Manostructural and Optical Features of Nano-crystalline Si Fims preparted by PECVD and RF Magnetron Sputter Techniques (PECVD 및 RF마그네트론 스퍼터 기법을 이용하여 제조된 나도 결정 Si 박막의 나노구조 및 광학적 특성)

• 한규호;박명범;조남희
• • Proceedings of the Materials Research Society of Korea Conference
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  • 2001.05a
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  • pp.102-102
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  • 2001
• PDF

THE COMPOSITIONAL AND STRUCTURAL ANALYSIS OF ALUMINUM OXIDE FILMS DEPOSITED BY PECVD (PECVD 방법으로 증착된 알루미늄 산화박막의 조성 및 구조 분석)

• 김용천;이원종;천성순
• • Proceedings of the Materials Research Society of Korea Conference
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  • 1992.05a
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  • pp.30-31
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  • 1992
• PDF

Effects of Annealing Conditions on PECVD $Ta_{2}O_{5}$ Film on Silicon Substrate (열처리 조건이 PECVD $Ta_{2}O_{5}$ 박막 특성에 미치는 영향)

• 백용구;박영진;김종철;박헌섭
• • Proceedings of the Materials Research Society of Korea Conference
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  • 1992.05b
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  • pp.140-141
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  • 1992
• PDF

Deposition of $Si_{3}N_{4}$ on Si and InP by PECVD (Si 및 InP 위에 PECVD법에 의한 $Si_{3}N_{4}$의 증착)

• 김남준;유순재;김앙서;이두환
• • Proceedings of the Materials Research Society of Korea Conference
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  • 1992.05b
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  • pp.158-158
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  • 1992
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Effect of Reaction Gas on the Structural and Optical Features of nc-Si:H thin Films Prepared by PECVD Techniques (PECVD 기법에의해 제조된 나노 결정 Si 박막의 구조 및 광학적 특성)

• Sim, Jae-Hyeon;Jo, Nam-Hui
• • Proceedings of the Korean Ceranic Society Conference
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  • 2003.04a
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  • pp.231.2-231
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  • 2003
• PDF

Physical analysis of silicon oxynitride deposited by PECVD (PECVD 법으로 증착된 silicon oxynitride 의 물성 분석)

• Jo, Yu-Jeong;Han, Gil-Jin;Kim, Yeong-Cheol
• • Proceedings of the Materials Research Society of Korea Conference
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  • 2005.05a
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  • pp.242-242
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  • 2005
• PDF

Electrical Characteristics of Silicon Oxynitride Thin Films Fabricated by ECR PECVD at Room Temperature (상온에서 ECR PECVD에 의해 형성된 실리콘 산화질화막의 전기적 특성)

• 이호영;전유찬;주승기
• • Proceedings of the Materials Research Society of Korea Conference
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  • 1993.11a
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  • pp.81-82
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  • 1993
• PDF

A Study on the dielectric $Al_{2}O_3$ thin films prepared by ECR-PECVD (ECR-PECVD법으로 증착된 $Al_{2}O_3$ 절연 박막의 특성에 관한 연구)

• 이재균;전병혁;이원종
• • Proceedings of the Materials Research Society of Korea Conference
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  • 1993.11a
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  • pp.117-117
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  • 1993
• PDF

Effect of Substrate Temperature on the Recrystal1ization of Amorphous Si1icon Films Deposited by PECVD (증착 온도가 PECVD 비정질 Si 박막의 고상 결정화에 미치는 영향)

• 문대규;이정노;안병태;임호빈
• • Proceedings of the Materials Research Society of Korea Conference
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  • 1993.11a
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  • pp.149-149
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  • 1993
• PDF

ION IRRADIATION EFFECT ON PECVD SILICON NITRIDE FILMS (PECVD 실리콘질화막에 대한 이온빔 방사효과)

• 이상환;이중환;서경수;박형호;조경익
• • Proceedings of the Materials Research Society of Korea Conference
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  • 1993.11a
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  • pp.77-77
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  • 1993
• PDF

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