• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.7
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• pp.605-610
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• 2006

We have investigated $Al_{0.25}Ga_{0.75}As/In_{0.2}Ga_{0.8}As$ structures for pseudomorphic high electron mobility transistor(pHEMT), which were grown by molecular beam epitaxy(MBE) and consequently annealed by rapid thermal anneal(RTA), using Hall measurement, photoluminescence, and transmission electron microscopy (TEM). According to intensity and full-width at half maximum maintained stable at the same energy level, the quantized energy level in $Al_{0.25}Ga_{0.75}As/In_{0.2}Ga_{0.8}As$ quantum wells was independent of the RTA conditions. However, the Hall mobility was decreased from $6,326cm^2/V.s\;to\;2,790cm^2/V.s\;and\;2,078cm^2/V.s$ after heat treatment respectively at $500^{\circ}C\;and\;600^{\circ}C$. The heat treatment which is indispensable during the fabrication procedure would cause catastrophic degradation in electrical transport properties. TEM observation revealed atomically non-uniform interfaces, but no dislocations were generated or propagated. From theoretical consideration about the mobility changes owing to inter-diffusion, the degraded mobility could be directly correlated to the interface scattering as long as samples were annealed below $600^{\circ}C$ lot 1 min.

• Journal of the Korean Electrochemical Society
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• v.3 no.1
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• pp.1-4
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• 2000

The Bis(8-oxyquinolino) zinc lII (Znq2) were synthesized successfully from zinc chloride $(ZnCl_2)$ as a initial material . The organic electroluminescece devices (ELDs) were fabricated with N-N'-diphenyl-N-N'-bis (3-meth-ylphenyl)-1,1'-biphenyl-4,4'-diamine (TPD) which act as a hole transporting layer and the Znq2 act as an EL emitting layer and electron transporting layer. In order to maximize luminance of ELD, TPD/Znq2/Al were deposited onto cleaned indium tin oxide (ITO) by changing thickness of EL emitting layer. The photoluminescence (PL) results show that Znq2 compound emits yellow green from 540nm. electrochemical behavior with V-J and V-L curve of carrier injection was investigated from 6 V. respectively. The maximum luminance were defected about $838 cd/m^2$. From these results, ai synthesized Znq2 material maybe one of the useful material of organic EL display material.

• Korean Journal of Materials Research
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• v.21 no.5
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• pp.273-276
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• 2011

Ultraviolet (UV) light emitting diodes (LEDs) were grown on a patterned n-type GaN substrate (PNS) with 200 nm silicon-di-oxide (SiO2) nano pattern diameter to improve the light output efficiency of the diodes. Wet etched self assembled indium tin oxide (ITO) nano clusters serve as a dry etching mask for converting the SiO2 layer grown on the n-GaN template into SiO2 nano patterns by inductively coupled plasma etching. PNS is obtained by n-GaN regrowth on the SiO2 nano patterns and UV-LEDs were fabricated using PNS as a template. Two UV-LEDs, a reference LED without PNS and a 200 nm PNS UV-LEDs were fabricated. Scanning Electron microscopy (SEM), Transmission Electron Microscopy (TEM), X-Ray Diffraction (XRD), Photoluminescence (PL) and Light output intensity- Input current- Voltage (L-I-V) characteristics were used to evaluate the ITO-$SiO_2$ nanopattern surface morphology, threading dislocation propagation, PNS crystalline property, PNS optical property and UVLED device performance respectively. The light out put intensity was enhanced by 1.6times@100mA for the LED grown on PNS compared to the reference LED with out PNS.

• Transactions on Electrical and Electronic Materials
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• v.12 no.2
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• pp.51-55
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• 2011

We investigated the etching characteristics of zinc oxide (ZnO) thin films deposited by the atomic layer deposition method. The gases of the inductively coupled plasma chemistry consisted of $Cl_2$, Ar, and $O_2$. The maximum etch rate was 40.3 nm/min at a gas flow ratio of $Cl_2$/Ar=15:5 sccm, radio-frequency power of 600 W, bias power of 200 W, and process pressure of 2 Pa. We also investigated the plasma induced damage in the etched ZnO thin films using X-ray diffraction (XRD), atomic force microscopy and photoluminescence (PL). A highly oriented (100) peak was present in the XRD spectroscopy of the ZnO samples. The full width at half maximum value of the ZnO sample etched using the $O_2/Cl_2$/Ar chemistry was higher than that of the as-deposited sample. The roughness of the ZnO thin films increased from 1.91 nm to 2.45 nm after etching in the $O_2/Cl_2$/Ar plasma chemistry. Also, we obtained a strong band edge emission at 380 nm. The intensities of the peaks in the PL spectra from the samples etched in all of the chemistries were increased. However, there was no deep level emission.

• Journal of the Korean Vacuum Society
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• v.1 no.3
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• pp.360-370
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• 1992

HWE(Hot-Wall Epitaxy) 방법에 의하여 pyrex 유리기판 위에 CdS 다결정 박막을 성장하였다. X-선 회절실험 결과 CdS 박막은 육방정이었는데 (0002)면보다 91013)면이 강 하게 성장됨을 알 수 있었다. 전자현미경으로 표면을 분석한 결과 입자의 크기는 기판의 온 도가 48$0^{\circ}C$, 증발원의 온도가 $610^{\circ}C$일 때 1~1.5$mu extrm{m}$로서 가장 컸다. 박막의 표면저항은 4-point probe로서 측정한 결과 10-8$\Omega$/\ulcorner이상이었다. 성장된 CdS 다결정 박막의 photoluminesence을 20K에서 측정하였는데 bound exciton, donor acceptor pair에 의한 발광이 관측되었다. Spectral response의 peak는 505nm이었다. CdS 다결정 박막의 표면 저항을 줄이기 위하여 여러 가지 온도에서 Indium을 확산시켰다. 그 결과 표면저항은 ~ $\times$ 101에서 ~ $\times$ 103$\Omega$/\ulcorner 정도 감소되었다. 50$0^{\circ}C$에 In을 1시간 확산시켰을 때 표면저항은 1300$\Omega$/\ulcorner이었다. 이 때 CdS : In의 운반자 농도는 1.2 $\times$ 1018cm-3, 이동도는 1.8cm-2/V-sec, 비저항은 1.3 $\times$ 10-2$\Omega$-cm이었다. CdS : In의 photoluminescence는 20K 에서 Gaussian curve를 보여 주었으며 peak의 위치는 510nm이었다. CdS : In 박막의 spectral response의 peak는 상온에서 500nm이다. CdS : In 광전도 cell의 sensitivity ${\gamma}$ =0.77이고, 최대 허용소비전력은 p=120mW, 100lux에서 rise time은 8 msec, decay time 은 6 msec이다.

• Journal of the Korean Ceramic Society
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• v.38 no.3
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• pp.261-266
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• 2001

적색 CaTiO$_3$:Pr 형광체 막을 졸-겔법으로 제조하고 형광체의 결정상 및 발광특성에 미치는 열처리 조건 및 Pr 첨가량의 영향에 대하여 연구하였다. CaTiO$_3$:Pr sol로부터 제조된 CaTiO$_3$:Pr 분말은 30~60nm 크기의 입자들이 0.3~0.5$mu extrm{m}$ 크기로 응집된 상태를 나타내었으며, 한편 sol을 borosilicate 기판 위에 4000rpm의 속도로 3회 스핀 코팅하고 열처리하였을 경우 두께 1.2$\mu\textrm{m}$의 CaTiO$_3$:Pr 박막이 형성되었다. CaTiO$_3$:Pr gel 분말을 여러 온도에서 열처리한 경우, $600^{\circ}C$ 이하에서는 비정질이지만, 온도가 증가하면서 erovskite 결정상이 생성되기 시작하여 90$0^{\circ}C$에서는 우수한 perovskite 결정상이 발달되었다. 반면, 박막의 경우에는 80$0^{\circ}C$의 열처리 온도에서는 결정성이 우수한 perovskite 상이 관찰되었으며 이러한 온도는 기존의 분말법의 소결온도에 비하여 300~40$0^{\circ}C$나 낮은 것이다. 0.2 mol% Pr이 첨가되고 90$0^{\circ}C$로 열처리된 분말시편은 최적의 Photoluminescence (PL) 특성을 나타낸 반면, 박막의 경우에는 80$0^{\circ}C$에서 열처리된 시편이 최적의 PL 특성을 나타내었다. 제조된 CaTiO$_3$:Pr 박막에 대하여 Cathodoluminescence (CL) 분석을 행한 결과, 6100$\AA$에서 폭이 좁고 강도가 큰 스펙트럼을 나타냄으로서, 본 실험에서 제조된 박막이 FED(field emission display)등의 적색형광체로 사용될 수 있음을 확인하였다.

• Journal of Biomedical Engineering Research
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• v.28 no.1
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• pp.148-152
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• 2007

In this paper, we have synthesized $Gd_2O_3:Eu^{3+}$ nano phosphor particle using a low temperature solution-combustion method. We have investigated the structure and the luminescent characteristic as the sintering temperature and europium concentration. From XRD(X-ray diffraction) and SEM(scanning electron microscope) results, we have verified that the phosphor particle was fabricated a spherical shape with $30{\sim}40nm$ particle size. From the photoluminescence results, the strong peak exhibits at 611 um and the luminescent intensity depends on europium concentration. $Gd_2O_3:Eu$ fine phosphor particle has shown excellent luminescent efficiency at 5 wt% of europium concentration. The phosphors calcinated at $500^{\circ}C$ have possessed the x-ray peaks corresponding to the cubic phase of $Gd_2O_3$. As calcinations temperature increased to $700^{\circ}C$, the new monoclinic phase has identified except cubic patterns. From the luminescent decay time measurements, mean lifetimes were $2.3{\sim}2.6ms$ relatively higher than conventional bulk phosphors. These results indicate that $Gd_2O_3:Eu$ nano phosphor is possible for the operation at the low x-ray dose, therefore, the application as medical imaging detector.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.13 no.6
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• pp.290-296
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• 2003

The heteroepitaxial growth of crystalline 3C-SiC on 6H-SiC substrates using high purity silane ($SiH_4$) and prophane ($C_3H^8$) was carried out by thermal chemical vapor deposition, and growth characteristics were investigated in this study. In case that the flow ratio of C/Si and flow rate of $H_2$ were 4.0 and 5.0 slm, respectively, the growth rate of epilayers was about 1.8 $\mu$m/h at growth temperature of $1200^{\circ}C$. The Nomarski surface morphology, X-ray diffraction, Raman spectroscopy, and photoluninescence of grown epilayers were measured to investigate the crystallinity. In this study, the high quality of crystalline 3C-SiC heteropitaxial layers was observed at growth temperature of above $1150^{\circ}C$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.281-287
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• 2002

The stochiometric composition of AgGaS$_2$ polycrystal source materials for the AgGaS$_2$/GaAs epilayer was prepared from horizontal furnace. From the extrapolation method of X-ray diffraction patterns it was found that the polycrystal AgGaS$_2$ has tetragonal structure of which lattice constant a$\sub$0/ and c$\sub$0/ were 5.756 ${\AA}$ and 10.305 ${\AA}$, respectively. AgGaS$_2$/GaAs epilayer was deposited on throughly etched GaAs(100) substrate from mixed crystal AgGaS$_2$ by the Hot Wall Epitaxy (100) system. The source and substrate temperature were 590$^{\circ}C$ and 440$^{\circ}C$ respectively. The crystallinity of the grown AgGaS$_2$/GaAs epilayer was investigated by the DCRC (double crystal X-ray diffraction rocking curve). The optical energy gaps were found to be 2.61 eV for AgGaS$_2$/GaAs epilayer at room temperature. The temperature dependence of the photocurrent peak energy is well explained by the Varshni equation, then the constants in the Varshni equation are given by ${\alpha}$ : 8.695${\times}$10$\^$-4/ eV/K, and ${\beta}$ = 332 K. From the photocurrent spectra by illumination of polarized light of the AgGaS$_2$/GaAs epilayer, we have found that crystal field splitting ΔCr was 0.28 eV at 20 K. From the PL spectra at 20 K, the peaks corresponding to free and bound excitons and a broad emission band due to D-A pain are identified. The binding energy of the free excitons are determined to be 0.2676 eV and 0.2430 eV and the dissociation energy of the bound excitons to be 0.4695 eV.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.11a
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• pp.460-463
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• 2004

본 논문은 고에너지 방사선 검출을 위한 흔합형 구조의 방사선 센서를 제작, 반응 특성을 평가하였다. 먼저, 스크린 인쇄법을 이용하여 형광체 필름을 제작하였으며, 발광스펙트럼(PL, Photoluminescence) 및 잔광 시간(decay time) 측정을 통하여 형광체의 발광 특성을 조사하였다. 제작된 혼합구조의 방사선 센서는 $2{\mu}m$ 두께의 $HgI_2$와 $150{\mu}m$ 두께의 형광체 필름으로 제작되었으며, 면적은 $2\;cm\;{\times}\;2\;cm$이다. 방사선에 대한 전기적 검출 신호의 특성을 조사하기 위해 인가전압에 따른 암전류 및 방사선민감도, 선량에 따른 검출신호를 측정하였다. 측정결과, 제작된 $HgI_2$ 필름은 방사선에 의해 형광체에서 방출된 가시광 파장을 잘 흡수하였으며, 진단영역의 저에너지 방사선에 의해 직접 전기적 신호를 발생시켜 높은 방사선 민감도를 보였다. 뿐만 아니라, 인가전압에 대해 $10\;pA/mm^2$이하의 낮은 암전류를 가졌으며, 넓은 조사선량에서 우수한 선형성을 보였다.