• Journal of the Korean Institute of Gas
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• v.26 no.5
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• pp.35-40
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• 2022

PCVD (Plasma Chemical Vapor Deposition), a solar cell manufacturing facility, is a facility that deposits plasma generated in a chamber (NH₃, SIH₄, O₂ on a wafer. In the PCVD facility, gas movement and injection is performed in the gas cabinet, and there are many leak points inside because MFC, regulator, valve, pipe, etc. are intricately connected. In order to prevent explosion in case of leakage of NH₃ with an upper explosive limit (UEL) of 33.6% and a lower explosive limit (LEL) of 15%, the dilution capacity must be capable of allowing the concentration of NH₃ to be out of the explosive range. This study was analyzed using the CFD analysis technique, which can confirm the dilution ability in 3D and numerical values when NH₃ gas leaks from the existing PCVD gas cabinet. As a result, it was concluded that it corresponds to medium dilution and that testicular ventilation is possible through facility improvement.

• Proceedings of the KIEE Conference
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• 1996.07c
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• pp.1492-1494
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• 1996

We have studied the generation, growth and behavior of chemical species and particles in silane PCVD. We included the plasma chemistry of silane, particle nucleation by homogeneous formation, acrosol dynamics and transport phenomena of chemical species and particles. The concentration profile of chemical species and particles were shown as a function of reactor length. The effects of process variables such as reactor pressure, total gas flow rate and electrical field strength on the behavior of chemical species and particles were analyzed.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2009.05a
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• pp.151-152
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• 2009

We coated $TiO_2$ thin films on particles by a rotating cylindrical plasma chemical vapor deposition (PCVD) process and investigated the effects of various process variables on the morphology and growth of thin films. The polypropylene (PP) particles were rotated with the cylindrical PCVD reactor and they were coated with $TiO_2$ thin films uniformly by the deposition of thin mm precursors in the gas phase. The $TiO_2$ thin films were coated on the PP particles uniformly and the thickness of thin films almost proportional to the deposition time. The $TiO_2$ thin films grew more quickly on the PP particles with increasing rotation speed of the reactor. This study shows that a rotating cylindrical PCVD reactor can be a good method to coat high-quality $TiO_2$ thin films uniformly on particles.

• Korean Journal of Materials Research
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• v.7 no.12
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• pp.1070-1076
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• 1997

DLC(diamond-like carbon)박막을 RF PCVD법으로 증착하여 일반적인 증착특성과 마찰.마모특성사이의 관계를 알아보기 위해, 증착속도, 박막경도, 내무압축응력 및 박막내의 수소량 측정을 통해 일반적인 증착특성을 조사하였다. 그리고 증착된 박막의 C-H 결합구조와 물질특성 분성을 위해 각각 FTIR 및 Raman분광분석을 행하였다. 박막의 마찰계수와 내마모특성은 Pin-on-disk형 마찰시험기를 이용하여 상기의 증착조건과의 상관관계를 조사하였다. DC self-bais, 즉 충돌에너지가 커지면 박막의 증착속도와 경도는 대체로 증가하고, 박막내의 압축응력은 최대값을 가지다가 다시 감소됨을 알 수 있언ㅆ다. 또한 박막내의 수소량은 급격히 감소하다가 포화됨을 알 수 있었다. 얻어진 박막의 마찰계수는 최소 0.08로 분위기가 dry일 때 더 작으며 내마모성은 이온의 충돌에너지와 밀접한 관계를 가지며 모재인 Si-wafer보다 훨씬 큼을 알수 있었다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2009.10a
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• pp.185-185
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• 2009

Polypropylene beads (PP) coated with $TiO_2$ thin films were prepared by a rotating cylindrical plasma chemical vapor deposition (PCVD) reactor and were used to remove phenol in aqueous solution. The $TiO_2$ thin films of 416 nm thickness were coated on the PP particles uniformly. As the number of $TiO_2$-coated PP beads increases, the phenol is degraded faster, because of larger total surface area of photocatalysts for photodegradation. This study shows that a rotating cylindrical PCVD reactor can be a good method to prepare the particles coated with high-quality $TiO_2$ thin films, which can be applied to the pollutant removal by a photodegradation reaction of $TiO_2$ with high efficiency.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2009.10a
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• pp.177-178
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• 2009

DLC (Diamond-like Carbon) 코팅막은 저마찰, 고경도, 낮은 표면조도 등의 우수한 특성을 갖는 박막 물질로 다양한 산업분야에서 그 코팅막의 활용을 목적으로 응용연구가 활발하게 이루어지고 있다. 본 연구에서는 플라즈마 화학기상증착(PCVD) 공정을 이용하여 바이어스, 진공도, 공정 온도 등의 코팅 조건 변수를 이용하여 DLC 코팅막을 제작하였다. 또한, 코팅막은 공정 조건에 따라 증착속도, 표면 및 단면 조직, 밀착력, 경도, 마찰계수 등의 특성을 평가하였다. 플라즈마 화학기상증착법을 이용한 DLC 코팅막 제조는 상온과 $175^{\circ}C$에서 이루어졌으며, 저온 중 DLC 코팅막 제조가 가능해짐에 따라 고분자 와 같은 저융점을 갖는 피처리물의 코팅처리가 가능하여 산업적 응용의 확대가 기대된다. SEM 표면 조직 관찰에 따른 DLC 코팅막의 표면조직과 조도는 공정조건에 따라 큰 차이는 보이지 않았지만, 밀착력에 있어서는 매우 큰 차이를 나타내었다. 스크래치 시험 결과 가장 높은 밀착력은 100 N 이상을 나타내었으며, 이 때의 마찰계수는 약 0.02를 나타내었다. 가장 낮은 마찰계수는 약 0.01을 보였으며, 이때의 밀착력은 25 N을 나타내었다. 증착속도는 바이어스 전압의 증가에 따라 증가하는 경향을 나타내었으며, 온도의 증가에 따라 감소하는 경향을 나타내었다.

• Proceedings of the Korean Vacuum Society Conference
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• 1997.07a
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• pp.202-203
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• 1997

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.11a
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• pp.108-109
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• 2012

DLC 박막은 고경도 및 저마찰의 우수한 물리적 특성을 갖는 것으로 널리 알려져 다양한 산업분야에 적용이 되고 있다. 또한, 그 응용 분야 확대를 위해 DLC 박막의 후막화, 대면적 균일처리, 경제성 확보 등의 연구 노력이 지속되고 있다. 특히, DLC 박막은 높은 내부응력에 의해 후막화가 어렵고, 탄소와 수소의 화학적 결합에 의한 고형 물질로 내열성이 다른 경질코팅 물질 보다 취약하다는 단점을 갖고 있다. 본 연구는 DLC 박막의 내부응력 완화를 위해 실리콘 및 질소 원소를 함유하여 박막을 제작하고, 제작 공정 조건이 박막의 물성에 미치는 영향을 연구하였다.

• Journal of the Korean Vacuum Society
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• v.7 no.s1
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• pp.140-148
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• 1998

We prepared $C_3N_4$ films by rf plasma enhanced chemical vapor deposition(PCVD) and alternating $C_3N_4$/TiN composite films by dc magnetron sputtering. X-ray diffraction (XRD) and transmission electron diffraction (TED) revealed that the structure of the films is amorphous or polycrystalline, depending on deposition conditions and heat treatment. X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FTIR) spectroscopy confirmed the presence of $sp_3\; and sp _2$ hybridized C atoms bonded with N atoms in the tetrahedral and hexagonal configurations, respectively. Graphite-free $C_3N_4$ films were obtained by PCVD under optimal conditions. To prepare well crystallized $C_3N_4$ films by magnetron sputtering, we introduced negatively biased gratings in the sputtering system. CN films deposited at grating voltages (Vg) lower than 400V are amorphous. Crystallites of cubic and $\beta$-$C_3N_4$ were formed at increased voltages.

• Korean Journal of Veterinary Service
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• v.37 no.4
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• pp.253-261
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• 2014

Porcine circovirus disease (PCVD) is a major problem of swine industry worldwide, and diagnosis of PCV2, causal agent of PCVD, has been doing in clinical laboratories of pig disease by polymerase chain reaction (PCR) methods. But the PCR analyses have a serious problem of misdiagnosis by contamination of DNA, in particular, from carryover contamination with previously amplified DNA or extracted DNA from field samples. In this study, an uracil DNA glycosylase (UNG)-based direct PCR (udPCR) without DNA extraction process and DNA carryover contamination was developed and evaluated on PCV2 culture and field pig samples. The sensitivity of the udPCR combined with dPCR and uPCR was same or better than that of the commercial PCR (cPCR) kit (Median diagnostics, Korea) on PCV2-positive serum, lymph node and lung samples of the pigs. In addition, the udPCR method confirmed to have a preventing ability of mis-amplification by contamination of pre-amplified PCV2 DNA from previous udPCR. In clinical application, 170 pig samples (86 tissues and 84 serum) were analysed by cPCR kit and resulted in 37% (63/170) of positive reaction, while the udPCR was able to detect the PCV2 DNA in 45.3% (77/170) with higher sensitivity than cPCR. In conclusion, the udPCR developed in the study is a time, labor and cost saving method for the detection of PCV2 and providing a preventing effect for DNA carryover contamination that can occurred in PCR process. Therefore, the udPCR assay could be an useful alternative method for the diagnosis of PCV2 in the swine disease diagnostic laboratories.