• Title/Summary/Keyword: Phase-change memory

Search Result 175, Processing Time 0.024 seconds

Phase-Change Properties of the Sb-doped $Ge_1Se_1Te_2$ thin films application for Phase-Change Random Access Memory (상변화 메모리 응용을 위한 Sb을 첨가한 $Ge_1Se_1Te_2$ 박막의 상변화 특성)

  • Nam, Ki-Hyeon;Choi, Hyuk;Ju, Long-Yun;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2007.06a
    • /
    • pp.156-157
    • /
    • 2007
  • For tens of years many advantages of Phase-Change Random Access Memory(PRAM) were introduced. Although the performance improved gradually, there are some portions which must be improved. So, we studied new constitution of $Ge_1Se_1Te_2$ chalcogenide material to improve phase transition characteristic. Actually, the performance properties have been improved surprisingly. However, crystallization time was as long as ever for amorphization time. We conducted this experiment in order to solve that problem by doping-Sb.

  • PDF

Location-Aware Hybrid SLC/MLC Management for Compressed Phase-Change Memory Systems (압축 기반 상변화 메모리 시스템에서 저장 위치를 고려한 하이브리드 SLC/MLC 관리 기법)

  • Park, Jaehyun;Lee, Hyung Gyu
    • IEMEK Journal of Embedded Systems and Applications
    • /
    • v.11 no.2
    • /
    • pp.107-116
    • /
    • 2016
  • Density of Phase-Change Memory (PCM) devices has been doubled through the employment of multi-level cell (MLC) technology. However, this doubled-capacity comes in the expense of severe performance degradation, as compared to the conventional single-level cell (SLC) PCM. This negative effect on the performance of the MLC PCM detracts from the potential benefits of the MLC PCM. This paper introduces an efficient way of minimizing the performance degradation while maximizing the capacity benefits of the MLC PCM. To this end, we propose a location-aware hybrid management of SLC and MLC in compressed PCM main memory systems. Our trace-driven simulations using real application workloads demonstrate that the proposed technique enhances the performance and energy consumption by 45.1% and 46.5%, respectively, on the average, over the conventional technique that only uses a MLC PCM.

Improving Energy Efficiency and Lifetime of Phase Change Memory using Delta Value Indicator

  • Choi, Ju Hee;Kwak, Jong Wook
    • JSTS:Journal of Semiconductor Technology and Science
    • /
    • v.16 no.3
    • /
    • pp.330-338
    • /
    • 2016
  • Phase change memory (PCM) has been studied as an emerging memory technology for last-level cache (LLC) due to its extremely low leakage. However, it consumes high levels of energy in updating cells and its write endurance is limited. To relieve the write pressure of LLC, we propose a delta value indicator (DVI) by employing a small cache which stores the difference between the value currently stored and the value newly loaded. Since the write energy consumption of the small cache is less than the LLC, the energy consumption is reduced by access to the small cache instead of the LLC. In addition, the lifetime of the LLC is further extended because the number of write accesses to the LLC is decreased. To this end, a delta value indicator and controlling circuits are inserted into the LLC. The simulation results show a 26.8% saving of dynamic energy consumption and a 31.7% lifetime extension compared to a state-of-the-art scheme for PCM.

Electrical and thermal characteristics of PRAM with thickness of phase change thin film (상변화 박막의 두께에 따른 상변화 메모리의 전류 및 열 특성)

  • Choi, Hong-Kyw;Kim, Hong-Seung;Lee, Seong-Hwan;Jang, Nak-Won
    • Journal of Advanced Marine Engineering and Technology
    • /
    • v.32 no.1
    • /
    • pp.162-168
    • /
    • 2008
  • In this paper, we analyzed the heat transfer phenomenon and the reset current variation of PRAM device with thickness of phase change material using the 3-D finite element analysis tool. From the simulation, Joule's heat was generated at the contact surface of phase change material and bottom electrode of PRAM. As the thickness of phase change material was decreased, the reset current was highly increased. In case thickness of phase change material thin film was $200\;{\AA}$, heat increased through top electrode and reset current caused by phase transition highly increased. And as thermal conductivity of top electrode decreased, temperature of unit memory cell was increased.

A high performance nonvolatile memory cell with phase change material of $Ge_1Se_1Te_2$ ($Ge_1Se_1Te_2$ 상변화 재료를 이용한 고성능 비휘발성 메모리에 대한 연구)

  • Lee, Jae-Min;Shin, Kyung;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2005.07a
    • /
    • pp.15-16
    • /
    • 2005
  • Chalcogenide phase change memory has high performance to be next generation memory, because it is a nonvolatile memory processing high programming speed, low programming voltage, high sensing margin, low consumption and long cycle duration. We have developed a new material of PRAM with $Ge_1Se_1Te_2$. This material has been propose to solve the high energy consumption and high programming current. We have investigated the phase transition behaviors in function of various process factor including contact size, cell size, and annealing time. As a result, we have observed that programming voltage and writing current of $Ge_1Se_1Te_2$ are more improved than $Ge_2Sb_2Te_5$ material.

  • PDF

Unified Dual-Gate Phase Change RAM (PCRAM) with Phase Change Memory and Capacitor-Less DRAM (Phase Change Memory와 Capacitor-Less DRAM을 사용한 Unified Dual-Gate Phase Change RAM)

  • Kim, Jooyeon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.27 no.2
    • /
    • pp.76-80
    • /
    • 2014
  • Dual-gate PCRAM which unify capacitor-less DRAM and NVM using a PCM instead of a typical SONOS flash memory is proposed as 1 transistor. $VO_2$ changes its phase between insulator and metal states by temperature and field. The front-gate and back-gate control NVM and DRAM, respectively. The feasibility of URAM is investigated through simulation using c-interpreter and finite element analysis. Threshold voltage of NVM is 0.5 V that is based on measured results from previous fabricated 1TPCM with $VO_2$. Current sensing margin of DRAM is 3 ${\mu}A$. PCM does not interfere with DRAM in the memory characteristics unlike SONOS NVM. This novel unified dual-gate PCRAM reported in this work has 1 transistor, a low RESET/SET voltage, a fast write/erase time and a small cell so that it could be suitable for future production of URAM.

PCM Main Memory for Low Power Embedded System (저전력 내장형 시스템을 위한 PCM 메인 메모리)

  • Lee, Jung-Hoon
    • IEMEK Journal of Embedded Systems and Applications
    • /
    • v.10 no.6
    • /
    • pp.391-397
    • /
    • 2015
  • Nonvolatile memories in memory hierarchy have been investigated to reduce its energy consumption because nonvolatile memories consume zero leakage power in memory cells. One of the difficulties is, however, that the endurance of most nonvolatile memory technologies is much shorter than the conventional SRAM and DRAM technology. This has limited its usage to only the low levels of a memory hierarchy, e.g., disks, that is far from the CPU. In this paper, we study the use of a new type of nonvolatile memories - the Phase Change Memory (PCM) with a DRAM buffer system as the main memory. Our design reduced the total energy of a DRAM main memory of the same capacity by 80%. These results indicate that it is feasible to use PCM technology in place of DRAM in the main memory for better energy efficiency.

Phase Change Properties of Amorphous Ge1Se1Te2 and Ge2Sb2Te5 Chalcogenide Thin Films (비정질 Ge1Se1Te2 과 Ge2Sb2Te5 칼코게나이드 박막의 상변화특성)

  • Chung Hong-Bay;Cho Won-Ju;Ku Sang-Mo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.19 no.10
    • /
    • pp.918-922
    • /
    • 2006
  • Chalcogenide Phase change memory has the high performance necessary for next-generation memory, because it is a nonvolatile memory with high programming speed, low programming voltage, high sensing margin, low power consumption and long cycle duration. To minimize the power consumption and the program voltage, the new composition material which shows the better phase-change properties than conventional $Ge_2Sb_2Te_5$ device has to be needed by accurate material engineering. In the present work, we investigate the basic thermal and the electrical properties due to phase-change compared with chalcogenide-based new composition $Ge_1Se_1Te_2$ material thin film and convetional $Ge_2Sb_2Te_5$ PRAM thin film. The fabricated new composition $Ge_1Se_1Te_2$ thin film exhibited a successful switching between an amorphous and a crystalline phase by applying a 950 ns -6.2 V set pulse and a 90 ns -8.2 V reset pulse. It is expected that the new composition $Ge_1Se_1Te_2$ material thin film device will be possible to applicable to overcome the Set/Reset problem for the nonvolatile memory device element of PRAM instead of conventional $Ge_2Sb_2Te_5$ device.

Energy-Efficient Last-Level Cache Management for PCM Memory Systems

  • Bahn, Hyokyung
    • International Journal of Internet, Broadcasting and Communication
    • /
    • v.14 no.1
    • /
    • pp.188-193
    • /
    • 2022
  • The energy efficiency of memory systems is an important task in designing future computer systems as memory capacity continues to increase to accommodate the growing big data. In this article, we present an energy-efficient last-level cache management policy for future mobile systems. The proposed policy makes use of low-power PCM (phase-change memory) as the main memory medium, and reduces the amount of data written to PCM, thereby saving memory energy consumptions. To do so, the policy keeps track of the modified cache lines within each cache block, and replaces the last-level cache block that incurs the smallest PCM writing upon cache replacement requests. Also, the policy considers the access bit of cache blocks along with the cache line modifications in order not to degrade the cache hit ratio. Simulation experiments using SPEC benchmarks show that the proposed policy reduces the power consumption of PCM memory by 22.7% on average without degrading performances.

Properties of GST Thin Films for PRAM with Composition (PRAM 용 GST계 상변화 박막의 조성에 따른 특성)

  • Jang Nak-Won
    • Journal of Advanced Marine Engineering and Technology
    • /
    • v.29 no.6
    • /
    • pp.707-712
    • /
    • 2005
  • PRAM (Phase change random access memory) is one of the most promising candidates for next generation Non-volatile Memories. The Phase change materials have been researched in the field of optical data storage media. Among the phase change materials. $Ge_2Sb_2Te_5$ is very well known for its high optical contrast in the state of amorphous and crystalline. However the characteristics required in solid state memory are quite different from optical ones. In this study. the structural Properties of GeSbTe thin films with composition were investigated for PRAM. The 100-nm thick $Ge_2Sb_2Te_5$ and $Sb_2Te_3$ films were deposited on $SiO_2/Si$ substrates by RF sputtering system. In order to characterize the crystal structure and morphology of these films. x-ray diffraction (XRD). atomic force microscopy (AFM), differential scanning calorimetry (DSC) and 4-point measurement analysis were performed. XRD and DSC analysis result of GST thin films indicated that the crystallization of $Se_2Sb_2Te_5$ films start at about $180^{\circ}C$ and $Sb_2Te_3$ films Start at about $125^{\circ}C$.