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http://dx.doi.org/10.5695/JKISE.2012.45.6.248

A Study on the Surface Pre-treatment of Palladium Alloy Hydrogen Membrane  

Park, Dong-Gun (Department of Advanced Materials Engineering, Kyonggi University)
Kim, Hyung-Ju (Department of Advanced Materials Engineering, Kyonggi University)
Kim, Hyo Jin (Department of Advanced Materials Engineering, Kyonggi University)
Kim, Dong-Won (Department of Advanced Materials Engineering, Kyonggi University)
Publication Information
Journal of the Korean institute of surface engineering / v.45, no.6, 2012 , pp. 248-256 More about this Journal
Abstract
A Pd-based hydrogen membranes for hydrogen purification and separation need high hydrogen perm-selectivity. The surface roughness of the support is important to coat the pinholes free and thin-film membrane over it. Also, The pinholes drastically decreased the hydrogen perm-selectivity of the Pd-based composite membrane. In order to remove the pinholes, we introduced various surface pre-treatment such as alumina powder packing, nickel electro-plating and micro-polishing pre-treatment. Especially, the micro-polishing pretreatment was very effective in roughness leveling off the surface of the porous nickel support, and it almost completely plugged the pores. Fine Ni particles filled surface pinholes with could form open structure at the interface of Pd alloy coating and Ni support by their diffusion to the membrane and resintering. In this study, a $4{\mu}m$ surface pore-free Pd-Cu-Ni ternary alloy membrane on a porous nickel substrate was successfully prepared by micro-polishing, high temperature sputtering and Cu-reflow process. And $H_2$ permeation and $N_2$ leak tests showed that the Pd-Cu-Ni ternary alloy hydrogen membrane achieved both high permeability of $13.2ml{\cdot}cm^{-2}{\cdot}min^{-1}{\cdot}atm^{-1}$ permation flux and infinite selectivity.
Keywords
Hydrogen membrane; Pd-based membrane; Surface treatment; Micro-polishing; Porous nickel support; Sputtering deposition; Cu-reflow;
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  • Reference
1 Y. S. Cheng, K. L. Yeung, J. Membr. Sci., 158 (1999) 127.   DOI   ScienceOn
2 F. A. Lewis, Int. J. Hydrogen Energy, 21 (1996) 461.   DOI
3 H. T. Hoang, H. D. Tong, F. C. Gielens, H. V. Jansen, M. C. Elwenspoek, Mater. Lett., 58 (2004) 525.   DOI   ScienceOn
4 H. B. Zhao, G. X. Xiong, G. V. Baron, Catalysis Today, 56 (2000) 89.   DOI   ScienceOn
5 S. E. Nam, K. H. Lee, J. Membr. Sci., 170 (2000) 91.   DOI   ScienceOn
6 C. S. Jun, K. H. Lee, J. Membr. Sci., 176 (2000) 121.   DOI
7 T. A. Peters, M. Stange, H. Klette, R. Bredesen, J. Membr. Sci., 316 (2008) 119.   DOI
8 D. Wang, J. Tong, H. Xu, Y. Matsumura, Catalysis Today, 93 (2004) 689.   DOI
9 Y. M. Lin, M. H. Rei, Sep. Purif. Tech., 25 (2001) 87.   DOI
10 Y. She, J. Han, Y. H. Ma, Catal. Today 67 (2001) 43.   DOI
11 J. Shu, A. Adnot, B. P. A. Grandjean, S. Kaliaguine, Thin Solid Films, 286 (1996) 72.   DOI
12 S. E. Nam, S. H. Lee, K. H. Lee, J. Membr. Sci., 153 (1999) 163.   DOI
13 D. W. Kim, Y. J. Park, J. W. Moon, S. K. Ryi, J. S. Park, Thin Solid Films, 516 (2008) 3036.   DOI   ScienceOn
14 Y. H. Chi, P. S. Yen, M. S. Jeng, S. T. Ko, T. C. Lee, Int. J. Hydrogen Energy, 35 (2010) 630.
15 Y. Huang, R. Dittmeyer, J. Membr. Sci., 282 (2006) 296.   DOI
16 D. W. Kim, Y. J. Park, S. M. Kang, H. S. An, J. S. Park, Jpn. J. Appl. Phys., 49 (2010) 100208.   DOI