• Transactions on Electrical and Electronic Materials
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• 제11권6호
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• pp.266-270
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• 2010

The effect of an Ar plasma treatment on polycarbonate substrates was investigated using $TiO_2$ coatings produced by reactive ion-beam assisted sputtering. The typical pressure used during sputtering was about $10^{-4}$ Torr. After the Ar plasma treatment, the contact angle of a water droplet was reduced from $88^{\circ}$ to $52^{\circ}$ and then further decreased to $12^{\circ}$ with the addition of oxygen into the chamber. The surface of the polycarbonate substrate hanged from hydrophobic to hydrophilic with these treatments and revealed its changing nano-scale roughness. The $TiO_2$ films on the treated surface showed various colors and periodic ordering dependant on the film thickness due to optical interference.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제48권5호
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• pp.319-325
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• 1999

Direct current(d.c.)leakage current voltage characteristics of radio-frequencymagnetron sputtered BaTa\sub 2\O\sub 6\ film capacitors with aluminum(A1) top and indium tin oxide (ITO) bottom electrodes have been investigatedas a function of applied field and temperature. In order to study surfacetreatment effect on the electrical characteristics of as-deposited film weperformed exposure of oxygen plasma on $BaTa_2O_6$ surface. d. c.current-voltage (I-V), bipolar pulse charge-voltage (Q-V), d. c. current-time (I-t) andcapacitance-frequency (C-f) analysis were performed on films. All ofthe films exhibita low leakage current, a high breakdown field strength (3MV/cm-4.5MV/cm), and high dielectric constant (20-30). From the temperature dependence of leakage current,we can conclude that the dominant conduction mechanism is ascribed toSchottky emission at high electric field (>1MV/cm) and hopping conduction at lowelectric field (<1MV/cm). According to our results, the oxide plasma surfacetreatmenton as-deposited $BaTa_2O_6$ resulted in lowering interfacebarrier height and thus, leakage current when a negative voltage applied to the A1 electrode. This can be explained by reduction of surface contamination via etching surface and filling defects such as oxygen vacancies.

• Elastomers and Composites
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• 제40권1호
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• pp.22-28
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• 2005

본 연구에서는 실리카/고무 복합재료의 기계적 계면 물성과 열안정성에 대한 산소플라즈마의 영향에 대하여 살펴보았다. 실리카의 표면특성은 XPS와 접촉각 측정을 통하여 살펴보았다. 실리카/고무 복합재료의 기계적 물성과 열안정성은 각각 인열에너지 ($G_{IIIC}$)와 열중량분석(TGA)를 통하여 관찰하였다. 실험결과, 플라즈마 처리시간이 증가함에 따라 실리카 표면에 산소가 함유된 극성 관능기의 도입량이 증가하였으며, 이에 따라 고무 복합재료의 인열에너지와 열안정성이 향상되었다. 이러한 결과는 NBR과 같은 극성고무가 산소가 함유된 관능기가 도입된 실리카와 상대적으로 높은 상호작용을 하기 때문으로 판단된다.

• 멤브레인
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• 제32권1호
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• pp.43-49
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• 2022

높은 안전성과 견고한 기계적 특성을 가진 고체상 슈퍼커패시터는 차세대 에너지 저장 장치로서 세계적 관심을 끌고 있다. 슈퍼커패시터의 전극으로서 경제적인 탄소 기반 전극이 많이 사용되는데 수계 전해질을 도입하는 경우 소수성 표면을 가진 탄소 기반 전극과의 계면 상호성이 좋지 않아 저항이 증가한다. 이와 관련하여 본 연구에서는 전극 표면에 산소 플라즈마 처리를 하여 친수화된 전극과 수계 전해질 사이의 향상된 계면 성질을 기반으로 더 높은 전기화학적 성능을 얻는 방법을 제시한다. 풍부해진 산소 작용기들로 인한 표면 친수화 효과는 접촉각 측정을 통해 확인하였으며, 전력과 지속시간을 조절함으로써 친수화 정도를 손쉽게 조절할 수 있음을 확인하였다. 수계 전해질로 PVA/H₃PO₄ 고체상 고분자 전해질막을 사용하였으며 프레싱하여 전극에 도입하였다. 15 W의 낮은 전력으로 5초간 산소 플라즈마 처리를 시행하는 것이 최적 조건이었으며 슈퍼커패시터의 에너지 밀도가 약 8% 증가하였다.

• 한국전기전자재료학회논문지
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• 제18권2호
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• pp.148-152
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• 2005

Atmospheric low-temperature plasma was produced using dielectric barrier discharge (DBD) plate-type plasma reactor and high frequency of 13.56 Hz. The surfaces of polyimide films for insulating and packaging materials were treated by the atmospheric low-temperature plasma. The contact angle of 67$^{\circ}$ was observed before the plasma treatment. The contact angle was decreased with deceasing the velocity of plasma treatment. In case of oxygen content of 0.2 %, electrode gap of 2 mm, the velocity of plasma treatment of 20 mm/sec, and input power of 400 W, the minimum contact angle of 13$^{\circ}$ was observed. The chemical characteristics of polyimide film after the plama treatment were investigated using X-ray photoelectron spectroscopy (XPS), and new carboxyl group bond was observed. The surfaces of polyimide films were changed into hydrophilic by the atmospheric low-temperature plasma. The polyimide films having hydrophilic surface will be very useful as a packaging and insulating materials in electronic devices.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 1999년도 추계학술발표회 초록집
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• pp.65-66
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• 1999

• 한국전기전자재료학회논문지
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• 제20권7호
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• pp.615-619
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• 2007

MgO layer plays an important role for plasma display panels (PDPs). In this experiment, ion beam assisted deposition (IBAD) methode was uesed to deposit a MgO thin film and the assisting oxygen ion beam energy was varied from 100 eV to 500 eV. In order to investigate the relationship between the secondary electron emission and the defect levels of the MgO layer, we measured the cathodoluminescence (CL) spectra of the MgO thin films, and we analyzed the CL peak intensity and peak transition. The results showed that the assisting ion beam energy played an important role in the peak intensity and the peak transition of the CL spectrum. The properties of MgO thin film were also analyzed using XRD and SEM, these results showed the assisting ion beam energy had direct effect on characteristics of MgO thin film.

• 약학회지
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• 제53권4호
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• pp.189-193
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• 2009

To investigate the antioxidant effect of lutein on N-nitrosodimethylamine (NDEA)-induced oxidative stress in mice, we measured lipid peroxidation, superoxide dismutase (SOD) and catalase of various tissues. Body weight was almost similar in lutein and control groups during 3 weeks. NDEA increased significantly the activities of typical marker enzymes of liver function (AST, ALT and ALP) in both groups. However, the increase of plasma aminotransferase activity significantly decreased in lutein group. Lipid peroxidation and SOD in various tissues, such as heart, lung, liver, kidney, spleen and plasma were significantly increased by NDEA, which were significantly reduced by lutein at a dose of 50 mg/kg. Catalase activity decreased significantly in control and lutein groups treated with NDEA, the effect being less in lutein group. Lesser effect on SOD and catalase in NDEA-treated lutein group indicates the improvement of protective mechanisms by lutein. Thus, it can be concluded from the present study that lutein can offer a useful protection against NDEA-induced oxidative stress.

• 조명전기설비학회논문지
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• 제27권7호
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• pp.45-51
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• 2013

This study is to discuss simulation results with 51 principal chemical reactions in non-thermal plasma space under atmospheric pressure, and the ambient gas was mainly composed of oxygen and nitrogen molecules. The initial density of O and OH radicals under the ambient temperature of 300K is largely generated in comparison with other higher temperature, and the density of O radical decreased from $20{\mu}s$ according to increase the temperature. The initial density of OH radical seemed to decrease steeply at the initial stage. By increasing the initial density of $H_2O$ molecules, O radical's effect was few and the density of OH radical was largely generated about 2 times. In addition, ozone density was increased as increasing the density of O radical, but it was decreased as increasing the density of $H_2O$. In case of the temperature more than 300K, $NO_2$ tend to be removed, but NO was increased than the initial density.

• 한국표면공학회지
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• 제39권3호
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• pp.98-104
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• 2006

Al-doped ZnO (AZO) films were deposited on the plastic substrate by inductively coupled plasma (ICP) assisted DC magnetron sputtering. The AZO films were produced by sputtering a metallic target (Zn/Al) in a mixture of argon and oxygen gases. AZO films with an electrical resistivity of ${\sim}10^3\;{\Omega}cm$ and an optical transmittance of 80% were obtained even at a low deposition temperature. In-situ process control methods were used to obtain stable deposition conditions in the transition region without any hysteresis effect. The target voltage was controlled either at a constant DC power. It was found that the ratio of the zinc to oxygen emission intensity, I (O 777)/I (Zn 481) decreased with increasing the target voltage in the transition region. The $Ar/O_2$ plasma treatment improve the adhesion strength between the polycarbonate substrate and AZO films.