• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2008년도 추계학술대회 초록집
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• pp.33-33
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• 2008

산소 플라스마를 이용하여 마그네슘 판재를 표면처리한 후 내식성 변화를 관찰하였다. 마그네슘 판재표면처리 시 표면처리 온도, 표면처리 전압, 공정 가스 유량비 등의 변수에 대한 효과를 분석하여 최적 조건을 도출하였다. 표면처리 온도가 높을 경우, 마그네슘 판재의 내식성이 향상되었으며, 표면처리 전압이 일정한 값보다 높으면 이온의 운동 에너지가 증가하여 마그네슘 판재 표면에 손상을 입혀 오히려 내식성이 나빠지는 현상을 보였다. 공정 가스는 산소만을 사용하여 표면 처리할 경우, 마그네슘 판재의 내식성이 향상되는 현상을 관찰하였다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2007년도 추계학술대회 논문집
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• pp.17-18
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• 2007

진공 용기 내에서 펄스 전원 공급 장치를 이용하여 아르곤과 산소 분위기에서 발생시킨 글로 방전으로 마그네슘 판재의 표면을 처리하여 내식성 변화를 관찰하였다. 마그네슘 판재의 내식성 평가를 위하여 염수분무 시험을 실시 하였으며, 마그네슘 판재의 표면 변화를 관찰하기 위해서 x-선 분광기를 이용하였다. 글로 방전에 의해 표면 처리된 마그네슘 판재는 표면처리를 하지 않은 마그네슘 판재보다 높은 내식성을 보여주었다. x-선 분광기 분석결과, 글로 방전에 의해 마그네슘 판재 표면에 산화막이 형성되는 것을 관찰하였다.

• 반도체디스플레이기술학회지
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• 제18권4호
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• pp.120-123
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• 2019

The effect of surface plasmon on ZTO thin films was investigated. The phenomenon of depletion occurring in the interface of the ZTO thin film created a potential barrier and the dielectric layer of the depletion formed a non-mass particle called plasmon. ZTO thin film represents n-type semiconductor features, and surface current by plasma has been able to obtain the effect of improving electrical efficiency as a result of high current at positive voltage and low current at negative voltage. It can be seen that the reduction of electric charge due to recombination of electronic hole pairs by heat treatment of compound semiconductors induces higher surface current in semiconductor devices.

• 치위생과학회지
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• 제14권1호
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• pp.1-6
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• 2014

본 연구는 저온 상압 플라즈마 장치를 이용하여 구강점막질환을 일으키는 C. albicans 균을 효과적으로 사멸하기 위해 시행하였다. 조직에 적합하게 처리될 수 있도록 저온 상압 플라즈마 장치를 고안하고, 먼저 agar plate에 C. albicans 균을 처리하여 플라즈마를 조사한 결과 agar plate표면에 C. albicans 균을 처리 후 저온 상압 플라즈마 장치를 적용한 결과 60초 처리시 1.2 cm, 180초 처리시 1.4 cm, 300초 처리시 1.7 cm의 박테리아 생장 억제 구간이 나타나는 것을 확인하였다. 또한, 조직에서의 구강병원균 사멸 효과를 확인하기 위해 HRM-2 마우스 조직에 C. albicans 균을 처리하여 저온 상압 플라즈마를 조사 시 마우스 조직 표면에 C. albicans 균을 오염시켜 저온 상압 플라즈마 처리 후 CFU 방법으로 측정한 결과 300초간 1회 처리시 2 log CFU/ml, 300초간 2회 처리시 3 log CFU/ml, 300초간 3 회 처리시 6 log CFU/ml의 균 수 감소 효과가 나타나는 것을 확인하였다(p<0.05). 따라서, 저온의 저온 상압 플라즈마 장치는 효과적으로 구강 병원균을 사멸시킬 수 있으며, 구강점막질환 치료 장비로서 사용될 수 있을 것으로 생각된다.

• Journal of Korean Vacuum Science & Technology
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• 제6권2호
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• pp.62-66
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• 2002

Hydraulic pumps are used to control the landing wheels of aircrafts, and their proper operation is vital to plane safety It is well hewn that adhesive wear failure is a major cause of pump failure. A dual nitrogen plasma immersion ion implantation process calling for the implantation of nitrogen at two different energies and doses has been developed to enhance the surface properties of the disks in the pumps. The procedures meet the strict temperature requirement of <200$^{\circ}C$, and after the treatment, the working lifetime of the pumps increases by more than a factor of two. This experimental protocol has been adopted by the hydraulic pump factory as a standard manufacturing procedure.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.859-862
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• 2003

Well-aligned multiwall carbon nanotubes (MWCNTs) were prepared at low temperature of 400 $^{\circ}C$ by utilizing a radio frequency plasma-enhanced chemical vapor deposition (rf-PECVD) system. The MWCNTs were treated by an external rf plasma source and an ultra-violet laser in order to modify structural defect of carbon nanotube and to ablate possible contamination on carbon nanotube surface. Structural properties of carbon nanotubes were investigated by using a scanning electron microscopy (SEM), Raman spectroscopy, Fourier transformer Infrared spectroscopy (FTIR) and transmission electron microscope (TEM). In addition, the emission properties of the MWNTs were measured for the application of field emission display (FED) in near future. Various post treatments were found to improve the field emission property of carbon nanotubes.

• 한국윤활학회:학술대회논문집
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• 한국윤활학회 2001년도 제34회 추계학술대회 개최
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• pp.322-330
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• 2001

The plasma-sprayed 8％Y$_2$O$_3$-Zirconia coating was studied to know the relationship between phase transformation and wear properties after several heat treatment. Wear tests were carried out with ball on disk on 50N, 70N, 90N. The specimen in this study was cast iron and tests were performed on room temperature. The transformation of phase and residual stress was measured by x-ray diffraction method(XRD) and worn surface were observed by SEM.

• 설비공학논문집
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• 제14권10호
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• pp.781-785
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• 2002

The effects of different surfaces on dry and wet frosting test were experimentally investigated. The results of experiment were compared by the performance evaluation coefficient (PEC). Results showed that the air-side pressure drop of lacquer coated evaporator increased by 5% as compared to the plasma treated one. It was also found that the Plasma coated evaporator is lower than lacquer coated one in the PEC ratio.

• 반도체디스플레이기술학회지
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• 제15권3호
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• pp.72-77
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• 2016

As the semiconductor production technology has gradually developed and intra-market competition has grown fiercer, the caliber of Si Wafer for semiconductor production has increased as well. And semiconductors have become integrated with higher density. Presently the Si Wafer caliber has reached up to 450 mm and relevant production technology has been advanced together. Electrostatic chuck is an important device utilized not only for the Wafer transport and fixation but also for the heat treatment process based on plasma. To effectively control the high calories generated by plasma, it employs a refrigerant-based cooling method. Amid the enlarging Si Wafers and semiconductor device integration, effective temperature control is essential. Therefore, uniformed temperature distribution in the electrostatic chuck is a key factor determining its performance. In this study, the form of refrigerant flow channel will be investigated for uniformed temperature distribution in electrostatic chuck.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2002년도 추계학술대회 논문집 전기물성,응용부문
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• pp.124-126
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• 2002

In this study, composite materials were put to dry interfacial treatment by use of plasma technology. It has been presented that the optimum parameters for the best wettability of the samples at the time of generation of plasma were oxygen atmosphere, 0.1 torr of system pressure, 100 W of discharge power, and 3 minutes of discharge time. Also, the surface resistance rate, dielectric property and tensile strength were improved.