• 제목/요약/키워드: Photoluminescence properties

검색결과 896건 처리시간 0.031초

$Sr_{1-x}Ca_xGa_2S_4:Ce,Na$ 형광체의 합성과 발광 특성 (Synthesis and luminescence properties of $Sr_{1-x}Ca_xGa_2S_4:Ce,Na$ phosphors)

  • 성혜진;허영덕
    • 한국결정성장학회지
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    • 제16권6호
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    • pp.267-272
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    • 2006
  • 일련의 $Sr_{1-x}Ca_xGa_2S_4:Ce,Na$ 형광체를 고상법으로 합성하였다. $Sr_{1-x}Ca_xGa_2S_4:Ce,Na$의 구조와 발광 특성을 조사하였다. $Sr_{1-x}Ca_xGa_2S_4:Ce,Na$은 보라색 발광 다이오드의 발광 파장인 400 nm에서 강한 흡수가 있다. $SrGa_2S_4:Ce,Na$의 발광 봉우리는 448 nm와 485 nm에 있다. $Sr_{1-x}Ca_xGa_2S_4:Ce,Na$에서 Sr이 Ca으로 부분 치환되면 발광 파장이 장파장으로 이동된다. 다파장 백색 LED를 제작할 때 $Sr_{1-x}Ca_xGa_2S_4:Ce,Na$은 보라색 LED로 여기하여 청색 발광 형광체로 사용 될 수 있다.

Synthesis and Physical Properties of Decylbithiophene End-Capped Oligomers Based on Naphthalene, Anthracene and Benzo[1,2-b:4,5-b']dithiophene

  • Jang, Sang-Hun;Tai, Truong Ba;Kim, Min-Kyu;Han, Jeong-Woo;Kim, Yun-Hi;Shin, Sung-Chul;Yoon, Yong-Jin;Kwon, Soon-Ki;Lee, Sang-Gyeong
    • Bulletin of the Korean Chemical Society
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    • 제30권3호
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    • pp.618-622
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    • 2009
  • The new candidates for OTFTs, which were composed of naphthalene, anthracene, benzo[1,2-b:4,5-b’]dithiophene and 2-decylbithiophene end-capper were synthesized under Suzuki coupling reaction conditions. All of the oligomers were characterized by FT-IR, mass analysis, UV-vis, PL spectrum, cyclic voltametry (CV), differential scanning calorimetry (DSC), thermal gravimetric analysis (TGA), $^1H-NMR\;and\;^{13}C-NMR$. Investigation of physical properties showed that all of the oligomers have higher oxidation potential and good thermal stability. Especially, DBT-DtB-DBT is soluble in common solvents and suitable for low cost processing technologies.

고상법에 의한 Zn2SiO4:Mn2+녹색 형광체의 제조와 특성에 관한 연구 (Preparation and Characterization of Zn2SiO4:Mn2+ Green Phosphor with Solid State Reaction)

  • 유현희;;원형일;원창환
    • 한국재료학회지
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    • 제21권6호
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    • pp.352-356
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    • 2011
  • [ $Zn_{2(1-x)}Mn_xSiO_4$ ]$0.07{\leq}x{\leq}0.15$) green phosphor was prepared by solid state reaction. The first heating was at $900^{\circ}C-1250^{\circ}C$ in air for 3 hours and the second heating was at $900^{\circ}C$ in $N_2/H_2$(95%/5%) for 2 hours. The size effect of $SiO_2$ in forming $Zn_2SiO_4$ was investigated. The temperature for obtaining single phase $Zn_2SiO_4$ was lowered from $1100^{\circ}C$ to $1000^{\circ}C$ by decreasing the $SiO_2$ particle size from micro size to submicro size. The effect of the activators for the Photoluminescence (PL) intensity of $Zn_2SiO_4:Mn^{2+}$ was also investigated. The PL intensity properties of the phosphors were investigated under vacuum ultraviolet excitation (147 nm). The emission spectrum peak was between 520 nm and 530 nm, which was involved in green emission area. $MnCl_2{\cdot}4H_2O$, the activator source, was more effective in providing high emission intensity than $MnCO_3$. The optimum conditions for the best optical properties of $Zn_2SiO_4:Mn^{2+}$ were at x = 0.11 and $1100^{\circ}C$. In these conditions, the phosphor particle shape was well dispersed spherical and its size was 200 nm.

구형 SiO2@Y2O3: Eu 코어-쉘 복합체 형광체 합성 및 특성 (Synthesis and Characterization of Spherical SiO2@Y2O3 : Eu Core-Shell Composite Phosphors)

  • 송우석;양희선
    • 한국세라믹학회지
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    • 제48권5호
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    • pp.447-453
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    • 2011
  • The monodisperse spherical $SiO_2$ particles were overcoated with $Y_2O_3:Eu^{3+}$ phosphor layers via a Pechini sol-gel process and the resulting $SiO_2@Y_2O_3:Eu^{3+}$ core-shell phosphors were subsequently annealed at $800^{\circ}C$ at an ambient atmosphere. The crystallographic structure, morphology, and luminescent property of core-shell structured $SiO_2@Y_2O_3:Eu^{3+}$ phosphors were characterized by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), and photoluminescence (PL). The spherical, nonagglomerated $SiO_2$ particles prepared by a Stober method exhibited a relatively narrow size distribution in the range of 260-300 nm. The thickness of phosphor shell layer in the core-shell particles can be facilely controlled by varying the coating number of $Y_2O_3:Eu^{3+}$ phosphors. The core-shell structured $SiO_2@Y_2O_3:Eu^{3+}$ phosphors showed a strong red emission, which was dominated by the $^5D_0-^7F_2$ transition (610 nm) of $Eu^{3+}$ ion under the ultraviolet excitation (263 nm). The PL emission properties of $SiO_2@Y_2O_3:Eu^{3+}$ phosphors were also compared with pure $Y_2O_3:Eu^{3+}$ nanophosphors.

Preparation of SrGd2(MoO4)4:Er3+/Yb3+ Phosphors by the Microwave-Modified Sol-Gel Method and Their Upconversion Photoluminescence Properties

  • Lim, Chang Sung
    • 한국세라믹학회지
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    • 제51권6호
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    • pp.605-611
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    • 2014
  • $SrGd_{2-x}(MoO_4)_4:Er^{3+}/Yb^3$ phosphors with doping concentrations of $Er^{3+}$+ and $Yb^{3+}$ ($x=Er^{3+}+Yb^{3+}$, $Er^{3+}=0.05$, 0.1, 0.2, and $Yb^{3+}=0.2$, 0.45) were successfully synthesized by the cyclic microwave-modified sol-gel method, and their upconversion mechanism and spectroscopic properties have been investigated in detail. Well-crystallized particles showed a fine and homogeneous morphology with grain sizes of $2-5{\mu}m$. Under excitation at 980 nm, $SrGd_{1.7}(MoO_4)_4:Er_{0.1}Yb_{0.2}$ and $SrGd_{1.5}(MoO_4)_4:Er_{0.05}Yb_{0.45}$ particles exhibited a strong 525-nm emission band, a weak 550-nm emission band in the green region, and a very weak 655-nm emission band in the red region. The Raman spectra of the doped particles indicated the domination of strong peaks at higher frequencies of 1023, 1092, and $1325cm^{-1}$ and at lower frequencies of 223, 2932, 365, 428, 538, and $594cm^{-1}$ induced by the incorporation of the $Er^{3+}$+ and $Yb^{3+}$+ elements into the $Gd^{3+}$ site in the crystal lattice, which resulted in the unit cell shrinkage accompanying a new phase formation of the $[MoO_4]^{2-}$ groups.

HVPE법을 이용하여 PSS와 AlN Buffered PSS 위에 성장시킨 GaN 박막의 결정 특성 (Crystalline Properties of GaN Layers Grown on PSS and AlN Buffered PSS by HVPE Method)

  • 이원준;박미선;이원재;김일수;최영준;이혜용
    • 한국전기전자재료학회논문지
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    • 제31권6호
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    • pp.386-391
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    • 2018
  • An epitaxial GaN layer was grown on a cone-shape-patterned sapphire substrate (PSS) (Sample A) and an AlN-buffered PSS (Sample B) with two growth steps under the same process conditions by employing the hydride vapor phase epitaxy (HVPE) method. We have investigated the characteristics of the GaN layer grown on two kinds of substrates at each growth step. The cross-sectional SEM image of the GaN layer grown on the two types of substrates showed growth states of GaN layers formed during the 1st and 2nd growth steps with different growth durations. Dislocation density was obtained by calculation using the FWHM value of the rocking curve for (002) and (102). Sample A showed 2.62+08E and 6.66+08E and sample B exhibited 5.74+07E and 1.65+08E for two different planes. The red shift was observed is photoluminescence (PL) analysis and Raman spectroscopy results. GaN layers grown on AlN-buffered PSS exhibited better optical and crystallographic properties than GaN layers grown on PSS.

The effect of thermal anneal on luminescence and photovoltaic characteristics of B doped silicon-rich silicon-nitride thin films on n-type Si substrate

  • Seo, Se-Young;Kim, In-Yong;Hong, Seung-Hui;Kim, Kyung-Joong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.141-141
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    • 2010
  • The effect of thermal anneal on the characteristics of structural properties and the enhancement of luminescence and photovoltaic (PV) characteristics of silicon-rich silicon-nitride films were investigated. By using an ultra high vacuum ion beam sputtering deposition, B-doped silicon-rich silicon-nitride (SRSN) thin films, with excess silicon content of 15 at. %, on P-doped (n-type) Si substrate was fabricated, sputtering a highly B doped Si wafer with a BN chip by N plasma. In order to examine the influence of thermal anneal, films were then annealed at different temperature up to $1100^{\circ}C$ under $N_2$ environment. Raman, X-ray diffraction, and X-ray photoemission spectroscopy did not show any reliable evidence of amorphous or crystalline Si clusters allowing us concluding that nearly no Si nano-cluster could be formed through the precipitation of excess Si from SRSN matrix during thermal anneal. Instead, results of Fourier transform infrared and X-ray photoemission spectroscopy clearly indicated that defective, amorphous Si-N matrix of films was changed to be well-ordered thanks to high temperature anneal. The measurement of spectral ellipsometry in UV-visible range was carried out and we found that the optical absorption edge of film was shifted to higher energy as the anneal temperature increased as the results of thermal anneal induced formation of $Si_3N_4$-like matrix. These are consistent with the observation that higher visible photoluminescence, which is likely due to the presence of Si-N bonds, from anneals at higher temperature. Based on these films, PV cells were fabricated by the formation of front/back metal electrodes. For all cells, typical I-V characteristic of p-n diode junction was observed. We also tried to measure PV properties using a solar-simulator and confirmed successful operation of PV devices. Carrier transport mechanism depending on anneal temperature and the implication of PV cells based on SRSN films were also discussed.

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Fabrication and Characterization of InGaN/GaN LED structures grown on selectively wet-etched porous GaN template layer

  • Beck, Seol;Cho, Yong-Hoon
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.124-124
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    • 2010
  • Much interest has been focused on InGaN-based materials and their quantum structures due to their optoelectronics applications such as light emitting diode (LED) and photovoltaic devices, because of its high thermal conductivity, high optical efficiency, and direct wide band gap, in spite of their high density of threading dislocations. Build-in internal field-induced quantum-confined Stark effect in InGaN/GaN quantum well LED structures results in a spatial separation of electrons and holes, which leads to a reduction of radiative recombination rate. Therefore, many growth techniques have been developed by utilizing lateral over-growth mode or by inserting additional layers such as patterned layer and superlattices for reducing threading dislocations and internal fields. In this work, we investigated various characteristics of InGaN multiple quantum wells (MQWs) LED structures grown on selectively wet-etched porous (SWEP) GaN template layer and compared with those grown on non-porous GaN template layer over c-plane sapphire substrates. From the surface morphology measured by atomic force microscope, high resolution X-ray diffraction analysis, low temperature photoluminescence (PL) and PL excitation measurements, good structural and optical properties were observed on both LED structures. However, InGaN MQWs LED structures grown on SWEP GaN template layer show relatively low In composition, thin well width, and blue shift of PL spectra on MQW emission. These results were explained by rough surface of template layer, reduction of residual compressive stress, and less piezoelectric field on MQWs by utilizing SWEP GaN template layer. Better electrical properties were also observed for InGaN MQWs on SWEP GaN template layer, specially at reverse operating condition for I-V measurements.

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Effect of Deposition and Annealing Temperature on Structural, Electrical and Optical Properties of Ag Doped ZnO Thin Films

  • Jeong, Eun-Kyung;Kim, In-Soo;Kim, Dae-Hyun;Choi, Se-Young
    • 한국재료학회지
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    • 제18권2호
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    • pp.84-91
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    • 2008
  • The effects of the deposition and annealing temperature on the structural, electrical and optical properties of Ag doped ZnO (ZnO : Ag) thin films were investigated. All of the films were deposited with a 2wt% $Ag_2O-doped$ ZnO target using an e-beam evaporator. The substrate temperature varied from room temperature (RT) to $250^{\circ}C$. An undoped ZnO thin film was also fabricated at $150^{\circ}C$ as a reference. The as-grown films were annealed in temperatures ranging from 350 to $650^{\circ}C$ for 5 h in air. The Ag content in the film decreased as the deposition and the post-annealing temperature increased due to the evaporation of the Ag in the film. During the annealing process, grain growth occurred, as confirmed from XRD and SEM results. The as-grown film deposited at RT showed n-type conduction; however, the films deposited at higher temperatures showed p-type conduction. The films fabricated at $150^{\circ}C$ revealed the highest hole concentration of $3.98{\times}1019\;cm^{-3}$ and a resistivity of $0.347\;{\Omega}{\cdot}cm$. The RT PL spectra of the as-grown ZnO : Ag films exhibited very weak emission intensity compared to undoped ZnO; moreover, the emission intensities became stronger as the annealing temperature increased with two main emission bands of near band-edge UV and defect-related green luminescence exhibited. The film deposited at $150^{\circ}C$ and annealed at $350^{\circ}C$ exhibited the lowest value of $I_{vis}/I_{uv}$ of 0.05.

LaNbO4:RE3+ (RE = Dy, Dy/Sm, Sm) 형광체의 구조, 표면, 광학 특성 (Structural, Morphological, and Optical Properties of LaNbO4:RE3+ (RE = Dy, Dy/Sm, Sm) Phosphors)

  • 이진홍;조신호
    • 한국표면공학회지
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    • 제51권5호
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    • pp.271-276
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    • 2018
  • The effects of activator ion on the structural, morphological, and optical properties of $LaNbO_4:RE^{3+}$ (RE = Dy, Dy/Sm, Sm) phosphors were investigated. X-ray diffraction patterns exhibited that all the phosphors showed a monoclinic system with a main (112) diffraction peak, irrespective of the concentration and type of activator ions. The grain size showed a slightly decreasing tendency as the concentration of $Sm^{3+}$ ions increased. The excitation spectra of the $LaNbO_4:Dy^{3+}$, $Sm^{3+}$ phosphor powders consisted of a strong charge transfer band centered at 259 nm in the range of 220-290 nm and five weak peaks. The emission spectra of the $La_{0.95}NbO_4$:5 mol% $Dy^{3+}$ phosphors exhibited two intense yellow and blue bands centered at 575 nm and 479 nm respectively, which resulted from the $^4F_{9/2}{\rightarrow}^6H_{13/2}$ and $^4F_{9/2}{\rightarrow}^6H_{15/2}$ transitions of $Dy^{3+}$. As the concentration of $Sm^{3+}$ was increased, the intensity of the yellow emission band was gradually decreased, while those of orange and red emission bands centered at 604 and 646 nm began to appear and reached maxima at 5 mol%, and then decreased rapidly with further increases in the $Sm^{3+}$ concentration. These results indicated that white light emission could be realized by controlling the concentrations of the $Dy^{3+}$ and $Sm^{3+}$ ions incorporated into the $LaNbO_4$ host crystal.