• Title/Summary/Keyword: PECVD system

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Inductively Coupled Plasma Chemical Vapor Deposition System for Thin Film Ppassivation of Top Emitting Organic Light Emitting Diodes (전면발광 유기광소자용 박막 봉지를 위한 유도결합형 화학 기상 증착 장치)

  • Kim Han-Ki
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.6
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    • pp.538-546
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    • 2006
  • We report on characteristics of specially designed inductively-coupled-plasma chemical vapor deposition (ICP-CVD) system for top-emitting organic light emitting diodes (TOLEDs). Using high-density plasma on the order of $10^{11}$ electrons/$cm^3$ generated by linear-type antennas connected in parallel and specially designed substrate cooling system, a 100 nm-thick transparent $SiN_{x}$ passivation layer was deposited on thin Mg-Ag cathode layer at substrate temperature below $50\;^{\circ}C$ without a noticeable plasma damage. In addition, substrate-mask chucking system equipped with a mechanical mask aligner enabled us to pattern the $SiN_x$ passivation layer without conventional lithography processes. Even at low substrate temperature, a $SiN_x$ passivation layer prepared by ICP-CVD shows a good moisture resistance and transparency of $5{\times}10^{-3}g/m^2/day$ and 92 %, respectively. This indicates that the ICP-CVD system is a promising methode to substitute conventional plasma enhanced CVD (PECVD) in thin film passivation process.

The annealing method of nickel electrode for C-silicon solar cell (결정질 태양전지에서 니켈 전극 사용을 위한 열처리 방안)

  • Jung, W.W.;Kim, S.C.;Kyung, D.H.;Kwon, T.Y.;Lee, Y.S.;Heo, Y.S.;Park, S.I.;Yi, J.S.
    • Proceedings of the KIEE Conference
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    • 2009.04b
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    • pp.248-250
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    • 2009
  • 고효율 태양전지를 위한 결정질 태양전지의 구조 중 UNSW에서 개발한 BCSC(buried contact solar cell)가 있는데, 이는 전면 전극을 laser 처리 후 무전해 니켈 도금으로 형성한 것이다. 이같은 전면 전극을 형성하기 위해서는 무전해 nickel 도금 후 열처리가 필수적이다. 우리는 이 공정을 확립하기 위해 결정질 wafer에 후면을 PECVD로 SiNx막을 형성하여 $30\Omega/\square$로 도핑한 후 후면을 불산으로 제거한 상태에서 양면을 니켈 무전해 도금으로 전극을 형성하여 $300^{\circ}C,\;350^{\circ}C,\;400^{\circ}C$에서 각각 3,6,9분간 진행하였다. 그 결과 $400^{\circ}C$에서 3분간 열처리된 sample이 상대적으로 가장 명확한 IV curve를 형성하였다. 이 실험의 결과는 PN 접합 구조에서 전극을 nickel로 사용할 때 유용하게 사용될 수 있다.

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Reliability Improvement of the Electro Optical Tracking System by using DLC Films (DLC 박막을 통한 전자광학추적장비 신뢰성 개선)

  • Shim, Bo-Hyun;Jo, Hee-Jin;Kim, Jang-Eun
    • Journal of the Institute of Electronics and Information Engineers
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    • v.52 no.5
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    • pp.197-205
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    • 2015
  • The Diamond Like Carbon(DLC) films for the Electro Optical Tracking System(EOTS) by using Plasma Enhanced Chemical Vapor Deposition(PECVD) method is presented. We achieve that the DLC films can reduce the surface delamination of thermal observation sensor front window due to the high hardness, low friction and chemical inertness which is comparable to a Si film. According to our experiment results, DLC films can be used for various electro optical systems to eliminate surface delamination.

Design of Pad Type Air-Bearing for LCD Inspection (LCD 검사 장비용 패드형 에어베어링 설계)

  • Oh, Hyun-Seong;Lee, Sang-Min;Park, Jeong-Woo;Kim, Yong-Woo;Lee, Deug-Woo
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.9
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    • pp.103-109
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    • 2007
  • LCD (Liquid Crystal Display) is widely used electronic product. It needs too many processes such as PECVD (Plasma Enhanced Vapor Deposition), Sputtering, Photo-lithography, Dry etch. Each process is important but inspection process is more important because most companies emphasis on the six sigma. Recently, LCD inspection system is composed with inlet, inspector, outlet air pads. LCD is inspected on air pad which is shooting air from air hole. This paper studies on pad design of air bearing for LCD inspection to minimize LCD fluctuation. This design is able to reduce fluctuation and then satisfies CCD inspectional range. Also inspection pad needs to adequate stable area.

The efficiency charateristics of intrinsic layer thickness dependence for amorphous silicon single junction solar cells (Intrinsic layer 두께 가변에 따른 단일접합 비정질 박막 태양전지의 효율 특성 변화)

  • Yoon, Ki-Chan;Kim, Young-Kook;Heo, Jong-Kyu;Choi, Hyung-Wook;Yi, Young-Suk;Yi, Jun-Sin
    • 한국신재생에너지학회:학술대회논문집
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    • 2009.06a
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    • pp.80-82
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    • 2009
  • The dependence of the efficiency characteristics of hydrogenated amorphous silicon single junction solar cells on the various intrinsic layer thickness has been investigate in the glass/$SnO_2$:F/p,i,n a-Si:H/Al type of amorphous silicon solar cells by cluster PECVD system. The open circuit voltage, short circuit current, fill factor and conversion efficiency have been measured under AM 1.5 condition. The result of the cell performance was improved about 8.2% due to an increase in the short circuit current.

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In-situ rf treatment of multiwall carbon nanotube with various post techniques for enhanced field emission

  • Ahn, Kyoung-Soo;Kim, Jun-Sik;Kim, Ji-Hoon;Kim, Chae-Ok;Hong, Jin-Pyo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.859-862
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    • 2003
  • Well-aligned multiwall carbon nanotubes (MWCNTs) were prepared at low temperature of 400 $^{\circ}C$ by utilizing a radio frequency plasma-enhanced chemical vapor deposition (rf-PECVD) system. The MWCNTs were treated by an external rf plasma source and an ultra-violet laser in order to modify structural defect of carbon nanotube and to ablate possible contamination on carbon nanotube surface. Structural properties of carbon nanotubes were investigated by using a scanning electron microscopy (SEM), Raman spectroscopy, Fourier transformer Infrared spectroscopy (FTIR) and transmission electron microscope (TEM). In addition, the emission properties of the MWNTs were measured for the application of field emission display (FED) in near future. Various post treatments were found to improve the field emission property of carbon nanotubes.

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고밀도 플라즈마를 이용한 STI 공정에 적용되는 $SiO_2$ 절연막의 균일성 연구

  • Kim, Su-In;Lee, Chang-U;Hong, Sun-Il
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.183-183
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    • 2010
  • 최근 고밀도 플라즈마(High Density Plasma, HDP)를 이용하여 STI (shallow trench Isolation) 공정에 사용하기 위한 높은 종횡비를 가지는 갭을 공극 없이 절연물질로 채우는 HDP CVD 법이 개발되어 사용되고 있으며, HDP 공정에서는 그 증착 과정 중에 스퍼터링(Sputtering)에 의한 식각이 동시에 발생하기 때문에 높은 종횡비를 가지는 갭을 공극 없이 채우는 것이 가능하게 되었다. 이러한 특성을 이용하여 HDP CVD 공정은 주로 STI 와 알루미늄 배선간의 갭을 실리콘 산화막 ($SiO_2$)의 절연막으로 채우는 데 주로 사용되고 있다. 이 논문에서는 새로 개발된 HDP CVD 법을 적용하여 300 mm Si 웨이퍼에 $SiO_2$ 절연막을 증착하여 웨이퍼의 중심과 가장자리의 deposition uniformity를 nano-indenter system을 이용하여 연구하였으며, 그 결과 300 mm 웨이퍼에서 균일한 탄성계수 값이 측정되었다. 또한 HDP CVD로 제작된 SiO2 박막의 탄성계수 값이 99 - 107 GPa로 측정되어 기존 PECVD-$SiO_2$ 박막보다 약 10 - 20% 향상된 것을 확인하였다.

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Plasma Synthesis of Silicon Nanoparticles for Next Generation Photovoltaics

  • Kim, Ka-Hyun;Kim, Dong Suk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.135.1-135.1
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    • 2014
  • Silicon nanoparticles can be synthesized in a standard radio-frequency glow discharge system at low temperature (${\sim}200^{\circ}C$). Plasma synthesis of silicon nanoparticles, initially a side effect of powder formation, has become over the years an exciting field of research which has opened the way to new opportunities in the field of materials deposition and their application to optoelectronic devices. Hydrogenated polymorphous silicon (pm-Si:H) has a peculiar microstructure, namely a small volume fraction of plasma synthesized silicon nanoparticles embedded in an amorphous matrix, which originates from the unique deposition mechanism. Detailed discussion on plasma synthesis of silicon nanoparticles, growth mechanism and photovoltaic application of pm-Si:H will be presented.

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External rf plasma treatment effect on multi-wall carbon nanotubes grown inside anodic alumina nanoholes at low deposition temperatures

  • Ahn, Kyoung-Soo;Kim, Jun-Sik;Kim, Eun-Kyu;Kim, Chae-Ok;Hong, Jin-Pyo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.692-693
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    • 2002
  • Well-aligned multi-wall carbon nanotubes (MWNTs) were fabricated by utilizing a radio frequency plasma-enhanced chemical vapor deposition (rf-PECVD) system from Ni particles at the bottom of anodic alumina nanoholes (AAN). To remove the amorphous graphite layers on the AAN surface and to eliminate the protrusion of MWNT tips, the AAN surface with MWNTs were treated by external rf plasma source. As a result, the AAN surface almost became flat without having any protrusion of MWNT tips. The diameter, length of MWNTs and AAN were investigated by using a scanning electron microscopy (SEM). Raman spectroscopy was also used to characterize wall structure of the carbon nanotube. And the emission properties of the MWNTs were measured for the application of field emission display (FED) in near future.

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Multidirectional Liquid Crystal Orientation by Using Ion Beam Irradiation

  • Ahn, Han-Jin;Kim, Kyung-Chan;Kim, Jong-Bok;Hwang, Byung-Har;Baik, Hong-Koo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07a
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    • pp.543-546
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    • 2005
  • We have investigated the alignment ability of multi-domains by using ion beam irradiation on diamond-like carbon (DLC) thin film layers. The DLC thin films were deposited by plasma enhanced chemical vapor deposition (PECVD) system and the low energy ion beam is irradiated from Kaufman type ion gun. The direction of liquid crystal alignment is varied by the direction of Ar ion beam irradiation.

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