• 제목/요약/키워드: Photolithography Process

검색결과 251건 처리시간 0.023초

Photolithography Process of Organic Thin Film with A New Water Soluble Photoresist

  • Kim, Kwang-Hyun;Song, Chung-Kun
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.1038-1039
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    • 2004
  • We developed a new photoresist which was composed of polyaniline, uv-curing agent, N-methyl-2- pyrrolidine (NMP) and N-Butyl alcohol (BuOH) as solution. The photoresist is characterized by the capability of being developed in water. We successfully patterned pentacene thin film, which was vulnerable to organic solvent and thus could not be patterned by the conventional photolithography process, with the water soluble photoresist and the minimum feature size was found to be 2um.

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FIB를 이용한 나노가공공정 기술 개발 (Development of Nano Machining Technology using Focused ion Beam)

  • 최헌종;강은구;이석우;홍원표
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 2004년도 춘계학술대회 논문집
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    • pp.482-486
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    • 2004
  • The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies, such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. This paper presents that the recent development and our research goals in FIB nano machining technology are given. The emphasis will be on direct milling, or chemical vapor deposition techniques (CVD), and this can distinguish the FIB technology from the contemporary photolithography process and provide a vital alternative to it. After an introduction to the technology and its FIB principles, the recent developments in using milling or deposition techniques for making various high-quality devices and high-precision components at the micro/nano meter scale are examined and discussed. Finally, conclusions are presented to summarize the recent work and to suggest the areas for improving the FIB milling technology and for studying our future research.

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미세입자 분사가공에서 SU-8 마스크의 특성 (Characteristics of SU-8 Mask for Abrasive Jet Machining)

  • 고태조;박동진;김희술
    • 한국정밀공학회지
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    • 제24권1호
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    • pp.71-78
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    • 2007
  • Abrasive jet machining (AJM) has been traditionally used for removing rusts or paints. Nowadays, this is promising technology for micro bulk machining where brittle substrate materials are used. In order to get accurate details, masks such as metal, polymer or elastomer is inevitable. Among them, photo polymer which is sensitive to the light has been attractive for it's high accuracy using photolithography. In this research, SU-8 as a photo polymer is used since it is adequate for making thick mask. So, this paper describes how to make AJM masks using SU-8 with a photolithography process, and investigates the characteristics of SU-8 masks during AJM process. Also, an example of fabrication using AJM was shown.

광조형법과 UV 포토리소그래피를 이용한 웨이브 마이크로펌프 미세 채널 제작 (Fabrication of Micro-channels for Wave-Micropump Using Stereolithography and UV Photolithography)

  • 노병국;김우식;심광보
    • 한국정밀공학회지
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    • 제24권12호
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    • pp.128-135
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    • 2007
  • Micro-channels for a wave micropump have been fabricated using the Stereolithography and UV Photolithography. The micro-channel with a channel height of $500\;{\mu}m$ was fabricated with stereolithography. UV photolithography was used for producing micro-channels with a channel length less than $100\;{\mu}m$. The fabrication process data including spinning rpm, pre-bake and post-bake time, and develop time for single layer and multiple layer 3D micro-structures using SU-8 photo resist are experimentally found. A film mask printed with a 40,000 dpi laser printer was used for UV lithography and micro-structures in the order of tens of micrometers in dimension were successfully fabricated.

Gray-scale photolithography를 이용한 바이오칩 제작 (Fabrication of Biochip Using Gray-scale Photolithography)

  • 배영민
    • 전기학회논문지
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    • 제57권1호
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    • pp.137-141
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    • 2008
  • Biochip, which implements bioanalytical process on a tiny surface, is one of candidates for medical diagnosis, drug screening, and molecular sensing. In general, a type of biochip based on microfluidics is composed of microcomponents including microchannel, pump, and valve, which require complicated processes. In this study, gray-scale photolithography(GSPL) was applied to fabricate a biochip with multiple layers. A mould for casting PDMS(polydimethylsiloxane) channel, was fabricated using GSPL. A gray-photomask was prepared by printing gray patterns on a high-quality glossy paper followed by photoreducing by 10:1 onto the photo-film. The formation of multiple layers was studied according to the change of gray level of pattern and the developing time. A biochip composed of a weir(multiple layer structure) and a reaction chamber in a single microchannel was fabricated in a glass plate. Finally, we investigated the application of biochip to antigen-antibody reaction by packing the microbead coated with antibody.

포토리소그래피 공정으로 제작된 터치스크린패널용 금속메시 (Thin Metal Meshes for Touch Screen Panel Prepared by Photolithography)

  • 김서한;송풍근
    • 한국표면공학회지
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    • 제49권6호
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    • pp.575-579
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    • 2016
  • The metal mesh films with thickness of 1.0, 1.5, $2.0{\mu}m$ were prepared by photolithography using Ag, Al, and Cu metals. Every metal films were showed C(111) preferred orientation and Ag showed the lowest resistivity and followed by Al and Cu. The transmittance of almost films were higher than 90%. But, the Ag film with thickness of $2.0{\mu}m$ was delaminated during photolithography process due to low adhesion. So, Cu and Ti metal films were introduced under Ag film to improve adhesion property. The Cu film showed higher adhesion properties compared to Ti film. Furthermore, the Ti films that deposited on Ag film showed higher acid resistance.

반도체 노광 공정의 DI 세정과 Oxide의 HF 식각 과정이 실리콘 표면에 미치는 영향 (Effects of DI Rinse and Oxide HF Wet Etch Processes on Silicon Substrate During Photolithography)

  • 백정헌;최선규;박형호
    • 한국재료학회지
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    • 제20권8호
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    • pp.423-428
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    • 2010
  • This study shows the effects of deionized (DI) rinse and oxide HF wet etch processes on silicon substrate during a photolithography process. We found a fail at the wafer center after DI rinse step, called Si pits, during the fabrication of a complementary metal-oxide-semiconductor (CMOS) device. We tried to find out the mechanism of the Si pits by using the silicon wafer on CMOS fabrication and analyzing the effects of the friction charge induced by the DI rinsing. The key parameters of this experiment were revolution per minute (rpm) and time. An incubation time of above 10 sec was observed for the formation of Si pits and the rinsing time was more effective than rpm on the formation of the Si pits. The formation mechanism of the Si pits and optimized rinsing process parameters were investigated by measuring the charging level using a plasma density monitor. The DI rinse could affect the oxide substrate by a friction charging phenomenon on the photolithography process. Si pits were found to be formed on the micro structural defective site on the Si substrate under acceleration by developed and accumulated charges during DI rinsing. The optimum process conditions of DI rinse time and rpm could be established through a systematic study of various rinsing conditions.

Narrow Channel Formation Using Asymmetric Halftone Exposure with Conventional Photolithography

  • Cheon, Ki-Cheol;Woo, Ju-Hyun;Jung, Deuk-Soo;Park, Mun-Gi;Kim, Hwan;Lim, Byoung-Ho;Yu, Sang-Jean
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.258-260
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    • 2008
  • Developed halftone exposure technique was successfully applied to the fabrication of narrow transistor channels below $4\;{\mu}m$ with conventional photolithography method. Asymmetric slits concept of photo mask was applied to make channel lengths (L) shorter for thin film transistor's (TFT) high performance. These short channel TFTs verified better quality transistor characteristics.

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모사 광전자 소자 상에 적용한 마이크로렌즈 어레이의 UV 성형 (UV molding of Microlens Array on the Simulated Optoelectronic Device)

  • 구승완;김석민;강신일;손현주
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2003년도 추계학술대회논문집
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    • pp.377-380
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    • 2003
  • Recently, demand of digital products with optoelectronic device is increasing rapidly. A microlens array is applied to improve optical efficiency on optoelectronic device, and it is usually fabricated by photolithography and reflow process after planarization layer coating process. UV molding process is more suitable for mass production of high quality microlens array than photolithography and reflow process. In the present study, microlens array was fabricated on the simulated optoelectronic device with planarization layer by aligned UV molding process. The shape of replicated microlens was measured, and the section image of molded part was examined.

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마이크로 크기를 가지는 빗살무늬 그루우브 패턴의 빗살각도변화에 대한 실험적 마찰특성 (Sliding Friction Property of Angle Effect for Crosshatch Micro-grooved Pattern under Lubricated)

  • 김석삼;채영훈
    • 한국기계가공학회지
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    • 제10권3호
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    • pp.94-99
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    • 2011
  • Micro-scale surface pattern has an benefit of tribological application under lubricated sliding contact. Therefore, a special pattern, that has to reduce the coulomb friction under contact, is considered to be necessary for improved efficiency of machines. The current study investigated the friction property of angle effect for micro-scale grooved crosshatch pattern on bearing steel surface using pin-on-disk type. The samples fabricated by photolithography process and then these are carry out the electrochemical etching process. We discuss the friction property due to the influence of hatched-angle on contact surface. We could be explained the lubrication mechanism for a Stribeck curve. It was found that the friction coefficient depend on an angle of the crosshatch on contact surface. It was thus verified that micro-scale crosshatch grooved pattern could affect the friction reduction.