• Journal of Environmental Impact Assessment
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• v.12 no.4
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• pp.303-313
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• 2003

This study was carried out to survey the high ozone episode of summertime in Busan. The selected day was July 18, 1999 and August 24, 2001 which recorded exceed to 12ppb/hr at 3 station in Busan simultaneously. In case July 18, 1999, thick cloud and variable wind made weak ozone concentration during morning hour. And increase of ozone concentration by revolution of mixed layer for morning hour did not occur in this case study day. Photochemical reaction by strong radiation after 1100LST made sharp increase rate of ozone concentration(50ppb/hr). In case August 24, 2001, the meteorological condition of this day was not general wind with gradient force, very clear day with less cloud amount, high insolation and sunshine. Dongsamdong, Beomcheondong, Daeyeondong, and Sinpyeongdong had double peak which twice maximum concentration in the early afternoon and late afternoon. Ozone concentration of this day was in inverse proportion to Nitrogen oxide strongly. Ozone concentration exceed to 60ppb/hr occurred at 1400LST, continued to 2300LST.

• Journal of Photoscience
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• v.1 no.1
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• pp.39-45
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• 1994

Haloarene in which the phenyl group and halophenyl group are connected by alkyl groups were synthesized to study the photochemical behavior. The photochemical reactions of 1-halo-2-(phenylalkyl)enzenes (1 and 2) were studied in several aerated or unaerated solvents. In the case of 2-benzyl-1-halobenzene photoreduced product (biphenyl) is major in acetonitrile or benzene. In cyclohexane or acetonitrile with triethylamine, photoreduced product is obtained exclusively, while in acetonitrile with toluene, xylene, or sodium hydroxide photocyclized product (fluorene) is mainly obtained. In the case of 1-halo-2-phenethylbenzenes (5 and 6), photocyclized product (9,10-dihydrophenanthrene and phenanthrene) are major in acetonitrile or benzene. While the haloarenes 1 or 2 connecting the two arene rings by methylene is photoreduced, the other haloarene 5 or 6 connecting by ethylene is photocyclized. In cyclohexane or acetonitrile with a small amount of triethylamine, photoreduced reactions of 5 or 6 mainly occur. In acetonitrile with sodium hydroxide, toluene, or xylene, photocyclization of 5, 6 occur exclusively. The triplet state is mainly involved in the photocyclization of 5 or 6, because of the inhibition of oxygen.

• Journal of Photoscience
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• v.6 no.4
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• pp.177-181
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• 1999

The photochemical transformation of carbon monoxide in aqueous ammonia solution has been investigated at 25${\pm}$0.1$^{\circ}C$ using 184.9 nm UV light. Amination and carbonylation processes were carried out by irradiating the aqueous ammonia solution saturated with carbon monoxide, and the formation of formamide, urea, hexamethylenetetramine, formaldehyde, glyoxal and hydrazine was observed. The formation of hydrazine was affected by the presence of ammonia, and the formation of carbonyl compounds such as formaldehyde and glyoxal was influenced by the presence of carbon monoxide. The formation of formamide, urea and hexamethylenetetramine was affected by both ammonia and carbon monoxide. The initial quantum yields of the products were determined and probable mechanisms for the photochemical reaction were presented on the basis of product analysis.

• Bulletin of the Korean Chemical Society
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• v.3 no.1
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• pp.30-33
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• 1982

Photochemical and thermal solvolysis of 2,3,4-picolyl chlorides (2,3,4-PC) were studied in amine solvents and the results were correlated with the electronic structures calculated by PPP-SCF-MO CI method. Activation parameters show that the thermal solvolysis of PC is $S_N2$ type rcaction. The rates of thermal reaction in pyridine or t-butylamine solvent decrease in the order of 2-PC > 3-PC > 4-PC. These results are consistent with the predictions based on the electron densities of picolyl chlorides. In photosolvolysis, the same products as those of thermal reactions were obtained. The results indicate that photochemical solvolysis undergoes through heterolytic cleavage. Relative quantum yields of photosolvolysis of 2,3,4-picolyl chlorides in t-butylamine solvent were determined to be 0.73, 1, and 0.50 respectively. These results are in good agreement with the electron densities of the excited triplet state of picolyl chlorides.

• Journal of Powder Materials
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• v.24 no.6
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• pp.489-493
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• 2017

In this study, the surface passivation process for InP-based quantum dots (QDs) is investigated. Surface coating is performed with poly(methylmethacrylate) (PMMA) and thioglycolic acid. The quantum yield (QY) of a PMMA-coated sample slightly increases by approximately 1.3% relative to that of the as-synthesized InP/ZnS QDs. The QYs of the uncoated and PMMA-coated samples drastically decrease after 16 days because of the high defect state density of the InP-based QDs. PMMA does not have a significant effect on the defect passivation. Thioglycolic acid is investigated in this study for the effective surface passivation of InP-based QDs. Surface passivation with thioglycolic acid is more effective than that with the PMMA coating, and the QY increases from 1.7% to 11.3%. ZnS formed on the surface of the InP QDs and S in thioglycolic acid show strong bonding property. Additionally, the QY is further increased up to 21.0% by the photochemical reaction. Electron-hole pairs are formed by light irradiation and lead to strong bonding between the inorganic and thioglycolic acid sulfur. The surface of the InP core QDs, which does not emit light, is passivated by the irradiated light and emits green light after the photochemical reaction.

• Proceedings of the Korea Air Pollution Research Association Conference
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• 2005.11a
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• pp.527-528
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• 2005

• Proceedings of the Korea Air Pollution Research Association Conference
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• 2004.05a
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• pp.233-234
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• 2004

• Journal of the Korean Chemical Society
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• v.35 no.3
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• pp.285-287
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• 1991

• Bulletin of the Korean Chemical Society
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• v.15 no.7
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• pp.597-599
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• 1994

• Journal of the Microelectronics and Packaging Society
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• v.27 no.4
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• pp.77-81
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• 2020

Resistive RAM (ReRAM) is a strong candidate for the next-generation nonvolatile memories which use the resistive switching characteristic of transition metal oxides. The resistive switching behaviors originate from the redistribution of oxygen vacancies inside of the oxide film by applied programming voltage. Therefore, controlling the oxygen vacancy inside transition metal oxide film is most important to obtain and control the resistive switching characteristic. In this study, we introduced an applying electric field into photochemical metal-organic deposition (PMOD) process to control the oxidation state of metal oxide thin film during the photochemical reaction by UV exposure. As a result, the surface oxidation state of FeOx film could be successfully controlled by the electric field-assisted PMOD (EFAPMOD), and the controlled oxidation states were confirmed by x-ray photoelectron spectroscopy (XPS) I-V characteristic. And the resistive switching characteristics with the oxidation-state of the surface region could be controlled effectively by adjusting an electric field during EFAPMOD process.