• Journal of the Korea Furniture Society
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• v.20 no.5
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• pp.414-430
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• 2009

This paper is designed for the purpose of suggesting Figurative data applicable to modern furniture designs through doing research on Haejuban's engraving that includes excellent Figurative beauty among Korean traditional lighted-floor type furnitures. As a result of the analysis, Haejuban's(Traditional Korean dining table) engraving pattern type was mainly divided into independent patterns and combined patterns. The patterns expressed the most among them are peony patterns. The patterns expressed by the engraving mostly showed the Figurative characteristics of symmetry. The patterns shown in Haejuban's engraving wish or stand for richness, long life, lucky, fidelity, divinity, happiness, success and so on. The species of trees used for Haejuban were a total of 8 kinds such as ginkgo trees, zelkova trees, walnut trees, wild-walnut trees, chinaberry trees and other scrub trees. Ginkgo trees were used the most among them.

• Design & Manufacturing
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• v.2 no.1
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• pp.45-50
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• 2008

Micro channel is to fabricate desired pattern on the polymer substrate by pressing the patterned mold against the substrate which is heated above the glass transition temperature, and it is a high throughput fabrication method for bio chip, optical microstructure, etc. due to the simultaneous large area patterning. However, the bad pattern fidelity in large area patterning is one of the obstacles to applying the hot embossing technology for mass production. In the present study, stamper of cross channel with width $100{\mu}m$ and height $50{\mu}m$ was manufactured using UV-LiGA process. Micro channel was manufactured using stamper manufactured in this study. Also replicability appliance was evaluated for micro channel and factors affected replicability were investigated using Taguchi method.

• Journal of the Korean Institute of Telematics and Electronics B
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• v.28B no.10
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• pp.831-841
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• 1991

A combined model of probabilistic and MLP(multi layer perceptron) model is proposed for the pattern classification of EMG( electromyogram) signals. The MLP model has a problem of not guaranteeing the global minima of error and different quality of approximations to Bayesian probabilities. The probabilistic model is, however, closely related to the estimation error of model parameters and the fidelity of assumptions. A proper combination of these will reduce the effects of the problems and be robust to input variations. Proposed model is able to get the MAP(maximum a posteriori probability) in the probabilistic model by estimating a priori probability distribution using the MLP model adaptively. This method minimize the error probability of the probabilistic model as long as the realization of the MLP model is optimal, and this is a good combination of the probabilistic model and the MLP model for the usage of MLP model reliability. Simulation results show the benefit of the proposed model compared to use the Mlp and the probabilistic model seperately and the average calculation time fro classification is about 50ms in the case of combined motion using an IBM PC 25 MHz 386model.

• Transactions on Electrical and Electronic Materials
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• v.5 no.3
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• pp.104-108
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• 2004

Problems of overlap errors and side-lobe printing by the design rule reduction in the lithography process using attenuated phase-shifting masks(attPSM) have been serious. Overlap errors and side-lobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the side-lobes and to get additional pattern fidelity at the same time.

• Proceedings of the KSME Conference
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• 2003.04a
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• pp.1065-1068
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• 2003

The nano imprint process is one of the next generation lithography has been mentioned as one of major nanoreplication techniques because it is simple process, low cost, high replication fidelity and relatively high throughput. This process requires a surface contact between a template with patterns and a wafer on a stage. After contact, the vertical moving the template to the wafer causes some directional motions of the stage. Thus the stage must move according to the motions of the template to avoid the damage of the transferred patterns on the wafer. This study is to develop the wafer stage with a passive compliance to overcome the damage. This stage is designed with the concept like that it has a monolithic, symmetry and planar 6-DOF mechanism.

• Journal of Surface Science and Engineering
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• v.41 no.6
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• pp.331-334
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• 2008

The replica of highly ordered nano-sphere array patterns were fabricated using hot embossing method. First, silica nano-sphere array on Si substrate was transferred to PVC film at $130^{\circ}C$ and 7 bar using hot embossing process. Then, silica nano-sphere array on PVC template was removed by soaking the PVC film in buffered oxide etcher. In order to form anti-stiction layer, the PVC template was coated with silicon dioxide layer and self-assembled monolayer. Through UV nanoimprint lithography with the fabricated flexible PVC template, highly ordered nano-sphere array pattern was imprinted on curved substrates with high fidelity.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2004.05a
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• pp.159-162
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• 2004

Problems of overlap errors and sidelobe printing by the design rule reduction in the lithography process using attenuated phase-shifting masks(attPSM) have been serious. Overlap errors and sidelobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the sidelobes and to get additional pattern fidelity at the same time.

• Korean Journal of Metals and Materials
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• v.48 no.2
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• pp.163-168
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• 2010

We here describe the laser-direct patterning of nanostructured metal thin films. This method involves light-matter interaction in which a pulsed laser beam impinging on the film generates a thermoelastic force that plays a role to detach the film from the substrate or underlying layers. A moderate cohesion of the nanostructured film enables localized desorption of the material upon irradiation by a spatiallymodulated laser beam, giving good fidelity with the transfered pattern. This photoresist-free process provides a simple high-resolution scheme for patterning metal thin films.

• Korean Journal of Optics and Photonics
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• v.18 no.5
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• pp.303-308
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• 2007

We report here on the application of a digital holographic microscope as a metrology tool for the inspection and the micro-topography reconstruction of different micro-structures of phase shift photo-mask (PSM). The lithography by phase shift photo-mask uses the interference and the pattern of the PSM is not imaged by general optical microscope. The technique allows us to obtain digitally a high-fidelity surface topography description of the phase shift photo-mask with only one hologram image acquisition, allowing us to have relatively simple and compact set-ups able to give quantitative information of PSM.

• Korean Journal of Materials Research
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• v.26 no.11
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• pp.635-643
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• 2016

Graphene has shown exceptional properties for high performance devices due to its high carrier mobility. Of particular interest is the potential use of graphene nanoribbons as field-effect transistors. Herein, we introduce a facile approach to the fabrication of graphene nanoribbon (GNR) arrays with ~200 nm width using nanoimprint lithography (NIL), which is a simple and robust method for patterning with high fidelity over a large area. To realize a 2D material-based device, we integrated the graphene nanoribbon arrays in field effect transistors (GNR-FETs) using conventional lithography and metallization on highly-doped $Si/SiO_2$ substrate. Consequently, we observed an enhancement of the performance of the GNR-transistors compared to that of the micro-ribbon graphene transistors. Besides this, using a transfer printing process on a flexible polymeric substrate, we demonstrated graphene-silicon junction structures that use CVD grown graphene as flexible electrodes for Si based transistors.