• Title/Summary/Keyword: PLASMA SURFACE TREATMENT

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Effect of Pretreatment on the Dissolution of Aluminum Alloy during Hydration Process (수화과정에서 전처리가 알루미늄 합금의 용출에 미치는 효과)

  • Lee, Byoung-Gu;Lee, Hoyeon;Tak, Yongsug
    • Corrosion Science and Technology
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    • v.12 no.5
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    • pp.215-219
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    • 2013
  • Aluminum alloy(3003) can be dissolved during hydration process with hot tap water. In order to increase the stability of aluminum alloy, it was pretreated with anodization and phosphoric acid before hydration process. The effect of pretreatment on the surface property changes was analyzed with X-ray Photoelectron Spectroscopy (XPS) and Inductively Coupled Plasma-Optical Emission Spectrometer (ICP-OES) and their results supported that the increase of hydroxyl group (-OH) on the surface formed during anodization and phosphorous acid treatment prevented the dissolution of aluminum alloy during hydration process at high temperature.

Study on Finding Optimum Condition of Plasma Treatment on SiO2 Substrates to Reduce Contact Resistance at Graphene-Metal Interface (그래핀-금속 접촉 저항을 줄이기 위한 SiO2 기판 플라즈마 처리의 최적화 연구)

  • Gang, Sa-Rang;Ra, Chang-Ho;Lee, Dae-Yeong;Yu, Won-Jong
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2013.05a
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    • pp.96-96
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    • 2013
  • 그래핀과 금속 결합에서 발생하는 접촉 저항을 줄이기 위한 목적으로, 소자 제작에 사용되는 $SiO_2$ 기판의 표면을 플라즈마를 사용하여 에칭하는 최적의 조건에 대해 연구하였다. 기존에 발표된 연구 결과에 따라 $SF_6$$O_2$를 섞어 플라즈마 처리를 하였고, 플라즈마 방전에 사용 된 두 가스의 혼합 비율을 조절함으로써 소자 제작에 적합한 조건을 찾고자 하였다. 플라즈마 처리 전후의 $SiO_2$ 기판의 표면 측정은 AFM (Atomic Force Microscope)을 사용하였고, 단면은 SEM(Scanning Electron Microscope)을 통해 확인하였다.

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The effects of the plasma treatment on the electrical properties and stability of IZO-based TFTs (플라즈마 처리가 IZO기반 TFT의 전기적 특성과 신뢰성에 끼치는 영향)

  • Song, Chang-U;Hong, Chan-Hwa;Sin, Jae-Heon;Kim, Gyeong-Hyeon;Park, Rae-Man;Yang, Ji-Ung;Seo, U-Hyeong;Gwon, Hyeok-In;Jeong, U-Seok
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2014.11a
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    • pp.246-247
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    • 2014
  • 고사양을 요구하는 차세대 디스플레이용 소자 중 하나로 산화물 TFT(thin-film transistor)가 주목받고 있으며, 기존의 a-Si TFT보다 월등한 성능을 보인다. 소자의 특성을 개선시키기 위해 back channel 표면에 플라즈마 처리를 하였다. 플라즈마처리시 산소의 비중이 늘어날수록 산화물 TFT의 특성을 개선하는데 도움을 주는 것을 확인하였다.

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Enhanced Electrical & Environmental Properties of AgNWs through Plasma Treatment (플라즈마 처리를 통한 은 나노와이어의 특성 향상 기술)

  • Jeong, Seong-Hun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2016.11a
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    • pp.95-95
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    • 2016
  • 은나노와이어 투명전극은 높은 투과도와 높은 전도도를 가짐과 동시에 높은 유연성을 가지고 있어 차세대 투명전극으로 주목받고 있다. 많은 연구자들이 이를 이용하여 다양한 전자소자에 대한 적용 연구를 수행하고 있고, 터치스크린에 적용한 제품 등이 실제로 선보이고 있다. 하지만 ITO에 비해 높은 생산 단가와 낮은 열적, 환경적인 안정성은 이를 다양한 품목에서 실용화하는데에 있어 문제가 되고 있다. 은나노와이어에 장시간 열이 가해지거나, 습도에 노출되거나, 국소 부분에 높은 열/전류가 가해지게 되면 Rayleigh Instability 현상을 보이며 각각의 나노와이어가 끊어지는 현상이 발생한다. 또한, 공기 중의 수분에 의한 산화가 발생하는 문제도 존재한다. 이러한 문제를 해결하기 위해 상부에 이종의 물질을 덮어 Passivation을 수행하지만, 이는 생산 단가의 상승으로 이어진다. 본 연구에서는 플라즈마 기술을 활용하여 은나노와이어의 특성을 강화시키는 연구를 수행하였고, 이종의 물질 형성 없이 전기적, 환경적 안정성을 향상시킬 수 있었다. 또한 전기적 특성의 향상으로 인해 더 적은 은나노와이어의 양으로도 같은 전기적 특성을 가질 수 있었고, 이를 통해 높은 투과도/재료소모 절감의 효과를 동시에 얻을 수 있었다.

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Total Photoyields from CVD Diamond Surfaces and Their Electron Affinity

  • T.Ito;H.Yagi;N.Eimori;A.Hatta;A.Hiraki
    • The Korean Journal of Ceramics
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    • v.3 no.1
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    • pp.21-23
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    • 1997
  • Dependences of total photoyields on incident photon energies were measured using synchrotron radiation light for different chemical-vapor-deposited diamond with differently treated surface. Results show that a considerable amount of gap states are presented for as-grown specimens with H-terminated, that negative electron affinity (NEA) is realized for H-plasma-treated specimens, and that sufficient O-treatment to NEA specimens results in positive electron affinity. The observed electron affinity can be explained in terms of differences in strength of the surface dipole layer formed by difference in the electron negativity among C, H and O atoms.

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Duplex Surface Modification with Micro-arc Discharge Oxidation and Magnetron Sputtering for Aluminum Alloys

  • Tong, Honghui;Jin, Fanya;He, Heng
    • Journal of the Korean Vacuum Society
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    • v.12 no.S1
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    • pp.21-27
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    • 2003
  • Micro-arc discharge oxidation (MDO) is a cost-effective plasma electrolytic process which can be used to improve the wear and corrosion resistance of Al-alloy parts by forming a alumina coating on the component surface. However, the MDO coated Al-alloy components often exhibit relatively high friction coefficients and low wear resistance fitted with many counterface materials, additionally, the pitting corrosion for the MDO coated AI-alloy components, especially for a thinner alumina coating, often occurs in atmosphere circumstance due to the porous alumina coats. Therefore, a duplex treatment, combining a MDO coated ahumina thin layer with a TiN coating, prepared by magnetron sputtering (MS), has been investigated. The Vicker's microhardness, pin-on-disc, electrochemical measurement, salt spray, XRD and SEM tests were used to characterize and analyze the treated samples. The work demonstrates that the MDO/MS coated samples have a combination of a very low friction coefficient and good wear resistance as well as corrosion since the micro-holes on alumina coating are partly or fully covered by TiN material.

Controls of Graphene work function by using the chemical and plasma treatment

  • Lee, Seung-Hwan;Choe, Min-Seop;Im, Yeong-Dae;Ra, Chang-Ho;Mun, In-Yong;Yu, Won-Jong
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2012.05a
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    • pp.215-215
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    • 2012
  • 본 연구에서는 화학적 도핑 방법 및 플라즈마 표면 처리방법을 이용하여 그래핀 내 Electron & Hole carrier 들의 농도를 변화시켜, 전계효과에 따른 Graphene Field Effect Transistors (GFETs) 소자의 전기적 특성 변화를 확인 하였으며, 전기적 특성 결과 중에 Dirac-point (DP) 이동에 따른 그래핀 $E_F$ (Fermi-energy) level 변화를 계산 및 유추 하였으며, Ultraviolet Photoelectron Spectroscpy (UPS)를 이용하여 실제적으로 He 소스 광전자를 그래핀 샘플 표면에 입사하여 나오는 전자들의 Kinetic Energy($E_K$) 결과를 이용하여 Work function (WF) 변화를 확인 및 검증하였다.

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Improving CO2 Adsorption Performance of Activated Carbons Treated by Plasma Reaction with Tetrafluoromethane (사불화탄소 플라즈마 반응에 의해 처리된 활성탄소의 CO2 흡착 성능 향상)

  • Chung Gi Min;Chaehun Lim;Seo Gyeong Jeong;Seongjae Myeong;Young-Seak Lee
    • Applied Chemistry for Engineering
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    • v.34 no.2
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    • pp.170-174
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    • 2023
  • CO2 is known as one of the causes of global warming, and various studies are being conducted to capture it. In this study, a tetrafluoromethane (CF4) plasma reaction was performed to improve the CO2 adsorption of activated carbons (ACs) through changes in surface characteristics, and the adsorption characteristics according to the reaction time were considered. After the reaction, the micropore volume increased up to 1.03 cm3/g. In addition, as the reaction time increased, the fluorine content on the surface increased to 0.88%. It was possible to simultaneously control the pore properties and surface functional groups of the ACs through this experiment. Also, the CO2 uptake of surface-treated ACs improved up to 7.44% compared to untreated ACs, showing the best performance at 3.90 mmol/g when the reaction time was 60 s. This is due to the synergy effect of the fluorine functional groups introduced on the surface of the ACs and the increased micropore volume caused by the etching effect. It was found that the micropore volume had a greater effect on CO2 adsorption in the region where the CO2 uptake was less than 3.67 mmol/g, while the added fluorine content had a greater effect in the region above that.

Effect of Heat Treatment on Interface Behavior in Ni-P/Cr Double Layer (열처리 시간에 따른 Ni-P/Cr 이중 도금 층의 계면 거동에 관한 연구)

  • Choi, Myung-Hee;Park, Young-Bae;Rhee, Byong-ho;Byon, Eungsun;Lee, Kyu Hwan
    • Journal of the Korean institute of surface engineering
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    • v.48 no.6
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    • pp.260-268
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    • 2015
  • The thermal barrier coating (TBC) for inner wall of liquid-fuel rocket combustor consists of NiCrAlY as bonding layer and $ZrO_2$ as a top layer. In most case, the plasma spray coating is used for TBC process and this process has inherent possibility of cracking due to large difference in thermal expansion coefficients among bonding layer, top layer and metal substrate. In this paper, we suggest crack-free TBC process by using a precise electrodeposition technique. Electrodeposited Ni-P/Cr double layer has similar thermal expansion coefficient to the Cu alloy substrate resulting in superior thermal barrier performance and high temperature oxidation resistance. We studied the effects of phosphorous concentrations (2.12 wt%, 6.97 wt%, and 10.53 wt%) on the annealing behavior ($750^{\circ}C$) of Ni-P samples and Cr double layered electrodeposits. Annealing temperature was simulated by combustion test condition. Also, we conducted SEM/EDS and XRD analysis for Ni-P/Cr samples. The results showed that the band layers between Ni-P and Cr are Ni and Cr, and has no formed with heat treatment. These band layers were solid solution of Cr and Ni which is formed by interdiffusion of both alloy elements. In addition, the P was not found in it. The thickness of band layer was increased with increasing annealing time. We expected that the band layer can improve the adhesion between Cr and Ni-P.

Study of surface modification and contact angle by electrospun PVdF-HFP membrane with DLC coating (DLC 코팅에 의한 PVdF-HFP 막의 표면변화 및 접촉각 연구)

  • Lee, Tae Dong;Cho, Hyun;Yoon, Su Jong;Kim, Tae Gyu
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.24 no.1
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    • pp.33-40
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    • 2014
  • Poly vinylidene fluoride-co-hexafluoropropylene (PVdF-HFP) membrane were prepared by the electrospinning technique. We had applied a DLC coating process and then the surface of the membrane and the contact angle change was investigated. Electrospun fibrous PVdF-HFP membrane surface became to wrinkled shape by Ar plasma treatment and treatment conditions. The wrinkled surface of PVdF-HFP membrane became super-hydrophilic. However, after DLC coating process, it became super-hydrophobic. The resulting surfaces were characterized by water contact angle measurement, X-ray photoelectron spectroscopy (XPS) and field emission scanning electron microscopy (FE-SEM). Resultantly it was recognized that the wettability characteristics of the membrane surfaces depended on the chemical composition and surface morphology.