• Title/Summary/Keyword: Pd film

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A Study on the Surface Pre-treatment of Palladium Alloy Hydrogen Membrane (팔라듐 합금 수소 분리막의 전처리에 관한 연구)

  • Park, Dong-Gun;Kim, Hyung-Ju;Kim, Hyo Jin;Kim, Dong-Won
    • Journal of the Korean institute of surface engineering
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    • v.45 no.6
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    • pp.248-256
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    • 2012
  • A Pd-based hydrogen membranes for hydrogen purification and separation need high hydrogen perm-selectivity. The surface roughness of the support is important to coat the pinholes free and thin-film membrane over it. Also, The pinholes drastically decreased the hydrogen perm-selectivity of the Pd-based composite membrane. In order to remove the pinholes, we introduced various surface pre-treatment such as alumina powder packing, nickel electro-plating and micro-polishing pre-treatment. Especially, the micro-polishing pretreatment was very effective in roughness leveling off the surface of the porous nickel support, and it almost completely plugged the pores. Fine Ni particles filled surface pinholes with could form open structure at the interface of Pd alloy coating and Ni support by their diffusion to the membrane and resintering. In this study, a $4{\mu}m$ surface pore-free Pd-Cu-Ni ternary alloy membrane on a porous nickel substrate was successfully prepared by micro-polishing, high temperature sputtering and Cu-reflow process. And $H_2$ permeation and $N_2$ leak tests showed that the Pd-Cu-Ni ternary alloy hydrogen membrane achieved both high permeability of $13.2ml{\cdot}cm^{-2}{\cdot}min^{-1}{\cdot}atm^{-1}$ permation flux and infinite selectivity.

Fabrication of oxide semiconductor thin film gas sensor array (산화물 반도체 박막 가스센서 어레이의 제조)

  • 이규정;김석환;허창우
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.4 no.3
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    • pp.705-711
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    • 2000
  • A thin film oxide semiconductor micro gas sensor array which shows only 60 mW of power consumption at an operating temperature of $300^{\circ}C$ has been fabricated using microfabrication and micromachining techniques. Excellent thermal insulation of the membrane is achieved by the use of a double-layer structure of $0.1\mum\; thick\; Si_3N_4 \;and\; 1 \mum$ thick phosphosilicate glass (PSG) prepared by low-pressure chemical-vapor deposition (LPCVD) and atmospheric-pressure chemical-vapor deposition (APCVD), respectively. The sensor array consists of such thin film oxide semiconductor sensing materials as 1 wt.% Pd-doped $SnO_2,\; 6 wt.% A1_2O_3-doped\; ZnO,\; WO_3$/ and ZnO. Baseline resistances of the four sensing materials were found to be stable after the aging for three days at $300^{\circ}C$. The thin film oxide semiconductor micro gas sensor array exhibited resistance changes usable for subsequent data processing upon exposure to various gases and the sensitivity strongly depended on the sensing layer materials.

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Fabrication and yield improvement of oxide semiconductor thin film gas sensor array (산화물 반도체 박막 가스센서 어레이의 제조 및 수율 개선)

  • 이규정;류광렬;허창우
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.6 no.2
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    • pp.315-322
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    • 2002
  • A thin film oxide semiconductor micro gas sensor array which shows only 60㎽ of power consumption at an operating temperature of 30$0^{\circ}C$ has been fabricated using microfabrication and rnicrornachining techniques. Excellent thermal insulation of the membrane is achieved by the use of a double la! or structure of 0.1${\mu}{\textrm}{m}$ thick Si$_3$N$_4$ and 1${\mu}{\textrm}{m}$ thick phosphosilicate glass(PSG) prepared by low pressure chemical vapor deposition(LPCVD) and atmospheric-pressure chemical-vapor deposition(APCVD), respectively. The sensor way consists of such thin film oxide semiconductor sensing materials as 1wt.% Pd-doped SnO$_2$, 6wt.% AI$_2$O$_3$-doped ZnO, WO$_3$ and ZnO. The thin film oxide semiconductor micro gas sensor array exhibited resistance changes usable for subsequent data processing upon exposure to various gases and the sensitivity strongly depended on the sensing layer materials. Heater Part of the sensor structure has been modified in order to improve the process yield of the sensor, and as a result of modified heater structure improved process yield has been achieved.

Structure and Conductivity Characteristics of Sandwich Structures with Fullerite Films

  • Berdinsky, A.S.;Shevtsov, Yu. V.;Chun, Hui-Gon;Yoo, Yong-Zoo;Fink, D.;Ayupov, B.M.
    • Journal of Sensor Science and Technology
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    • v.13 no.5
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    • pp.399-404
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    • 2004
  • We report on the technology of formation of sandwich structures based on fullerite films and on experimental results in research of optical and conductivity properties of these sandwich samples. Single crystals of sapphire (100) or silicon were used as substrates. The sandwich specimens were based on the structure M/$C_{60}$/M (M=Cr, Pd, Ag, Al, Cu). The thickness of the fullerite films was about $0.2{\sim}1.0{\mu}m$. The area of the $C_{60}$ film under the top contact was about $1cm^{2}$. The specimens have been investigated by infrared spectroscopy, spectra-photometry, ellipsometry and X-ray diffraction analysis. Measurements of the current/voltage characteristics and research on the temperature dependence of conductivity were performed as well. It was shown that metals such as Cr, Pd, Ag, Al, and Cu penetrate easily into the fullerite films. It appears that these specimens have a large conductivity. For silver/$C_{60}$ and other sandwich structures the conductivities show a semiconductor-like behaviour.

Fabrication of Thick Film type Cluster for Anion Generator applications (음이온 발생용 후막형 클러스터의 제조)

  • Choa, Jung-Hwan;Yeo, Dong-Hun;Shin, Hyo-Soon;Hong, Youn-Woo;Park, Zee-Hoon;Kim, Jong-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.464-464
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    • 2007
  • 환경오염으로 인한 각종 질병 및 증후군 등의 발생으로 가정용 산업용에서 환경관련 기술들이 다양한 분야로 확대되고 있다. 본 연구에서는 양이온 및 음이온 양쪽이온을 최대한 발생시키며, 오존 발생량은 억제하고 소비전력을 절감하고자 Ag-Pd 전극을 적용한 세라믹스 클러스터를 개발하였다. Ag-Pd 전극과 매칭되는 세라믹스 조성을 개발한 후 적층공정 기술을 이용하여 후막형 클러스터를 제조하였다. 전극 패턴모양, 전극간 방전간격 및 전극 보호층의 두께에 따른 음이온 발생량을 측정하여 최적화를 위한 실험을 진행하였으며, 음이온 발생량 100만개이상, 오존발생량 0.6ppb인 특성을 확인하였다.

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Fabrication and Characterization of Portable Electronic Nose System for Identification of CO/HC Gases (CO/HC 가스 인식을 위한 소형 전자코 시스템의 제작 및 특성)

  • Hong, Hyung-Ki;Kwon, Chul-Han;Yun, Dong-Hyun;Kim, Seung-Ryeol;Lee, Kyu-Chung;Kim, In-Soo;Sung, Yung-Kwon
    • Journal of Sensor Science and Technology
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    • v.6 no.6
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    • pp.476-482
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    • 1997
  • A portable electronic nose system has been fabricated and characterized using an oxide semiconductor gas sensor array and pattern recognition techniques such as principal component analysis and back-propagation artificial neural network. The sensor array consists of six thick-film gas sensors whose sensing layers are Pd-doped $WO_{3}$, Pt-doped $SnO_{2}$, $TiO_{2}-Sb_{2}O_{5}-Pd$-doped $SnO_{2}$, $TiO_{2}-Sb_{2}O_{5}-Pd$-doped $SnO_{2}$ + Pd coated layer, $Al_{2}O_{3}$-doped ZnO and $PdCl_{2}$-doped $SnO_{2}$. The portable electronic nose system consists of an 16bit Intel 80c196kc as CPU, an EPROM for storing system main program, an EEPROM for containing optimized connection weights of artificial neural network, an LCD for displaying gas concentrations. As an application the system has been used to identify 26 carbon monoxide/hydrocarbon (CO/HC) car exhausting gases in the concentration range of CO 0%/HC 0 ppm to CO 7.6%/HC 400 ppm and the identification has been successfully demonstrated.

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Development of a Hydrogen Peroxide Sensor Based on Palladium and Copper Electroplated Laser Induced Graphene Electrode (PdCu를 전기 도금한 레이저 유도 그래핀 전극 기반의 과산화수소 측정 센서 개발)

  • Park, Daehan;Han, Ji-Hoon;Kim, Taeheon;Pak, Jungho
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.67 no.12
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    • pp.1626-1632
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    • 2018
  • In this paper, we describe the fabrication and characterization of a hydrogen peroxide ($H_2O_2$) sensor based on palladium and copper (PdCu) electroplated laser induced graphene (LIG) electrodes. $CO_2$ laser was used to form LIG electrodes on a PI film. This fabrication method allows simple control of the LIG electrode size and shape. The PdCu was electrochemically deposited on the LIG electrodes to improve the electrocatalytic reaction with $H_2O_2$. The electrochemical performance of this sensor was evaluated in terms of selectivity, sensitivity, and linearity. The physical characterization of this sensor was conducted using scanning electron microscopy (SEM) and energy-dispersive X-ray spectroscopy (EDS), which confirmed that PdCu was formed on the laser induced graphene electrode. In order to increase the sensor sensitivity, the Pd:Cu ratio of the electroplated PdCu was varied to five different values and the condition of highest amperometric current at an identical of $H_2O_2$ concentration was chosen among them. The resulting amperometric current was highest when the ratio of Pd:Cu was 7:3 and this Pd;Cu ratio was employed in the sensor fabrication. The fabricated PdCu/LIG electrode based $H_2O_2$ sensor exhibited a sensitivity of $139.4{\mu}A/mM{\cdot}cm^2$, a broad linear range between 0 mM and 16 mM of $H_2O_2$ concentrations at applied potential of -0.15 V, and high reproducibility (RSD = 2.6%). The selectivity of the fabricated sensors was also evaluated by applying ascorbic acid, glucose, and lactose separately onto the sensor in order to see if the sensor ourput is affected by one of them and the sensor output was not affected. In conclusion, the proposed PdCu/LIG electrode based $H_2O_2$ sensor seems to be suitable $H_2O_2$ sensor in various applications.

Selective Contact Hole Filling by Electroless Ni Plating (무전해Ni도금에 의한 선택적 CONTACT HOLE 충진)

  • 김영기;우찬희;박종완;이원해
    • Proceedings of the Materials Research Society of Korea Conference
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    • 1992.05b
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    • pp.26-27
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    • 1992
  • The effect of activation and electroless nickel plating conditions on contact properties were investigated for selective electroless nickel plating of Si farers in order to obtain an optimum condition of contact hole filling. According to RCA prosess, p-type si 1 icon (100) surface was cleaned out and activated. The effects of temperture, DMAB concentration, time, and stirring iwere investigated for activation of p-type Si(100) surface. The optimal activation condition obtained was 0.5M HF, 1mM PdCl$_2$, 2mM EDTA, 7$0^{\circ}C$, 90sec under ultrasonic vibration. In electroless nickel plating, the effect of temperature, DMAB concentration, pH, and plating ti me were studied. The optimal plating condition found was 0. 10M NiS0$_4$.$H_2O$, 0.lIM Citrate, pH 6.8, 6$0^{\circ}C$, 30 minutes. The contact resistence of fi]ms wascomparatively low. It took 30 minutes to obtain 1$\mu$m thick film with 8$\mu$M DMAB concentration. The film surface roughness was improved with increasing temperature and decreasing pH of the plating solution. The best quality of the film was obtained with the condition of temperature 6$0^{\circ}C$ and pH 6.8. The micro-victors hardness of film was about 600Hv and was decreased wi th increasing particle size of plating layer.

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Pb-based piezoelectric thick films prepared by a screen printing (Screen printing에 위한 Pb계 압전세라믹스 후막의 제조)

  • Paik, D.S.;Shin, H.S.;Sim, S.H.;Park, Y.W.;Kang, C.Y.;Shin, H.Y.;Yoon, S.J.
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1541-1543
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    • 1999
  • Screen printing에 의해 압전 후막을 제조하기 위하여 약 $0.6{\mu}m$의 평균 입자 크기를 갖는 PMN-PZT와 PAN-PZT 분말을 산화물 혼합법에 의해 제조하였다. 치밀한 후막의 제조를 위한 분말과 유기물의 비율은 분산이 가능한 범위에서 80:20 (분말:유기물)의 중량비를 나타내었다 사용된 기판과 하부전극은 각각 $SiO_2$/Si와 AgPd 였으며, 후막 제조시 박리 및 균열현상은 발생되지 않았다. 프린트된 후막은 건조온도와 무관한 미세구조를 나타내었으며, 보다 치밀한 구조를 갖는 후막의 제조를 이해 입자의 분산 및 열처리 조건 그리고 기판과의 매칭에 대해 연구가 계속되어야 할 것으로 생각된다.

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