• 제목/요약/키워드: Photo-lithography technology

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A study on the highly sensitive metal nanowire sensor for detecting hydrogen (수소감지를 위한 고감도의 금속 나노선 센서에 관한 연구)

  • An, Ho-Myoung;Seo, Young-Ho;Yang, Won-Jae;Kim, Byungcheul
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.18 no.9
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    • pp.2197-2202
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    • 2014
  • In this paper, we report on an investigation of highly sensitive sensing performance of a hydrogen sensor composed of palladium (Pd) nanowires. The Pd nanowires have been grown by electrodeposition into nanochannels and liberated from the anodic aluminum oxide (AAO) template by dissolving in an aqueous solution of NaOH. A combination of photo-lithography, electron beam lithography and a lift-off process has been utilized to fabricate the sensor using the Pd nanowire. The hydrogen concentrations for 2% and 0.1% were obtained from the sensitivities (${\Delta}R/R$) for 1.92% and 0.18%, respectively. The resistance of the Pd nanowires depends on absorption and desorption of hydrogen. Therefore, we expect that the Pd nanowires can be applicable for detecting highly sensitive hydrogen gas at room temperature.

A Study on the Simulation of the Resolution for Ink-Jet Printing (잉크젯 프린팅에서 해상력에 관한 컴퓨터 시뮬레이션 연구)

  • Lee, Ji-Eun;Youn, Jong-Tae;Koo, Chul-Whoi
    • Journal of the Korean Graphic Arts Communication Society
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    • v.28 no.1
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    • pp.51-63
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    • 2010
  • Ink-jet is part of the non impact printing that shooting the ink drop from the nozzle to paper. It is very silence and express good color. There are two types of printing that continuous and drop on demand. But drop on demand process is becoming the mainstream. these days, LCD, PDP is passed more than semiconductor industry. And we expect organic EL, FED as a next display. But product equipment, main component and technology have a gap between an advanced country and us nevertheless physical development. Expecially, previous process part is depended on imports. Ink-jet printing technology that there isn't complicated photo lithography process is attracted, so ink-jet printing resolution is more embossed. But there were not many of ink-jet resolution thesis but ink-jet head or nozzle. Because, to out of the ink from the nozzle is unseeable and hard to experiment. Therefore this thesis was experimented and simulated how can ink-jet printer improved resolution by flow-3d simulation package program.

Patterned Growth of ZnO Semiconducting Nanowires and its Field Emission Properties (ZnO 반도체 나노선의 패턴 성장 및 전계방출 특성)

  • Lee, Yong-Koo;Park, Jae-Hwan;Choi, Young-Jin;Park, Jae-Gwan
    • Journal of the Korean Ceramic Society
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    • v.47 no.6
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    • pp.623-626
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    • 2010
  • We synthesized ZnO nanowires patterned on Si substrate and investigated the field emission properties of the nanowires. Firstly, Au catalyst layers were fabricated on Si substrate by photo-lithography and lift-off process. The diameter of Au pattern was $50\;{\mu}m$ and the pattern was arrayed as $4{\times}4$. ZnO nanowires were grown on the Au catalyst pattern by the aid of Au liquid phase. The orientation of the ZnO nanowires was vertical on the whole. Sufficient brightness was obtained when the electric field was $5.4\;V/{\mu}m$ and the emission current was $5\;mA/cm^2$. The threshold electric field was $5.4\;V/{\mu}m$ in the $4{\times}4$ array of ZnO nanowires, which is quite lower than that of the nanowires grown on the flat Si substrate. The lower threshold electric field of the patterned ZnO nanowires could be attributed to their vertical orientation of the ZnO nanowires.

Directed Alignment of DNA Molecule between the gold electrodes (금 전극위에 DNA 분자의 정렬에 관한 연구)

  • Hwang, Hyun Suk;Kim, Hyung Jin
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.16 no.8
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    • pp.5586-5590
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    • 2015
  • In this paper, the directed alignment methode of the DNA molecule between the Au electrodes was suggested for the application of nano devices. To fabricate the nano device coated DNA, 2-Aminoethanthiol(AET) was coated on Au electrodes which was formed using photo-lithography process on $SiO_2/Si$ substrates. In general, the AET that was a positive charge with $NH^{3+}$ was strongly combined under the electrostatic interaction with DNA molecule which had to be a negative charge. The DNA molecules could be easily aligned between Au electrodes coated with AET. The structures of the DNA molecules were investigated using AFM(Atomic force microscope), they were changed from single types to bundle according to the AET concentrations.

Processing Study for the Micro Pillar for Piezoelectric Energy Harvest (압전 에너지 하베스트를 위한 마이크로 필라 공정 연구)

  • Yun, Seok-Woo;Lee, Ku-Tak;Lee, Kyoung-Su;Jeong, Soon-Jong;Kim, Min-Soo;Cho, Kyoung-Ho;Koh, Jung-Hyuk
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.8
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    • pp.601-604
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    • 2010
  • In this study, the piezoelectric energy harvester was investigated employing the pillar structure with the diameter size of 50~500 um. Usually, the aspect ratio between the height and diameter was related with the piezoelectric performance. High aspect ratio was showed the low electric noise and high piezoelectric properties than low aspect ratio. Therefore, we have selected the Su-8 photo-resist and modified lithography process to manufacture the pillar structure with height above the 250 ${\mu}m$. In this presentation, we will report the process and properties of micro pillar structure based on the PMN-PZT (Pb$(Mg_{1/3}Nb_{2/3})O_3$-PbZrTiO$_3$) materials.

Process Variation on Arch-structured Gate Stacked Array 3-D NAND Flash Memory

  • Baek, Myung-Hyun;Kim, Do-Bin;Kim, Seunghyun;Lee, Sang-Ho;Park, Byung-Gook
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.17 no.2
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    • pp.260-264
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    • 2017
  • Process variation effect on arch-structured gate stacked array (GSTAR) 3-D NAND flash is investigated. In case of arch-structured GSTAR, a shape of the arch channel is depending on an alignment of photo-lithography. Channel width fluctuates according to the channel hole alignment. When a shape of channel exceeds semicircle, channel width becomes longer, increasing drain current. However, electric field concentration on tunnel oxide decreases because less electric flux converges into a larger surface of tunnel oxide. Therefore, program efficiency is dependent on the process variation. Meanwhile, a radius of channel holes near the bottom side become smaller due to an etch slope. It also affects program efficiency as well as channel width. Larger hole radius has an advantage of higher drain current, but causes degradation of program speed.

Fabrication of GaN Micro-pyramid Structure Arrays for Phosphor-free white Lighting-emitting Diode

  • Sim, Young-Chul;Ko, Young-Ho;Lim, Seung-Hyuk;Cho, Yong-Hoon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.299-299
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    • 2014
  • 기존의 고출력 광원들이 환경문제 등으로 외국에서 규제대상으로 지정되고 있는 가운데고체 상태의 광원인 Light-emitting diode (LED)는 기존의 광원에 비해 에너지 절감효과 크기 때문에 인해 널리 사용되고 있는 추세이다. 대부분의 백색 LED의 경우 청색 LED에 황색 형광체를 사용하는 것이 일반적이다. 그러나 이의 경우 빛의 흡수와 재방출 과정에서 생기는 에너지 변환손실의 문제가 불가피하다. 또한, 두 종류의 색을 섞어서 나타나는 낮은 연색성의 문제가 있고 사용할 수 있는 형광체의 종류와 조합도 일본 등 해외에 출원된 특허권으로 연구개발에 어려움이 있다. 이를 해결하기 위해 본 연구에서는 형광체를 사용하지 않는 단일 백색 LED를 개발을 위하여 극성과 반극성을 조합한 구조를 연구하였다. Photo-lithography를 이용하여 다양한 크기와 구조의 홀 패턴을 얻을 수 있었으며, metal organic chemical vapor deposition을 이용하여 다양한 형태의 피라미드 구조를 성장할 수 있었다. 패턴의 홀 크기와 홀 사이의 간격을 조절하면서 성장을 진행 하였고, 그 결과 pyramid와 truncated pyramid 모양의 GaN 구조를 성장할 수 있었다. [그림 1] Pyramid 구조의 반극성 면과 truncated pyramid 구조의 극성 면사이의 성장속도 차이 때문에 양자우물의 두께가 달라짐을 확인하였다. 이로 인해 양자구속효과가 달라져 다른 파장의 발광을 기대할 수 있었다. 뿐만 아니라 In의 확산거리가 Ga보다 길어서 홀사이 간격을 달리하면 In조성비가 달라지는 효과가 있음을 확인하였고 다양한 홀 사이 간격으로부터 각기 다른 파장의 발광을 얻을 수 있었다. 파장을 조금 더 상세하게 분석하기 위하여 Photoluminescence과 Cathodoluminescence을 사용하였다. 이로써 여러 파장을 발광하는 패턴을 섞어 넓은 영역의 발광 스펙트럼을 만들었다. 특히 패턴을 섞는 방법도 홀과 에피 구조를 섞는 방법, 크기가 다른 홀 패턴을 배열하는 방법등 다양히 하며 가장 좋을 패턴을 연구하였다. 그리하여 최적의 패턴과 구조, 성장조건을 찾아 백색의 CIE 좌표값을 얻을 수 있었다.

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Improvement of Outcoupled Light Efficiency of Organic Light-emitting Diodes with a Use of Microlens Array (마이크로 렌즈 어레이를 이용한 유기 발광 소자의 광추출 효율 향상에 관한 연구)

  • Kim, Hye Sook;Hwang, Deok Hyeon;Hong, Jin Woong;Song, Min Jong;Han, Wone Keun;Kim, Tae Wan
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.5
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    • pp.307-311
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    • 2014
  • Because of a waveguiding effect and total internal reflection caused by a difference in refractive indices, only 20% of generated light is emitted to the air and the rest is trapped or absorbed in the device. An improvement of outcoupled efficiency of organic light-emitting diodes was studied using a microlens array. Mold of microlens array was fabricated by using photo-lithography with the AZ9260 photoresist, and the microlens array was formed onto the glass substrate using the UV curing agent named ZPU13-440. Device structure consists of microlens/glass/ITO/TPD/$Alq_3$/LiF/Al. It was found that there is an improvement of external quantum efficiency by about 20% at the same current density for the device with the microlens array compared to that of the reference one. Simulated outcoupled efficiency shows the improvement by about 20% for the device with the microlens array compared to that of the reference one. These results are consistent with the experimental ones.

반도체 및 Optic Industries 클린룸 배기가스의 오염제어 및 청정화기술

  • 황유성
    • Air Cleaning Technology
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    • v.17 no.4 s.67
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    • pp.39-57
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    • 2004
  • 첨단산업으로 불리는 반도체, LCD, PDP, 유기EL(OLED) 등의 생산 공정은 고도의 청정상태를 요구하며, 때문에 이들의 생산공정 중 대부분이 클린룸 내에서 이루어진다. 클린룸 내에서의 주요공정은 크게 박막형성(Layering), 노광(Photo Lithography), 식각(Etching) 등 3가지 공정으로 나눌 수 있으며, 반도체 제조공정의 경우 특별히 도핑(Doping) 공정이 추가된다. 오염물질을 함유하는 클린룸 배기는 일반적으로 산, 알칼리, Toxic(PFCs, Flammable), VOC 등으로 분류하며, 각각의 배기는 각 배기특성에 맞는 오염제어 장치를 통해, 정화된 후, 대기로 방출된다. 산, 알칼리 배기는 일반적으로 최종 단계에서 중앙집중식 습식스크러버에 의해 흡수, 중화 처리되며, VOC의 경우 농축기(Concentrator) & 축열식 열 산화장치(RTO) 설비에 의해 연소 처리된다. 하지만 CVD공정으로부터의 배기가 주를 이루는 Toxic배기의 경우, 다량의 PFCs(과불소화합물) 가스를 함유하고 있는 이유로, 대부분 클린룸 내부에 P.O.U(Point of use) 처리장치가 설치되며, P.O.U에 의해 1차 처리된 후 최종적으로 중앙집중식 습식스크러버를 거쳐 대기로 방출된다. 알칼리배기의 주성분으로는 암모니아($NH_3$), HMDS (Hexa Methyl DiSilazane), TMAH (Tetra Methyl Ammonium Hydroxide), LGL, CD 등이며 흡수액에 황산(Sulfuric Acid)용액을 공급, 중화처리하고 있다. 탄소성분을 먹이로 하는 미생물의 번식에 의한 막힘 문제를 제외하고는 큰 문제가 없다. 하지만 Toxic배기 및 산배기의 경우 처리효율이, 가스흡수 이론에 의한 계산결과와 비교할 때, 매우 저조하게 나타나는 효율부족 현상을 겪고 있으며, 이는 잔여 PFCs 가스성분 및 반응에어로졸, 응축에어로졸 등의 영향으로 추정하고 있다. 최근 Toxic 배기의 경우, P.O.U 설비를 Burn & Wet type으로 변경하여, 배기 중 PFCs 및 반응에 에어로졸($SiO_2$)의 농도를 원천적으로 감소시키는 노력이 진행 중이다. 산배기의 경우, 산결로 현상에 의한, 응축에어로졸이 문제가 되고 있으나 내식열교환기(Anti-Corrosive Heat Exchanger), 하전액적스크러버 시스템(Charged Droplets Scrubber System), Wet ESP(Wet Electrostatic Procipitator) 등의 도입을 통해 문제해결을 위한 노력을 경주하고 있다.

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Fabrication of Size-Controlled Hole Array by Surface-Catalyzed Chemical Deposition (표면 촉매 화학 반응을 이용한 크기 조절이 가능한 홀 어레이 제작)

  • Park, Hyung Ju;Park, Jeong Won;Lee, Dae-Sik;Pyo, Hyeon-Bong
    • Journal of Sensor Science and Technology
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    • v.27 no.1
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    • pp.55-58
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    • 2018
  • Low-cost and large-scale fabrication method of nanohole array, which comprises nanoscale voids separated by a few tens to a few hundreds of nanometers, has opened up new possibilities in biomolecular sensing as well as novel frontier optical devices. One of the key aspects of the nanohole array research is how to control the hole size following each specific needs of the hole structure. Here, we report the extensive study on the fine control of the hole size within the range of 500-2500 nm via surface-catalyzed chemical deposition. The initial hole structures were prepared via conventional photo-lithography, and the hole size was decreased to a designed value through the surface-catalyzed chemical reduction of the gold ion on the predefined hole surfaces, by simple dipping of the hole array device into the aqueous solution of gold chloride and hydroxylamine. The final hole size was controlled by adjusting reaction time, and the optimal experimental condition was obtained by doing a series of characterization experiments. The characterization of size-controlled hole array was systematically examined on the image results of optical microscopy, field emission scanning electron microscopy(FESEM), atomic-force microscopy(AFM), and total internal reflection microscopy.