there is an improvement of external quantum efficiency by about 20% at the same current density for the device with the microlens array compared to that of the reference one. Simulated outcoupled efficiency shows the improvement by about 20% for the device with the microlens array compared to that of the reference one. These results are consistent with the experimental ones.

Fabrication of a Bottom Electrode for a Nano-scale Beam Resonator Using Backside Exposure with a Self-aligned Metal Mask

  • Lee, Yong-Seok;Jang, Yun-Ho;Bang, Yong-Seung;Kim, Jung-Mu;Kim, Jong-Man;Kim, Yong-Kweon
    • Journal of Electrical Engineering and Technology
    • /
    • 제4권4호
    • /
    • pp.546-551
    • /
    • 2009
  • In this paper, we describe a self-aligned fabrication method for a nano-patterned bottom electrode using flood exposure from the backside. Misalignments between layers could cause the final devices to fail after the fabrication of the nano-scale bottom electrodes. A self-alignment was exploited to embed the bottom electrode inside the glass substrate. Aluminum patterns act as a dry etching mask to fabricate glass trenches as well as a self-aligned photomask during the flood exposure from the backside. The patterned photoresist (PR) has a negative sidewall slope using the flood exposure. The sidewall slopes of the glass trench and the patterned PR were $54.00^{\circ}$ and $63.47^{\circ}$, respectively. The negative sidewall enables an embedment of a gold layer inside $0.7{\mu}m$ wide glass trenches. Gold residues on the trench edges were removed by the additional flood exposure with wet etching. The sidewall slopes of the patterned PR are related to the slopes of the glass trenches. Nano-scale bottom electrodes inside the glass trenches will be used in beam resonators operating at high resonant frequencies.

XPS와 SEM을 이용한 폴리실리콘 표면에 형성된 잔류막에 대한 연구 (A Study on the Polysilicon Etch Residue by XPS and SEM)

  • 김태형;이종완;최상준;이창원
    • 한국진공학회지
    • /
    • 제7권3호
    • /
    • pp.169-175
    • /
    • 1998
  • HBr/$Cl_2/He-O_2$ 반응 기체를 이용한 반응성 이온 식각후, 폴리실리콘 표면에 형성된 잔류막을 x-선 광전자 분광법(x-ray photoelectron spectroscopy, XPS)과 전자 현미경 (scanning electron mocroscopy, SEM)을 이용하여 관찰하였다. 그 결과 잔류물은 패턴된 폴 리실리콘의 맨 윗부분에 자존하고 있었으며, 화학 결합 상태는 실리콘 산화물임이 밝혀졌다. 잔류물인 실리콘 산화물의 형성 메카니즘을 규명하기 위하여 원래의 혼합 기체 성분중 한가 지씩의 반응 기체를 제외시켜 가면서 실험하였다. 비록 플라즈마 성질이 다를지라도, 잔류물 은 산소의 존재하에서 잘 형성됨을 알 수 있었는데, 이는 휘발성이 낮은 실리콘-할로겐 화 합물이 산소에 의해 산화됨으로써 형성되는 것으로 이해하게 되었다. 또한 반응성 이온 식 각후 형성된 잔류층은 소자의 전기적 특성과 후처리 공정에 영향을 미치는 것으로 알려져 있어서, 이를 제거하기 위해 습식과 건식 후처리 공정을 도입하여 비교하였다. 그 결과 건식 공정의 경우 기체에 의해 새로운 잔류물이 형성됨을 XPS를 통하여 관찰하였다. 따라서 잔 류물을 제거하고 깨끗한 표면을 얻기 위해서는 습식 공정이 더 적합함을 알았다.

  • PDF

응집반응 검출을 위한 미세 유체 Lab on a chip의 사출성형 금형 인서트의 디자인 및 제작 (Design and Fabrication of Mold Insert for Injection Molding of Microfluidic tab-on-a-chip for Detection of Agglutination)

  • 최성환;김동성;권태헌
    • 소성∙가공
    • /
    • 제15권9호
    • /
    • pp.667-672
    • /
    • 2006
  • Agglutination is one of the most commonly employed reactions in clinical diagnosis. In this paper, we have designed and fabricated nickel mold insert for injection molding of a microfluidic lab-on-a-chip for the purpose of the efficient detection of agglutination. In the presented microfluidic lab-on-a-chip, two inlets for sample blood and reagent, flow guiding microchannels, improved serpentine laminating micromixer(ISLM) and reaction microwells are fully integrated. The ISLM, recently developed by our group, can highly improve mixing of the sample blood and reagent in the microchannel, thereby enhancing reaction of agglutinogens and agglutinins. The reaction microwell was designed to contain large volume of about $25{\mu}l$ of the mixture of sample blood and reagent. The result of agglutination in the reaction microwell could be determined by means of the level of the light transmission. To achieve the cost-effectiveness, the microfluidic lab-on-a-chip was realized by the injection molding of COC(cyclic olefin copolymer) and thermal bonding of two injection molded COC substrates. To define microfeatures in the microfluidic lab-on-a-chip precisely, the nickel mold inserts of lab-on-a-chip for the injection molding were fabricated by combining the UV photolithography with a negative photoresist SU-8 and the nickel electroplating process. The microfluidic lab-on-a-chip developed in this study could be applied to various clinical diagnosis based on agglutination.

Diffraction Efficiency Analysis of Silver Halide Film for Color Holography Recording

  • Park, Sung Chul;Kim, Sang Il;Son, Kwang Chul;Kwon, Soon Chul;Lee, Seung Hyun
    • International Journal of Internet, Broadcasting and Communication
    • /
    • 제7권2호
    • /
    • pp.16-27
    • /
    • 2015
  • Holography technology which was developed by Dennis Gabor (1900~1979) in 1948 is a technology to record wave planes of actual 3D objects. It is known as the only technology which can express 3D information most perfectly close to human-friendly. Holography technology is widely used in advertisement, architecture and arts as well as science technology areas. Especially, digital holographic print which is an applied area is greatly used in military map, architecture map and cultural asset restoration by printing and reproducing 3D information. Holography is realized by recording and reproducing the amplitude and phase information on high resolution film using coherent light like laser. Recording materials for digital holographic printer are silver halide, photoresist and photopolymer. Because the materials have different diffraction efficiency according to film characteristics of each manufacturer, appropriate guide lines should be suggested through efficiency analysis of each film. This paper suggests appropriate guide lines through the diffraction efficiency measurement of silver halide which is a holographic printer recording medium. And the objective of this study is to suggest appropriate guide lines through diffraction efficiency analysis of Ultimate 08-C and PFG-03C which are commercially used. The experiment was prepared by self-diffraction efficiency system which measures the strength with the defector by penetrating RGB recording medium and concentrating diffracted beams through collimating lens. The experiment showed Geola's PFG-03C which is a silver halide for full color has price/performance advantage in optical hologram recording, but recording angles and reproduction angles are irregular for digital holographic printer recording. Ultimate's Ultimate08-C for full color shows its diffraction efficiency is relatively stable and high according to recording angles and laser wavelength.

반도체공정에서 구리기둥주석범프의 전해도금 형성과 특성 (Formation and Properties of Electroplating Copper Pillar Tin Bump on Semiconductor Process)

  • 왕리;정원철;조일환;홍상진;황재룡;소대화
    • 한국정보통신학회:학술대회논문집
    • /
    • 한국해양정보통신학회 2010년도 추계학술대회
    • /
    • pp.726-729
    • /
    • 2010
  • 고밀도집적을 위하여 전기도금과 무전해도금법을 적용하여 구리기둥주석범프(CPTB)를 제작하고, 그 특성을 분석하였다. CPTB는 ${\sim}100{\mu}m$의 피치를 갖도록 KM-1250 건식감광필름(DFR)을 사용하여 먼저 구리 기둥범프(CPB)를 도금 전착시킨 다음, 구리의 산화억제를 위하여 그 위에 주석을 무전해 도금하였다. 열-압력에 따른 산화효과와 접합특성을 위하여 전기저항계수와 기계적 층밀림전단강도를 측정하였다. 전기저항계수는 산화두께의 증가에 따라서 증가하였고, 전단강도는 $330^{\circ}C$에서 500 N의 열-압력일 때 최고치를 나타냈다. 시뮬레이션 결과에 따르면, CPTB는 크기 감소의 결과를 나타냈으며, 그것은 구리의 산화에 의해 크게 영향을 받는 것으로 확인되었다.

  • PDF

광학적 검출을 위한 PDMS 마이크로렌즈의 제작 (Fabrication of PDMS microlens for optical detection)

  • 박세완;김현철;전국진
    • 대한전자공학회논문지SD
    • /
    • 제46권4호
    • /
    • pp.15-20
    • /
    • 2009
  • 레이저 광 산란을 이용한 검출 시스템 및 레이저를 이용한 광학적 검출에 있어서 높은 발광 강도를 통해 궁극적으로 높은 효율의 광 산란 신호를 광검출기에서 얻기 위해서는 발광 레이저빔을 미세유체 칩의 채널 중앙에 집광하는 것이 매우 중요하다. 본 논문을 통해 레이저 광 산란을 이용한 세포 검출을 위해 PDMS 마이크로렌즈가 집적화된 PDMS 미세유체 칩을 소개하고자 한다. 기존에 제작된 PDMS 미세유체 칩 위에 간편히 정렬하여 올려놓아 사용함으로써 검출 효율을 증가시킬 수 있는 PDMS 마이크로렌즈를 제작하였다. PDMS 마이크로렌즈는 포토레지스트 리플로우와 PDMS 복제 몰딩에 의해 제작되었다. 이 제작 방법은 간단하며 높은 치수 정확성 및 좋은 마이크로렌즈의 성능을 제공한다. PDMS 미세유체 칩 위에 집적화된 PDMS 마이크로렌즈가 적혈구를 이용한 레이저 광 산란을 통한 세포 검출 실험에서 레이저 강도를 증가시켜 신호대잡음비 및 감도를 증가시킴을 검증하였다.

광영상 발생을 위한 화소형 위상격자의 설계 및 제작 (Design of pixelated phase gratings for optical image generation)

  • 이득주;김남;이권연;은재정
    • 전자공학회논문지A
    • /
    • 제33A권5호
    • /
    • pp.132-141
    • /
    • 1996
  • The pixelated phase grating has been studied as a kind of diffraction gratings splitting and input beam into multiple spots. It consists of regular size cells which produce phase delays, and each cell provokes the phase delay up to sixteen levels. We have compared and analyzed the characteristics of multi-level phase gratings, laying streess on efficiency and resulted pattern. Experimental resutls obtained form fabricated grating have been presented, and the real-time method using a liquid-crystal spatial light modulator has been demonstrated through experiments. Gratings making meams with specific intensities have been designed and optical images have been generated by them. In order to specific intensities have been designed and optical images have been genrated by them. In order to decide the phase delay of each cell, optimization conditon consists of diffraction efficiency and target values. One period of phase gratings fabricated with surface relief was less than 256${\mu}m{\times}256{\mu}m$ and size of each cell was 1${\mu}m{\times}1{\mu}m$ surface relief grating has been made by coating photoresist on the glass plate, writing information pattern by Ar laser and developing it. in the experiment for real-tiem processing liquid-crystal display of epson video projector has been used.

  • PDF

홀로그래픽 리소그래피에 의한 미세패턴 형성과 MOCVD에 의한 양자세선 어레이의 제작 (Micropattern generation by holographic lithography and fabrication of quantum wire array by MOCVD)

  • 김태근;조성우;임현식;김용;김무성;박정호;민석기
    • 전자공학회논문지A
    • /
    • 제33A권6호
    • /
    • pp.114-119
    • /
    • 1996
  • The use of holographic interference lithography and removal techniques to corrugate GaAs substrate have been studied. The periodic photoresist structure, which serves as a protective mask during etching, is holographically prepared. Subsequently periodic V-grooved pattern is formed on the GaAs substrate by conventional a H$_{2}$SO$_{4}$-H$_{2}$O$_{2}$-H$_{2}$O wet etching. The linewidth of a GaAs pattern is about 0.4$\mu$m and the depth is 0.5$\mu$m A quantum wires(QWRs) array is well formed on the V-grooved substrate by MOCVD (metalorganic chemical vapor deposition) growth of GaAs/Al$_{0.5}$Ga$_{0.5}$As (50$\AA$/300$\AA$) quantum wells. The formation of QWR array is confirmed by the temperature dependent photoluminescence (PL) measurement. The intensive PL peak with a FWHM of 6meV at 21K shows the high quality of the QWR array.

  • PDF