• 환경영향평가
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• 제12권4호
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• pp.303-313
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• 2003

This study was carried out to survey the high ozone episode of summertime in Busan. The selected day was July 18, 1999 and August 24, 2001 which recorded exceed to 12ppb/hr at 3 station in Busan simultaneously. In case July 18, 1999, thick cloud and variable wind made weak ozone concentration during morning hour. And increase of ozone concentration by revolution of mixed layer for morning hour did not occur in this case study day. Photochemical reaction by strong radiation after 1100LST made sharp increase rate of ozone concentration(50ppb/hr). In case August 24, 2001, the meteorological condition of this day was not general wind with gradient force, very clear day with less cloud amount, high insolation and sunshine. Dongsamdong, Beomcheondong, Daeyeondong, and Sinpyeongdong had double peak which twice maximum concentration in the early afternoon and late afternoon. Ozone concentration of this day was in inverse proportion to Nitrogen oxide strongly. Ozone concentration exceed to 60ppb/hr occurred at 1400LST, continued to 2300LST.

• Journal of Photoscience
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• 제1권1호
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• pp.39-45
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• 1994

Haloarene in which the phenyl group and halophenyl group are connected by alkyl groups were synthesized to study the photochemical behavior. The photochemical reactions of 1-halo-2-(phenylalkyl)enzenes (1 and 2) were studied in several aerated or unaerated solvents. In the case of 2-benzyl-1-halobenzene photoreduced product (biphenyl) is major in acetonitrile or benzene. In cyclohexane or acetonitrile with triethylamine, photoreduced product is obtained exclusively, while in acetonitrile with toluene, xylene, or sodium hydroxide photocyclized product (fluorene) is mainly obtained. In the case of 1-halo-2-phenethylbenzenes (5 and 6), photocyclized product (9,10-dihydrophenanthrene and phenanthrene) are major in acetonitrile or benzene. While the haloarenes 1 or 2 connecting the two arene rings by methylene is photoreduced, the other haloarene 5 or 6 connecting by ethylene is photocyclized. In cyclohexane or acetonitrile with a small amount of triethylamine, photoreduced reactions of 5 or 6 mainly occur. In acetonitrile with sodium hydroxide, toluene, or xylene, photocyclization of 5, 6 occur exclusively. The triplet state is mainly involved in the photocyclization of 5 or 6, because of the inhibition of oxygen.

• Journal of Photoscience
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• 제6권4호
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• pp.177-181
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• 1999

The photochemical transformation of carbon monoxide in aqueous ammonia solution has been investigated at 25${\pm}$0.1$^{\circ}C$ using 184.9 nm UV light. Amination and carbonylation processes were carried out by irradiating the aqueous ammonia solution saturated with carbon monoxide, and the formation of formamide, urea, hexamethylenetetramine, formaldehyde, glyoxal and hydrazine was observed. The formation of hydrazine was affected by the presence of ammonia, and the formation of carbonyl compounds such as formaldehyde and glyoxal was influenced by the presence of carbon monoxide. The formation of formamide, urea and hexamethylenetetramine was affected by both ammonia and carbon monoxide. The initial quantum yields of the products were determined and probable mechanisms for the photochemical reaction were presented on the basis of product analysis.

• Bulletin of the Korean Chemical Society
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• 제3권1호
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• pp.30-33
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• 1982

Photochemical and thermal solvolysis of 2,3,4-picolyl chlorides (2,3,4-PC) were studied in amine solvents and the results were correlated with the electronic structures calculated by PPP-SCF-MO CI method. Activation parameters show that the thermal solvolysis of PC is $S_N2$ type rcaction. The rates of thermal reaction in pyridine or t-butylamine solvent decrease in the order of 2-PC > 3-PC > 4-PC. These results are consistent with the predictions based on the electron densities of picolyl chlorides. In photosolvolysis, the same products as those of thermal reactions were obtained. The results indicate that photochemical solvolysis undergoes through heterolytic cleavage. Relative quantum yields of photosolvolysis of 2,3,4-picolyl chlorides in t-butylamine solvent were determined to be 0.73, 1, and 0.50 respectively. These results are in good agreement with the electron densities of the excited triplet state of picolyl chlorides.

• 한국분말재료학회지
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• 제24권6호
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• pp.489-493
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• 2017

In this study, the surface passivation process for InP-based quantum dots (QDs) is investigated. Surface coating is performed with poly(methylmethacrylate) (PMMA) and thioglycolic acid. The quantum yield (QY) of a PMMA-coated sample slightly increases by approximately 1.3% relative to that of the as-synthesized InP/ZnS QDs. The QYs of the uncoated and PMMA-coated samples drastically decrease after 16 days because of the high defect state density of the InP-based QDs. PMMA does not have a significant effect on the defect passivation. Thioglycolic acid is investigated in this study for the effective surface passivation of InP-based QDs. Surface passivation with thioglycolic acid is more effective than that with the PMMA coating, and the QY increases from 1.7% to 11.3%. ZnS formed on the surface of the InP QDs and S in thioglycolic acid show strong bonding property. Additionally, the QY is further increased up to 21.0% by the photochemical reaction. Electron-hole pairs are formed by light irradiation and lead to strong bonding between the inorganic and thioglycolic acid sulfur. The surface of the InP core QDs, which does not emit light, is passivated by the irradiated light and emits green light after the photochemical reaction.

• 한국대기환경학회:학술대회논문집
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• 한국대기환경학회 2005년도 추계학술대회 논문집
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• pp.527-528
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• 2005

• 한국대기환경학회:학술대회논문집
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• 한국대기환경학회 2004년도 춘계학술대회 논문집
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• pp.233-234
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• 2004

• 대한화학회지
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• 제35권3호
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• pp.285-287
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• 1991

• Bulletin of the Korean Chemical Society
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• 제15권7호
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• pp.597-599
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• 1994

• 마이크로전자및패키징학회지
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• 제27권4호
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• pp.77-81
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• 2020

Resistive RAM (ReRAM)은 전이금속 산화물의 저항변화 특성을 이용하는 차세대 비휘발 메모리로 전이금속산화물 내의 산소공공의 재분포를 통한 저항변화 특성을 이용한다. 따라서 저항변화 특성을 위해 전이금속산화물 내에는 일정량 이상의 산소공공이 요구되며 이를 위해서는 박막 형성 공정에서 산화 수를 조절할 수 있는 공정이 필요하다. 본 연구에서는 직접패턴이 가능한 photochemical metal organic deposition (PMOD) 공정을 사용하여 UV 노출에 의해 photochemical metal organic precursor의 ligand가 분해되는 과정에서 전기장을 인가하여 박막내의 산화 수를 조절하는 실험을 진행하였다. Electric field assisted PMOD (EFAPMOD) 법을 이용하여 FeOx 박막의 산화 수 조절이 가능함을 x-ray photoelectron spectroscopy (XPS) 분석과 I-V 측정을 통하여 확인하였으며, EFAPMOD 공정 중 인가하는 전압의 크기를 조절하여 박막의 산화 수를 조절할 수 있음을 확인하였다. 따라서 EFAPMOD 공정 중 인가전압의 크기를 이용하여 저항변화 특성에 적합한 적정한 산화수를 가지는 금속산화물 박막을 얻고 그 저항변화 특성을 조정할 수 있음을 확인하였다.