• Proceedings of the Optical Society of Korea Conference
• /
• 2003.02a
• /
• pp.146-147
• /
• 2003

무선 통신 시스템이 발달하고 정보의 양이 많아짐에 따라 고주파를 이용한 통신 시스템에 대한 수요가 증가하고 있다. 최근 이러한 고주파 통신 시스템을 optical fiber를 이용하여 구현(Radio-on-fiber system)하는 연구가 주목받고 있다. 무선 고주파 통신 시스템에서는 많은 수의 안테나 기지국이 필요하게 되는데 optical fiber를 이용하면 적은 전송 손실로 기지국간의 연결이 가능하게 된다. 안테나 기지국의 구축을 위해서 최근 InP High Electron Mobility Transistor(HEMT)를 이용하여 광 검출을 구현하는연구가 활발히 진행되고 있다. (중략)

• Proceedings of the IEEK Conference
• /
• 2000.11a
• /
• pp.369-372
• /
• 2000

본 논문에서는 P-HEMT Gate-바이어스 튜닝에 의한 위상동기 마이크로파 발진기를 설계하였다. 설계된 유전체 발진기는 병렬궤환공진 형태로서 P-HEMT의 게이트단에서 전압을 제어하여 전압제어발진기 형태로 주파수를 가변시키므로서 안정된 위상동기신호를 나타나도록 하였다. 위상동기방식은 외부에서 제공되는 125㎒의 기준주파수를 SRD로 체배시켜 하모닉 신호를 이용한 마이크로파 샘플링 위상검파 방식으로 설계하였으며, 유전체 발진기의 자유발진신호와 샘플링 신호사이의 위상비교에 의하여 ±1㎒ 범위의 고안정 특성을 갖는 13.25㎓대역의 위상고정 발진기의 동기화와 저 위상잡음을 나타내었다.

• Proceedings of the IEEK Conference
• /
• 2000.11b
• /
• pp.17-20
• /
• 2000

We have enhanced the yield of 0.25 ${\mu}{\textrm}{m}$ T-gate $Al_{0.25}$G $a_{0.75}$As/I $n_{0.2}$G $a_{0.8}$As P-HEMT using three-layer E-beam lithography process and selective etching process. The three-layer resist structure (PMMA/copolymer/ PMMA=2000 $\AA$/3000 $\AA$/2000 $\AA$) and three developers (Benzene：IPA=1：1,Methanol：IPA =1：1,MIBK：IPA=1：3) were used for fabrication of a wide-head T-gate by the conventional double E-beam exposure technology. Also 1 wt% citric acid： $H_2O$$_2$：N $H_{4}$OH(200m1：4ml：2.2ml) solution were used for uniform gate recess. The etching selectivity of GaAs over $Al_{0.25}$G $a_{0.75}$As is measured to be 80. So these P-HEMT processes can be used in X-band MMIC LNA fabrication.ion.ion.ion.

• JSTS:Journal of Semiconductor Technology and Science
• /
• v.1 no.2
• /
• pp.111-115
• /
• 2001

Metamorphic InAlAs/InGaAs HEMT are successfully demonstrated, exhibiting several advantages over conventional P-HEMT on GaAs and LM-HEMT on InP substrate. The strain-relaxed metamorphic structure is grown by MBE on the GaAs substrate with the inverse-step graded InAlAs metamorphic buffer. The device with 40% indium content shows the better characteristics than the device with 53% indium content. The fabricated metamorphic HEMT with $0.2\mu\textrm{m}$T-gate and 40% indium content shows the excellent DC and microwave characteristics of $V_{th}-0.65V,{\;}g_{m,max}=620{\;}mS/mm,{\;}f_T120GHZ{\;}and{\;}f_{max}=210GHZ$.

• The Journal of the Korea institute of electronic communication sciences
• /
• v.6 no.5
• /
• pp.621-627
• /
• 2011

In this paper, we analysed performance for on-wafer GaN HEMT using load-pull in X-band, and studied optimum impedance point based on analysis result. We suggested method of optimum performance device by analysis of optimum impedance for solid state device on-wafer condition before packaging. The measured device is gate length 0.25um, and gate width is 400um, 800um. device 400um is performed $P_{sat}$=33.16dBm, PAE=67.36%, Gain=15.16dBm, and device 800um is performed $P_{sat}$=35.91dBm, PAE=69.23%, Gain=14.87dBm.

• Journal of the Korean Vacuum Society
• /
• v.14 no.4
• /
• pp.207-214
• /
• 2005

This paper presents a channel structure for promising high performance pseudomorphic high electron mobility transistor(pHEMT) switching device for design and fabricating of microwave control circuits, such as switches, phase shifters, attenuators, limiters, for application in personal mobile communication systems. Using the designed epitaxial channel layer structure and ETRI's $0.5\mu$m pHEMT switch process, single pole double throw (SPDT) Tx/Rx monolithic microwave integrated circuit (MMIC) switch was fabricated for 2.4 GHz and 5 GHz band wireless local area network (WLAN) systems. The SPDT switch exhibits a low insertion loss of 0.849 dB, high isolation of 32.638 dB, return loss of 11.006 dB, power transfer capability of 25dBm, and 3rd order intercept point of 42dBm at frequency of 5.8GHz and control voltage of 0/-3V These performances are enough for an application to 5 GHz band WLAN systems.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
• /
• v.29 no.10
• /
• pp.766-772
• /
• 2018

A 6~10 GHz wide-band power amplifier was designed using an InGaAs enhancement-mode(E-mode) $0.15{\mu}m$ pseudomorphic high-electron-mobility transistor(pHEMT). The positive gate bias of the E-mode pHEMT device removes the need for complex negative voltage generation circuits, therefore reducing the module size. The wire bond and substrate loss parameters were modeled and extracted using a three-dimensional electromagnetic(3D EM) simulation. For wideband characteristics, lossy matching was adopted and the gate bias was optimized for maximum power and efficiency. The measured gain, in/output return loss, output power, and power-added efficiency were greater than 20 dB, 8 dB, 27 dBm, and 35 %, respectively, in the 6~10 GHz band.

• The Proceeding of the Korean Institute of Electromagnetic Engineering and Science
• /
• v.11 no.2
• /
• pp.21-34
• /
• 2000

Millimeter wave is expected as the unlimited useful frequency resources for the next generation wireless communication services. In the past, its usage was limited to the military warfare due to lack of millimeter devices. The development of GaAs pHEMT in 1980 and the progress in the processing technologies made the new consumer wireless services possible utilizing millimeter waves. Specially, most of passive components necessary for circuit design can be integrated with GaAs pHEMTs and this removes the difficulty in assembly unavoidable in hybrid design. InP based pHEMTs developed later possess all the properties of GaAs and it shows many advantages in higher frequency applications. In this paper, the status and trends of those devices and MMICs are presented and the future developing trends is also described.

• Journal of the Korean Institute of Telematics and Electronics D
• /
• v.36D no.1
• /
• pp.38-46
• /
• 1999

o.25${\mu}m$ T-shaped gate P-HEMT is fabricated and used for design of X0band three stage monolithic microwave integrated circuit(MMIC) low noise amplifier(LNA). The fabricated P-HEMT exhibits an extrinsis transconductance of 400mS/mm and a drain current of 400mA/mm. The RF and noise characteristics show that the current gain cut off frequency is 65GHz and minimum noise figure(NFmin) of 0.7dB with an associated gain of 14.8dB at 9GHz. In the design of the three stage LNA, we have used the inductive series feedback circuit topology with the short stub. The effects of series feedback to the noise figure, the gain, and the stability have been investigated to find the optimal short stub length. The designed three staage LNA showed a gain of above 33dB, a noise figure of under 1.2dB, and ainput/output return loss of under 15dB and 14dB, respectively. The results show that the fabricated P-HEMT is very suitable for a X-band LNA with high gain.

• Proceedings of the IEEK Conference
• /
• 2000.06b
• /
• pp.16-19
• /
• 2000

DC and low frequency noise characteristics of InGaP/InGaAs pseudomorphic HEMTs (p-HEMTs) grown by compound source MBE are investigated for temperature range of 150K to 370K. Equivalent input noise spectra( $S_{iv}$ ) were measured as a function of frequency and temperature. $S_{iv}$ was measured to be 3.4 $\times$ 10$^{-12}$ $V^2$/ Hz at 1kHz for 1.3 X 50${\mu}{\textrm}{m}$$^2$InGaP/InGaAs p-HEMT at room temperature. Measurements of the low-frequency noise spectra of the p-HEMT as a function of temperature show that the trap with an activation energy level around 0.589 eV is a dominant trap that accounts for the low-frequency noise behavior of the device. The normalized extrinsic gm frequency dispersion of the p-HEMT. was as low as 2.5％ at room temperature, indicating that the device has well-behaved low-frequency noise characteristics. Sub-micron (0.25 $\times$ 50${\mu}{\textrm}{m}$$^2$) gate p-HEMT showed $f_{T}$ and $f_{max}$ of 40GHz and 108GHz, respectively.y.y.