• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2011.05a
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• pp.100-101
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• 2011

사출금형은 자동차의 경량화 요구에 따라 일반 엔지니어링 플라스틱에서 고강도 플라스틱 성형을 위한 사용 환경으로 변해가고 있다. 이에, 사출금형의 표면은 마모에 대한 내력을 갖는 고경도 특성과 수지의 유동성을 양호하게 하기 위한 저마찰 특성의 요구가 점차 증가하고 있다. 본 연구는 사출금형 소재 표면의 고경도 저마찰 특성 부여를 위하여 대형 플라즈마 표면처리 공정을 이용하여 각각 질화처리와 비정질 탄소 코팅 공정기술에 관한 연구를 수행하였다. 각각의 플라즈마 처리된 샘플은 표면처리 공정 변수에 따른 경도 및 마찰계수 평가를 통하여 사출금형 소재 표면의 물리적 특성 변화를 관찰하였다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2008.11a
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• pp.33-33
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• 2008

산소 플라스마를 이용하여 마그네슘 판재를 표면처리한 후 내식성 변화를 관찰하였다. 마그네슘 판재표면처리 시 표면처리 온도, 표면처리 전압, 공정 가스 유량비 등의 변수에 대한 효과를 분석하여 최적 조건을 도출하였다. 표면처리 온도가 높을 경우, 마그네슘 판재의 내식성이 향상되었으며, 표면처리 전압이 일정한 값보다 높으면 이온의 운동 에너지가 증가하여 마그네슘 판재 표면에 손상을 입혀 오히려 내식성이 나빠지는 현상을 보였다. 공정 가스는 산소만을 사용하여 표면 처리할 경우, 마그네슘 판재의 내식성이 향상되는 현상을 관찰하였다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.11a
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• pp.17-18
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• 2007

진공 용기 내에서 펄스 전원 공급 장치를 이용하여 아르곤과 산소 분위기에서 발생시킨 글로 방전으로 마그네슘 판재의 표면을 처리하여 내식성 변화를 관찰하였다. 마그네슘 판재의 내식성 평가를 위하여 염수분무 시험을 실시 하였으며, 마그네슘 판재의 표면 변화를 관찰하기 위해서 x-선 분광기를 이용하였다. 글로 방전에 의해 표면 처리된 마그네슘 판재는 표면처리를 하지 않은 마그네슘 판재보다 높은 내식성을 보여주었다. x-선 분광기 분석결과, 글로 방전에 의해 마그네슘 판재 표면에 산화막이 형성되는 것을 관찰하였다.

• Journal of the Semiconductor & Display Technology
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• v.18 no.4
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• pp.120-123
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• 2019

The effect of surface plasmon on ZTO thin films was investigated. The phenomenon of depletion occurring in the interface of the ZTO thin film created a potential barrier and the dielectric layer of the depletion formed a non-mass particle called plasmon. ZTO thin film represents n-type semiconductor features, and surface current by plasma has been able to obtain the effect of improving electrical efficiency as a result of high current at positive voltage and low current at negative voltage. It can be seen that the reduction of electric charge due to recombination of electronic hole pairs by heat treatment of compound semiconductors induces higher surface current in semiconductor devices.

• Journal of Korean Vacuum Science & Technology
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• v.6 no.2
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• pp.62-66
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• 2002

Hydraulic pumps are used to control the landing wheels of aircrafts, and their proper operation is vital to plane safety It is well hewn that adhesive wear failure is a major cause of pump failure. A dual nitrogen plasma immersion ion implantation process calling for the implantation of nitrogen at two different energies and doses has been developed to enhance the surface properties of the disks in the pumps. The procedures meet the strict temperature requirement of <200$^{\circ}C$, and after the treatment, the working lifetime of the pumps increases by more than a factor of two. This experimental protocol has been adopted by the hydraulic pump factory as a standard manufacturing procedure.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.859-862
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• 2003

Well-aligned multiwall carbon nanotubes (MWCNTs) were prepared at low temperature of 400 $^{\circ}C$ by utilizing a radio frequency plasma-enhanced chemical vapor deposition (rf-PECVD) system. The MWCNTs were treated by an external rf plasma source and an ultra-violet laser in order to modify structural defect of carbon nanotube and to ablate possible contamination on carbon nanotube surface. Structural properties of carbon nanotubes were investigated by using a scanning electron microscopy (SEM), Raman spectroscopy, Fourier transformer Infrared spectroscopy (FTIR) and transmission electron microscope (TEM). In addition, the emission properties of the MWNTs were measured for the application of field emission display (FED) in near future. Various post treatments were found to improve the field emission property of carbon nanotubes.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2001.11a
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• pp.322-330
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• 2001

The plasma-sprayed 8％Y$_2$O$_3$-Zirconia coating was studied to know the relationship between phase transformation and wear properties after several heat treatment. Wear tests were carried out with ball on disk on 50N, 70N, 90N. The specimen in this study was cast iron and tests were performed on room temperature. The transformation of phase and residual stress was measured by x-ray diffraction method(XRD) and worn surface were observed by SEM.

• Korean Journal of Air-Conditioning and Refrigeration Engineering
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• v.14 no.10
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• pp.781-785
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• 2002

The effects of different surfaces on dry and wet frosting test were experimentally investigated. The results of experiment were compared by the performance evaluation coefficient (PEC). Results showed that the air-side pressure drop of lacquer coated evaporator increased by 5% as compared to the plasma treated one. It was also found that the Plasma coated evaporator is lower than lacquer coated one in the PEC ratio.

• Journal of the Semiconductor & Display Technology
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• v.15 no.3
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• pp.72-77
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• 2016

As the semiconductor production technology has gradually developed and intra-market competition has grown fiercer, the caliber of Si Wafer for semiconductor production has increased as well. And semiconductors have become integrated with higher density. Presently the Si Wafer caliber has reached up to 450 mm and relevant production technology has been advanced together. Electrostatic chuck is an important device utilized not only for the Wafer transport and fixation but also for the heat treatment process based on plasma. To effectively control the high calories generated by plasma, it employs a refrigerant-based cooling method. Amid the enlarging Si Wafers and semiconductor device integration, effective temperature control is essential. Therefore, uniformed temperature distribution in the electrostatic chuck is a key factor determining its performance. In this study, the form of refrigerant flow channel will be investigated for uniformed temperature distribution in electrostatic chuck.

• Proceedings of the KIEE Conference
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• 2002.11a
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• pp.124-126
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• 2002

In this study, composite materials were put to dry interfacial treatment by use of plasma technology. It has been presented that the optimum parameters for the best wettability of the samples at the time of generation of plasma were oxygen atmosphere, 0.1 torr of system pressure, 100 W of discharge power, and 3 minutes of discharge time. Also, the surface resistance rate, dielectric property and tensile strength were improved.